公开(公告)号：US20050206888A1

公开(公告)日：2005-09-22

申请号：US11131379

申请日：2005-05-18

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G01N21/956 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/7065 ,  G01N21/95684

摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.

摘要翻译： 图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影 从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。 该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器 显示由图像处理器检测到的缺陷的信息。

公开(公告)号：US06943876B2

公开(公告)日：2005-09-13

申请号：US10223423

申请日：2002-08-20

申请人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

发明人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

IPC分类号： G01B11/30 ,  G01N21/956 ,  H01L21/66 ,  G02N21/88

CPC分类号： G01N21/95684

摘要： A method and apparatus for detecting pattern defects which includes annularly scanning of a laser beam emitted from a laser light source on a pupil of an objective lens, illuminating the scanned laser beam, through the objective lens, onto a sample on which there is formed a pattern coated with an optically transparent thin film, acquiring an optical image of the illuminated sample, and processing the acquired image to find defects in the pattern. The annular scan diameter of the laser beam is determined based on the thickness of the optically transparent thin film.

摘要翻译： 一种用于检测图案缺陷的方法和装置，其包括从物镜的瞳孔上的激光光源发射的激光束的环状扫描，将扫描的激光束通过物镜照射到其上形成有 涂覆有光学透明薄膜的图案，获取照射样品的光学图像，以及处理所获取的图像以发现图案中的缺陷。 基于光学透明薄膜的厚度确定激光束的环形扫描直径。

公开(公告)号：US20050052642A1

公开(公告)日：2005-03-10

申请号：US10893988

申请日：2004-07-20

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

IPC分类号： G01B11/30 ,  G01N21/13 ,  G01N21/15 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  G06K9/00 ,  H01L21/66

CPC分类号： G01N21/9501 ,  G01N21/13 ,  G01N21/8806 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/154 ,  G01N2021/8825 ,  G01N2021/9513

摘要： The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.

摘要翻译： 本发明涉及一种适用于图案精细化的高灵敏度检测方法和装置，其中使用以下技术提高了缺陷检查灵敏度：通过填充物镜30与物镜30之间的间隙来提高检测光学系统的分辨率。 样品1，具有液体，并且增加有效NA（数值孔径）; 并且当在样品的表面上形成透明的层间绝缘膜时，抑制液体与绝缘膜之间的界面处的振幅分裂，以减少由于薄膜的干扰引起的光学图像在亮度上的不均匀性，由 将物镜与样品之间的间隙浸入折射率接近于透明膜的液体。

公开(公告)号：US06841403B2

公开(公告)日：2005-01-11

申请号：US10348747

申请日：2003-01-21

申请人： Maki Tanaka ,  Shunji Maeda ,  Minori Noguchi ,  Takafumi Okabe ,  Yuji Takagi ,  Chie Shishido

发明人： Maki Tanaka ,  Shunji Maeda ,  Minori Noguchi ,  Takafumi Okabe ,  Yuji Takagi ,  Chie Shishido

IPC分类号： H01L21/00 ,  H01L21/66 ,  G06F19/00

CPC分类号： H01L21/67276 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： Disclosed herein is a method for manufacturing semiconductor device and a method and apparatus for processing detected defect data, making it possible to quickly infer or determine a process and related manufacturing equipment that causes defects in a fabrication line of semiconductor devices, take remedy action, and achieve a constant and high yield. The method of the invention comprises quantitatively evaluating similarity of a defects distribution on a wafer that suffered abnormal occurrence of defects to inspection results for wafers inspected in the past, analyzing cyclicity of data sequence of evaluated similarity, evaluating relationship between the cyclicity of defects obtained from the analysis and the process method according to each manufacturing equipment in the fabrication line, and inferring or determining a causal process and equipment that caused the defects.

摘要翻译： 本发明公开了一种用于制造半导体器件的方法和用于处理检测到的缺陷数据的方法和装置，使得可以快速推断或确定导致半导体器件制造线中的缺陷的处理和相关制造设备，采取补救措施，以及 实现恒定和高收益。 本发明的方法包括定量评估在异常发生缺陷的晶片上的缺陷分布与以往检查的晶片的检查结果的相似性，分析评估的相似性的数据序列的循环性，评估从 根据制造线上每个制造设备的分析和处理方法，并推断或确定引起缺陷的因果过程和设备。

公开(公告)号：US06797526B2

公开(公告)日：2004-09-28

申请号：US10232871

申请日：2002-08-30

申请人： Maki Tanaka ,  Shunji Maeda ,  Minori Noguchi ,  Takafumi Okabe ,  Yuji Takagi ,  Chie Shishido

发明人： Maki Tanaka ,  Shunji Maeda ,  Minori Noguchi ,  Takafumi Okabe ,  Yuji Takagi ,  Chie Shishido

IPC分类号： H01L2100

CPC分类号： H01L21/67276 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： Disclosed herein is a method for manufacturing semiconductor device and a method and apparatus for processing detected defect data, making it possible to quickly infer or determine a process and related manufacturing equipment that causes defects in a fabrication line of semiconductor devices, take remedy action, and achieve a constant and high yield. The method of the invention comprises quantitatively evaluating similarity of a defects distribution on a wafer that suffered abnormal occurrence of defects to inspection results for wafers inspected in the past, analyzing cyclicity of data sequence of evaluated similarity, evaluating relationship between the cyclicity of defects obtained from the analysis and the process method according to each manufacturing equipment in the fabrication line, and inferring or determining a causal process and equipment that caused the defects.

摘要翻译： 本发明公开了一种用于制造半导体器件的方法和用于处理检测到的缺陷数据的方法和装置，使得可以快速推断或确定导致半导体器件制造线中的缺陷的处理和相关制造设备，采取补救措施，以及 实现恒定和高收益。 本发明的方法包括定量评估在异常发生缺陷的晶片上的缺陷分布与以往检查的晶片的检查结果的相似性，分析评估的相似性的数据序列的循环性，评估从 根据制造线上每个制造设备的分析和处理方法，并推断或确定引起缺陷的因果过程和设备。

公开(公告)号：US06765201B2

公开(公告)日：2004-07-20

申请号：US09764457

申请日：2001-01-19

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

IPC分类号： G21K700

CPC分类号： G01N21/956 ,  G01N21/33 ,  G02F2001/3505 ,  G02F2001/3542 ,  H01S3/0092

摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.

摘要翻译： 一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗 并且在其中安装波长转换器装置，其中容器被气​​密密封，并在其中填充有惰性气体，例如氮气或氩气。

公开(公告)号：US06674890B2

公开(公告)日：2004-01-06

申请号：US09733092

申请日：2000-12-11

申请人： Shunji Maeda ,  Kenji Oka ,  Hiroshi Makihira ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Chie Shishido

发明人： Shunji Maeda ,  Kenji Oka ,  Hiroshi Makihira ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Chie Shishido

IPC分类号： G06K900

CPC分类号： G06T7/001 ,  G01R31/308 ,  G01R31/311 ,  G03F7/7065 ,  G06T7/0004 ,  G06T2207/10061 ,  G06T2207/30121 ,  G06T2207/30148

摘要： A pattern inspection method and apparatus in which an image of a first pattern formed on a sample and an image of a second pattern formed on the sample is detected. At least one of the first pattern image and the second pattern image is converted to a gray level so as to be substantially the same with each other by linear combination including a gain and offset. A defect of the sample is detected by using the first pattern image and the second pattern image at least one of which has been converted to the gray level and a result of the detection is outputted to an external storage or processor by a communication arrangement.

摘要翻译： 检测形成在样本上的第一图案的图像和形成在样本上的第二图案的图像的图案检查方法和装置。 第一图案图像和第二图案图像中的至少一个被转换为灰度级，以便通过包括增益和偏移的线性组合彼此基本相同。 通过使用第一图案图像和其中至少一个已经被转换为灰度级的第二图案图像和通过通信装置将检测结果输出到外部存储器或处理器来检测样本的缺陷。

公开(公告)号：US06236057B1

公开(公告)日：2001-05-22

申请号：US09610954

申请日：2000-07-06

申请人： Chie Shishido ,  Takashi Hiroi ,  Haruo Yoda ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Takanori Ninomiya ,  Hideaki Doi ,  Shunji Maeda ,  Mari Nozoe ,  Hiroyuki Shinoda ,  Atsuko Takafuji ,  Aritoshi Sugimoto ,  Yasutsugu Usami

发明人： Chie Shishido ,  Takashi Hiroi ,  Haruo Yoda ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Takanori Ninomiya ,  Hideaki Doi ,  Shunji Maeda ,  Mari Nozoe ,  Hiroyuki Shinoda ,  Atsuko Takafuji ,  Aritoshi Sugimoto ,  Yasutsugu Usami

IPC分类号： G01N2188

CPC分类号： G01N21/95607

摘要： A method and apparatus for inspecting a pattern, a first image of a first area on a sample is acquired by imaging the first area formed as a first pattern, and the first image is memorized. A second image of a second area on the sample is acquired by imaging the second area formed as a second pattern which is to be the same as the first pattern. A defect of the first pattern is detected by acquiring a differential image between the first image and the second image. The detection of the defect includes processing the differential image by using information of brightness corresponding to both of the first image and the second image.

摘要翻译： 通过对形成为第一图案的第一区域进行成像，并记录第一图像来获取用于检查图案的样品的第一区域的第一图像的方法和装置。 通过对形成为与第一图案相同的第二图案的第二区域成像来获取样品上的第二区域的第二图像。 通过获取第一图像和第二图像之间的差分图像来检测第一图案的缺陷。 缺陷的检测包括通过使用与第一图像和第二图像两者相对应的亮度的信息来处理差分图像。

公开(公告)号：US6091075A

公开(公告)日：2000-07-18

申请号：US87901

申请日：1998-06-01

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Hiroshi Makihara ,  Minoru Yoshida ,  Yasuhiko Nakayama ,  Kenji Oka

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Hiroshi Makihara ,  Minoru Yoshida ,  Yasuhiko Nakayama ,  Kenji Oka

IPC分类号： G01N21/95 ,  G02B21/24 ,  G01N21/00 ,  G01N21/88

CPC分类号： G02B21/241 ,  G01N21/9501

摘要： An automatic focus detection method comprises the steps of: irradiating onto a single spot of a sample a plurality of beams of illuminating light transmitted and condensed through an objective lens in a symmetrically diagonal manner with respect to an optical axis of the objective lens; branching reflected light from the same spot of the illuminated sample after transmission through the objective lens, in directions of illumination symmetrical with respect to the optical axis so as to obtain a plurality of optical images; and causing a photoelectric conversion device to receive the branched optical images for conversion to an electric signal representing light intensity distribution of the images, whereby a defocus of the sample is detected based on a discrepancy between the optical axis and the center of the light intensity distribution.

摘要翻译： 一种自动对焦检测方法，包括以下步骤：以相对于物镜的光轴对称对角线的方式，将通过物镜透射和聚光的多束照明光照射在样品的单个点上; 在相对于光轴对称的照明方向透射物镜之后，将来自照射样品的同一点的反射光分支，以获得多个光学图像; 并且使光电转换装置接收用于转换为表示图像的光强度分布的电信号的分支光学图像，由此基于光轴和光强度分布的中心之间的差异来检测样品的散焦 。

公开(公告)号：US6087673A

公开(公告)日：2000-07-11

申请号：US81636

申请日：1998-05-20

申请人： Chie Shishido ,  Takashi Hiroi ,  Haruo Yoda ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Takanori Ninomiya ,  Hideaki Doi ,  Shunji Maeda ,  Mari Nozoe ,  Hiroyuki Shinoda ,  Atsuko Takafuji ,  Aritoshi Sugimoto ,  Yasutsugu Usami

发明人： Chie Shishido ,  Takashi Hiroi ,  Haruo Yoda ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Takanori Ninomiya ,  Hideaki Doi ,  Shunji Maeda ,  Mari Nozoe ,  Hiroyuki Shinoda ,  Atsuko Takafuji ,  Aritoshi Sugimoto ,  Yasutsugu Usami

IPC分类号： G01N23/20 ,  G01N21/88 ,  G01N21/956 ,  G01N23/225 ,  G06T1/00 ,  H01L21/66

CPC分类号： G01N21/95607

摘要： In a method of inspecting a defect and an apparatus thereof, an allowable range for a gradation value of a difference image is determined for each pixel from one pixel or less of position shift quantity between two images to be compared, a variation rate in a local gradation value of an image, and a representative value of the local gradation value. Then, by comparing the gradation value of the difference image with the allowable range determined for each pixel, a pixel, on which the gradation value of the difference image is within the allowable range, is judged to be an non-defective candidate and a pixel, on which the gradation value of the difference image is beyond the allowable range, is judged to be a defective candidate. This reduces the number of false information caused by mismatches attributed to an object to be inspected and an image detecting system, such as an infinitesimal difference in pattern configuration, a difference in the gradation value, a distortion of a pattern, and a position shift, thus making it possible to detect a more minute defect.

摘要翻译： 在检查缺陷的方法和装置中，针对要比较的两个图像之间的位置偏移量的一个像素或更少的像素，针对每个像素确定差分图像的灰度值的允许范围，局部变化率 图像的灰度值和局部灰度值的代表值。 然后，通过将差分图像的灰度值与对于每个像素确定的容许范围进行比较，将差分图像的灰度值在允许范围内的像素判断为无缺陷候选和像素 ，其中差分图像的灰度值超出允许范围，被判断为缺陷候选。 这减少了归因于待检查对象的失配和图像检测系统引起的错误信息的数量，例如图案配置中的无穷小差异，灰度值的差异，图案的失真和位置偏移， 从而可以检测到更小的缺陷。