公开(公告)号：US12066364B2

公开(公告)日：2024-08-20

申请号：US17958718

申请日：2022-10-03

Applicant: NanoCytomics, LLC ,  Northwestern University

Inventor： Sergey Rozhok ,  Justin R. Derbas ,  Jarema Czarnecki ,  Hariharan Subramanian

IPC: G01N1/30 ,  B05C3/02 ,  B05C3/08 ,  G01N1/28 ,  G01N1/31

CPC classification number: G01N1/312 ,  B05C3/02 ,  B05C3/08 ,  G01N1/28 ,  G01N1/30

Abstract: Automated cell staining systems and methods are disclosed herein. In particular, the staining systems disclosed herein provide low-volume, automated bench top staining systems for staining biological samples contained on a cytological slide.

公开(公告)号：US12042815B2

公开(公告)日：2024-07-23

申请号：US17489045

申请日：2021-09-29

Applicant: Tokyo Electron Limited

Inventor： Kotaro Tsurusaki ,  Koji Yamashita ,  Yusuke Yamamoto ,  Koji Tanaka ,  Kouzou Kanagawa

IPC: B05C3/109 ,  B05C3/02 ,  B05C11/00 ,  B05C11/10 ,  B05D1/20 ,  C25D21/04 ,  H01L21/67 ,  B05C3/00

CPC classification number: B05C3/109 ,  B05C3/02 ,  B05C11/00 ,  B05C11/1013 ,  B05D1/20 ,  C25D21/04 ,  H01L21/67017 ,  H01L21/67057 ,  B05C3/00

Abstract: A substrate processing apparatus includes a processing tank, a holder, an organic solvent supply, a drainage port, a gas supply, and an exhaust port. The processing tank stores an aqueous layer. The holder holds a substrate. The organic solvent supply supplies an organic solvent onto the aqueous layer to form a liquid layer of the organic solvent. The drainage port discharges the aqueous layer from a bottom wall of the processing tank and causes the liquid layer of the organic solvent to descend from above the substrate to below the substrate. The gas supply supplies a gas of a water repellent agent to the liquid layer from above the processing tank while the liquid layer descends. The exhaust port is exposed on a side wall of the processing tank by the descending of the liquid layer and discharges the gas of the water repellent gas.

公开(公告)号：US11691172B2

公开(公告)日：2023-07-04

申请号：US16918678

申请日：2020-07-01

Applicant: Tokyo Electron Limited

Inventor： Chikara Nobukuni ,  Tomoaki Ojima ,  Takuya Itahashi ,  Ryoichi Horiguchi ,  Shota Wakayama

IPC: B05C3/02 ,  B05C11/10 ,  H01L21/67

CPC classification number: B05C3/02 ,  B05C11/1015 ,  B05C11/1026 ,  B05C11/1039 ,  B05C11/1042 ,  H01L21/67023

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

公开(公告)号：US20180133744A1

公开(公告)日：2018-05-17

申请号：US15867672

申请日：2018-01-10

Applicant: PARTICLE MEASURING SYSTEMS INC.

Inventor： Boris Zachar GORBUNOV ,  Harald Wilhelm Julius GNEWUCH

IPC: B05C3/00 ,  B01D5/00 ,  G01N15/02 ,  B05C3/02

CPC classification number: B05C3/005 ,  B01D5/0027 ,  B05C3/02 ,  G01N15/02 ,  G01N15/065 ,  G01N33/0011 ,  G01N2015/0046 ,  Y10T137/6416 ,  Y10T137/8593

Abstract: The invention provides an apparatus for increasing the size of gas-entrained particles in order to render the gas-entrained particles detectable by a particle detector, the apparatus comprising an evaporation chamber (2) and a condenser (7); the evaporation chamber (2) having an inlet (1) for admitting gas into the evaporation chamber and an outlet through which vapour-laden gas may leave the evaporation chamber; the evaporation chamber (2) having disposed therein a heating element (3) and a porous support (6), the heating element being in direct contact with the porous support, wherein the porous support (6) carries thereon a vaporisable substance and the heating element (3) is heatable to vaporise the vaporisable substance to form vapour within the evaporation chamber (2); the condenser (2) being in fluid communication with the outlet of the evaporation chamber, and the condenser (7) having an outlet for connection to the particle detector. the apparatus being configured so that vapour-laden gas from the evaporation chamber can flow into the condenser and condensation of the vaporisable substance onto gas-entrained particles in the condenser takes place to increase the size of the particles so that they are capable of being detected by a particle detector.

公开(公告)号：US09968961B2

公开(公告)日：2018-05-15

申请号：US14807768

申请日：2015-07-23

Applicant: Hernan Chaves

Inventor： Hernan Chaves

IPC: B05D1/18 ,  B05B9/04 ,  B05C3/02 ,  B05D1/02 ,  A01K63/00 ,  B05B1/20 ,  B08B3/00 ,  B08B3/02 ,  B05B15/06

CPC classification number: B05D1/18 ,  A01K63/00 ,  A01K63/006 ,  B05B1/20 ,  B05B9/0403 ,  B05B15/652 ,  B05C3/02 ,  B05D1/02 ,  B08B3/006 ,  B08B3/02

Abstract: A dipping tank includes a pump, a container, a fitting, and a plate which is used to place objects, such as corals, to be dipped. The pump draws fluid from inside the container and discharges it into the container through the fitting. The fitting includes two flexible hoses, one with a propulsive nozzle and the other with one or more dipping nozzles. The propulsive nozzle produces a jet which impinges upon the blades protruding from the bottom side of the plate causing the plate to rotate. The dipping nozzles eject jets which are used to spray and thereby dip the objects. Flexible hoses are configured so as to provide movements in 6 degrees of freedom for the nozzles. Flexible hoses may also further comprise valves to control fluid flow through said hoses.

公开(公告)号：US20180099305A1

公开(公告)日：2018-04-12

申请号：US15396335

申请日：2016-12-30

Applicant: MIRLE AUTOMATION CORPORATION

Inventor： Jung-Lung HUANG ,  Chin-Chang HUANG ,  Ying-Ju CHEN

IPC: B05C11/10 ,  B05D1/18 ,  B05C3/02 ,  B05C11/11

CPC classification number: B05C11/1026 ,  B05C3/02 ,  B05C3/18 ,  B05C11/11 ,  B05D1/18 ,  G03D3/132 ,  H01L21/67086 ,  H01L21/67253

Abstract: The present invention provides a liquid level control system and method. The present invention achieves a uniformly soaking process of a substrate during different segments of a fixed time period, by using a liquid removal device to gradually remove a processing liquid from a tank. The substrate is disposed in the liquid in the tank to be wet processed. By the removal of the liquid from the tank via the liquid removal device, an area of the portion of the substrate being processed by the liquid can be gradually decreased whereby the substrate can be uniformly processed.

公开(公告)号：US20170291189A1

公开(公告)日：2017-10-12

申请号：US15632416

申请日：2017-06-26

Applicant: WMV Apparatebau GmbH

Inventor： Martin Muller ,  Jurgen Muller ,  Hubert Jongen

IPC: B05C3/02 ,  B05C11/10 ,  B05C9/12

CPC classification number: B05C3/02 ,  B05C9/12 ,  B05C11/08 ,  B05C11/1039 ,  B05D7/26 ,  B08B3/102 ,  B65G49/04 ,  B65G2201/047

Abstract: A method for treating components with a liquid comprises providing a splash guard in a dip tank filled with the liquid, and dipping components into the liquid. Then the components are moved out of the liquid, the splash guard is moved relative to the dip tank into a centrifuging position surrounding the components, the components are rotated within the splash guard; and the splash guard is moved relative to the dip tank into a dipping position.

公开(公告)号：US09771655B2

公开(公告)日：2017-09-26

申请号：US14812119

申请日：2015-07-29

Applicant: Eastman Kodak Company

Inventor： Robert R. Bettin ,  Kelvin P. Hill ,  Gary P. Wainwright ,  James Douglas Shifley

IPC: B05C3/02 ,  C23C18/16 ,  B05C3/12

CPC classification number: C23C18/1664 ,  B05C3/02 ,  B05C3/125 ,  B65H20/14 ,  B65H23/24 ,  B65H23/26 ,  B65H2301/3112 ,  B65H2301/51422 ,  B65H2404/1364 ,  B65H2404/62 ,  B65H2406/211 ,  C23C18/1619 ,  C23C18/1632

Abstract: A web transport system for transporting a web of media along a web-transport path includes a fluid bar for guiding the web of media, and first and second fluid shields positioned proximate to first and second ends of the fluid bar. A liquid is pumped through holes in an exterior bearing surface of the fluid bar into a region between the web of media and the bearing surface of the fluid bar, thereby pushing the web of media away from the fluid bar. The fluid shields are positioned to redirect fluid that is ejected from the region between the web of media and the bearing surface of the fluid bar along the edges of the web of media.

公开(公告)号：US09731316B2

公开(公告)日：2017-08-15

申请号：US14864806

申请日：2015-09-24

Applicant: Unicharm Corporation

Inventor： Kazuo Ukegawa

IPC: B05C5/02 ,  B05C3/02 ,  B32B5/02 ,  B32B5/26 ,  B32B7/12 ,  A61F13/15

CPC classification number: B05C5/027 ,  A61F13/15 ,  A61F13/15593 ,  B05C3/02 ,  B05C5/0241 ,  B32B5/022 ,  B32B5/26 ,  B32B7/12 ,  B32B2250/03 ,  B32B2250/20 ,  B32B2250/40 ,  B32B2262/0207 ,  B32B2307/51 ,  B32B2555/02 ,  Y10T428/24132

Abstract: A nozzle assembly includes an upstream block, an upstream shim, an intermediate shim, a downstream shim and a downstream block arranged in this order in a machine direction MD from the upstream side to the downstream side. A lower end of the nozzle is formed with grooves as guide grooves to support elastics. A first pipe, a dispersion slit for a web and convergence slits for a web define first flow channels wherein the slits are respectively formed with outlets for a web. A second pipe, a dispersion slit for elastics and convergence slits for elastics define a second flow channels wherein the slits are respectively formed with outlets for elastics. The outlets for elastics are formed in the respective guide grooves and each of the outlets for a web lies between each pair of the adjacent outlets for elastics as viewed in the cross direction CD.

公开(公告)号：US20170219288A1

公开(公告)日：2017-08-03

申请号：US15500699

申请日：2015-08-07

Applicant: JFE STEEL CORPORATION

Inventor： Sachihiro IIDA

IPC: F27B9/30 ,  B05C3/132 ,  B05C3/12 ,  F27B9/36 ,  B05C3/02

CPC classification number: F27B9/30 ,  B05C3/02 ,  B05C3/125 ,  B05C3/132 ,  C21D8/0278 ,  C21D9/56 ,  C21D9/565 ,  F27B9/36

Abstract: A steel-strip production method for producing a hot-dip-plated steel strip and a cold-rolled steel strip, the method being executed by a production apparatus including a continuous annealing furnace, a snout connected to the continuous annealing furnace, a contact-type seal plate device, a noncontact-type seal roll device, a hot-dip-plating tank being movable; and a roll configured to turn the path direction of the steel strip after passing through the snout, wherein a hot-dip-plated steel strip production unit configured to produce the hot-dip-plated steel strip by bringing the steel strip continuously annealed in the continuous annealing furnace into the hot-dip-plating tank; and a cold-rolled steel strip production unit configured to produce the cold-rolled steel strip by transferring the steel strip continuously annealed in the continuous annealing furnace without causing the steel strip to pass through the hot-dip-galvanizing tank, are configured to be switchable with one another.