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    Dressing tool, dressing device, dressing method, processing device and semiconductor device producing method
    5.
    发明申请
    Dressing tool, dressing device, dressing method, processing device and semiconductor device producing method 审中-公开
    修整工具，修整装置，修整方法，加工装置和半导体装置的制造方法

    公开(公告)号：US20060292969A1

    公开(公告)日：2006-12-28

    申请号：US11511279

    申请日：2006-08-29

    申请人： Susumu Hoshino ,  Eiichi Yamamoto

    发明人： Susumu Hoshino ,  Eiichi Yamamoto

    IPC分类号： B24B1/00 ,  B24B21/18

    CPC分类号： B24B53/017

    摘要： A dressing apparatus DA is constructed from a pad holding mechanism 10 which holds a polishing pad 15 that has a doughnut disk-form pad surface 15a, and which causes this polishing pad 15 to rotate, a dressing tool 2 which has a substantially rectangular dressing surface 3, and a dressing tool holding mechanism 1 which holds the dressing tool 2 so that the dressing surface 3 of this dressing tool 2 is caused to face the pad surface 15a of the polishing pad 15 that is held and caused to rotate by the pad holding mechanism 10. The dressing tool holding mechanism 1 causes the held dressing tool 2 to contact the pad surface 15a in a state in which the centerline L1 in the direction of width of the dressing surface 3 is oriented so that this centerline extends in the radial direction of the pad surface 15a, and thus causes dressing to be performed. As a result, the flatness of the working surface following dressing can be improved.

    摘要翻译： 修整装置DA由保持具有环形盘形垫表面15a的抛光垫15的垫保持机构10构成，并使该抛光垫15旋转，修整工具2具有大致矩形的敷料 表面3和修整工具保持机构1，其保持修整工具2，使得该修整工具2的修整面3面对被保持并由其旋转的抛光垫15的焊盘表面15a 敷料保持机构10.修整工具保持机构1使得保持的修整工具2在修整面3的宽度方向上的中心线L 1取向成使得该中心线延伸的状态下接触衬垫表面15a 在垫表面15a的径向方向上，从而进行修整。 结果，能够提高修整后的工作面的平坦度。

    Pyridine derivatives substituted by heterocyclic ring and phosphonoamino group, and anti-fungal agent containing same
    7.
    发明授权
    Pyridine derivatives substituted by heterocyclic ring and phosphonoamino group, and anti-fungal agent containing same 有权
    由杂环和膦酰氨基取代的吡啶衍生物和含有它们的抗真菌剂

    公开(公告)号：US08507530B2

    公开(公告)日：2013-08-13

    申请号：US12109834

    申请日：2008-04-25

    申请人： Keigo Tanaka ,  Eiichi Yamamoto ,  Naoaki Watanabe

    发明人： Keigo Tanaka ,  Eiichi Yamamoto ,  Naoaki Watanabe

    IPC分类号： C07F9/06 ,  A61K31/443

    CPC分类号： C07F9/65583

    摘要： Anti-fungal agent having excellent anti-fungal action physicochemical properties including safety and water solubility. Compound represented by formula (I), or salt thereof: wherein R1 represents hydrogen, halogen, amino, R11—NH— wherein R11 represents C1-6 alkyl, hydroxy C1-6 alkyl, C1-6 alkoxy C1-6 alkyl, or C1-6alkoxycarbonyl C1-6 alkyl, R12—(CO)—NH— wherein R12 represents C1-6 alkyl group or C1-6 alkoxy C1-6 alkyl, C1-6 alkyl, hydroxy C1-6 alkyl, cyano C1-6 alkyl, C1-6 alkoxy, or C1-6 alkoxy C1-6 alkyl or a phosphonoamino group; R2 represents hydrogen, C1-6 alkyl, amino, or a di C1-6 alkylamino group or a phosphonoamino group; one of X and Y is nitrogen while the other is nitrogen or oxygen; ring A represents a 5- or 6-member heteroaryl ring or a benzene ring which may have a halogen atom or 1 or 2 C1-6 alkyl groups; Z represents a single bond, a methylene group, an ethylene group, oxygen, sulfur, —CH2O—, —OCH2—, —NH—, —CH2NH—, —NHCH2—, —CH2S—, or —SCH2—; R3 represents hydrogen or halogen or C1-6 alkyl, C3-8 cycloalkyl, C6-10 aryl, a 5- or 6-member heteroaryl group or a 5- or 6-member nonaromatic heterocyclic group which may have 1 or 2 substituents; and R4 represents hydrogen or halogen; provided that either R1 or R2 represents a phosphonoamino group.

    摘要翻译： 抗真菌剂具有优异的抗真菌作用物理化学性质，包括安全性和水溶性。 式（I）表示的化合物或其盐：其中R1表示氢，卤素，氨基，R11-NH-，其中R11表示C1-6烷基，羟基C1-6烷基，C1-6烷氧基C1-6烷基或C1 （C 1 -C 6）烷基，R 12 - （CO）-NH-，其中R 12表示C 1-6烷基或C 1-6烷氧基C 1-6烷基，C 1-6烷基，羟基C 1-6烷基，氰基C 1-6烷基， C 1-6烷氧基或C 1-6烷氧基C 1-6烷基或膦酰氨基; R 2表示氢，C 1-6烷基，氨基或二C 1-6烷基氨基或膦酰氨基; X和Y之一是氮，而另一个是氮或氧; 环A表示可以具有卤素原子或1或2个C 1-6烷基的5或6元杂芳基环或苯环; Z表示单键，亚甲基，亚乙基，氧，硫，-CH 2 O - ， - OCH 2 - ， - NH - ， - CH 2 NH - ， - NHCH 2 - ， - CH 2 S-或-SCH 2 - R 3表示氢或卤素或C 1-6烷基，C 3-8环烷基，C 6-10芳基，5或6元杂芳基或可具有1或2个取代基的5或6元非芳族杂环基; 并且R 4表示氢或卤素; 条件是R 1或R 2表示膦酰氨基。

    SEMICONDUCTOR SUBSTRATE PLANARIZATION APPARATUS AND PLANARIZATION METHOD
    8.
    发明申请
    SEMICONDUCTOR SUBSTRATE PLANARIZATION APPARATUS AND PLANARIZATION METHOD 失效
    半导体基板平面设计和平面化方法

    公开(公告)号：US20110165823A1

    公开(公告)日：2011-07-07

    申请号：US12748109

    申请日：2010-03-26

    申请人： Satoru IDE ,  Moriyuki Kashiwa ,  Kazuo Kobayashi ,  Noriyuki Motimaru ,  Eiichi Yamamoto ,  Tomio Kubo ,  Hiroaki Kida

    发明人： Satoru IDE ,  Moriyuki Kashiwa ,  Kazuo Kobayashi ,  Noriyuki Motimaru ,  Eiichi Yamamoto ,  Tomio Kubo ,  Hiroaki Kida

    IPC分类号： B24B1/00 ,  B24B41/00 ,  B24B7/10

    CPC分类号： B24B37/00

    摘要： A planarization apparatus and method that thins and planarizes a substrate by grinding and polishing the rear surface of the substrate with high throughput, and that fabricates a semiconductor substrate with reduced adhered contaminants. A planarization apparatus that houses various mechanism elements in semiconductor substrate loading/unloading stage chamber, a rear-surface polishing stage chamber, and a rear-surface grinding stage chamber. The throughput time of the rear-surface polishing stage that simultaneously polishes two substrates is typically about double the throughput time of the rear-surface grinding stage that grinds one substrate.

    摘要翻译： 一种平面化装置和方法，其通过以高生产量研磨和抛光衬底的后表面来使衬底平坦化，并且制造具有减少的附着污染物的半导体衬底。 一种在半导体衬底装载/放电室中容纳各种机构元件的平面化装置，后表面抛光台室和后表面研磨台室。 同时抛光两个基材的后表面抛光阶段的生产时间通常是研磨一个基板的后表面研磨阶段的生产时间的两倍。

    PYRIDINE DERIVATIVES SUBSTITUTED BY HETEROCYCLIC RING AND PHOSPHONOAMINO GROUP, AND ANTI-FUNGAL AGENT CONTAINING SAME
    9.
    发明申请
    PYRIDINE DERIVATIVES SUBSTITUTED BY HETEROCYCLIC RING AND PHOSPHONOAMINO GROUP, AND ANTI-FUNGAL AGENT CONTAINING SAME 有权
    通过杂环化合物和磷酰胺基取代的吡啶衍生物和含有它的抗真菌剂

    公开(公告)号：US20090082403A1

    公开(公告)日：2009-03-26

    申请号：US12109834

    申请日：2008-04-25

    申请人： Keigo Tanaka ,  Eiichi Yamamoto ,  Naoaki Watanabe

    发明人： Keigo Tanaka ,  Eiichi Yamamoto ,  Naoaki Watanabe

    IPC分类号： A61K31/444 ,  C07D413/14 ,  A61K31/4439 ,  C07D413/04 ,  C07D401/04 ,  A61P31/10

    CPC分类号： C07F9/65583

    摘要： Anti-fungal agent having excellent anti-fungal action physicochemical properties including safety and water solubility. Compound represented by formula (I), or salt thereof: wherein R1 represents hydrogen, halogen, amino, R11—NH— wherein R11 represents C1-6 alkyl, hydroxy C1-6 alkyl, C1-6 alkoxy C1-6 alkyl, or C1-6alkoxycarbonyl C1-6 alkyl, R12—(CO)—NH— wherein R12 represents C1-6 alkyl group or C1-6 alkoxy C1-6 alkyl, C1-6 alkyl, hydroxy C1-6 alkyl, cyano C1-6 alkyl, C1-6 alkoxy, or C1-6 alkoxy C1-6 alkyl or a phosphonoamino group; R2 represents hydrogen, C1-6 alkyl, amino, or a di C1-6 alkylamino group or a phosphonoamino group; one of X and Y is nitrogen while the other is nitrogen or oxygen; ring A represents a 5- or 6-member heteroaryl ring or a benzene ring which may have a halogen atom or 1 or 2 C1-6 alkyl groups; Z represents a single bond, a methylene group, an ethylene group, oxygen, sulfur, —CH2O—, —OCH2—, —NH—, —CH2NH—, —NHCH2—, —CH2S—, or —SCH2—; R3 represents hydrogen or halogen or C1-6 alkyl, C3-8 cycloalkyl, C6-10 aryl, a 5- or 6-member heteroaryl group or a 5- or 6-member nonaromatic heterocyclic group which may have 1 or 2 substituents; and R4 represents hydrogen or halogen; provided that either R1 or R2 represents a phosphonoamino group.

    摘要翻译： 抗真菌剂具有优异的抗真菌作用物理化学性质，包括安全性和水溶性。 式（I）表示的化合物或其盐：其中R1表示氢，卤素，氨基，R11-NH-，其中R11表示C1-6烷基，羟基C1-6烷基，C1-6烷氧基C1-6烷基或C1 （C 1 -C 6）烷基，R 12 - （CO）-NH-，其中R 12表示C 1-6烷基或C 1-6烷氧基C 1-6烷基，C 1-6烷基，羟基C 1-6烷基，氰基C 1-6烷基， C 1-6烷氧基或C 1-6烷氧基C 1-6烷基或膦酰氨基; R 2表示氢，C 1-6烷基，氨基或二C 1-6烷基氨基或膦酰氨基; X和Y之一是氮，而另一个是氮或氧; 环A表示可以具有卤素原子或1或2个C 1-6烷基的5或6元杂芳基环或苯环; Z表示单键，亚甲基，亚乙基，氧，硫，-CH 2 O - ， - OCH 2 - ， - NH - ， - CH 2 NH - ， - NHCH 2 - ， - CH 2 S-或-SCH 2 - R 3表示氢或卤素或C 1-6烷基，C 3-8环烷基，C 6-10芳基，5或6元杂芳基或可具有1或2个取代基的5或6元非芳族杂环基; R4表示氢或卤素; 条件是R 1或R 2表示膦酰氨基。

    Yarn guide roller
    10.
    发明授权
    Yarn guide roller 失效
    纱线导辊

    公开(公告)号：US6007465A

    公开(公告)日：1999-12-28

    申请号：US183514

    申请日：1998-10-30

    申请人： Toshinori Kawamura ,  Eiichi Yamamoto ,  Makoto Endo ,  Mikiya Takechi ,  Haruki Morikawa

    发明人： Toshinori Kawamura ,  Eiichi Yamamoto ,  Makoto Endo ,  Mikiya Takechi ,  Haruki Morikawa

    IPC分类号： D01F9/32 ,  B21B31/08

    CPC分类号： D01F9/32

    摘要： A heat treatment furnace for fiber for heat-treating a fiber bundle (yarn) formed of many continuous filaments in hot gas while running the yarn. The heat treatment furnace has a plurality of heat treatment chambers provided in a furnace body. The temperature in each individual heat treatment chamber is independently adjusted to a temperature which is different from the temperatures in the other heat treatment chambers. Thereby, the heat treatment furnace can be made small and is able to heat-treat fiber efficiently.This heat treatment furnace is useful, particularly, as a heat treatment furnace (an oxidizing heat treatment furnace, or a oxidizing furnace) for producing an oxidized fiber needed to produce a carbon fiber. A polyacrylonitrile-based fiber bundle (yarn), that is a precursor fiber bundle for producing an oxidized fiber, passes through a zigzag yarn path, and passes through the heat treatment furnaces, in each of which temperature is independently adjusted to a temperature that is different from the temperatures in the other furnaces. An oxidized fiber bundle (yarn) is thereby produced.The zigzag yarn path in the heat treatment chambers for the oxidizing heat treatment is established by a combination of a plurality of yarn guide rollers provided outside the furnace body. Each yarn guide roller has, on its peripheral surface, a yarn guide groove for guiding a yarn. The yarn guide grooves have a specific cross-sectional shape whereby the cross-sectional shape of the yarn to be supplied into the heat treatment chambers for the oxidizing heat treatment is adjusted into a flat generally rectangular shape. Heat accumulation in the yarn being heat-treated is thereby reduced.

    摘要翻译： 一种用于在运行纱线的同时热处理由热气体中的许多连续长丝形成的纤维束（纱线）的纤维热处理炉。 热处理炉具有设置在炉体中的多个热处理室。 每个单独的热处理室中的温度独立地调节到与其它热处理室中的温度不同的温度。 由此，能够使热处理炉小，能够有效地对纤维进行热处理。 该热处理炉特别适用于制造碳纤维所需的氧化纤维的热处理炉（氧化热处理炉或氧化炉）。 作为用于制造氧化纤维的前体纤维束的聚丙烯腈类纤维束（纱线）通过锯齿状纱线，通过热处理炉，各温度独立地调节为 与其他炉子的温度不同。 由此生产氧化纤维束（纱线）。 用于氧化热处理的热处理室中的之字形纱线通过设置在炉体外部的多个导丝辊的组合来建立。 每个导丝辊在其周面上具有用于引导纱线的导纱槽。 纱线引导槽具有特定的横截面形状，由此将供给到用于氧化热处理的热处理室中的纱线的横截面形状调节成扁平的大致矩形形状。 因此，热处理的纱线中的热积聚减少。