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公开(公告)号：US08283187B2
公开(公告)日：2012-10-09
申请号：US13251851
申请日：2011-10-03
Applicant: Dalong Zhong , Gautam Parthasarathy , Richard Arthur Nardi, Jr.
Inventor： Dalong Zhong , Gautam Parthasarathy , Richard Arthur Nardi, Jr.
CPC classification number: H01L31/073 , C23C14/0036 , C23C14/0084 , C23C14/0629 , C23C14/3485 , H01L21/02554 , H01L21/02557 , H01L21/02631 , H01L31/02966 , H01L31/1832 , H01L31/1836 , Y02E10/543 , Y02P70/521
Abstract: One aspect of the present invention provides a device that includes a substrate; a first semiconducting layer; a transparent conductive layer; a transparent window layer. The transparent window layer includes cadmium sulfide and oxygen. The device has a fill factor of greater than about 0.65. Another aspect of the present invention provides a method of making the device.
Abstract translation: 本发明的一个方面提供一种包括基板的装置; 第一半导电层; 透明导电层; 透明窗口层。 透明窗层包括硫化镉和氧。 该装置的填充系数大于约0.65。 本发明的另一方面提供一种制造该装置的方法。
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公开(公告)号：US20120080306A1
公开(公告)日：2012-04-05
申请号：US12894217
申请日：2010-09-30
Applicant: Dalong Zhong , Gautam Parthasarathy , Richard Arthur Nardi, JR.
Inventor： Dalong Zhong , Gautam Parthasarathy , Richard Arthur Nardi, JR.
CPC classification number: H01L21/02557 , H01L21/02472 , H01L21/02474 , H01L21/0251 , H01L21/02554 , H01L21/02568 , H01L21/02631 , H01L31/0296 , H01L31/073 , H01L31/1836 , H01L31/1864 , Y02E10/543 , Y02P70/521
Abstract: One aspect of the present invention provides a method to make a film. The method includes providing a target comprising a semiconductor material within an environment comprising oxygen; applying a plurality of direct current pulses to the target to create a pulsed direct current plasma; sputtering the target with the pulsed direct current plasma to eject a material comprising cadmium and sulfur into the plasma; and depositing a film comprising the material onto a substrate. The target includes a semiconductor material that comprises semiconductor material comprises cadmium and sulfur.
Abstract translation: 本发明的一个方面提供了制造薄膜的方法。 该方法包括在包含氧的环境中提供包含半导体材料的靶; 向目标施加多个直流脉冲以产生脉冲直流等离子体; 用脉冲直流等离子体溅射靶，将包含镉和硫的材料喷射到等离子体中; 以及将包含所述材料的膜沉积到基底上。 靶包括包含镉和硫的半导体材料的半导体材料。
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公开(公告)号：US20100328896A1
公开(公告)日：2010-12-30
申请号：US12826337
申请日：2010-06-29
Applicant: David Mulford Shaddock , Deng Tao , Hendrik Pieter Jacobus De Bock , Dalong Zhong , Christopher Michael Eastman , Kevin Matthew Durocher , Stanton Earl Weaver, JR.
Inventor： David Mulford Shaddock , Deng Tao , Hendrik Pieter Jacobus De Bock , Dalong Zhong , Christopher Michael Eastman , Kevin Matthew Durocher , Stanton Earl Weaver, JR.
CPC classification number: H01L23/433 , B82Y30/00 , B82Y40/00 , C25D5/022 , C25D7/12 , F28F2013/006 , F28F2255/00 , H01L2924/0002 , Y10T29/49 , Y10T428/30 , H01L2924/00
Abstract: An article and method of forming the article is disclosed. The article includes a heat source, a heat-sink, and a thermal interface element having a plurality of freestanding nanosprings, a top layer, and a bottom layer. The nanosprings, top layer, and the bottom layers of the article include at least one inorganic material. The article can be prepared using a number of methods including the methods such as GLAD and electrochemical deposition.
Abstract translation: 公开了一种形成物品的制品和方法。 该制品包括热源，散热器和具有多个独立纳米脉冲，顶层和底层的热界面元件。 制品的纳米螺旋，顶层和底层包括至少一种无机材料。 该制品可以使用许多方法制备，包括诸如GLAD和电化学沉积的方法。
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公开(公告)号：US20080142755A1
公开(公告)日：2008-06-19
申请号：US11638022
申请日：2006-12-13
Applicant: Balasubramaniam Vaidhyanathan , Salil Mohan Joshi , Sheela Kollali Ramasesha , Mamatha Nagesh , Victor Lienkong Lou , George Theodore Dalakos , Michael John Wittbrodt , Dalong Zhong
Inventor： Balasubramaniam Vaidhyanathan , Salil Mohan Joshi , Sheela Kollali Ramasesha , Mamatha Nagesh , Victor Lienkong Lou , George Theodore Dalakos , Michael John Wittbrodt , Dalong Zhong
CPC classification number: H01L21/67103 , C03C8/02 , C03C8/08 , C03C8/24 , H01L21/67098 , H05B3/143 , H05B3/283
Abstract: A wafer processing apparatus, including a heater apparatus, is provided. The heater apparatus includes a coating layer; and a seal structure in contact with the coating layer. The seal structure is formed from a seal formable material. The seal formable material includes at least one of a YASB glassy composition, a CGYP glassy composition, or a combination of the YASB glassy composition and the CGYP glassy composition. A method and device are also included.
Abstract translation: 提供了包括加热器装置的晶片处理装置。 加热器装置包括涂层; 以及与涂层接触的密封结构。 密封结构由可密封成型材料形成。 可密封成型材料包括YASB玻璃组合物，CGYP玻璃组合物或YASB玻璃组合物和CGYP玻璃组合物的组合中的至少一种。 还包括一种方法和装置。
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公开(公告)号：US20080141938A1
公开(公告)日：2008-06-19
申请号：US11638039
申请日：2006-12-13
Applicant: Ramachandran Gopi Chandran , George Theodore Dalakos , Dalong Zhong
Inventor： Ramachandran Gopi Chandran , George Theodore Dalakos , Dalong Zhong
CPC classification number: H01L21/68757 , C04B35/44 , C04B35/6261 , C04B2235/3206 , C04B2235/3208 , C04B2235/445 , C04B2235/9607 , C04B2235/9669 , C23C16/4581 , H01L21/67103 , H01L21/6831 , H02N13/00
Abstract: A processing apparatus for use in a corrosive operating environment is provided. The apparatus includes a base substrate for placing a wafer thereon. The base substrate has a coefficient of thermal expansion. At least one electrode is embedded in or disposed on or under the base substrate. The electrode has a coefficient of thermal expansion in a range of from about 0.70 to about 1.25 times that of the base substrate coefficient of thermal expansion (CTE). At least one coating layer is disposed on the base substrate. The coating layer includes a composition capable of forming a calcium aluminate coating. The calcium aluminate coating layer is doped with one of MgO, CaO, CaF2 and mixtures thereof to control the CTE of the coating layer to match the CTE of the base substrate. The apparatus is exposed to a corrosive operating environment at a temperature range of from about 25 degrees Celsius to about 1500 degrees Celsius. A coated article and associated method are provided.
Abstract translation: 提供一种用于腐蚀性操作环境的处理装置。 该装置包括用于在其上放置晶片的基底基板。 基底具有热膨胀系数。 至少一个电极嵌入或设置在基底基板上或下方。 电极的热膨胀系数在基底热膨胀系数（CTE）的约0.70至约1.25倍的范围内。 在基底基板上设置至少一层涂层。 涂层包括能够形成铝酸钙涂层的组合物。 铝酸钙涂层掺杂有MgO，CaO，CaF 2 O 2和其混合物中的一种，以控制涂层的CTE以匹配基底基材的CTE。 该装置暴露在约25摄氏度至约1500摄氏度的温度范围内的腐蚀性操作环境中。 提供涂覆制品和相关方法。
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Patent Agency Ranking
公开(公告)号：US20050268662A1
公开(公告)日：2005-12-08
申请号：US11147809
申请日：2005-06-06
Applicant: John Moore , Dalong Zhong
Inventor： John Moore , Dalong Zhong
CPC classification number: C23C28/322 , C03B11/086 , C03B2215/16 , C03B2215/17 , C03B2215/22 , C03B2215/31 , C03B2215/32 , C03B2215/34 , C03B2215/38 , C23C14/025 , C23C14/027 , C23C14/06 , C23C14/0641 , C23C28/321 , C23C28/34 , C23C28/347 , C23C28/36 , Y02P40/57 , Y10T428/24975 , Y10T428/265
Abstract: The invention provides coatings to achieve the best accommodation of chemical, physical, and mechanical properties desired in high performance and reliable glass molding and forming tools. The substrate material can be any ordinary die or tool material such as cast iron, stainless steel, platinum, tungsten carbide and silicon. A simple coating architecture consisting of a titanium adhesion layer and a Ni—Al—N or Ti—B—C—N working layer is provided. A NiAl working layer can meet the requirements of wear resistance in which abrasive and/or erosive wear is relatively low, while a Ti—B—C—N working layer is sufficient for processes operating at relatively low temperature or in vacuum or a protective environment. The coating architectures, from the coating/substrate interface to the outer most surface of the coating include an inner adhesion layer, an outer working layer and, optionally, one or more finctionally graded material layers. The invention also provides methods of making these coatings.
Abstract translation: 本发明提供涂层，以实现在高性能和可靠的玻璃成型和成型工具中所需的化学，物理和机械性能的最佳调节。 基板材料可以是任何普通的模具或工具材料，例如铸铁，不锈钢，铂，碳化钨和硅。 提供了由钛粘合层和Ni-Al-N或Ti-B-C-N工作层组成的简单涂层结构。 NiAl工作层可以满足磨损和/或侵蚀磨损相对较低的耐磨性要求，而Ti-B-C-N工作层对于在较低温度或真空或保护环境中操作的工艺是足够的。 从涂层/基底界面到涂层的最外表面的涂层结构包括内部粘合层，外部工作层和任选的一个或多个有序分级的材料层。 本发明还提供了制备这些涂层的方法。
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公开(公告)号：US20130192667A1
公开(公告)日：2013-08-01
申请号：US13362813
申请日：2012-01-31
Applicant: Jinbo Cao , Bastiaan Arie Korevaar , Dalong Zhong , Juan Carlos Rojo , Qianqian Xin , Aharon Yakimov
Inventor： Jinbo Cao , Bastiaan Arie Korevaar , Dalong Zhong , Juan Carlos Rojo , Qianqian Xin , Aharon Yakimov
IPC: H01L31/0352 , H01L31/18
CPC classification number: H01L31/073 , H01L31/0749 , Y02E10/541 , Y02E10/543 , Y02P70/521
Abstract: A photovoltaic device is presented. The photovoltaic device includes a transparent conductive layer; a window layer disposed on the transparent conductive layer; and an absorber layer disposed on the window layer. The window layer includes a low-diffusivity layer disposed adjacent to the transparent conductive layer and a high-diffusivity layer interposed between the low-diffusivity layer and the absorber layer. Method of making a photovoltaic device is also presented.
Abstract translation: 介绍了光伏器件。 光电器件包括透明导电层; 设置在所述透明导电层上的窗口层; 以及设置在窗口层上的吸收层。 窗口层包括邻近透明导电层设置的低扩散层和介于低扩散层和吸收层之间的高扩散性层。 还提出了制造光伏器件的方法。
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公开(公告)号：US08044477B1
公开(公告)日：2011-10-25
申请号：US12894242
申请日：2010-09-30
Applicant: Dalong Zhong , Gautam Parthasarathy , Richard Arthur Nardi, Jr.
Inventor： Dalong Zhong , Gautam Parthasarathy , Richard Arthur Nardi, Jr.
IPC: H01L31/102 , H01L21/00
CPC classification number: H01L31/073 , C23C14/0036 , C23C14/0084 , C23C14/0629 , C23C14/3485 , H01L21/02554 , H01L21/02557 , H01L21/02631 , H01L31/02966 , H01L31/1832 , H01L31/1836 , Y02E10/543 , Y02P70/521
Abstract: One aspect of the present invention provides a device that includes a substrate; a first semiconducting layer; a transparent conductive layer; a transparent window layer. The transparent window layer includes cadmium sulfide and oxygen. The device has a fill factor of greater than about 0.65. Another aspect of the present invention provides a method of making the device.
Abstract translation: 本发明的一个方面提供一种包括基板的装置; 第一半导电层; 透明导电层; 透明窗口层。 透明窗层包括硫化镉和氧。 该装置的填充系数大于约0.65。 本发明的另一方面提供一种制造该装置的方法。
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9.发明授权Apparatus for increasing radiative heat transfer in an x-ray tube and method of making same 失效用于增加x射线管中的辐射热传递的装置及其制造方法公开(公告)号：US07672433B2
公开(公告)日：2010-03-02
申请号：US12122279
申请日：2008-05-16
Applicant: Dalong Zhong , Dennis M. Gray , Michael Hebert , Don Mark Lipkin , Thomas Raber , Gregory Alan Steinlage , Thomas C. Tiearney
Inventor： Dalong Zhong , Dennis M. Gray , Michael Hebert , Don Mark Lipkin , Thomas Raber , Gregory Alan Steinlage , Thomas C. Tiearney
IPC: H01J35/00
CPC classification number: H01J35/105 , H01J2235/081 , H01J2235/086 , H01J2235/1204 , H01J2235/1229 , H01J2235/1291
Abstract: A target assembly for generating x-rays includes a target substrate, and an emissive coating applied to a portion of the target substrate, the emissive coating comprising one or more of a carbide and a carbonitride.
Abstract translation: 用于产生X射线的目标组件包括目标衬底和施加到目标衬底的一部分的发射涂层，所述发射涂层包含一种或多种碳化物和碳氮化物。
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10.发明申请APPARATUS FOR INCREASING RADIATIVE HEAT TRANSFER IN AN X-RAY TUBE AND METHOD OF MAKING SAME 有权用于增加X射线管中的辐射热传递的装置及其制造方法公开(公告)号：US20100046717A1
公开(公告)日：2010-02-25
申请号：US12197679
申请日：2008-08-25
Applicant: Dalong Zhong , Dennis M. Gray , Michael Hebert , Thomas Raber , Gregory Alan Steinlage , Thomas C. Tiearney
Inventor： Dalong Zhong , Dennis M. Gray , Michael Hebert , Thomas Raber , Gregory Alan Steinlage , Thomas C. Tiearney
IPC: H01J35/08
CPC classification number: H01J35/105 , H01J2235/1204 , H01J2235/1245
Abstract: A target assembly for generating x-rays includes a target substrate, and an emissive coating attached to the target substrate, the emissive coating including a textured material including a plurality of granular protrusions arranged to increase gray body emissive characteristics of the target assembly above that of the target substrate.
Abstract translation: 用于产生X射线的目标组件包括目标衬底和附着到目标衬底的发射涂层，所述发射涂层包括纹理材料，所述纹理材料包括多个颗粒突起，所述纹理材料布置成将所述靶组件的灰色体发射特性增加到高于 目标基板。
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