公开(公告)号：US06395363B1

公开(公告)日：2002-05-28

申请号：US08743308

申请日：1996-11-05

Applicant: David S. Ballance ,  Benjamin Bierman ,  Robert M. Haney ,  David W. LaCourt

Inventor： David S. Ballance ,  Benjamin Bierman ,  Robert M. Haney ,  David W. LaCourt

IPC: C23C1600

CPC classification number: H01L21/68735 ,  H01L21/68757 ,  Y10T428/21 ,  Y10T428/213 ,  Y10T428/216 ,  Y10T428/218 ,  Y10T428/219 ,  Y10T428/31663

Abstract: A substrate support comprising a shelf having a surface sloped at an angle such that the support contacts the substrate substantially at an edge portion of the substrate. The angle of the shelf is greater than an angle of the edge portion of the substrate. The surface of the shelf may be machined or polished to improve its smoothness. The substrate support thereby reduces the effect and severity of scratches on the substrate caused by the support. As a result, the substrate support improves substrate yield.

Abstract translation: 一种基板支撑件，其包括具有以一定角度倾斜的表面的搁架，使得支撑件基本上在基板的边缘部分处接触基板。 搁板的角度大于基板的边缘部分的角度。 搁板的表面可以被加工或抛光以提高其平滑度。 衬底支撑件因此降低了由支撑件引起的衬底划伤的影响和严重性。 结果，衬底支撑物改善了衬底产量。

公开(公告)号：US6035100A

公开(公告)日：2000-03-07

申请号：US858089

申请日：1997-05-16

Applicant: Benjamin Bierman ,  David S. Ballance ,  James V. Tietz ,  Brian Haas ,  Meredith J. Williams ,  Paul Deaton

Inventor： Benjamin Bierman ,  David S. Ballance ,  James V. Tietz ,  Brian Haas ,  Meredith J. Williams ,  Paul Deaton

IPC: G01J5/00 ,  H01L21/00 ,  H01L21/26 ,  F27B5/08 ,  F27B5/14 ,  H01L21/324

CPC classification number: H01L21/67017 ,  G01J5/0003

Abstract: In one embodiment, the invention is directed to an apparatus for preventing depositions from occurring on a reflector in a processing chamber, comprising: a cover disposed adjacent to the reflector, the cover optically transparent over a range of wavelengths in which the reflector is reflective; and at least one cover support for maintaining the position of the cover relative to the reflector.

Abstract translation: 在一个实施例中，本发明涉及一种用于防止在处理室中的反射器上发生沉积的装置，包括：邻近反射器布置的盖，所述盖在反射器反射的波长范围内可光学透明; 以及用于保持盖相对于反射器的位置的至少一个盖支撑件。

公开(公告)号：US6123766A

公开(公告)日：2000-09-26

申请号：US872123

申请日：1997-05-16

Applicant: Meredith J. Williams ,  David S. Ballance ,  Benjamin Bierman ,  Paul Deaton ,  Brian Haas ,  Nobuyuki Takahashi ,  James V. Tietz

Inventor： Meredith J. Williams ,  David S. Ballance ,  Benjamin Bierman ,  Paul Deaton ,  Brian Haas ,  Nobuyuki Takahashi ,  James V. Tietz

IPC: C23C16/46 ,  C30B25/10 ,  C30B25/16

CPC classification number: C23C16/46 ,  C30B25/10 ,  C30B25/16 ,  Y10T117/1008

Abstract: A method for controlling the temperature of a substrate in a processing chamber. The processing chamber employs a heating control over at least two heating zones. Each heating zone is independently controllable according to a measured signal corresponding to the substrate temperature and a user-definable offset.

Abstract translation: 一种用于控制处理室中的衬底的温度的方法。 处理室采用对至少两个加热区的加热控制。 根据与衬底温度和用户可定义的偏移相对应的测量信号，每个加热区可独立控制。

公开(公告)号：US5879128A

公开(公告)日：1999-03-09

申请号：US687165

申请日：1996-07-24

Applicant: James V. Tietz ,  Benjamin Bierman

Inventor： James V. Tietz ,  Benjamin Bierman

IPC: H01L21/683 ,  H01L21/26 ,  H01L21/687 ,  B05C13/00

CPC classification number: H01L21/68742 ,  Y10S414/135 ,  Y10S414/139

Abstract: A substrate support mechanism including a housing made of a magnetically permeable material; a pin located substantially within the housing and having an upper end extending up into a passage which extends up through the bottom of the chamber and into the cavity which contains a substrate during processing; a first magnet assembly on the inside of the housing and mounted on the pin; a carriage structure located outside of the housing; and a second magnet assembly mounted on the carriage structure, wherein the first and second magnet assemblies are positioned relative to each other so that the second magnet assembly causes the pin and the first magnet assembly to magnetically levitate within the housing.

Abstract translation: 一种衬底支撑机构，包括由导磁材料制成的壳体; 销基本上位于壳体内，并且具有向上延伸到通道的上端的上端，该通道在处理期间向上延伸穿过腔室的底部并进入包含衬底的空腔中; 位于壳体内部并安装在销上的第一磁体组件; 位于壳体外部的托架结构; 以及安装在所述滑架结构上的第二磁体组件，其中所述第一和第二磁体组件相对于彼此定位，使得所述第二磁体组件引起所述销和所述第一磁体组件在所述壳体内磁悬浮。

公开(公告)号：US5781693A

公开(公告)日：1998-07-14

申请号：US687150

申请日：1996-07-24

Applicant: David S. Ballance ,  Benjamin Bierman ,  James V. Tietz

Inventor： David S. Ballance ,  Benjamin Bierman ,  James V. Tietz

IPC: B01J4/00 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  C23F4/00 ,  C30B25/10 ,  C30B25/14 ,  C30B31/12 ,  C30B31/16 ,  H01L21/205 ,  H01L21/22 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/20

CPC classification number: C23C16/45574 ,  C23C16/45565 ,  C23C16/4584 ,  C23C16/481 ,  C30B25/10 ,  C30B25/14 ,  C30B31/12 ,  C30B31/16

Abstract: A showerhead for use with a lamp head in a thermal processing chamber, the lamp head including a high intensity source which emits radiation that heats a substrate within the chamber, the showerhead including a top window on a side of the showerhead that is adjacent to the lamp head; a bottom window on a side of the showerhead that is adjacent to the substrate during processing; and a gas supply inlet through which a gas is introduced into a space between the top and bottom windows, wherein the top and bottom windows are transparent to the radiation from the source in the lamp head and wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber.

Abstract translation: 一种与热处理室中的灯头一起使用的喷头，所述灯头包括发射辐射的高强度源，所述辐射辐射加热所述腔室内的衬底，所述喷头包括位于所述淋浴头侧面上的顶部窗口， 灯头; 在处理过程中在喷头的与衬底相邻的一侧上的底部窗口; 以及气体供给入口，通过所述气体供给入口将气体引入到所述顶部和底部窗口之间的空间中，其中所述顶部和底部窗口对于来自所述灯头中的所述源的辐射是透明的，并且其中所述底部窗口包括多个气体分布 气体从顶部和底部窗口之间的空间注入到腔室中。

公开(公告)号：US6157106A

公开(公告)日：2000-12-05

申请号：US879497

申请日：1997-05-16

Applicant: James V. Tietz ,  Benjamin Bierman

Inventor： James V. Tietz ,  Benjamin Bierman

IPC: H01L21/205 ,  H01L21/00 ,  H01L21/26 ,  H01L21/687 ,  H02K7/09

CPC classification number: H01L21/68785 ,  F16C32/047 ,  H01L21/68792

Abstract: Accomodations for a magnetically levitated rotating system in an RTP chamber are provided. The system includes a magnetically permeable rotor; a cylindrical thin wall concentric with and surrounding the rotor; and a magnetic stator assembly adjacent the cylindrical thin wall. The radial distance between the rotor and the magnetic stator assembly is small enough that a magnetic field created by the stator assembly magnetically levitates the rotor but is great enough that the rotor does not physically contact the thin wall upon thermal expansion. The system is such that the relative positions of a plurality of sensors which determine the position of a rotating frame is maintained upon dismantling. Thermal isolation of the area including the rotor is accomplished from the reactive gases in a processing area of the RTP chamber. The rotor may be cooled by a number of cooling chambers formed within the chamber.

Abstract translation: 提供了一个用于RTP室中的磁悬浮旋转系统的住宿。 该系统包括导磁转子; 与转子同心并围绕转子的圆柱形薄壁; 以及邻近圆柱形薄壁的磁性定子组件。 转子和磁性定子组件之间的径向距离足够小，使得由定子组件产生的磁场使转子磁悬浮，但足够大，使得转子在热膨胀时不与薄壁物理接触。 该系统使得在拆卸时保持确定旋转框架的位置的多个传感器的相对位置。 包括转子在内的区域的热隔离由RTP室的处理区域内的反应性气体完成。 转子可以由在室内形成的多个冷却室冷却。

公开(公告)号：US06133152A

公开(公告)日：2000-10-17

申请号：US880194

申请日：1997-05-16

Applicant: Benjamin Bierman ,  Meredith J. Williams ,  David S. Ballance ,  Brian Haas ,  Paul Deaton ,  James V. Tietz

Inventor： Benjamin Bierman ,  Meredith J. Williams ,  David S. Ballance ,  Brian Haas ,  Paul Deaton ,  James V. Tietz

IPC: H01L21/205 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  C30B25/12 ,  C30B25/14 ,  H01L21/26 ,  H01L21/687 ,  H01L21/302

CPC classification number: C23C16/45521 ,  C23C16/4401 ,  C23C16/4584 ,  C23C16/481 ,  C30B25/12 ,  C30B25/14 ,  H01L21/68735 ,  H01L21/68785 ,  H01L21/68792

Abstract: An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.

Abstract translation: 一种用于隔离处理室中的旋转框架的装置，包括：可旋转地从所述旋转框架延伸的支撑筒; 以及从所述支撑筒延伸到至少一个基本上热，光学和机械地将所述共旋转边缘环延伸部上方的区域与所述同向旋转边缘环延伸部下方的区域隔开的共同旋转边缘环延伸。

公开(公告)号：US6090210A

公开(公告)日：2000-07-18

申请号：US690265

申请日：1996-07-24

Applicant: David S. Ballance ,  Benjamin Bierman ,  James V. Tietz

Inventor： David S. Ballance ,  Benjamin Bierman ,  James V. Tietz

IPC: B01J4/00 ,  C23C16/44 ,  C23C16/455 ,  C23C16/48 ,  C23F4/00 ,  C30B25/14 ,  C30B31/16 ,  H01L21/205 ,  H01L21/22 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00 ,  F27B5/04 ,  F27B5/16

CPC classification number: C23C16/45574 ,  C23C16/45565 ,  C23C16/45572 ,  C23C16/481 ,  C30B25/14 ,  C30B31/16 ,  H01L21/67115

Abstract: A showerhead for introducing gas from one or more external supplies into a substrate processing chamber, the showerhead including a faceplate including a plurality of gas injection ports through which gas is injected into the chamber, wherein the plurality of gas injection ports includes a first subset of gas injection ports and a second subset of gas injection ports; a first gas distribution system which during use delivers a first gas to the first subset of injection ports for injection into the chamber; and a second gas distribution system which during use delivers a second gas to the second subset of injection ports for injection into the chamber.

Abstract translation: 一种用于将气体从一个或多个外部供应引入基板处理室的喷头，所述喷头包括面板，所述面板包括多个气体注入口，气体通过所述气体注入口注入到所述室中，其中所述多个气体注入端口包括： 气体注入口和气体注入口的第二子集; 第一气体分配系统，其在使用期间将第一气体输送到用于喷射到所述室中的所述注入口的第一子集; 以及第二气体分配系统，其在使用期间将第二气体输送到用于喷射到室中的第二注入口子集。

公开(公告)号：US5960555A

公开(公告)日：1999-10-05

申请号：US858091

申请日：1997-05-16

Applicant: Paul Deaton ,  Benjamin Bierman ,  Meredith J. Williams ,  Brian Haas ,  David S. Ballance ,  James V. Tietz

Inventor： Paul Deaton ,  Benjamin Bierman ,  Meredith J. Williams ,  Brian Haas ,  David S. Ballance ,  James V. Tietz

IPC: H01L21/683 ,  C23C16/44 ,  C23C16/455 ,  H01L21/205 ,  H01L21/26 ,  H01L21/31 ,  F26B11/18

CPC classification number: C23C16/45521 ,  C23C16/455

Abstract: An apparatus for purging the backside of a substrate in a process chamber includes a purge gas injector. The injector includes a substantially annular-shaped opening providing a slit that is structured and arranged to direct a flow of purge gas about radially outward therefrom in a direction approximately parallel to a plane defined by the substrate, wherein the substrate is supported in the process chamber above the purge gas injector. When the substrate is rotated at a sufficient speed, the purge gas flowing from the injector is impelled to flow spirally outward along the backside of the substrate.

Abstract translation: 用于清洗处理室中的衬底背面的装置包括净化气体注入器。 喷射器包括大致环形的开口，其提供狭缝，该狭缝被构造和布置成沿着大致平行于由衬底限定的平面的方向引导吹扫气体的径向向外流动，其中衬底被支撑在处理室 在吹扫气体喷射器之上。 当衬底以足够的速度旋转时，从注射器流出的吹扫气体被推动沿着衬底的背面螺旋地向外流动。

公开(公告)号：US5848889A

公开(公告)日：1998-12-15

申请号：US685493

申请日：1996-07-24

Applicant: James V. Tietz ,  Benjamin Bierman ,  David S. Ballance

Inventor： James V. Tietz ,  Benjamin Bierman ,  David S. Ballance

IPC: H01L21/683 ,  H01L21/205 ,  H01L21/22 ,  H01L21/26 ,  H01L21/687 ,  F27D5/00

CPC classification number: H01L21/68735

Abstract: An annular-shaped edge ring support for a semiconductor wafer has an innermost radial portion for supporting the semiconductor wafer and an outermost radial portion contiguous with the inner portion. The inner portion has a graded thermal mass that generally increases with increasing radius.

Abstract translation: 用于半导体晶片的环形边缘环支撑件具有用于支撑半导体晶片的最内径向部分和与内部部分邻接的最外径部分。 内部部分具有通常随着半径的增加而增加的分级热质量。