Method and apparatus for monitoring and control of suck back level in a photoresist dispense system
    1.
    发明授权
    Method and apparatus for monitoring and control of suck back level in a photoresist dispense system 有权
    用于在光刻胶分配系统中监测和控制吸回水平的方法和装置

    公开(公告)号:US07935948B2

    公开(公告)日:2011-05-03

    申请号:US11691468

    申请日:2007-03-26

    IPC分类号: G01N15/06 G01N21/00 G01F23/00

    CPC分类号: H01L21/6715 H01L21/67253

    摘要: An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.

    摘要翻译: 用于监测分配喷嘴中的半导体工艺流体界面的位置的装置包括适于提供沿光路传播的光束的扩展光源。 光束的特征在于沿与分配方向对齐的第一方向测量的路径宽度。 该装置还包括耦合到光路并适于检测光束的至少一部分的光学检测器以及沿着光路布置在扩展光源和光学检测器之间的位置处的分配喷嘴。 该装置还包括联接到分配喷嘴并适于沿着第一方向平移分配喷嘴的喷嘴定位构件。

    METHOD AND APPARATUS FOR MONITORING AND CONTROL OF SUCK BACK LEVEL IN A PHOTORESIST DISPENSE SYSTEM
    3.
    发明申请
    METHOD AND APPARATUS FOR MONITORING AND CONTROL OF SUCK BACK LEVEL IN A PHOTORESIST DISPENSE SYSTEM 有权
    用于监视和控制光电复原系统中回退级别的方法和装置

    公开(公告)号:US20080035666A1

    公开(公告)日:2008-02-14

    申请号:US11691468

    申请日:2007-03-26

    IPC分类号: B67D5/08 G01B11/14

    CPC分类号: H01L21/6715 H01L21/67253

    摘要: An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.

    摘要翻译: 用于监测分配喷嘴中的半导体工艺流体界面的位置的装置包括适于提供沿光路传播的光束的扩展光源。 光束的特征在于沿与分配方向对齐的第一方向测量的路径宽度。 该装置还包括耦合到光路并适于检测光束的至少一部分的光学检测器以及沿着光路布置在扩展光源和光学检测器之间的位置处的分配喷嘴。 该装置还包括联接到分配喷嘴并适于沿着第一方向平移分配喷嘴的喷嘴定位构件。