Abstract:
The present invention relates to a counter electrode for DSSC which includes a porous membrane include a carbon-based material calcinated at high temperature and a platinum nano-particles and maintains higher conductivity than a thin membrane and in which the electrolyte moves smoothly, a method of preparing the same, and a DSSC using the same which is improved in photoelectric efficiency.
Abstract:
Provided are semiconductor integrated circuit (IC) devices including gate patterns having a step difference therebetween and a connection line interposed between the gate patterns. The semiconductor IC device includes a semiconductor substrate including a peripheral active region, a cell active region, and a device isolation layer. Cell gate patterns are disposed on the cell active region and the device isolation layer. A peripheral gate pattern is disposed on the peripheral active region. A cell electrical node is disposed on the cell active region adjacent to the cell gate patterns. Peripheral electrical nodes are disposed on the peripheral active region adjacent to the peripheral gate pattern. Connection lines are disposed on the cell gate patterns disposed on the device isolation layer. The connection lines are connected between the cell gate patterns and the peripheral gate pattern.
Abstract:
A time synchronization method in a wireless sensor network, a low power routing method using a reservation scheme, and an apparatus for performing the method are provided. The time synchronization method in the wireless sensor network may include: receiving a first synchronization request command packet from a parent node that manages time synchronization for a predetermined synchronization region; receiving, from the parent node, a second synchronization request command packet that has a transmission timestamp value of the first synchronization request command packet; and performing time synchronization for a child node based on a reception time of the first synchronization request command packet, a reception time of the second synchronization request command packet, and the transmission timestamp value of the first synchronization request command packet.
Abstract:
Integrated circuit devices include a semiconductor substrate having a plurality of trench isolation regions therein that define respective semiconductor active regions therebetween. A trench is provided in the semiconductor substrate. The trench has first and second opposing sidewalls that define opposing interfaces with a first trench isolation region and a first active region, respectively. A first electrical interconnect is provided at a bottom of the trench. An electrically insulating capping pattern is provided, which extends between the first electrical interconnect and a top of the trench. An interconnect insulating layer is also provided, which lines the first and second sidewalls and bottom of the trench. The interconnect insulating layer extends between the first electrical interconnect and the first active region. A recess is provided in the first active region. The recess has a sidewall that defines an interface with the interconnect insulating layer. A second electrical interconnect is also provided, which extends on: (i) an upper surface of the first trench isolation region, (ii) the electrically insulating capping pattern; and (iii) the sidewall of the recess. The first and second electrical interconnects extend across the semiconductor substrate in first and second orthogonal directions, respectively.
Abstract:
A semiconductor device having a cell area and a peripheral area includes a semiconductor substrate, a cell insulating isolation region delimiting a cell active region of the semiconductor substrate in the cell area, a word line disposed within the semiconductor substrate in the cell area, a bit line contact plug disposed on the cell active region, a bit line disposed on the bit line contact plug, a peripheral insulating isolation region delimiting a peripheral active region of the semiconductor substrate in the peripheral area, and a peripheral transistor including a peripheral transistor lower electrode and a peripheral transistor upper electrode. The bit line contact plug is formed at the same level in the semiconductor device as the peripheral transistor lower electrode, and the bit line electrode is formed at the same level in the semiconductor device as the peripheral transistor upper electrode.
Abstract:
A mobile terminal includes a projector module projecting an image onto an external surface; a display having a touchscreen; and a controller configured to receive a control signal corresponding to a touch input received via the display, wherein the control signal is for adjusting at least a size or a position of an external display area formed on the external surface such that the external display area is adjusted based on a touch pattern of the touch input, to adjust the external display area in response to the control signal, and to control the projector module to project the image on the adjusted external display area, wherein a screen area set and positioned according to the touch input is displayed via the touchscreen and the external display area is adjusted according to a size and a position of the screen area.
Abstract:
A semiconductor device includes a semiconductor substrate having a cell region and a peripheral circuit region defined therein. A buried word line is disposed in the substrate in the cell region and has a top surface lower than top surfaces of cell active regions in the cell region. A gate line is disposed on the substrate in the peripheral circuit region. A word line interconnect is disposed in the substrate in the peripheral circuit region, the word line interconnect including a first portion contacting the buried word line and having a top surface lower than a top surfaces of the cell active regions and a second portion that is overlapped by and in contact with the gate line.
Abstract:
Provided is a method of supporting node portability in a sensor network, wherein data transmission to a portable node can be guaranteed since even when the portable node is assigned with a different address by being associated with another network, the newly assigned address is transmitted to a parent node or a sink node that was previously associated with the portable node.
Abstract:
A semiconductor device may include a substrate having a cell active region. A cell gate electrode may be formed in the cell active region. A cell gate capping layer may be formed on the cell gate electrode. At least two cell epitaxial layers may be formed on the cell active region. One of the at least two cell epitaxial layers may extend to one end of the cell gate capping layer and another one of the at least two cell epitaxial layers may extend to an opposite end of the cell gate capping layer. Cell impurity regions may be disposed in the cell active region. The cell impurity regions may correspond to a respective one of the at least two cell epitaxial layers.
Abstract:
A semiconductor device having a cell area and a peripheral area includes a semiconductor substrate, a cell insulating isolation region delimiting a cell active region of the semiconductor substrate in the cell area, a word line disposed within the semiconductor substrate in the cell area, a bit line contact plug disposed on the cell active region, a bit line disposed on the bit line contact plug, a peripheral insulating isolation region delimiting a peripheral active region of the semiconductor substrate in the peripheral area, and a peripheral transistor including a peripheral transistor lower electrode and a peripheral transistor upper electrode. The bit line contact plug is formed at the same level in the semiconductor device as the peripheral transistor lower electrode, and the bit line electrode is formed at the same level in the semiconductor device as the peripheral transistor upper electrode.