Invention Grant
US6123766A Method and apparatus for achieving temperature uniformity of a substrate
失效
用于实现基板的温度均匀性的方法和装置
- Patent Title: Method and apparatus for achieving temperature uniformity of a substrate
- Patent Title (中): 用于实现基板的温度均匀性的方法和装置
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Application No.: US872123Application Date: 1997-05-16
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Publication No.: US6123766APublication Date: 2000-09-26
- Inventor: Meredith J. Williams , David S. Ballance , Benjamin Bierman , Paul Deaton , Brian Haas , Nobuyuki Takahashi , James V. Tietz
- Applicant: Meredith J. Williams , David S. Ballance , Benjamin Bierman , Paul Deaton , Brian Haas , Nobuyuki Takahashi , James V. Tietz
- Applicant Address: CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: CA Santa Clara
- Main IPC: C23C16/46
- IPC: C23C16/46 ; C30B25/10 ; C30B25/16
Abstract:
A method for controlling the temperature of a substrate in a processing chamber. The processing chamber employs a heating control over at least two heating zones. Each heating zone is independently controllable according to a measured signal corresponding to the substrate temperature and a user-definable offset.
Public/Granted literature
- US5370950A Non-aqueous electrolyte secondary battery Public/Granted day:1994-12-06
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