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1.发明授权Systems and methods for creating persistent data for a wafer and for using persistent data for inspection-related functions 有权用于创建晶片持久性数据以及使用持久性数据进行检查相关功能的系统和方法公开(公告)号：US08126255B2
公开(公告)日：2012-02-28
申请号：US12234201
申请日：2008-09-19
申请人： Kris Bhaskar , Chetana Bhaskar , Ashok Kulkarni , Eliezer Rosengaus , Cecelia Campochiaro , Chris Maher , Brian Duffy , Aneesh Khullar , Alpa Kohli , Lalita A. Balasubramanian , Santosh Bhattacharyya , Mohan Mahadevan
发明人： Kris Bhaskar , Chetana Bhaskar , Ashok Kulkarni , Eliezer Rosengaus , Cecelia Campochiaro , Chris Maher , Brian Duffy , Aneesh Khullar , Alpa Kohli , Lalita A. Balasubramanian , Santosh Bhattacharyya , Mohan Mahadevan
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.
摘要翻译： 提供了用于创建晶片的持久数据并使用持久数据进行检查相关功能的各种系统和方法。 一个系统包括耦合到检查系统的检测器的一组处理器节点。 每个处理器节点被配置为在扫描晶片期间接收由检测器产生的图像数据的一部分。 该系统还包括分开耦合到每个处理器节点的存储介质阵列。 处理器节点被配置为将由处理器节点接收的图像数据的所有图像数据或选定部分发送到存储介质阵列，使得由检测器生成的图像数据或图像数据的所选部分 在扫描晶片期间存储在存储介质的阵列中。
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2.发明授权Method of improving corrosion resistance of stainless steel surfaces by a process of passivation 有权通过钝化工艺提高不锈钢表面的耐腐蚀性的方法公开(公告)号：US07850786B2
公开(公告)日：2010-12-14
申请号：US11582748
申请日：2006-10-17
申请人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
发明人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded. Subsequent to diffusion bonding, a stainless steel diffusion bonded part may advantageously be treated to enhance corrosion resistance using a series of steps designed to bring more chromium to the surface of the steel.
摘要翻译： 描述了对于半导体加工设备中的气体分布特别有用的节省空间的集成流体输送系统。 该系统包括集成流体流网络结构，并且除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。 层状衬底是扩散接合的。 在扩散接合之后，可以使用一系列设计成将更多的铬带到钢的表面的步骤，可以有利地处理不锈钢扩散接合部分以增强耐腐蚀性。
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3.发明申请SYSTEMS AND METHODS FOR CREATING PERSISTENT DATA FOR A WAFER AND FOR USING PERSISTENT DATA FOR INSPECTION-RELATED FUNCTIONS 有权用于创建WAFER的持续数据并使用用于检查相关功能的数据的系统和方法公开(公告)号：US20090080759A1
公开(公告)日：2009-03-26
申请号：US12234201
申请日：2008-09-19
申请人： Kris Bhaskar , Chetana Bhaskar , Ashok Kulkarni , Eliezer Rosengaus , Cecilia Campochiaro , Chris Maher , Brian Duffy , Aneesh Khullar , Alpa Kohli , Lalita A. Balasubramanian , Santosh Bhattacharyya , Mohan Mahadevan
发明人： Kris Bhaskar , Chetana Bhaskar , Ashok Kulkarni , Eliezer Rosengaus , Cecilia Campochiaro , Chris Maher , Brian Duffy , Aneesh Khullar , Alpa Kohli , Lalita A. Balasubramanian , Santosh Bhattacharyya , Mohan Mahadevan
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.
摘要翻译： 提供了用于创建晶片的持久数据并使用持久数据进行检查相关功能的各种系统和方法。 一个系统包括耦合到检查系统的检测器的一组处理器节点。 每个处理器节点被配置为在扫描晶片期间接收由检测器产生的图像数据的一部分。 该系统还包括分开耦合到每个处理器节点的存储介质阵列。 处理器节点被配置为将由处理器节点接收的图像数据的所有图像数据或选定部分发送到存储介质阵列，使得由检测器生成的图像数据或图像数据的所选部分 在扫描晶片期间存储在存储介质的阵列中。
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4.发明申请Diffusion bonded fluid flow manifold with partially integrated inter-active component 失效具有部分集成的相互作用部件的扩散粘合流体流动歧管公开(公告)号：US20070226973A1
公开(公告)日：2007-10-04
申请号：US11788428
申请日：2007-04-19
申请人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
发明人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译： 一种节省空间的集成流体输送系统，其特别适用于半导体加工设备中的气体分配。 流体输送系统包括集成的流体流动网络结构，除了含有流体流动通道的分层基底之外，还可以包括各种流体处理和监测部件。 分层基板是扩散接合的，并且根据设计和材料要求，各种流体处理和监测部件可以部分地集成或完全集成到基板中。
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5.发明授权Method of increasing etchability of metals having chemical etching resistant microstructure 失效具有耐化学蚀刻微观结构的金属的蚀刻性的提高方法公开(公告)号：US08017028B2
公开(公告)日：2011-09-13
申请号：US12287772
申请日：2008-10-14
申请人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
发明人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
IPC分类号： C03C25/68
CPC分类号： F16K99/0001 , F16K27/003 , F16K99/0015 , F16K99/0028 , F16K99/0059 , F16K2099/0074 , F16K2099/0076
摘要： A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译： 提高具有抗化学蚀刻的微结构的金属的蚀刻性的方法（例如HASTELLOY C-22）。 这是通过暂时去除提供对金属的耐腐蚀性的微结构来实现的。 通过热处理金属去除微结构。 化学蚀刻后，通过热处理将微结构恢复到其原始的耐腐蚀性。
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6.发明申请Method of increasing etchability of metals having chemical etching resistant microstructure 失效具有耐化学蚀刻微观结构的金属的蚀刻性的提高方法公开(公告)号：US20090039057A1
公开(公告)日：2009-02-12
申请号：US12287772
申请日：2008-10-14
申请人： Mark Crockett , John W. Lane , Micahel J. DeChellis , Chris Melcer , Erica R. Porras , Aneesh Khullar , Balarabe N. Mohammed
发明人： Mark Crockett , John W. Lane , Micahel J. DeChellis , Chris Melcer , Erica R. Porras , Aneesh Khullar , Balarabe N. Mohammed
IPC分类号： C23F1/00
CPC分类号： F16K99/0001 , F16K27/003 , F16K99/0015 , F16K99/0028 , F16K99/0059 , F16K2099/0074 , F16K2099/0076
摘要： A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译： 一种节省空间的集成流体输送系统，其特别适用于半导体加工设备中的气体分配。 本发明还包括集成流体流网络结构，除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。 分层基板是扩散接合的，并且根据设计和材料要求，各种流体处理和监测部件可以部分地集成或完全集成到基板中。
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公开(公告)号：US07459003B2
公开(公告)日：2008-12-02
申请号：US11542829
申请日：2006-10-03
申请人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
发明人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
IPC分类号： B01D46/00
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention pertains to a diffusion bonded integrated fluid flow network architecture, which includes, in addition to a layered substrate containing fluid flow channels, an in-line filter and may include various fluid handling and monitoring components. The integrated fluid delivery system that is formed from a layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译： 一种节省空间的集成流体输送系统，其特别适用于半导体加工设备中的气体分配。 本发明涉及一种扩散结合的集成流体流动网络结构，其包括除含有流体流动通道的层状基底之外的在线过滤器，并且可以包括各种流体处理和监测部件。 由分层基板形成的集成流体输送系统是扩散接合的，并且根据设计和材料要求，各种流体处理和监测部件可以部分地集成或完全集成到基板中。
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8.发明授权Capacitance dual electrode pressure sensor in a diffusion bonded layered substrate 失效电容双电极压力传感器在扩散键层状衬底中公开(公告)号：US07448276B2
公开(公告)日：2008-11-11
申请号：US11509507
申请日：2006-08-23
申请人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
发明人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
IPC分类号： G01L9/12
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： A diffusion bonded space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The disclosure includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. A capacitive dual electrode pressure sensor which is integrated into a multilayered substrate is described. The pressure sensor may be used as a gage relative to atmospheric pressure if desired for a particular application.
摘要翻译： 一种扩散保温空间节约综合流体输送系统，对于半导体加工设备中的气体分布特别有用。 本公开包括集成流体流网络架构，除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。 描述了集成到多层基板中的电容双电极压力传感器。 如果特定应用需要，压力传感器可以用作相对于大气压的量具。
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9.发明申请Method of improving corrosion resistance of stainless steel surfaces by a process of passivation 有权通过钝化工艺提高不锈钢表面的耐腐蚀性的方法公开(公告)号：US20070062909A1
公开(公告)日：2007-03-22
申请号：US11582748
申请日：2006-10-17
申请人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
发明人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded. Subsequent to diffusion bonding, a stainless steel diffusion bonded part may advantageously be treated to enhance corrosion resistance using a series of steps designed to bring more chromium to the surface of the steel.
摘要翻译： 描述了对于半导体加工设备中的气体分布特别有用的节省空间的集成流体输送系统。 该系统包括集成流体流网络结构，并且除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。 层状衬底是扩散接合的。 在扩散接合之后，可以使用一系列设计成将更多的铬带到钢的表面的步骤，可以有利地处理不锈钢扩散接合部分以增强耐腐蚀性。
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10.发明申请Method of attaching components to semiconductor processing chambers using diffusion bonding 失效使用扩散接合将部件附接到半导体处理室的方法公开(公告)号：US20070062021A1
公开(公告)日：2007-03-22
申请号：US11586103
申请日：2006-10-24
申请人： Mark Crockett , John Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
发明人： Mark Crockett , John Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
IPC分类号： B21D35/00
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译： 本公开涉及一种节省空间的集成流体输送系统，其特别适用于半导体加工设备中的气体分配。 本发明还涉及一种集成流体流网络结构，除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。 分层基板是扩散接合的，并且根据设计和材料要求，各种流体处理和监测部件可以部分地集成或完全集成到基板中。
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