Method for depositing transparent conducting oxides

    公开(公告)号:US10131991B2

    公开(公告)日:2018-11-20

    申请号:US12895305

    申请日:2010-09-30

    IPC分类号: C23C16/455 C23C16/40

    摘要: A method of preparing light transmitting conducting metal oxide (TCO) films using atomic layer deposition (ALD) of a metal precursor multiple oxidizing reactants. The multiple metal oxidizing reactants may be selected to enhance growth of the TCO film. In a particular embodiment, an indium oxide TCO film is prepared using a cyclopentadienyl indium precursor and a combination of water and oxygen.

    SPATIALLY CONTROLLED ATOMIC LAYER DEPOSITION IN POROUS MATERIALS
    4.
    发明申请
    SPATIALLY CONTROLLED ATOMIC LAYER DEPOSITION IN POROUS MATERIALS 有权
    空间控制原子层沉积在多孔材料中

    公开(公告)号:US20090304920A1

    公开(公告)日:2009-12-10

    申请号:US12478578

    申请日:2009-06-04

    摘要: Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.

    摘要翻译: 在多孔基材内选择性沉积材料的方法。 该方法使用掩蔽前体施加到多孔基材上的钝化作用。 通过将衬底暴露于一个或多个掩模前体来掩蔽衬底内的孔表面的一部分。 被掩蔽的孔表面的深度可通过调节衬底对掩蔽前体的曝光来控制。 掩蔽前体的应用防止一个或多个随后施加的金属前体在被掩蔽前体涂覆的孔表面的一部分附近吸附。 小于整个未掩模的孔表面被金属前体涂覆,在孔表面的一部分上形成金属条纹。 通过调节多孔基材对金属前体的曝光来控制金属条纹的深度。 随后将底物暴露于饱和水中,使沉积的前体氧化。

    Use of flat panel microchannel photomultipliers in sampling calorimeters with timing
    10.
    发明授权
    Use of flat panel microchannel photomultipliers in sampling calorimeters with timing 有权
    平板微通道光电倍增器在采样量热仪中的使用

    公开(公告)号:US08604440B2

    公开(公告)日:2013-12-10

    申请号:US13044442

    申请日:2011-03-09

    IPC分类号: G01T1/164

    摘要: Large-area, flat-panel photo-detectors with sub-nanosecond time resolution based on microchannel plates are provided. The large-area, flat-panel photo-detectors enable the economic construction of sampling calorimeters with, for example, enhanced capability to measure local energy deposition, depth-of-interaction, time-of-flight, and/or directionality of showers. In certain embodiments, sub-nanosecond timing resolution supplies correlated position and time measurements over large areas. The use of thin flat-panel viewing radiators on both sides of a radiation-creating medium allows simultaneous measurement of Cherenkov and scintillation radiation in each layer of the calorimeter. The detectors may be used in a variety of applications including, for example, medical imaging, security, and particle and nuclear physics.

    摘要翻译: 提供了基于微通道板的亚纳秒时间分辨率的大面积平板光电探测器。 大面积的平板光电探测器能够对采样量热仪进行经济建设,例如增强测量局部能量沉积,相互作用深度,飞行时间和/或淋浴方向性的能力。 在某些实施例中,亚纳秒定时分辨率在大面积上提供相关位置和时间测量。 在辐射产生介质的两侧使用薄的平板观察辐射器允许同时测量量热计的每层中的切伦科夫和闪烁辐射。 检测器可以用于各种应用,包括例如医学成像,安全性,粒子和核物理学。