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10 条记录 (耗时 0.012 秒)

    Resist developer
    1.
    发明授权
    Resist developer 失效
    抵制开发商

    公开(公告)号：US06432621B1

    公开(公告)日：2002-08-13

    申请号：US09474802

    申请日：1999-12-29

    申请人： Shougo Nomoto ,  Akimitsu Sakai ,  Kozo Kitazawa

    发明人： Shougo Nomoto ,  Akimitsu Sakai ,  Kozo Kitazawa

    IPC分类号： G03F732

    CPC分类号： G03F7/322

    摘要： A resist developer obtained by a process comprising mixing (1) at least one compound selected from the group consisting of a basic compound A and an organic compound B having phenolic hydroxyl group and carboxyl group in a molecule, and/or (2) a salt C formed between the basic compound A and the organic compound B. The resist developer exhibiting excellent dissolution selectivity, and developing a resist in a short period of time, can be used for developing positive and negative resists.

    摘要翻译： 通过以下方法获得的抗蚀剂显影剂：（1）在分子中混合（1）选自碱性化合物A和具有酚性羟基和羧基的有机化合物B的至少一种化合物和/或（2）盐 C形成碱性化合物A和有机化合物B之间。可以使用显示出优异的溶解选择性和在短时间内显影抗蚀剂的抗蚀剂显影剂来显影正型和负型抗蚀剂。

    Method for using thermally stable esters in a lubricating oil for a refrigerating machine
    2.
    发明授权
    Method for using thermally stable esters in a lubricating oil for a refrigerating machine 失效
    在冷冻机用润滑油中使用热稳定酯的方法

    公开(公告)号：US06228820B1

    公开(公告)日：2001-05-08

    申请号：US08863049

    申请日：1997-05-23

    申请人： Akimitsu Sakai ,  Toshiya Hagihara

    发明人： Akimitsu Sakai ,  Toshiya Hagihara

    IPC分类号： C10M10538

    CPC分类号： C09K5/045 ,  C07C69/28 ,  C07C69/30 ,  C07C69/33 ,  C10M105/38 ,  C10M171/008 ,  C10M2207/281 ,  C10M2207/282 ,  C10M2207/283 ,  C10M2207/286 ,  C10M2211/022 ,  C10M2211/06 ,  C10N2240/00 ,  C10N2240/22 ,  C10N2240/30 ,  C10N2240/50 ,  C10N2240/52 ,  C10N2240/54 ,  C10N2240/56 ,  C10N2240/58 ,  C10N2240/60 ,  C10N2240/66

    摘要： An ester compound having thermal stability in the presence of a metal characterized in that the ester compound is formed between a dihydric to nonahydric hindered alcohol having 5-15 carbon atoms and a saturated aliphatic monocarboxylic acid having 3-20 carbon atoms or a derivative thereof; that the ratio of a branched carboxylic acid or a derivative thereof to the entire carboxylic acids or derivatives thereof is not less than 50 mol %; that the hydroxyl value of the ester compound is not more than 30 mg KOH/g; and that the acid value after a sealed tube test is not more than 10 mg KOH/g; and a lubricating oil composition comprising the ester compound in an amount of not less than 50% by weight. The present invention provides an ester compound having outstandingly good thermal stability in the presence of a metal and a lubricating oil composition and a working fluid composition for a refrigerating machine comprising the ester compound as the main component.

    摘要翻译： 在金属存在下具有热稳定性的酯化合物，其特征在于酯化合物形成在具有5-15个碳原子的二羟基至非羟基受阻醇和具有3-20个碳原子的饱和脂肪族单羧酸或其衍生物之间; 支链羧酸或其衍生物与整个羧酸或其衍生物的比例不小于50mol％; 酯化合物的羟值不超过30mg KOH / g; 密封管试验后的酸值不超过10mg KOH / g; 以及含有不少于50重量％的酯化合物的润滑油组合物。 本发明提供一种在金属和润滑油组合物存在下具有优异的热稳定性的酯化合物以及以所述酯化合物为主要成分的制冷机的工作流体组合物。

    Resist developer
    5.
    发明授权
    Resist developer 失效
    抵制开发商

    公开(公告)号：US06372415B1

    公开(公告)日：2002-04-16

    申请号：US09181621

    申请日：1998-10-28

    申请人： Shogo Nomoto ,  Akimitsu Sakai ,  Kozo Kitazawa

    发明人： Shogo Nomoto ,  Akimitsu Sakai ,  Kozo Kitazawa

    IPC分类号： G03F732

    CPC分类号： G03F7/322

    摘要： A resist developer comprising (1) a basic organic compound A and (2) a salt C of (a) a basic compound A′ and (b) an organic compound B capable of forming a salt together with said basic compound A′, wherein said basic compound A′ is the same or different from said basic organic compound A, and wherein said resist developer is prepared by combining (1) and (2), or by reacting an excess amount of said basic organic compound A with said organic compound B.

    摘要翻译： 一种抗蚀剂显影剂，其包含（1）碱性有机化合物A和（2）碱性化合物A'的（a）和（b）能够与所述碱性化合物A'一起形成盐的有机化合物B的盐C（其中 所述碱性化合物A'与所述碱性有机化合物A相同或不同，并且其中所述抗蚀剂显影剂通过组合（1）和（2）制备，或通过使过量的所述碱性有机化合物A与所述有机化合物 B.

    Semiconductor cleaner comprising a reducing agent, dispersant, and phosphonic acid-based chelant
    9.
    发明授权
    Semiconductor cleaner comprising a reducing agent, dispersant, and phosphonic acid-based chelant 有权
    包含还原剂，分散剂和基于膦酸的螯合剂的半导体清洁剂

    公开(公告)号：US07396806B2

    公开(公告)日：2008-07-08

    申请号：US10311471

    申请日：2001-06-14

    申请人： Akimitsu Sakai ,  Atsushi Tamura

    发明人： Akimitsu Sakai ,  Atsushi Tamura

    IPC分类号： C11D3/36 ,  C11D3/37 ,  C11D3/20

    CPC分类号： C11D7/34 ,  C11D3/0042 ,  C11D7/02 ,  C11D7/26 ,  C11D7/265 ,  C11D7/268 ,  C11D11/0047 ,  C23G1/20 ,  H01L21/02052

    摘要： To provide a detergent composition which has little corrosion to a wiring material and is excellent in cleaning ability of a semiconductor substrate or semiconductor device on which the fine particles and the metal impurities are deposited. A detergent composition comprising a reducing agent, wherein the detergent composition has an oxidation-reduction potential at 25° C. of +0.2 V or less, and a pH at 25° C. of from 3 to 12; and a cleaning process of a semiconductor substrate or a semiconductor device using the detergent composition.

    摘要翻译： 为了提供一种对配线材料几乎没有腐蚀的洗涤剂组合物，并且沉积有微细颗粒和金属杂质的半导体衬底或半导体器件的清洁能力优异。 一种洗涤剂组合物，其包含还原剂，其中所述洗涤剂组合物在25℃下的氧化还原电位为+ 0.2V或更低，并且25℃下的pH为3至12; 以及使用该洗涤剂组合物的半导体衬底或半导体器件的清洁处理。

    Synthetic lubricating oil
    10.
    发明授权
    Synthetic lubricating oil 失效
    合成润滑油

    公开(公告)号：US6096692A

    公开(公告)日：2000-08-01

    申请号：US776751

    申请日：1997-02-13

    申请人： Toshiya Hagihara ,  Shoji Nakagawa ,  Yuichiro Kobayashi ,  Hiroyasu Togashi ,  Koji Taira ,  Akimitsu Sakai

    发明人： Toshiya Hagihara ,  Shoji Nakagawa ,  Yuichiro Kobayashi ,  Hiroyasu Togashi ,  Koji Taira ,  Akimitsu Sakai

    IPC分类号： C07D317/12 ,  C07D317/22 ,  C07D493/04 ,  C10M105/18 ,  C10M171/00 ,  C07D317/18

    CPC分类号： C07D493/04 ,  C07D317/12 ,  C07D317/22 ,  C10M105/18 ,  C10M171/008 ,  C10M2207/044 ,  C10M2211/022 ,  C10M2211/06 ,  C10N2240/00 ,  C10N2240/02 ,  C10N2240/22 ,  C10N2240/30 ,  C10N2240/50 ,  C10N2240/52 ,  C10N2240/54 ,  C10N2240/56 ,  C10N2240/58 ,  C10N2240/60 ,  C10N2240/66

    摘要： The present invention relates to a synthetic lubricating oil comprising cyclic ketals or cyclic acetals obtained by a reaction between one or more polyhydric alcohols having an even number of hydroxyl groups of not less than 4 and not more than 10 and one or more specific carbonyl compounds, or one or more ketals or acetals which are reactive derivatives of said carbonyl compounds; a working fluid composition for a refrigerating machine comprising a hydrofluorocarbon and a refrigeration oil containing the cyclic ketals or cyclic acetals; and novel compounds of the above cyclic acetals and a production method thereof. The present invention provides a synthetic lubricating oil which shows a good thermal stability, a good oxidation resistance, no carboxylic acid formation due to hydrolysis and a low hygroscopicity and is inexpensive as well. Also, a working fluid composition for a refrigerating machine which shows a good insulating property, favorable hygroscopicity, and no carboxylic acid formation due to hydrolysis as well as being inexpensive can be provided.

    摘要翻译： PCT No.PCT / JP95 / 00304 Sec。 371日期1996年2月13日 102（e）日期1996年2月13日PCT提交1995年2月27日PCT公布。 公开号WO96 / 06839 日期：1996年3月7日本发明涉及一种合成润滑油，其包含通过一种或多种具有偶数个羟基的多元醇的反应而获得的环状缩酮或环状缩醛，所述羟基数为4以上且10以下， 更特异的羰基化合物或作为所述羰基化合物的反应性衍生物的一种或多种缩酮或缩醛; 一种用于制冷机的工作流体组合物，包括氢氟烃和含有环状缩酮或环状缩醛的冷冻机油; 和上述环状缩醛的新化合物及其制备方法。 本发明提供合成润滑油，它具有良好的热稳定性，良好的抗氧化性，由于水解而不形成羧酸，吸湿性低，并且也便宜。 另外，也可以提供一种冷冻机的工作流体组合物，其具有良好的绝缘性，良好的吸湿性，并且由于水解而不形成羧酸，而且价格便宜。