Display panel and method for fabricating the same
    1.
    发明授权
    Display panel and method for fabricating the same 有权
    显示面板及其制造方法

    公开(公告)号:US08582071B2

    公开(公告)日:2013-11-12

    申请号:US13423360

    申请日:2012-03-19

    IPC分类号: G02F1/1339

    CPC分类号: G02F1/1339

    摘要: A method for fabricating a display panel is provided. The method includes steps of: disposing a seal on a first substrate, in which a first side of the seal connects in approximately perpendicular to a second side of the seal and has at least one liquid crystal inlet; forming at least one block on the first substrate and between the liquid crystal inlet and the connection of the first side and the second side of the seal, in which there is a space between the block and the first side of the seal when the block is formed; and pressing a second substrate against the first substrate having the seal and the block thereon, such that the block adjoins the first side of the seal after the second substrate is pressed.

    摘要翻译: 提供一种制造显示面板的方法。 该方法包括以下步骤:将密封件设置在第一基板上,密封件的第一侧大致垂直于密封件的第二侧,并具有至少一个液晶入口; 在所述第一基板上形成至少一个块,并且在所述液晶入口与所述密封件的第一侧和所述第二侧的连接之间形成至少一个块,其中当所述块是所述块时,所述块与所述密封的第一侧之间存在空间 形成 并且将第二基板压靠在其上具有密封件和块体的第一基板上,使得该块在第二基板被按压之后邻接密封件的第一侧。

    Display Panel and Method for Fabricating the Same
    2.
    发明申请
    Display Panel and Method for Fabricating the Same 有权
    显示面板及其制造方法

    公开(公告)号:US20120175057A1

    公开(公告)日:2012-07-12

    申请号:US13423360

    申请日:2012-03-19

    IPC分类号: G02F1/1339

    CPC分类号: G02F1/1339

    摘要: A method for fabricating a display panel is provided. The method includes steps of: disposing a seal on a first substrate, in which a first side of the seal connects in approximately perpendicular to a second side of the seal and has at least one liquid crystal inlet; forming at least one block on the first substrate and between the liquid crystal inlet and the connection of the first side and the second side of the seal, in which there is a space between the block and the first side of the seal when the block is formed; and pressing a second substrate against the first substrate having the seal and the block thereon, such that the block adjoins the first side of the seal after the second substrate is pressed.

    摘要翻译: 提供一种制造显示面板的方法。 该方法包括以下步骤:将密封件设置在第一基板上,密封件的第一侧大致垂直于密封件的第二侧,并具有至少一个液晶入口; 在所述第一基板上形成至少一个块,并且在所述液晶入口与所述密封件的第一侧和所述第二侧的连接之间形成至少一个块,其中当所述块是所述块时,所述块与所述密封的第一侧之间存在空间 形成 并且将第二基板压靠在其上具有密封件和块体的第一基板上,使得该块在第二基板被按压之后邻接密封件的第一侧。

    Display panel and method for fabricating the same
    3.
    发明授权
    Display panel and method for fabricating the same 有权
    显示面板及其制造方法

    公开(公告)号:US08184255B2

    公开(公告)日:2012-05-22

    申请号:US12769932

    申请日:2010-04-29

    IPC分类号: G02F1/1339

    CPC分类号: G02F1/1339

    摘要: A display panel includes a first substrate, a second substrate, a seal and at least one block. The second substrate is disposed opposite to the first substrate. The seal is disposed between the first substrate and the second substrate and has a first side and a second side. The first side has at least one liquid crystal inlet and connects in approximately perpendicular to the second side. The block is disposed between the first substrate and the second substrate and adjoins the first side of the seal. The block is disposed between the liquid crystal inlet and the connection of the first side and the second side. A method for fabricating a display panel is also disclosed herein.

    摘要翻译: 显示面板包括第一基板,第二基板,密封件和至少一个块体。 第二基板与第一基板相对设置。 密封件设置在第一基板和第二基板之间,并且具有第一侧面和第二侧面。 第一侧具有至少一个液晶入口并且大致垂直于第二侧连接。 该块设置在第一基板和第二基板之间并且邻接密封件的第一侧。 该块设置在液晶入口与第一侧和第二侧的连接之间。 本文还公开了一种用于制造显示面板的方法。

    METHOD OF TEMPERATURE DETERMINATION FOR DEPOSITION REACTORS
    4.
    发明申请
    METHOD OF TEMPERATURE DETERMINATION FOR DEPOSITION REACTORS 有权
    沉积反应器温度测定方法

    公开(公告)号:US20120012047A1

    公开(公告)日:2012-01-19

    申请号:US12835789

    申请日:2010-07-14

    IPC分类号: C30B25/10

    摘要: A method of determining a temperature in a deposition reactor includes the steps of depositing a first epitaxial layer of silicon germanium on a substrate, depositing a second epitaxial layer of silicon above the first epitaxial layer, measuring the thickness of the second epitaxial layer and determining the temperature in the deposition reactor using the measured thickness of the second epitaxial layer. The method may also include heating the deposition reactor to approximately a predetermined temperature using a heating device and a temperature measuring device and generating a signal indicative of a temperature within the deposition reactor. The method may also contain the steps of comparing the measured thickness with a predetermined thickness of the second epitaxial layer corresponding to the predetermined temperature and determining the temperature in the deposition reactor using the measured thickness of the second epitaxial layer and the predetermined thickness of the second epitaxial layer.

    摘要翻译: 确定沉积反应器中的温度的方法包括以下步骤:将硅锗的第一外延层沉积在衬底上,在第一外延层上沉积硅的第二外延层,测量第二外延层的厚度并确定 使用测量的第二外延层的厚度在沉积反应器中的温度。 该方法还可以包括使用加热装置和温度测量装置将沉积反应器加热至约预定温度,并产生指示沉积反应器内的温度的信号。 该方法还可以包括以下步骤:将测量的厚度与对应于预定温度的第二外延层的预定厚度进行比较,并使用第二外延层的测量厚度和第二外延层的预定厚度来确定沉积反应器中的温度 外延层。

    Method and apparatus for controlling spatial distribution of RF power and plasma density
    6.
    发明申请
    Method and apparatus for controlling spatial distribution of RF power and plasma density 审中-公开
    用于控制RF功率和等离子体密度的空间分布的方法和装置

    公开(公告)号:US20050031796A1

    公开(公告)日:2005-02-10

    申请号:US10636154

    申请日:2003-08-07

    IPC分类号: H01J37/32 G06F9/45 H05H1/24

    摘要: Uniform spatial distribution of plasma over the face of a semiconductor wafer is achieved using a multi-zone electrode forming part of an electrostatic chuck used to hold the wafer in a processing chamber. The electrode includes a plurality of concentric electrode portions to which differing RF bias voltages may be applied to produce an electric field having a desired spatial distribution. Sensors are used to monitor either the spatial distribution of the plasma or the process effects of the plasma, and the sensed information is fed back to a controller that adjusts the bias voltage on the electrode portions in a manner to maintain the spatial uniformity of the plasma.

    摘要翻译: 使用形成用于将晶片保持在处理室中的静电卡盘的一部分的多区电极来实现半导体晶片的表面上的等离子体的均匀空间分布。 电极包括多个同心电极部分,可以施加不同的RF偏置电压以产生具有期望的空间分布的电场。 传感器用于监测等离子体的空间分布或等离子体的过程效应,并且将感测到的信息反馈到控制器,该控制器以维持等离子体的空间均匀性的方式调节电极部分上的偏置电压 。

    Method of temperature determination for deposition reactors
    7.
    发明授权
    Method of temperature determination for deposition reactors 有权
    沉积反应器温度测定方法

    公开(公告)号:US09011599B2

    公开(公告)日:2015-04-21

    申请号:US12835789

    申请日:2010-07-14

    摘要: A method of determining a temperature in a deposition reactor includes the steps of depositing a first epitaxial layer of silicon germanium on a substrate, depositing a second epitaxial layer of silicon above the first epitaxial layer, measuring the thickness of the second epitaxial layer and determining the temperature in the deposition reactor using the measured thickness of the second epitaxial layer. The method may also include heating the deposition reactor to approximately a predetermined temperature using a heating device and a temperature measuring device and generating a signal indicative of a temperature within the deposition reactor. The method may also contain the steps of comparing the measured thickness with a predetermined thickness of the second epitaxial layer corresponding to the predetermined temperature and determining the temperature in the deposition reactor using the measured thickness of the second epitaxial layer and the predetermined thickness of the second epitaxial layer.

    摘要翻译: 确定沉积反应器中的温度的方法包括以下步骤:将硅锗的第一外延层沉积在衬底上,在第一外延层上沉积硅的第二外延层,测量第二外延层的厚度并确定 使用测量的第二外延层的厚度在沉积反应器中进行温度测量。 该方法还可以包括使用加热装置和温度测量装置将沉积反应器加热至约预定温度,并产生指示沉积反应器内的温度的信号。 该方法还可以包括以下步骤:将测量的厚度与对应于预定温度的第二外延层的预定厚度进行比较,并使用第二外延层的测量厚度和第二外延层的预定厚度来确定沉积反应器中的温度 外延层。

    Display Panel and Method for Fabricating the Same
    8.
    发明申请
    Display Panel and Method for Fabricating the Same 有权
    显示面板及其制造方法

    公开(公告)号:US20110007258A1

    公开(公告)日:2011-01-13

    申请号:US12769932

    申请日:2010-04-29

    IPC分类号: G02F1/1339

    CPC分类号: G02F1/1339

    摘要: A display panel includes a first substrate, a second substrate, a seal and at least one block. The second substrate is disposed opposite to the first substrate. The seal is disposed between the first substrate and the second substrate and has a first side and a second side. The first side has at least one liquid crystal inlet and connects in approximately perpendicular to the second side. The block is disposed between the first substrate and the second substrate and adjoins the first side of the seal. The block is disposed between the liquid crystal inlet and the connection of the first side and the second side. A method for fabricating a display panel is also disclosed herein

    摘要翻译: 显示面板包括第一基板,第二基板,密封件和至少一个块体。 第二基板与第一基板相对设置。 密封件设置在第一基板和第二基板之间,并且具有第一侧面和第二侧面。 第一侧具有至少一个液晶入口并且大致垂直于第二侧连接。 该块设置在第一基板和第二基板之间并且邻接密封件的第一侧。 该块设置在液晶入口与第一侧和第二侧的连接之间。 本文还公开了一种用于制造显示面板的方法

    Continuous liquid delivery system with anti-clog function
    9.
    发明申请
    Continuous liquid delivery system with anti-clog function 审中-公开
    连续输液系统具有防堵塞功能

    公开(公告)号:US20060043029A1

    公开(公告)日:2006-03-02

    申请号:US10931123

    申请日:2004-08-30

    IPC分类号: B01D29/66

    CPC分类号: B01D37/00 B24B57/02

    摘要: A continuous liquid delivery system which includes at least one primary filter and at least one secondary filter for alternatively receiving a liquid such as a CMP polishing slurry. A primary backwash circuit is provided in fluid communication with each primary filter for backwashing of the primary filter. At least one secondary backwash circuit is provided in fluid communication with each secondary filter for backwashing of the secondary filter. As the liquid is distributed through the primary filter or filters, the secondary filter or filters can be backwashed, and vice-versa to facilitate a continuous flow of the liquid from a source to a destination.

    摘要翻译: 一种连续液体输送系统,其包括至少一个初级过滤器和至少一个辅助过滤器,用于替代地接收液体,例如CMP抛光浆料。 提供主回流电路与每个主过滤器流体连通,用于主过滤器的反冲洗。 提供至少一个二次反洗电路与每个二次过滤器流体连通,用于二次过滤器的反冲洗。 当液体通过主过滤器或过滤器分配时,二次过滤器或过滤器可以被反冲洗,反之亦然,以便于液体从源到目的地的连续流动。

    CHAMBER MATCH USING IMPORTANT VARIABLES FILTERED BY DYNAMIC MULTIVARIATE ANALYSIS
    10.
    发明申请
    CHAMBER MATCH USING IMPORTANT VARIABLES FILTERED BY DYNAMIC MULTIVARIATE ANALYSIS 有权
    使用动态多变量分析过滤的重要变量进行CHAMBER匹配

    公开(公告)号:US20120095582A1

    公开(公告)日:2012-04-19

    申请号:US12905354

    申请日:2010-10-15

    IPC分类号: G05B13/04 G05B13/02

    摘要: The present disclosure provides a method of chamber match. The method includes identifying a golden chamber designed operable to implement a semiconductor process; identifying a reference chamber designed operable for the semiconductor process; and extracting a matching index of a processing chamber relative to the golden chamber and the reference chamber using a dynamic variable analysis.

    摘要翻译: 本公开提供了室匹配的方法。 该方法包括识别可操作以实现半导体工艺的金室; 识别设计用于半导体工艺的参考室; 以及使用动态变量分析提取处理室相对于黄金室和参考室的匹配指数。