发明授权
US08461687B2 Semiconductor devices including bit line contact plug and buried channel array transistor, and semiconductor modules, electronic circuit boards and electronic systems including the same
有权
包括位线接触插头和掩埋沟道阵列晶体管的半导体器件,以及包括其的电子电路板和电子系统的半导体模块
- 专利标题: Semiconductor devices including bit line contact plug and buried channel array transistor, and semiconductor modules, electronic circuit boards and electronic systems including the same
- 专利标题(中): 包括位线接触插头和掩埋沟道阵列晶体管的半导体器件,以及包括其的电子电路板和电子系统的半导体模块
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申请号: US13072907申请日: 2011-03-28
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公开(公告)号: US08461687B2公开(公告)日: 2013-06-11
- 发明人: Sung-Il Cho , Nam-Gun Kim , Jin-Young Kim , Hyun-Chul Yoon , Bong-Soo Kim , Kwan-Sik Cho
- 申请人: Sung-Il Cho , Nam-Gun Kim , Jin-Young Kim , Hyun-Chul Yoon , Bong-Soo Kim , Kwan-Sik Cho
- 申请人地址: KR Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-do
- 代理机构: Volentine & Whitt, PLLC
- 优先权: KR10-2010-0031560 20100406; KR10-2010-0031562 20100406; KR10-2010-0031564 20100406
- 主分类号: H01L29/40
- IPC分类号: H01L29/40 ; H01L29/66
摘要:
A semiconductor device having a cell area and a peripheral area includes a semiconductor substrate, a cell insulating isolation region delimiting a cell active region of the semiconductor substrate in the cell area, a word line disposed within the semiconductor substrate in the cell area, a bit line contact plug disposed on the cell active region, a bit line disposed on the bit line contact plug, a peripheral insulating isolation region delimiting a peripheral active region of the semiconductor substrate in the peripheral area, and a peripheral transistor including a peripheral transistor lower electrode and a peripheral transistor upper electrode. The bit line contact plug is formed at the same level in the semiconductor device as the peripheral transistor lower electrode, and the bit line electrode is formed at the same level in the semiconductor device as the peripheral transistor upper electrode.
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