Sigma-delta analog-to-digital converter and solid-state image pickup device
    1.
    发明授权
    Sigma-delta analog-to-digital converter and solid-state image pickup device 有权
    Sigma-delta模数转换器和固态图像拾取器件

    公开(公告)号:US07773018B2

    公开(公告)日:2010-08-10

    申请号:US12453845

    申请日:2009-05-26

    IPC分类号: H03M3/00

    CPC分类号: H03M3/384 H03M3/424

    摘要: A sigma-delta analog-to-digital converter may include a sigma-delta modulator and a decimation filter. The sigma-delta modulator may convert a first analog input signal into a first bit stream having a first pattern using sigma-delta modulation and convert a second analog input signal into a second bit stream having a second pattern using the sigma-delta modulation. The decimation filter may integrate the number of bits having a particular value in the first bit stream, output a first digital value, calculate a bitwise complement value of the first digital value, integrate the number of bits having the particular value in the second bit stream with the bitwise complement value of the first digital value as an initial value of a second digital value, and output the second digital value.

    摘要翻译: Σ-Δ模数转换器可以包括Σ-Δ调制器和抽取滤波器。 Σ-Δ调制器可以使用Σ-Δ调制将第一模拟输入信号转换成具有第一模式的第一比特流,并且使用Σ-Δ调制将第二模拟输入信号转换成具有第二模式的第二比特流。 抽取滤波器可以将具有特定值的比特数量集成在第一比特流中,输出第一数字值,计算第一数字值的按位补码,将具有特定值的比特数集成在第二比特流中 以第一数字值的按位补码作为第二数字值的初始值,并输出第二数字值。

    APPARATUS AND METHOD FOR SIGMA-DELTA ANALOG TO DIGITAL CONVERSION
    2.
    发明申请
    APPARATUS AND METHOD FOR SIGMA-DELTA ANALOG TO DIGITAL CONVERSION 有权
    SIGMA-DELTA模拟数字转换的装置和方法

    公开(公告)号:US20090261998A1

    公开(公告)日:2009-10-22

    申请号:US12427303

    申请日:2009-04-21

    摘要: A method and apparatus are provided for sigma-delta (ΣΔ) analog to digital conversion, the method including receiving an analog signal, sampling the received signal, comparing the sampled signal with a constant reference voltage, providing at least one high-order bit responsive to the constant reference comparison, comparing the sampled signal with a variable reference voltage, providing at least one low-order bit responsive to the variable reference comparison, and combining the at least one high-order bit with the at least one low-order bit; and the apparatus including a comparator, a first ADC portion supplying the comparator with a constant reference voltage for providing at least one high-order bit, and a second ADC portion supplying the comparator with a variable reference voltage for providing at least One low-order bit.

    摘要翻译: 提供了一种用于Σ-Δ(SigmaDelta)模数转换的方法和装置,该方法包括接收模拟信号,对接收信号进行采样,将采样信号与恒定参考电压进行比较,提供至少一个高阶位响应 对所述恒定参考比较进行比较,将所述采样信号与可变参考电压进行比较,提供响应于所述可变参考比较的至少一个低阶位,以及将所述至少一个高位位与所述至少一个低位位 ; 并且所述装置包括比较器,向所述比较器提供用于提供至少一个高位的恒定参考电压的第一ADC部分和向比较器提供可变参考电压的第二ADC部分,用于提供至少一个低阶 位。

    Clavanins
    3.
    发明授权
    Clavanins 失效
    克拉夫人

    公开(公告)号:US6040293A

    公开(公告)日:2000-03-21

    申请号:US810324

    申请日:1997-02-28

    CPC分类号: C07K14/43504 A61K38/00

    摘要: Novel microbial peptides called clavanins are of the formula[X'.sub.1 X.sub.2 B'.sub.3 X.sub.4 X.sub.5 ]U.sub.6 B.sub.7 X.sub.8 X.sub.9 B.sub.10 B.sub.11 X.sub.12 U.sub.13 Z.sub.14 X.sub.15 X.sub.16 B*.sub.17 U.sub.18 X.sub.19 U.sub.20 B.sub.21 X.sub.22 X.sub.23 ( 1)(SEQ ID NO:1)including the salts, esters, amides and acylated forms thereofwherein X is a hydrophobic amino acid residue or modified form thereof;X' is a small or a hydrophobic amino acid residue or a modified form thereof;B is a basic amino acid residue or modified form thereof;B' is basic or a polar/large amino acid residue or modified form thereof; andB* is a basic or a hydrophobic amino acid residue or a modified form thereof;U is a small amino acid residue or modified form thereof;Z is a polar/large amino acid residue or modified form thereof, and wherein 1-5 amino acids is deleted from the N-terminus.

    摘要翻译: 称为克拉维宁的新型微生物肽具有式[X'1X2B'3X4X5] U6B7X8X9B10B11X12U13Z14X15X16B * 17U18X19U20B21X22X23(1)(1)(SEQ ID NO:1),其包括其盐,酯,酰胺和酰化形式,其中X是疏水性氨基酸残基或经修饰 形式; X'是小或疏水性氨基酸残基或其修饰形式; B是碱性氨基酸残基或其修饰形式; B'是碱性或极性/大氨基酸残基或其修饰形式; B *是碱性或疏水性氨基酸残基或其修饰形式; U是小氨基酸残基或其修饰形式; Z是极性/大的氨基酸残基或其修饰形式,其中1-5个氨基酸从N-末端缺失。

    Clavaspirins
    4.
    发明授权
    Clavaspirins 失效
    克拉霉素

    公开(公告)号:US5998374A

    公开(公告)日:1999-12-07

    申请号:US808277

    申请日:1997-02-28

    CPC分类号: C07K14/43504 A61K38/00

    摘要: Novel microbial peptides called clavaspirins are of the formula (SEQ ID NO:1)X'.sub.1 X.sub.2 B'.sub.3 X.sub.4 X.sub.5 U.sub.6 U.sub.7 X.sub.8 X.sub.9 B.sub.10 X'.sub.11 X.sub.12 U.sub.13 B.sub.14 X.sub.15 X.sub.16 B*.sub.17 B.sub.18 X.sub.19 U.sub.20 X.sub.21 X'.sub.22 X.sub.23 (1)including the salts, esters, amides and acylated forms thereofwherein X is a hydrophobic amino acid residue or modified form thereof;X' is a small or a hydrophobic amino acid residue or a modified form thereof;B is a basic amino acid residue or modified form thereof;B' is basic or a polar/large amino acid residue or modified form thereof;B* is a basic or a hydrophobic amino acid residue or a modified form thereof; andU is a small amino acid residue or modified form thereof.

    摘要翻译: 称为克拉斯匹林的新型微生物肽具有式(SEQ ID NO:1)X'1X2B'3X4X5U6U7X8X9B10X'11X12U13B14X15X16B * 17B18X19U20X21X'22X23(1),其包括其盐,酯,酰胺和酰化形式,其中X是疏水性氨基酸残基或 其修改形式; X'是小或疏水性氨基酸残基或其修饰形式; B是碱性氨基酸残基或其修饰形式; B'是碱性或极性/大氨基酸残基或其修饰形式; B *是碱性或疏水性氨基酸残基或其修饰形式; U是小氨基酸残基或其修饰形式。

    METHOD OF FORMING MINUTE PATTERNS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
    5.
    发明申请
    METHOD OF FORMING MINUTE PATTERNS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME 有权
    形成分钟图案的方法和使用其制造半导体器件的方法

    公开(公告)号:US20160218010A1

    公开(公告)日:2016-07-28

    申请号:US14975932

    申请日:2015-12-21

    IPC分类号: H01L21/28 H01L27/11 H01L29/66

    摘要: A method includes forming a first etch target layer and a first mask layer on a substrate. Sacrificial patterns extending in a first direction are formed on the first mask layer in a second direction. Spacers are formed on sidewalls of the sacrificial patterns. After removing the sacrificial patterns, the first mask layer is etched using the spacers as an etching mask to form first masks. Second masks are formed on sidewalls of each first mask to define a third masks including each first mask and the second masks on sidewalls of each first mask. The first etch target layer is etched using the first and third masks as an etching mask to form first and second patterns in the first and second regions, respectively. Each first pattern has a first width, and each second pattern has a second width greater than the first width.

    摘要翻译: 一种方法包括在衬底上形成第一蚀刻目标层和第一掩模层。 在第一方向上在第一掩模层上形成沿第一方向延伸的牺牲图案。 垫片形成在牺牲图案的侧壁上。 在去除牺牲图案之后,使用间隔件作为蚀刻掩模来蚀刻第一掩模层以形成第一掩模。 第二掩模形成在每个第一掩模的侧壁上以限定包括每个第一掩模的第三掩模和在每个第一掩模的侧壁上的第二掩模。 使用第一和第三掩模蚀刻第一蚀刻目标层作为蚀刻掩模,以分别在第一和第二区域中形成第一和第二图案。 每个第一图案具有第一宽度,并且每个第二图案具有大于第一宽度的第二宽度。

    Apparatus and method for sigma-delta analog to digital conversion
    6.
    发明授权
    Apparatus and method for sigma-delta analog to digital conversion 有权
    用于Σ-Δ模数转换的装置和方法

    公开(公告)号:US07916061B2

    公开(公告)日:2011-03-29

    申请号:US12427303

    申请日:2009-04-21

    IPC分类号: H03M1/12

    摘要: A method and apparatus are provided for sigma-delta (ΣΔ) analog to digital conversion, the method including receiving an analog signal, sampling the received signal, comparing the sampled signal with a constant reference voltage, providing at least one high-order bit responsive to the constant reference comparison, comparing the sampled signal with a variable reference voltage, providing at least one low-order bit responsive to the variable reference comparison, and combining the at least one high-order bit with the at least one low-order bit; and the apparatus including a comparator, a first ADC portion supplying the comparator with a constant reference voltage for providing at least one high-order bit, and a second ADC portion supplying the comparator with a variable reference voltage for providing at least one low-order bit.

    摘要翻译: 提供了一种用于Σ-Δ(&Sgr& Dgr)模数转换的方法和装置,该方法包括接收模拟信号,对接收信号进行采样,将采样信号与恒定参考电压进行比较, 响应于常数参考比较,将采样信号与可变参考电压进行比较,提供响应于可变参考比较的至少一个低阶位,以及将至少一个高位位与至少一个低位比较 顺序位 并且所述装置包括比较器,为比较器提供用于提供至少一个高位的恒定参考电压的第一ADC部分和向比较器提供可变参考电压的第二ADC部分,用于提供至少一个低阶 位。

    Decimation filters, analog-to-digital converters including the same, and image sensors including the converters
    7.
    发明申请
    Decimation filters, analog-to-digital converters including the same, and image sensors including the converters 有权
    抽取滤波器,包括相同的模数转换器和包括转换器的图像传感器

    公开(公告)号:US20090295956A1

    公开(公告)日:2009-12-03

    申请号:US12453593

    申请日:2009-05-15

    IPC分类号: H04N3/14 G06F17/17 H03M1/12

    摘要: An image sensor includes an analog-to-digital converter (ADC) and a decimation filter. The decimation filter includes a first digital data generator and a second digital data generator. The first digital data generator is configured to integrate sigma-delta modulated M-bit pixel data and output N-bit pixel data based on an integration result. The second digital data generator is configured to integrate the N-bit pixel data, generate P-bit pixel data based on an integration result, and output the P-bit pixel data as decimated data.

    摘要翻译: 图像传感器包括模数转换器(ADC)和抽取滤波器。 抽取滤波器包括第一数字数据发生器和第二数字数据发生器。 第一数字数据发生器被配置为基于积分结果来集成Σ-Δ调制的M位像素数据和输出N位像素数据。 第二数字数据发生器被配置为集成N位像素数据,基于积分结果产生P位像素数据,并将P位像素数据输出为抽取数据。

    Antimicrobial peptide isolated from halocynthia aurantium
    8.
    发明授权
    Antimicrobial peptide isolated from halocynthia aurantium 有权
    从紫罗兰peptide分离的抗菌肽

    公开(公告)号:US07504380B2

    公开(公告)日:2009-03-17

    申请号:US10535624

    申请日:2002-11-22

    IPC分类号: A61K38/03

    CPC分类号: C07K14/43504 A61K38/00

    摘要: The present invention relates to an antimicrobial peptide isolated from Halocynthia aurantium, more particularly, to an antimicrobial peptide isolated from the body fluid of Halocynthia aurantium and an antimicrobial agent comprising the same as an active ingredient. The antimicrobial peptide of the present invention shows excellent antimicrobial activity under strong acidic and basic environments. Moreover, it also shows strong antimicrobial activity against resistant bacteria. So, it can be used usefully as a natural antimicrobial agent.

    摘要翻译: 本发明涉及从Halocynthia aurantium分离的抗微生物肽,更具体地说,涉及从Halocynthia aurantium的体液中分离的抗微生物肽,以及含有它们作为活性成分的抗微生物剂。 本发明的抗微生物肽在强酸性和碱性环境下表现出优异的抗菌活性。 此外,它还显示出抗性细菌的强抗微生物活性。 因此,它可以有效地用作天然抗菌剂。

    Decimation filters, analog-to-digital converters including the same, and image sensors including the converters
    9.
    发明授权
    Decimation filters, analog-to-digital converters including the same, and image sensors including the converters 有权
    抽取滤波器,包括相同的模数转换器和包括转换器的图像传感器

    公开(公告)号:US08233068B2

    公开(公告)日:2012-07-31

    申请号:US12453593

    申请日:2009-05-15

    IPC分类号: H04N5/335

    摘要: An image sensor includes an analog-to-digital converter (ADC) and a decimation filter. The decimation filter includes a first digital data generator and a second digital data generator. The first digital data generator is configured to integrate sigma-delta modulated M-bit pixel data and output N-bit pixel data based on an integration result. The second digital data generator is configured to integrate the N-bit pixel data, generate P-bit pixel data based on an integration result, and output the P-bit pixel data as decimated data.

    摘要翻译: 图像传感器包括模数转换器(ADC)和抽取滤波器。 抽取滤波器包括第一数字数据发生器和第二数字数据发生器。 第一数字数据发生器被配置为基于积分结果来集成Σ-Δ调制的M位像素数据和输出N位像素数据。 第二数字数据发生器被配置为集成N位像素数据,基于积分结果产生P位像素数据,并将P位像素数据输出为抽取数据。

    Method of forming minute patterns and method of manufacturing a semiconductor device using the same
    10.
    发明授权
    Method of forming minute patterns and method of manufacturing a semiconductor device using the same 有权
    形成微小图案的方法和使用其制造半导体器件的方法

    公开(公告)号:US09543155B2

    公开(公告)日:2017-01-10

    申请号:US14975932

    申请日:2015-12-21

    IPC分类号: H01L21/28 H01L29/66 H01L27/11

    摘要: A method includes forming a first etch target layer and a first mask layer on a substrate. Sacrificial patterns extending in a first direction are formed on the first mask layer in a second direction. Spacers are formed on sidewalls of the sacrificial patterns. After removing the sacrificial patterns, the first mask layer is etched using the spacers as an etching mask to form first masks. Second masks are formed on sidewalls of each first mask to define a third masks including each first mask and the second masks on sidewalls of each first mask. The first etch target layer is etched using the first and third masks as an etching mask to form first and second patterns in the first and second regions, respectively. Each first pattern has a first width, and each second pattern has a second width greater than the first width.

    摘要翻译: 一种方法包括在衬底上形成第一蚀刻目标层和第一掩模层。 在第一方向上在第一掩模层上形成沿第一方向延伸的牺牲图案。 垫片形成在牺牲图案的侧壁上。 在去除牺牲图案之后,使用间隔件作为蚀刻掩模来蚀刻第一掩模层以形成第一掩模。 第二掩模形成在每个第一掩模的侧壁上以限定包括每个第一掩模的第三掩模和在每个第一掩模的侧壁上的第二掩模。 使用第一和第三掩模蚀刻第一蚀刻目标层作为蚀刻掩模,以分别在第一和第二区域中形成第一和第二图案。 每个第一图案具有第一宽度,并且每个第二图案具有大于第一宽度的第二宽度。