公开(公告)号：US20120247949A1

公开(公告)日：2012-10-04

申请号：US13433527

申请日：2012-03-29

申请人： Takashi SAKUMA ,  Tadahiro Ishizaka ,  Tatsuo Hatano ,  Shiro Hayashi ,  Toshiaki Fujisato ,  Hiroyuki Yokohara ,  Hiroyuki Toshima

发明人： Takashi SAKUMA ,  Tadahiro Ishizaka ,  Tatsuo Hatano ,  Shiro Hayashi ,  Toshiaki Fujisato ,  Hiroyuki Yokohara ,  Hiroyuki Toshima

IPC分类号： C23C14/34

CPC分类号： H01L21/2855 ,  C23C14/046 ,  C23C14/185 ,  C23C14/345 ,  C23C14/5833 ,  C23C14/5873 ,  C23C14/5893 ,  C23C16/509 ,  H01L21/76843 ,  H01L21/76865 ,  H01L21/76873

摘要： A film forming method includes depositing a metal thin film on a target substrate by generating an inductively coupled plasma in a processing chamber while introducing a plasma generating gas in the processing chamber with the substrate disposed on a placing table, by supplying DC power to a metal target from a DC power source, and by applying high-frequency bias to the placing table. A resputtering method includes resputtering the deposited metal thin film by stopping the generating of the inductively coupled plasma, by stopping the power supply from the DC power source, and by applying the high-frequency bias to the placing table while introducing the plasma generating gas in the processing chamber to form a capacitively coupled plasma in the processing chamber and by attracting ions of the plasma generating gas to the target substrate where the metal thin film is deposited.

摘要翻译： 一种成膜方法，包括通过在处理室中产生电感耦合等离子体，同时在处理室中引入等离子体产生气体，其中衬底设置在放置台上，通过向金属提供DC电力，在目标衬底上沉积金属薄膜 来自直流电源的目标，以及通过对放置台应用高频偏压。 再溅射方法包括：通过停止来自直流电源的电力供给，通过停止产生电感耦合等离子体，并将高频偏压施加到放置台，同时将等离子体产生气体引入到 所述处理室在所述处理室中形成电容耦合的等离子体，并且通过将所述等离子体产生气体的离子吸附到沉积金属薄膜的目标衬底上。

公开(公告)号：US20130001076A1

公开(公告)日：2013-01-03

申请号：US13497937

申请日：2010-09-21

申请人： Toshiaki Fujisato ,  Shiro Hayashi ,  Hiroyuki Yokohara

发明人： Toshiaki Fujisato ,  Shiro Hayashi ,  Hiroyuki Yokohara

IPC分类号： C23C14/50 ,  C23C14/34

CPC分类号： H01L21/6831 ,  C23C14/358 ,  C23C14/50 ,  H01J37/321 ,  H01J37/32577 ,  H01J37/3405

摘要： A mounting table structure includes a mounting table body, made of a conductive material, for mounting thereon the processing target object and serving as an electrode; a base table, made of a conductive material, disposed below the mounting table body with a gap therebetween in a state insulated from the mounting table body; a support column, connected to the ground side, for supporting the base table; a high frequency power supply line, connected to the mounting table body, for supplying a high frequency bias power to the mounting table body; and a power stabilization capacitor provided between the ground side and a hot side to which the high frequency bias power is applied. Here, an electrostatic capacitance of the power stabilization capacitor is set to be larger than an electrostatic capacitance of a stray capacitance between the mounting table body and the protective cover member.

摘要翻译： 安装台结构包括：由导电材料制成的安装台本体，用于在其上安装加工对象物体并用作电极; 由导电材料制成的底座，在与安装台体绝缘的状态下设置在安装台主体下面，其间具有间隙; 连接到地面的支撑柱，用于支撑基座; 连接到安装台主体的高频电源线，用于向安装台主体提供高频偏置电力; 以及设置在施加高频偏置功率的接地侧和热侧之间的功率稳定电容器。 这里，功率稳定化电容器的静电电容被设定为大于安装台体和保护盖构件之间的杂散电容的静电电容。

公开(公告)号：US09324600B2

公开(公告)日：2016-04-26

申请号：US13497937

申请日：2010-09-21

申请人： Toshiaki Fujisato ,  Shiro Hayashi ,  Hiroyuki Yokohara

发明人： Toshiaki Fujisato ,  Shiro Hayashi ,  Hiroyuki Yokohara

IPC分类号： C23C14/34 ,  H01L21/683 ,  C23C14/35 ,  C23C14/50 ,  H01J37/32 ,  H01J37/34

CPC分类号： H01L21/6831 ,  C23C14/358 ,  C23C14/50 ,  H01J37/321 ,  H01J37/32577 ,  H01J37/3405

摘要： A mounting table structure includes a mounting table body, made of a conductive material, for mounting thereon the processing target object and serving as an electrode; a base table, made of a conductive material, disposed below the mounting table body with a gap therebetween in a state insulated from the mounting table body; a support column, connected to the ground side, for supporting the base table; a high frequency power supply line, connected to the mounting table body, for supplying a high frequency bias power to the mounting table body; and a power stabilization capacitor provided between the ground side and a hot side to which the high frequency bias power is applied. Here, an electrostatic capacitance of the power stabilization capacitor is set to be larger than an electrostatic capacitance of a stray capacitance between the mounting table body and the protective cover member.

摘要翻译： 安装台结构包括：由导电材料制成的安装台本体，用于在其上安装加工对象物体并用作电极; 由导电材料制成的底座，在与安装台体绝缘的状态下设置在安装台主体下面，其间具有间隙; 连接到地面的支撑柱，用于支撑基座; 连接到安装台主体的高频电源线，用于向安装台主体提供高频偏置电力; 以及设置在施加高频偏置功率的接地侧和热侧之间的功率稳定电容器。 这里，功率稳定电容器的静电电容被设定为大于安装台体和保护盖构件之间的杂散电容的静电电容。

公开(公告)号：US5148334A

公开(公告)日：1992-09-15

申请号：US444764

申请日：1989-12-01

申请人： Takikazu Takeuchi ,  Hiroyuki Yokohara ,  Takuji Ogawa ,  Noboru Sakurai

发明人： Takikazu Takeuchi ,  Hiroyuki Yokohara ,  Takuji Ogawa ,  Noboru Sakurai

IPC分类号： G11B20/10 ,  G11B20/14 ,  H03L7/08

CPC分类号： G11B20/10222 ,  G11B20/10009 ,  G11B20/1403

摘要： Every other input pulse is extracted from an input signal containing alternate phase-advanced and phase-delayed pulses read out of a magnetic disk unit, a magnetic tape unit or the like. Output pulses in synchronism with the pulses thus extracted are produced. This extraction may be effected only during a predetermined length of time after staring application of the input pulses at the time of pull-in of a phase sync circuit. Whether phase synchronization is to be effected in accordance with advanced-phase or delayed-phase input pulses is determined from time to time as required.

摘要翻译： 从包含从磁盘单元，磁带单元等读出的交替相位提前和相位延迟脉冲的输入信号中提取每个其它输入脉冲。 产生与这样提取的脉冲同步的输出脉冲。 该提取可以仅在相位同步电路的拉入时在施加输入脉冲之后的预定长度的时间内进行。 根据需要不时地确定是否根据高级相位或延迟相位输入脉冲实现相位同步。