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    Apparatus for rinsing and drying surfaces
    71.
    发明授权
    Apparatus for rinsing and drying surfaces 失效
    用于冲洗和干燥表面的装置

    公开(公告)号：US4984597A

    公开(公告)日：1991-01-15

    申请号：US431268

    申请日：1989-11-03

    Applicant: Christopher F. McConnell ,  Alan E. Walter

    Inventor： Christopher F. McConnell ,  Alan E. Walter

    IPC: B05C3/109 ,  B08B3/04 ,  B08B7/00 ,  H01L21/00

    CPC classification number: H01L21/67028 ,  B05C3/109 ,  B08B3/04 ,  B08B7/0092 ,  B08B2203/002 ,  Y10S134/902

    Abstract: Object surfaces such as semiconductor wafers which are suspended in a rinsing fluid may be dried by replacing the rinsing fluid, such as water, with a drying vapor by directly displacing the water from the surfaces at such a rate that substantially no liquid droplets are left on the surfaces after replacement of the water with drying vapor. Preferably, the drying vapor is miscible with water and forms a minimum-boiling azeotrope with water, such as isopropanol. The drying vapor is then purged with a stream of dry, inert, noncondensable gas such as nitrogen. A vaporizer with automatic refill mechanism produces saturated drying vapor which may then be flashed to a superheated vapor prior to contacting the surfaces, which preferably are at the same temperature as the vapor. Preferably, no liquid is removed by evaporation, and the drying takes place in an enclosed, hydraulically full system which does not require movement or handling of the surfaces between rinsing and drying steps.

    Abstract translation: 悬浮在冲洗流体中的物体表面如半导体晶片可以通过用干燥蒸气替换冲洗流体例如水来干燥，该干燥蒸汽通过直接从表面移出水，其速度基本上不留下液滴 用干燥蒸汽替换水后的表面。 优选地，干燥蒸气与水混溶并与水形成最小沸点共沸物，例如异丙醇。 然后用干燥，惰性，不可冷凝的气体如氮气吹扫干燥蒸气。 具有自动补充机构的蒸发器产生饱和的干燥蒸气，然后在接触表面之前将其蒸发至过热蒸汽，其优选地处于与蒸气相同的温度。 优选地，不通过蒸发除去液体，并且干燥发生在封闭的液压完全系统中，其不需要移动或处理漂洗和干燥步骤之间的表面。

    Method and system for fluid treatment of semiconductor wafers
    72.
    发明授权
    Method and system for fluid treatment of semiconductor wafers 失效
    用于半导体晶片流体处理的方法和系统

    公开(公告)号：US4899767A

    公开(公告)日：1990-02-13

    申请号：US283465

    申请日：1988-12-12

    Applicant: Christopher F. McConnell ,  Alan E. Walter

    Inventor： Christopher F. McConnell ,  Alan E. Walter

    IPC: B05C3/109 ,  B08B3/04 ,  B08B7/00 ,  H01L21/00

    CPC classification number: B05C3/109 ,  B08B3/04 ,  B08B7/0092 ,  H01L21/67028 ,  B08B2203/002 ,  Y10S134/902

    Abstract: A system for the fluid treatment of semiconductor wafers includes a treatment vessel having opposed first and second ports, and means for holding wafers in a flow path therebetween. A flow segment comprising in sequence, a first vent, a first valve, an inlet, a second valve and a second vent extends between the first and the second port so as to constitute, together with the vessel, a closed fluid loop.A fluid delivery system for the delivery of a sequence of high purity treatment fluids to a treatment vessel includes a measuring tank having opposed ports and configured for plug flow between the ports, and a metering pump having its inlet connected to a said port for withdrawing metered amounts of fluid from the tank. A plurality of reservoirs of treatment fluid are each connected via a respective associated valve to one of the said ports. The tank is maintained hydraulically full, so that actuating the pump to withdraw a metered volume of fluid from the tank, and opening a valve associated with a selected treatment fluid draws the metered volume of the selected treatment fluid into the tank. Passive or non-mechanical means is provided for delivering the contents of the tank to a treatment vessel.A mixing tank may be provided, between the measuring tank and the treatment vessel. Mixing may be accomplished by bubbling a gas through the fluid held in the mixing tank.

    Abstract translation: 用于半导体晶片的流体处理的系统包括具有相对的第一和第二端口的处理容器以及用于将晶片保持在其间的流动路径中的装置。 包括依次包括第一通气口，第一阀，入口，第二阀和第二通气的流动段在第一和第二端口之间延伸，以便与容器一起构成封闭的流体回路。 用于将一系列高纯度处理流体输送到处理容器的流体输送系统包括具有相对端口并被配置用于端口之间的塞子流的测量罐，以及计量泵，其入口连接到所述端口用于抽出计量 来自坦克的液体量。 处理流体的多个储存器各自经由相应的相关阀连接到所述端口中的一个。 油箱保持液压充满，从而致动泵以从罐中取出计量体积的流体，并且打开与所选处理流体相关联的阀将所选择的处理流体的计量体积吸入罐中。 提供被动或非机械装置用于将罐的内容物输送到处理容器。 可以在测量罐和处理容器之间设置混合罐。 可以通过将气体鼓泡通过保持在混合罐中的流体来实现混合。

    Coating device
    73.
    发明授权
    Coating device 失效
    涂装装置

    公开(公告)号：US4899686A

    公开(公告)日：1990-02-13

    申请号：US332969

    申请日：1989-04-04

    Applicant: Takayuki Toshima ,  Osamu Hirakawa

    Inventor： Takayuki Toshima ,  Osamu Hirakawa

    IPC: B05C3/109 ,  G03F7/16 ,  G03F7/30

    CPC classification number: B05C3/109 ,  G03F7/162 ,  G03F7/3021

    Abstract: A coating device includes a ring-shaped outer circumferential groove formed along and adjacent to the outer circumferential rim of a cup means and communicated with a processing vessel, and a processing liquid supply source connected to the outer circumferential groove through nozzles. A partition wall is erected, as an inner wall of the cup means, inside the outer circumferential groove with the nozzles and a groove interposed between them. The supply of the processing liquid can be thus made stable and processing failure because of air bubbles mixed in the liquid and irregular coating of the liquid on substrates can be prevented.

    Abstract translation: 涂覆装置包括环形外周槽，该环形外周槽沿杯形装置的外圆周边缘形成并与处理容器连通，并与处理液供给源通过喷嘴连接到外周槽。 作为杯装置的内壁，分隔壁在外周槽内设置有喷嘴，并在它们之间插入槽。 因此，可以防止处理液的供给稳定，并且由于液体中混合的气泡和液体在基板上的不规则涂布而导致加工失败。

    Apparatus for depositing mono-molecular layer
    74.
    发明授权
    Apparatus for depositing mono-molecular layer 失效
    用于沉积单分子层的装置

    公开(公告)号：US4779562A

    公开(公告)日：1988-10-25

    申请号：US25253

    申请日：1987-03-12

    Applicant: Yoshinobu Ono

    Inventor： Yoshinobu Ono

    IPC: B05C3/02 ,  B05C3/109 ,  B05D1/20 ,  G03F7/16 ,  B05C3/18

    CPC classification number: B82Y30/00 ,  B05C3/02 ,  B05C3/109 ,  B05D1/206 ,  B82Y40/00 ,  G03F7/165

    Abstract: An apparatus for depositing a mono-molecular layer on a substrate surface comprises first and second containers which contain a liquid and are connected via a connecting passage, and a pressure applying mechanism for applying pressure on the liquid in the second container. A mono-molecular layer is formed at the liquid surface of the liquid in the first container, and the mono-molecular layer is deposited on the substrate surface by controlling the pressure applying mechanism so that the liquid surface of the first container rises and falls with respect to the substrate which is essentially stationary.

    Abstract translation: 用于在基板表面上沉积单分子层的装置包括含有液体并通过连接通道连接的第一和第二容器以及用于对第二容器中的液体施加压力的压力施加机构。 在第一容器的液体的液面上形成单分子层，通过控制压力施加机构使单分子层沉积在基板表面上，使得第一容器的液面随着 相对于基本上是静止的基底。

    Inflatable receptacle
    75.
    发明授权
    Inflatable receptacle 失效
    充气容器

    公开(公告)号：US4384603A

    公开(公告)日：1983-05-24

    申请号：US229148

    申请日：1981-01-28

    Applicant: Richard G. Tyrer ,  James R. France

    Inventor： Richard G. Tyrer ,  James R. France

    IPC: B27K3/10 ,  B65D88/16

    CPC classification number: B05C3/109 ,  B27K3/10

    Abstract: An inexpensive, readily handled receptacle for use in the bulk impregnation of timber by vacuum impregnation is made of flexible fluid-impermeable material and, over parts of its walls, is of double thickness to form closed pockets that can be inflated to form a container of rectangular shape hinged along one of its side faces to provide a sealable opening for loading and unloading. The pockets have a valve for inflating them with air; the receptacle has inlet and outlet ports for evacuating the receptacle and introducing impregnant. Preferably, the receptacle is supported in a two-part rectangular frame hinged along one side face.

    Abstract translation: 用于通过真空浸渍的木材的大量浸渍中使用的便宜且容易处理的容器由柔性流体不可渗透材料制成，并且在其壁的多个部分上具有双重厚度以形成封闭的袋，其可以被充气以形成容器 矩形的形状沿其一个侧面铰接，以提供用于装载和卸载的可密封的开口。 口袋里有一个用空气吹气的阀门; 容器具有用于抽出容器并引入浸渍剂的入口和出口。 优选地，容器被支撑在沿着一个侧面铰接的两部分矩形框架中。

    Apparatus for applying enamel slip to pipe
    76.
    发明授权
    Apparatus for applying enamel slip to pipe 失效
    搪瓷滑溜管应用

    公开(公告)号：US4338879A

    公开(公告)日：1982-07-13

    申请号：US223431

    申请日：1981-01-18

    Applicant: Anatoly E. Makeev ,  Alexandr A. Sirotinsky

    Inventor： Anatoly E. Makeev ,  Alexandr A. Sirotinsky

    IPC: C23D5/00 ,  B05C3/09 ,  B05C3/109 ,  B05C7/00 ,  B05C9/04 ,  C23D5/02 ,  C23D11/00 ,  B05C3/10

    CPC classification number: B05C3/09 ,  B05C3/109 ,  B05C7/00 ,  B05C9/045 ,  C23D11/00 ,  C23D5/02

    Abstract: Described is apparatus designed for applying enamel slip simultaneously to the internal and external surfaces of a pipe which includes a housing with a rod mounted centrally therein so that a clearance space is formed therebetween. That clearance space measures somewhat more than the thickness of the wall of the pipe under treatment which is to be moved in the clearance space, which is being filled with enamel slip. The clearance space between the housing and the rod measures at least 1.5 times the thickness of the pipe wall.In one of the embodiments of the invention, the housing and the rod are of cylindrical shape.The housing is provided with an enamel circulation system which includes a pump communicating with the housing and a reservoir via pipelines. The reservoir is filled with enamel slip and is provided with a thermoregulator.

    Abstract translation: 描述的是设计用于同时施加搪瓷滑移到管子的内表面和外表面上的装置，该管子包括具有安装在其中心的杆的壳体，从而在它们之间形成间隙空间。 该间隙空间比在待填充有搪瓷滑动的间隙空间中被移动的处理管道的壁厚稍大些。 外壳和杆之间的间隙尺寸至少为管壁厚度的1.5倍。 在本发明的一个实施例中，壳体和杆是圆柱形的。 壳体设置有搪瓷循环系统，其包括通过管道与壳体连通的泵和储存器。 储存器填充有搪瓷滑移并且设置有温度调节器。

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