公开(公告)号：US06614826B1

公开(公告)日：2003-09-02

申请号：US09565733

申请日：2000-05-05

Applicant: Jason W. Bethel ,  Eugene F. Yelden ,  Jeffery A. Broderick

Inventor： Jason W. Bethel ,  Eugene F. Yelden ,  Jeffery A. Broderick

IPC: H01S306

CPC classification number: H01S3/063 ,  H01S3/06 ,  H01S3/073 ,  H01S3/0804 ,  H01S3/22

Abstract: A laser system and method having an output laser beam uses an gain medium with one or more output beam transverse profile tailoring (OBTPT) longitudinal strips to tailor the transverse profile of the output laser beam to a desirable shape such as having a symmetrical profile transverse to the direction of propagation of the output laser beam. The laser system has two reflector systems on opposite ends in the long z-axis dimension of the gain medium to form a resonator that outputs the output laser beam following the same long z-axis dimension. In some embodiments the gain medium has a narrow y-axis dimension and a wide x-axis dimension. In these embodiments the OBTPT longitudinal strips have lengths running the long z-axis dimension, widths running the wide x-axis dimension and thicknesses running the narrow y-axis dimension of the gain medium. The widths of the OBTPT longitudinal strips are generally chosen with respect to coupling width of the output laser beam. The OBTPT longitudinal strips are contoured to change their y-axis thicknesses with respect to position along the z-axis so that the output laser beam is formed with a desired transverse profile upon exiting the laser system. Location, number, contouring, and other aspects of the OBTPT longitudinal strips can be varied depending upon the particular output beam tailoring that is desired.

Abstract translation: 具有输出激光束的激光系统和方法使用具有一个或多个输出光束横向轮廓裁剪（OBTPT）纵向条带的增益介质，以将输出激光束的横向轮廓定制成期望的形状，例如具有横向于 输出激光束的传播方向。 激光系统在增益介质的长z轴尺寸的相对端上具有两个反射器系统，以形成输出遵循相同长z轴尺寸的输出激光束的谐振器。 在一些实施例中，增益介质具有窄的y轴尺寸和宽的x轴尺寸。 在这些实施例中，OBTPT纵向条带具有长z轴尺寸的长度，运行宽x轴尺寸的宽度和运行增益介质的窄y轴尺寸的厚度。 通常相对于输出激光束的耦合宽度选择OBTPT纵向条的宽度。 OBTPT纵向条的轮廓是相对于沿着z轴的位置改变它们的y轴厚度，使得输出激光束在离开激光系统时形成所需的横向轮廓。 OBTPT纵向条的位置，数量，轮廓和其他方面可以根据所需的特定输出光束裁剪而变化。

公开(公告)号：US20030138018A1

公开(公告)日：2003-07-24

申请号：US09886765

申请日：2001-06-21

Inventor： Dale L. Hook ,  Thomas J. Engler

IPC: H01S003/04 ,  H01S003/22 ,  H01S003/223 ,  H01S003/095

CPC classification number: H01S3/095 ,  H01S3/03 ,  H01S3/0407 ,  H01S3/22 ,  Y10S372/701

Abstract: A DF or HF chemical laser gain generator fabricated by a platelet technique in which internal passages are more easily formed because the generator is made as a stack of thin platelets that are separately etched and then stacked together. The gain generator is water cooled through passages formed in it during the platelet fabrication process. Water cooling results in lower and more uniform operating temperatures and gas pressures, allowing the use of stronger metals which facilitate the elimination of supporting structures that can degrade laser beam quality. The fabrication method allows for the elimination of gas dynamic and thermally induced density gradients which further degrade laser beam quality.

Abstract translation: 通过血小板技术制造的DF或HF化学激光增益发生器，其中内部通道更容易形成，因为发生器被制成作为单独蚀刻并堆叠在一起的薄片的堆叠。 在血小板制造过程中，增益发生器通过其中形成的通道进行水冷。 水冷却导致更低和更均匀的操作温度和气体压力，允许使用更强的金属，这有助于消除可能降低激光束质量的支撑结构。 制造方法允许消除气体动态和热致密度梯度，这进一步降低激光束质量。

公开(公告)号：US06590922B2

公开(公告)日：2003-07-08

申请号：US09879311

申请日：2001-06-12

Applicant: Eckehard D. Onkels ,  Richard L. Sandstrom ,  Richard M. Ness ,  William N. Partlo ,  Alexander I. Ershov ,  Choonghoon Oh

Inventor： Eckehard D. Onkels ,  Richard L. Sandstrom ,  Richard M. Ness ,  William N. Partlo ,  Alexander I. Ershov ,  Choonghoon Oh

IPC: H01S322

CPC classification number: G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/082 ,  H01S3/0835 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/10092 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2325 ,  H01S3/2366

Abstract: A narrow band F2 laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed beam at a first narrow wavelength range corresponding to a first natural emission line of the F2 laser system. This beam is injected into the gain medium of the second laser subsystem in a first direction where the beam is amplified to produce a narrow band pulsed output beam. The seed laser subsystem also produces a second pulsed beam at a second wavelength range corresponding to a second natural emission line of the F2 laser. This line is injected into the gain medium of the second laser subsystem in a second direction opposite said first direction. The second beam is amplified in the gain medium of the second laser subsystem depleting the gain medium of gain potential at the second wavelength range. (This amplified second beam is preferably wasted.) With the gain potential at the second undesired wavelength the range thus reduced the portion of light at the second wavelength range in the output beam is greatly reduced.

公开(公告)号：US20030031216A1

公开(公告)日：2003-02-13

申请号：US10210761

申请日：2002-07-31

Inventor： John P. Fallon ,  Richard L. Sandstrom ,  William N. Partlo ,  Alexander I. Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard M. Ness ,  Paul C. Melcher ,  John A. Rule ,  Robert N. Jacques

IPC: H01S003/00 ,  H01S003/13

CPC classification number: H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

Abstract translation: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

公开(公告)号：US20030016363A1

公开(公告)日：2003-01-23

申请号：US10173190

申请日：2002-06-14

Inventor： Richard L. Sandstrom ,  John T. Melchior ,  Rajasekhar Rao

IPC: H01S003/22 ,  H01S003/223 ,  G01J003/45 ,  G01B009/02

CPC classification number: G01J3/26 ,  G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: The present invention provides a wavemeter for an ultraviolet laser capable of long life beam quality monitoring in a pulsed ultraviolet laser system at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater. In a preferred embodiment an enhanced illumination configuration reduces per pulse illumination of an etalon by a factor of 28 compared to a popular prior art configuration. Optics are provided in this embodiment which reduce light entering the etalon to only that amount needed to illuminate a linear photo diode array positioned to measure interference patterns produced by the etalon. In this preferred embodiment two sample beams produced by reflections from two surfaces of a beam splitter are diffused by a defractive diffuser and the output of the defractive diffuser is focused on two separate secondary diffusers effectively combining both beams in two separate spectrally equivalent diffuse beams. One beam is used for wavelength and bandwidth measurement and the other beam is used for calibration. In preferred embodiments an etalon chamber contains nitrogen with an oxygen concentration of between 1.6 and 2.4 percent.

Abstract translation: 本发明提供了一种用于紫外激光器的波长计，其能够在脉冲能量为5mJ以上的脉冲紫外激光系统中以大于2000Hz的脉冲速率进行长寿命光束质量监测。 在一个优选实施例中，与常用的现有技术配置相比，增强的照明配置将标准具的每脉冲照明降低了28倍。 在该实施例中提供光学器件，其将进入标准具的光仅仅照射照亮定位成测量由标准具产生的干涉图案的线性光电二极管阵列所需的量。 在该优选实施例中，通过来自分束器的两个表面的反射产生的两个采样光束被减光扩散器扩散，并且消光扩散器的输出聚焦在两个分开的二次扩散器上，两个分离的二次扩散器在两个分开的光谱等效漫射光束中有效地组合两个光束。 一个波束用于波长和带宽测量，另一个波束用于校准。 在优选实施例中，标准具室含有氧浓度在1.6和2.4％之间的氮。

公开(公告)号：US06504860B2

公开(公告)日：2003-01-07

申请号：US09837150

申请日：2001-04-18

Applicant: Peter C. Newman ,  John Van Doorn ,  Darrel W. Fullen ,  William H. Clopton ,  Shahryar Rokni

Inventor： Peter C. Newman ,  John Van Doorn ,  Darrel W. Fullen ,  William H. Clopton ,  Shahryar Rokni

IPC: H01S322

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

Abstract: A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.

公开(公告)号：US20020167986A1

公开(公告)日：2002-11-14

申请号：US10141201

申请日：2002-05-07

Inventor： Xiaojiang Pan ,  Holger K. Glatzel ,  John T. Melchoir ,  Raymond Cybulski

IPC: H01S003/22 ,  H01S003/223

CPC classification number: G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

Abstract: The present invention provides a gas discharge ultraviolet laser capable of producing a high quality pulsed ultraviolet laser beam at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater and having an enclosed beam path at least a portion of which comprises an oxidation agent. In a preferred embodiment a portion of the beam path comprises a sealed chamber containing a gas comprising a small concentration of oxygen. In one preferred embodiment the sealed chamber is an etalon chamber and the contained gas is nitrogen with an oxygen concentration of between 1.6 and 2.4 percent. In another preferred embodiments a small concentration of oxygen is added to the purge gas of a special purge compartment containing optical components exposed to high intensity output laser beam.

Abstract translation: 本发明提供一种气体放电紫外线激光器，其能够以5mJ以上的脉冲能量产生高于2000Hz的脉冲率的高质量脉冲紫外激光束，并且具有封闭的光束路径，其至少一部分包含氧化剂 。 在优选实施例中，光束路径的一部分包括含有包含少量氧气的气体的密封室。 在一个优选实施例中，密封室是标准室，并且所含有的气体是氧浓度在1.6和2.4％之间的氮气。 在另一个优选的实施方案中，将小浓度的氧气加入到包含暴露于高强度输出激光束的光学部件的特殊净化室的净化气体中。

公开(公告)号：US20020150138A1

公开(公告)日：2002-10-17

申请号：US09834840

申请日：2001-04-13

Inventor： Xiaojiang J. Pan ,  Vladimir Kulgeyko

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/22 ,  H01S3/2207

Abstract: A gas discharge modular laser with beam train isolation between laser chamber module and front and rear optics which define the laser resonant cavity. Beam train isolation units isolates the beam train from atmospheric air while permitting quick and easy removal of the laser chamber without disturbing the optics of the resonant cavity. In preferred embodiments, metal bellows units are bolted at only side so that the chamber module can be removed and replaced without unbolting the bellows unit.

Abstract translation: 一种气体放电模块激光器，其激光腔室模块与前后光学器件之间具有光束驱动隔离，其限定了激光谐振腔。 光束列车隔离单元将光束与大气隔离，同时允许快速且容易地去除激光室，而不会干扰谐振腔的光学器件。 在优选实施例中，金属波纹管单元仅在一侧螺栓连接，使得腔室模块可以被拆卸并且不拆卸波纹管单元而被更换。

公开(公告)号：US06466602B1

公开(公告)日：2002-10-15

申请号：US09590961

申请日：2000-06-09

Applicant: Vladimir B. Fleurov ,  Michael C. Cates ,  Michael Du'Lyea ,  Igor V. Fomenkov ,  Dmitri V. Gaidarenko ,  Jean-Marc Hueber ,  Richard G. Morton ,  Eckehard D. Onkels ,  Robert A. Shannon ,  Ross H. Winnick

Inventor： Vladimir B. Fleurov ,  Michael C. Cates ,  Michael Du'Lyea ,  Igor V. Fomenkov ,  Dmitri V. Gaidarenko ,  Jean-Marc Hueber ,  Richard G. Morton ,  Eckehard D. Onkels ,  Robert A. Shannon ,  Ross H. Winnick

IPC: H01S3097

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/041 ,  H01S3/0979 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225

Abstract: A gas discharge laser having a laser chamber with two elongated erodable electrode elements, each having an erodable section and an electrode with support configured to minimize discharge region laser gas turbulence and with the electrode elements being configured to permit gradual erosion over more than 8 billion pulses without causing substantial changes in the shape of electrical discharges between the electrode elements. A pulse power system provides electrical pulses of at least 2J at rates of at least 2 KHz. A blower circulates laser gas between the electrodes at speeds of at least 2 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.

Abstract translation: 一种气体放电激光器，其具有具有两个细长可蚀电极元件的激光室，每个具有可蚀刻部分和具有支撑件的电极，其配置为使放电区域激光气体湍流最小化，并且电极元件被配置为允许在超过80亿个脉冲 而不会引起电极元件之间放电形状的显着变化。 脉冲功率系统以至少2KHz的速率提供至少2J的电脉冲。 鼓风机以至少2m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

公开(公告)号：US20020122445A1

公开(公告)日：2002-09-05

申请号：US09761728

申请日：2001-01-18

Applicant: RAMOT UNIVERSITY AUTHORITY FOR APPLIED RESEARCH AND INDUSTRIAL DEVELOPTMENT LTD

Inventor： Eli Jerby ,  Avi Shahadi ,  Yoav Sintov ,  Shaul Yatsiv

IPC: H01S003/13 ,  H01S003/22 ,  H01S003/223 ,  H01S003/097 ,  H01S003/09

CPC classification number: H01S3/0975 ,  H01S3/0315 ,  H01S3/09 ,  H01S3/22

Abstract: A laser with microwave excitation includes a source of microwave radiation coupled to a microwave resonator. The resonator is configured such that the microwave radiation generates an oscillating electric-field perpendicular to the longitudinal axis of the resonator corresponding to the first longitudinal resonator mode standing wave pattern. An excitation cavity, housing at least one gas discharge conduit, is coupled to the microwave resonator along a major portion of the cavity's length. The excitation cavity is configured to be below cutoff.

Abstract translation: 具有微波激发的激光器包括耦合到微波谐振器的微波辐射源。 谐振器被配置为使得微波辐射产生垂直于谐振器的纵向轴线的振荡电场，该振荡电场对应于第一纵向谐振器模式驻波图案。 容纳至少一个气体排放导管的激发腔沿着空腔长度的主要部分耦合到微波谐振器。 激发腔被配置为低于截止。