摘要:
An in-liquid plasma electrode according to the present invention is an in-liquid plasma electrode for generating plasma in a liquid and has an electrically conductive member having an electric discharge end surface in contact with the liquid, and an electrically insulating member covering an outer periphery of the conductive member at least except the electric discharge end surface. Preferably, d and x satisfy −2d≦x≦2d, where d is a length of a minor axis of the cross section when a conductive end portion of the electrically conductive member having the electric discharge end surface has an approximately circular cross section, or d is a length of a short side of the cross section when the conductive end portion has an approximately rectangular cross section, and x is a distance from a reference plane to a plane containing the electric discharge end surface when the reference plane is an end surface of the electrically insulating member that is approximately parallel with the electric discharge end surface. Owing to this construction, it is possible to provide an in-liquid plasma electrode which can simply generate plasma in a wide variety of liquids including a conductive liquid such as water and alcohol, and furthermore an in-liquid plasma generating apparatus having this electrode, and an in-liquid plasma generating method using this electrode.
摘要:
The process for producing an amorphous carbon film of the present invention is a process for producing an amorphous carbon film comprising contacting a surface of a substrate S with bubbles B which have been formed in a liquid L containing an organic compound and inside which plasma has been generated, so as to form an amorphous carbon film on the surface of the substrate S, and the liquid L contains one or more selected from phenols and alcohols having a carbon number of from 1 to 12. According to the present invention, a hard amorphous carbon film can be formed easily.
摘要:
A powder feeding apparatus which has a substantially simplified structure compared to conventional powder feeding apparatuses and which can be easily installed, without requiring any substantial adjustment work. The powder feeding apparatus includes a powder flow rate measuring capillary, the inlet of which is connected to a powder introducing device and to a sensor nozzle for a powder flow rate detection gas provided with a flow control device. A pressure difference detecting device whose interior volume is invariant during normal operation is connected between the inlet and the outlet of the capillary. Further, a pressure difference adjusting device and a large-diameter feeding duct are connected together.
摘要:
A nanometer-size-particle production apparatus is provided which can prevent the occurrence of waste fluids, and which makes quick and continuous syntheses feasible while suppressing damages to the electrode.The present invention is a nanometer-size-particle production apparatus for synthesizing nanometer-size particles in a liquid by means of plasma in liquid, and comprises: a container for accommodating the liquid therein; an electromagnetic-wave generation device for generating a high-frequency wave, or a microwave; an electrode conductor whose leading end makes contact with the liquid to supply the high-frequency wave or the microwave to the liquid; a covering portion being disposed into the liquid so as to cover a leading-end upside of the electrode conductor; a metallic chip being composed of a metal making a raw material of nanometer-size particles, and having a leading end that is disposed to face to a leading-end section of the electrode conductor; and a feed device for feeding out the leading end of the metallic chip with respect to the leading-end section of the electrode conductor; the leading end of the electrode conductor having a configuration that is a non-edge configuration; and the electrode conductor, except for the leading end, having an axially-orthogonal cross-sectional area that is larger than an axially-orthogonal cross-sectional area of the metallic chip.
摘要:
A nanometer-size-particle production apparatus is provided which can prevent the occurrence of waste fluids, and which makes quick and continuous syntheses feasible while suppressing damages to the electrode.The present invention is a nanometer-size-particle production apparatus for synthesizing nanometer-size particles in a liquid by means of plasma in liquid, and comprises: a container for accommodating the liquid therein; an electromagnetic-wave generation device for generating a high-frequency wave, or a microwave; an electrode conductor whose leading end makes contact with the liquid to supply the high-frequency wave or the microwave to the liquid; a covering portion being disposed into the liquid so as to cover a leading-end upside of the electrode conductor; a metallic chip being composed of a metal making a raw material of nanometer-size particles, and having a leading end that is disposed to face to a leading-end section of the electrode conductor; and a feed device for feeding out the leading end of the metallic chip with respect to the leading-end section of the electrode conductor; the leading end of the electrode conductor having a configuration that is a non-edge configuration; and the electrode conductor, except for the leading end, having an axially-orthogonal cross-sectional area that is larger than an axially-orthogonal cross-sectional area of the metallic chip.
摘要:
[Problems] An object of this invention is to provide a method for the production of diamond at a high rate and in a high efficiency using in-liquid plasma.[Solving Means] In order to solve the above problems, the present invention relates to a method for the production of diamond, characterized in that, electromagnetic wave is irradiated to a liquid containing carbon, hydrogen and oxygen in which the ratio of hydrogen atoms to the sum of carbon atoms and hydrogen atoms is from 0.75 to 0.82 and the ratio of carbon atoms to the sum of carbon atoms and oxygen atoms is from 0.47 to 0.58 so as to generate plasma in the liquid whereby diamond is manufactured.
摘要:
An in-liquid plasma electrode 1 according to the present invention is an in-liquid plasma electrode for generating plasma in a liquid L and has a conductive member 11 having an electric discharge end surface 111 in contact with the liquid L, and an insulating member 16 covering an outer periphery of the conductive member 11 at least except the electric discharge end surface 111. Preferably, d and x satisfy −2d≦x≦2d, where d is a length of a minor axis of the cross section when a conductive end portion 110 of the conductive member 11 having the electric discharge end surface 11 has a roughly circular cross section, or d is a length of a short side of the cross section when the conductive end portion 110 has a roughly rectangular cross section, and x is a distance from a reference plane 161 to a plane containing the electric discharge end surface 111 when the reference plane 161 is an end surface 161 of the insulating member 16 in roughly parallel with the electric discharge end surface 111. Owing to this construction, it is possible to provide an in-liquid plasma electrode which can simply generate plasma in a wide variety of liquids including a conductive liquid such as water and alcohol, and furthermore an in-liquid plasma generating apparatus having this electrode, and an in-liquid plasma generating method using this electrode.
摘要翻译:根据本发明的液晶内等离子体电极1是用于在液体L中产生等离子体的液晶内等离子体电极,并且具有导电构件11,导电构件11具有与液体L接触的放电端面111,绝缘构件 除了放电端面111之外,至少覆盖导电构件11的外周。优选地,d和x满足-2d <= x <= 2d,其中d是横截面的短轴的长度,当a 具有放电端面11的导电构件11的导电端部110具有大致圆形的横截面,或d是当导电端部110具有大致矩形截面时的横截面的短边的长度,以及 当参考平面161是绝缘构件16的与放电端表面大致平行的端面161时,x是从参考平面161到包含放电端面111的平面的距离 由于这种结构,可以提供一种液体等离子体电极,其可以简单地在包括诸如水和醇的导电液体的各种液体中产生等离子体,此外还提供了一种液体内等离子体产生装置,其具有 该电极和使用该电极的液体内等离子体生成方法。
摘要:
Plasma generated in water vapor bubbles present in a water-containing liquid is brought into contact, in the liquid, with an article having a contact angle with water of 90° or less. The plasma is contacted with an organic substance adhering to the article to thereby remove the organic substance from the article. By bringing the plasma into contact with the article, the surface of the article is etched without breaking the article. The article may comprise a material composed of both a hydrophobic part having a contact angle with water exceeding 90° and a hydrophilic part having a contact angle with water of 90° or less. In this case only the hydrophobic part is etched by bringing the plasma into contact with the article.
摘要:
In an in-liquid plasma film-forming apparatus having: a vessel 1 being capable of accommodating a substrate “S” and a liquid “L” including raw material therein; an electrode 2 for in-liquid plasma, electrode 2 which is disposed in the vessel 1; an electric power device 3 for supplying electricity to the electrode 2 for in-liquid plasma; the electrode 2 for in-liquid plasma is equipped with: a main electrode 21 having a discharging end 22; an auxiliary electrode 26 not only facing the discharging end 22 but also being disposed between the discharging end 22 and the substrate “S” that face each other; and a plasma generating unit 29 having a space that is demarcated by a surface 22a of the discharging end 22 and a surface 26a of the auxiliary electrode 26 facing the surface 22a, and being for generating plasma by means of electricity being supplied to the main electrode 21. And, a decomposed component of the raw material is deposited onto a surface of the substrate “S” by contacting the plasma, which has generated at the plasma generating unit 29, with the substrate “S.”By means of the present construction, it becomes feasible to generate plasma in liquid without ever using a second electrode that serves as a substrate.