公开(公告)号：US08599488B2

公开(公告)日：2013-12-03

申请号：US13313399

申请日：2011-12-07

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G02B3/12

CPC classification number: G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

Abstract: A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass, and a gap formed between the member and the surface of the spherical lens element. The gap communicates with the space and includes lower and upper portions. A wafer is moved below and relative to the spherical lens element and the member, and the liquid is retained between the spherical lens element and the member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space.

Abstract translation: 光刻投影装置包括具有球面透镜元件的投影系统，曝光光从该球面透镜元件的球面透镜元件下方的空间中通过液体投射;与透镜元件的与透镜元件不同的透镜元件的表面附近设置的元件 在球面透镜元件的表面之间形成间隙。 该间隙与空间连通并且包括下部和上部。 晶片在球面透镜元件和构件之下移动并且相对于球形透镜元件和构件移动，并且液体保持在球面透镜元件与另一侧的晶片的一侧的构件和晶片的上表面之间。 液体局部地覆盖晶片的上表面的一部分，以通过空间中的液体将曝光光投影到晶片上而露出晶片。

公开(公告)号：US08493545B2

公开(公告)日：2013-07-23

申请号：US12382078

申请日：2009-03-09

Applicant: Hidemi Kawai ,  W. Thomas Novak

Inventor： Hidemi Kawai ,  W. Thomas Novak

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

Abstract: An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

Abstract translation: 浸渍光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 与工件不同的物体的表面设置在光学元件的下方，供给口和回收口。 在净化过程中，清洁液体被供应到物体上，使得清洁液仅覆盖物体表面的一部分。

公开(公告)号：US08059258B2

公开(公告)日：2011-11-15

申请号：US12232513

申请日：2008-09-18

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03B27/32

CPC classification number: G03F7/70341

Abstract: A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.

Abstract translation: 液浸光刻设备包括具有最后元件的投影系统。 投影系统将图像投影到工件上，以通过填充在最后一个元件和工件之间的空间中的液体来暴露工件。 液体供应装置包括在曝光期间将液体从供应入口供应到工件和最后元件之间的空间的供应入口。 最后一个元件包括光学元件和板。 该板防止可能受液体接触影响的光学元件的劣化。

公开(公告)号：US20110235007A1

公开(公告)日：2011-09-29

申请号：US13067464

申请日：2011-06-02

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/52

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract translation: 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，其包括具有可渗透构件的液体收集构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体，其中可渗透构件具有多个通道，其产生毛细管 力。

公开(公告)号：US07969552B2

公开(公告)日：2011-06-28

申请号：US11819689

申请日：2007-06-28

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/42

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a wick structure member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

Abstract translation: 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括一种液体收集系统，该液体收集系统包括具有芯结构构件的液体收集构件，从与液体收集构件相对的物体的表面收集液体。

公开(公告)号：US07965376B2

公开(公告)日：2011-06-21

申请号：US11819691

申请日：2007-06-28

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/42 ,  G03B27/32 ,  G03B27/52

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

公开(公告)号：USRE41232E1

公开(公告)日：2010-04-20

申请号：US10876201

申请日：2004-06-24

Applicant: Andrew J. Hazelton ,  W. Thomas Novak ,  Akimitsu Ebihara

Inventor： Andrew J. Hazelton ,  W. Thomas Novak ,  Akimitsu Ebihara

IPC: H01L21/68 ,  G03F9/00 ,  G03B27/42 ,  H02K41/00 ,  G05B11/16

CPC classification number: H02K41/03 ,  G03F7/70716 ,  G03F7/70758 ,  H02K2201/18

Abstract: A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is driveable in six degrees of freedom and includes variable reluctance actuators for positioning in three degrees of freedom.

Abstract translation: 一种具有粗糙台阶的定位台组件，其包括可以至少两个自由度驱动的平面电机，以及位于粗糙台上的精细台，所述精细平台可相对于粗略平台至少三个自由度驱动。 更优选地，精细级可以在六个自由度中驱动，并且包括用于以三个自由度定位的可变磁阻致动器。

公开(公告)号：US07570431B2

公开(公告)日：2009-08-04

申请号：US11606914

申请日：2006-12-01

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G02B3/12

CPC classification number: G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract translation: 将自动聚焦单元提供给浸没式光刻设备，其中流体设置在工件的目标表面上，并且图像图案通过流体投影到该目标表面上。 自动对焦单元具有相对设置在目标表面上方的投影透镜等光学元件。 自动对焦光源被布置成以特定角度倾斜地投射光束，使得该光束通过流体并被在光学元件下方的指定反射位置处被工件的目标表面反射。 接收器接收并分析反射光。 校正透镜可以设置在光束的光路上，用于校正光束的传播。

公开(公告)号：US20090161084A1

公开(公告)日：2009-06-25

申请号：US12379171

申请日：2009-02-13

Applicant: Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

Inventor： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

Abstract: A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.

Abstract translation: 光刻设备包括其上保持有基板的基板台，包括最终光学元件的投影系统，所述投影系统将图案化的辐射束通过浸没液投射到邻近最终光学元件的基板上，以在 浸渍光刻工艺，以及包括入口的液体供应系统。 液体供应系统在浸没式光刻工艺期间提供浸没液体，并在净化过程中提供与浸没液体不同的清洗液体。 清理工艺和浸没光刻工艺在不同时间进行。

公开(公告)号：US20090051888A1

公开(公告)日：2009-02-26

申请号：US12232513

申请日：2008-09-18

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/52

CPC classification number: G03F7/70341

Abstract: A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.

Abstract translation: 液浸光刻设备包括具有最后元件的投影系统。 投影系统将图像投影到工件上，以通过填充在最后一个元件和工件之间的空间中的液体来暴露工件。 液体供应装置包括在曝光期间将液体从供应入口供应到工件和最后元件之间的空间的供应入口。 最后一个元件包括光学元件和板。 该板防止可能受液体接触影响的光学元件的劣化。