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公开(公告)号：US07857683B2
公开(公告)日：2010-12-28
申请号：US12568497
申请日：2009-09-28
IPC分类号： B24B29/00
CPC分类号： B24B37/32 , Y10T29/49826
摘要： An improved chemical mechanical polishing retaining ring. A representative embodiment comprises a base portion made from a wear-resistant plastic material, and an upper portion, or backbone portion, made from a stiffer and more wear resistant material. One of the base or backbone portion is preferably overmolded onto the other. The base portion can be generally defined by a flat pad-contacting surface, an outer surface, and an inner surface. The base portion can additionally include channels extending from the outer surface to the inner surface to facilitate transfer of slurry to and from the substrate to be polished during the process. One or both of the base portion or backbone portion further includes a plurality of circular ribs that serve to create additional bonding surface with the overmolded material. The retaining ring may additionally includes a plurality of bosses with threaded insert holes by which the retaining ring is attached to a chemical mechanical polishing system.
摘要翻译： 改进的化学机械抛光保持环。 代表性的实施例包括由耐磨塑料材料制成的基部，以及由更硬和更耐磨的材料制成的上部或主体部分。 基部或骨架部分中的一个优选地包覆成型在另一个上。 基部一般可以由平垫接触表面，外表面和内表面限定。 基部可以另外包括从外表面延伸到内表面的通道，以便于在该过程期间将浆料转移到待抛光的基底上和从基底转移。 基部或骨架部分中的一个或两个还包括多个圆形肋，其用于与包覆成型的材料产生附加的粘合表面。 保持环可以另外包括具有螺纹插入孔的多个凸台，保持环通过该凸起附接到化学机械抛光系统。
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公开(公告)号：US07677393B2
公开(公告)日：2010-03-16
申请号：US11651779
申请日：2007-01-10
IPC分类号： B65D85/30
CPC分类号： H01L21/67373 , E05B17/0041 , E05B65/006 , E05B2015/0468 , E05B2015/0479 , E05C9/042
摘要： A container for holding a plurality of wafers in an axially aligned, generally parallel spaced apart arrangement includes an enclosure portion having a top, a bottom, a pair of opposing sides, a back and an open front. At least one wafer support is provided in the enclosure along with a kinematic coupling on the bottom of the enclosure. The container has a door for sealingly closing the open front which includes a chassis and an operable latching mechanism on the chassis. The latching mechanism includes a cam selectively rotatable to shift the latching mechanism between a first favored position and a second favored position and at least one vibration dampener for dampening vibrations generated when the latching mechanism is shifted between the first and second favored positions.
摘要翻译： 用于将多个晶片保持在轴向对准的大致平行间隔开的布置中的容器包括具有顶部，底部，一对相对侧面，后部和敞开前部的外壳部分。 在外壳中提供至少一个晶片支撑件以及在外壳的底部上的运动耦合。 容器具有用于密封地封闭敞开的前部的门，该门包括底盘和在底盘上的可操作的闩锁机构。 闩锁机构包括可选择地旋转的凸轮，以便在第一有利位置和第二偏好位置之间移动闩锁机构，以及至少一个振动阻尼器，用于抑制当锁定机构在第一和第二有利位置之间移动时产生的振动。
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公开(公告)号：US07344030B2
公开(公告)日：2008-03-18
申请号：US10983107
申请日：2004-11-05
IPC分类号： B65D85/48
CPC分类号： H01L21/67373 , H01L21/67386
摘要： A wafer carrier door having an inner door portion and an outer door portion. The inner door portion has a substantially continuous inner surface. The outer door portion extends over at least a portion of the inner door portion. The outer door portion has a plurality of apertures formed therein. The outer door portion is attached to the inner door portion.
摘要翻译： 具有内门部分和外门部分的晶片承载门。 内门部分具有基本连续的内表面。 外门部分在内门部分的至少一部分上延伸。 外门部分具有形成在其中的多个孔。 外门部分附接到内门部分。
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公开(公告)号：US07073667B2
公开(公告)日：2006-07-11
申请号：US10971556
申请日：2004-10-22
CPC分类号： H01L21/67288 , B65D79/02 , G03F1/66 , H01L21/67366
摘要： A semiconductor wafer, substrate, or reticle storage or shipping device that includes a photochromic indicator of exposure to undesired electromagnetic radiation. The present invention includes the incorporation of a photochromic material into the plastic used to fabricate at least a portion of a semiconductor wafer, disk, or reticle shipping or storage containers. The container may include photochromic material in the form of a transparent window or a larger portion of the container. The photochromic material may change color or darkness in response to exposure to a selected range of wavelengths of light.
摘要翻译： 包括暴露于不期望的电磁辐射的光致变色指示剂的半导体晶片，衬底或掩模版存储或运输装置。 本发明包括将光致变色材料结合到用于制造半导体晶片，盘或掩模版运输或存储容器的至少一部分的塑料中。 容器可以包括透明窗口形式的光致变色材料或容器的较大部分。 响应于暴露于所选择的光波长范围，光致变色材料可以改变颜色或黑暗。
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公开(公告)号：US4438227A
公开(公告)日：1984-03-20
申请号：US432451
申请日：1982-10-04
申请人： James B. Nall , Jeffery J. King
发明人： James B. Nall , Jeffery J. King
IPC分类号： B05D1/32 , C09D101/18 , C08L1/18 , B05D5/00
CPC分类号： B05D1/32 , C09D101/18 , Y10S260/24 , Y10S524/905
摘要： A composition and method of application of the composition to produce masks of the type particularly useful in the manufacture of varnished electronic terminals and components is specified. The composition consists of mixing acetone, nitrocellulose, methyl isobutyl ketone (MIBK), arylsulfonamide formaldehyde resin, and tri (b-chloroethyl) phosphate, a fire retardant, under carefully controlled conditions. This masking product is applied, prior to the varnish, on an electronic part and is subjected to heating in the varnish curing oven to about 200.degree. F. whereupon the masking product will carbonize. The resulting carbonized coating is easily removed by brushing to produce a varnish mask where the masking product was applied.
摘要翻译： 规定组合物的组合物和施用方法，用于生产特别可用于制造清漆电子终端和组分的类型的掩模。 该组合物是在仔细控制的条件下混合丙酮，硝基纤维素，甲基异丁基酮（MIBK），芳基磺酰胺甲醛树脂和三（B-氯乙基）磷酸酯，一种阻燃剂。 该掩蔽产品在清漆之前涂覆在电子部件上，并在清漆固化炉中加热至约200°F，于是掩蔽产物将碳化。 通过刷涂容易地除去所得到的碳化涂层，以产生涂覆掩蔽产品的清漆掩模。
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公开(公告)号：US07866480B2
公开(公告)日：2011-01-11
申请号：US11786035
申请日：2007-04-10
IPC分类号： B65D85/90
CPC分类号： H01L21/67369 , H01L21/67379 , H01L21/67393 , Y10S206/832
摘要： A substrate container and a bottom plate are connected with a mechanism for adjusting the distance between the container and bottom plate, by, e.g., a threaded connection between two members of the connector mechanism. Also provided are a duck-billed valve for venting the container and a dampener for minimizing damage due to shocks.
摘要翻译： 衬底容器和底板通过例如连接器机构的两个构件之间的螺纹连接的方式与用于调节容器和底板之间的距离的机构连接。 还提供了用于排放容器的鸭嘴阀和用于使由冲击引起的损坏最小化的阻尼器。
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公开(公告)号：US07422107B2
公开(公告)日：2008-09-09
申请号：US11339462
申请日：2006-01-25
IPC分类号： B65D85/86
CPC分类号： H01L21/67379 , Y10S414/14
摘要： A substrate kinematic coupling or guide plate for a substrate carrier having textured or patterned surfaces at the points of contact to reduce frictional forces generated between automated processing equipment and the kinematic coupling. The textured surface reduces the contact area between the processing equipment and the contact portion of the kinematic coupling, thereby reducing the resultant frictional force. By reducing the frictional force, the substrate carrier more readily settles on the mounting pins of the processing equipment, thus avoiding intolerable height and angular deviations during automated access to the substrates. Textures include, but are not limited to, a knurl pattern, ridges running laterally along the contact portions, and ridges running longitudinally along the contact portions. The textures may be formed by a blow molding, injection molding or in an overmolding process, or by a machining or imprinting process.
摘要翻译： 用于衬底载体的衬底运动耦合或引导板，其在接触点处具有纹理化或图案化表面，以减少在自动处理设备和运动耦合之间产生的摩擦力。 纹理表面减小了处理设备与运动联接器的接触部分之间的接触面积，从而减少了所产生的摩擦力。 通过减小摩擦力，基板载体更容易落在加工设备的安装销上，从而在自动进入基板期间避免不可容忍的高度和角度偏差。 纹理包括但不限于滚花图案，沿着接触部横向延伸的脊和沿着接触部分纵向延伸的脊。 纹理可以通过吹塑，注射成型或包覆成型工艺，或通过机械加工或压印加工形成。
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公开(公告)号：US07316325B2
公开(公告)日：2008-01-08
申请号：US10982401
申请日：2004-11-05
IPC分类号： A47G19/08
CPC分类号： H01L21/67396
摘要： A substrate carrier to dissipate electrostatic charge has a conductive grid or network overmolded in a substantially integral container. The grid is electrically connected to an underlying and grounded saddle. The carrier may further include substantially transparent side walls and electrically conductive shelves to retain stored substrates in a generally axial alignment.
摘要翻译： 耗散静电电荷的衬底载体具有在基本上一体的容器中包覆模制的导电栅格或网络。 电网电连接到底层和接地的鞍座上。 载体还可以包括基本上透明的侧壁和导电架，以将所存储的基板保持在大致轴向对准。
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公开(公告)号：US07325693B2
公开(公告)日：2008-02-05
申请号：US10988993
申请日：2004-11-15
IPC分类号： B65D85/30
CPC分类号： H01L21/67353 , H01L21/67373 , Y10T292/1049
摘要： A container for holding a single wafer includes a door with a latching mechanism having a cam with a pair of opposing wings extending laterally therefrom. The cam is selectively rotatably shiftable between a first favored position wherein the wings are completely within the door enclosure to enable the door to be engaged and disengaged from the door frame, and a second favored position wherein the wings extend laterally outward from the door enclosure so as to engage in the latch recesses in the door frame when the door is engaged in the door frame. The cam wings may include a ramped portion thereon for drawing the door into closer engagement in the door frame when the cam is rotated from the first favored position to the second favored position. Also, the latching mechanism may further include a spring disposed to provide a biasing force for urging the latching mechanism toward each of the first and second favored positions, and soft-stop dampening springs for decelerating the cam in a controlled fashion at the first and second favored positions and for absorbing vibrations resulting from the collision of the cam with a fixed stop on the door chassis.
摘要翻译： 用于保持单个晶片的容器包括具有闩锁机构的门，所述闩锁机构具有凸轮，所述凸轮具有从其横向延伸的一对相对的翼。 凸轮可选择性地可旋转地在第一有利位置之间移动，其中翼完全在门外壳内，以使门能够与门框接合和脱离，以及第二优选位置，其中翼从门外壳横向向外延伸， 当门接合在门框中时，接合门框中的闩锁凹部。 凸轮翼可以包括其上的斜坡部分，用于当凸轮从第一有利位置旋转到第二优选位置时，将门拉近门框中更紧密的接合。 此外，闩锁机构还可以包括设置成提供用于将闩锁机构朝向第一和第二受惠位置中的每一个推动的偏置力的弹簧，以及用于在第一和第二位置以受控的方式减速凸轮的软停止润滑弹簧 有利的位置和吸收由于凸轮与门底盘上的固定挡块碰撞而产生的振动。
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公开(公告)号：US07201276B2
公开(公告)日：2007-04-10
申请号：US10982400
申请日：2004-11-05
IPC分类号： B65D85/30
CPC分类号： H01L21/67369 , H01L21/67379 , H01L21/67393 , Y10S206/832
摘要： A substrate container and a bottom plate are connected with a mechanism for adjusting the distance between the container and bottom plate, by, e.g., a threaded connection between two members of the connector mechanism. Also provided are a duck-billed valve for venting the container and a dampener for minimizing damage due to shocks.
摘要翻译： 衬底容器和底板通过例如连接器机构的两个构件之间的螺纹连接的方式与用于调节容器和底板之间的距离的机构连接。 还提供了用于排放容器的鸭嘴阀和用于使由冲击引起的损坏最小化的阻尼器。
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