公开(公告)号：US20100136118A1

公开(公告)日：2010-06-03

申请号：US12452547

申请日：2008-07-10

申请人： Yutaka Matano ,  Yuri Matsui ,  Hidemi Kawai ,  Nobumitsu Sato

发明人： Yutaka Matano ,  Yuri Matsui ,  Hidemi Kawai ,  Nobumitsu Sato

IPC分类号： A61K9/14 ,  A61K33/00 ,  A61P3/00 ,  A61P25/00 ,  A61P19/10 ,  A61P19/08

CPC分类号： A23K50/75 ,  A21D2/02 ,  A23K20/24 ,  A23L33/16 ,  A23V2002/00 ,  A23V2250/1578

摘要： The present invention provides a calcium absorption enhancer that places no burden on the body of a human or a domestic animal to which a calcium compound is administered and can increase the efficiency with which a calcium content is absorbed into the body by supplying calcium ions in the stomach or the like of the human or the domestic animal in a sustained-release manner after administration of the calcium compound. The calcium absorption enhancer of the present invention contains, as an active ingredient, water-soluble calcium particles that can release calcium ions in an aqueous solution in a sustained-release manner.

摘要翻译： 本发明提供一种不给予施用钙化合物的人体或家畜体内的负担的钙吸收增强剂，并且可以通过在其中提供钙离子来提高钙含量被吸收到体内的效率 胃或类似物，在给予钙化合物后以缓释方式。 作为活性成分，本发明的钙吸收增强剂含有能以缓释方式在水溶液中释放钙离子的水溶性钙粒子。

公开(公告)号：US20070132975A1

公开(公告)日：2007-06-14

申请号：US11704241

申请日：2007-02-09

申请人： Andrew Hazelton ,  Hidemi Kawai ,  Douglas Watson ,  W. Novak

发明人： Andrew Hazelton ,  Hidemi Kawai ,  Douglas Watson ,  W. Novak

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： A megasonic immersion lithography exposure apparatus includes an optical transfer chamber for containing an exposure liquid, at least one megasonic plate operably engaging said optical transfer chamber for propagating sonic waves through the exposure liquid, and an optical system provided adjacent to said optical transfer chamber for projecting light through a mask and said exposure liquid and onto a wafer.

摘要翻译： 兆声浸没式光刻曝光装置包括用于容纳曝光液体的光学传送室，至少一个与所述光学传送室可操作地接合以便通过曝光液体传播声波的兆声道板，以及邻近所述光学传送室设置的光学系统， 通过掩模和所述曝光液体照射到晶片上。

公开(公告)号：US20060023185A1

公开(公告)日：2006-02-02

申请号：US11237651

申请日：2005-09-29

申请人： Andrew Hazelton ,  Hidemi Kawai ,  Douglas Watson ,  W. Novak

发明人： Andrew Hazelton ,  Hidemi Kawai ,  Douglas Watson ,  W. Novak

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.

公开(公告)号：US06175405B1

公开(公告)日：2001-01-16

申请号：US09207407

申请日：1998-12-08

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03B2742

CPC分类号： G03F7/70058 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108

摘要： An exposure method of illuminating a pattern on a mask by a light beam from an illuminating optical system and exposing the image of the pattern onto a photosensitive substrate through a projection optical system comprises the steps of discriminating the kind of the mask, setting the state of at least one of the field stop of the illuminating optical system, the aperture stop of the illuminating system and the aperture stop of the projection optical system in conformity with the discriminated kind of the mask, and projecting the image of the pattern on the mask onto a predetermined area of the photosensitive substrate.

摘要翻译： 通过来自照明光学系统的光束照射掩模上的图案并通过投影光学系统将图案的图像曝光到感光基板上的曝光方法包括以下步骤：区分掩模的种类， 照明光学系统的场地停止，照明系统的孔径光阑以及投影光学系统的孔径光阑符合所识别的掩模种类，并将图案的图像投影到掩模上，至 感光基板的预定区域。

公开(公告)号：US5912727A

公开(公告)日：1999-06-15

申请号：US614899

申请日：1996-03-13

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70058 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108

摘要： An exposure method of illuminating a pattern on a mask by a light beam from an illuminating optical system and exposing the image of the pattern onto a photosensitive substrate through a projection optical system comprises the steps of discriminating the kind of the mask, setting the state of at least one of the field stop of the illuminating optical system, the aperture stop of the illuminating system and the aperture stop of the projection optical system in conformity with the discriminated kind of the mask, and projecting the image of the pattern on the mask onto a predetermined area of the photosensitive substrate.

摘要翻译： 通过来自照明光学系统的光束照射掩模上的图案并通过投影光学系统将图案的图像曝光到感光基板上的曝光方法包括以下步骤：区分掩模的种类， 照明光学系统的场地停止，照明系统的孔径光阑以及投影光学系统的孔径光阑符合所识别的掩模种类，并将图案的图像投影到掩模上，至 感光基板的预定区域。

公开(公告)号：US5220176A

公开(公告)日：1993-06-15

申请号：US941176

申请日：1992-09-04

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/70

摘要： The apparatus is of the type which detects alignment marks formed on a mask and aligns the mask. The apparatus includes: a plurality of alignment optical systems to detect the plurality of alignment marks formed on the mask in predetermined detection areas; driving means for moving at least a part of the plurality of alignment optical systems in accordance with an arrangement of the alignment marks; and a projecting optical system to project a pattern on the mask onto a photosensitive substrate. In the apparatus, the relative positional relations among the detection areas of the plurality of alignment optical systems on the projection image plane of the projecting optical system are detected, and the position of the detection area of at least one of the plurality of alignment optical systems is corrected independent of the driving means so that the detected relative positional relations are set to predetermined positional relations.

摘要翻译： 该装置是检测形成在掩模上的对准标记并对准掩模的类型。 该装置包括：多个对准光学系统，用于检测在预定检测区域中形成在掩模上的多个对准标记; 驱动装置，用于根据对准标记的布置移动多个对准光学系统的至少一部分; 以及将掩模上的图案投影到感光基板上的投影光学系统。 在该装置中，检测投影光学系统的投影像平面上的多个取向光学系统的检测区域之间的相对位置关系，并且检测多个对准光学系统中的至少一个的检测区域的位置 被校正，独立于驱动装置，使得检测到的相对位置关系被设置为预定的位置关系。

公开(公告)号：US4860374A

公开(公告)日：1989-08-22

申请号：US218503

申请日：1988-07-06

申请人： Seiro Murakami ,  Akikazu Tanimoto ,  Susumu Makinouchi ,  Hidemi Kawai ,  Masaichi Murakami

发明人： Seiro Murakami ,  Akikazu Tanimoto ,  Susumu Makinouchi ,  Hidemi Kawai ,  Masaichi Murakami

IPC分类号： G03F9/00 ,  G06K9/46

CPC分类号： G03F9/70 ,  G06K9/4609

摘要： An apparatus for detecting a position of a reference pattern or mark formed in a substrate to be aligned with a photomask pattern performs the following functions: scanning a reference pattern having at least two edges and generating a time-serial pattern signal corresponding to the scanned pattern; extracting all scanning positions at which a waveform of the pattern signal has a shape corresponding to an edge of the pattern within a predetermined scanning range including the pattern; selecting one pair from all possible pairs of a plurality of extracted scanning positions in accordance with a degree to which a pattern signal between the two scanning positions defined by each pair satisfies predetermined waveform conditions; and determining as a pattern position a predetermined position at which the interval between the two scanning positions of the selected pair is divided into two intervals by a predetermined ratio.

摘要翻译： 用于检测形成在衬底中的与光掩模图案对准的参考图案或标记的位置的装置执行以下功能：扫描具有至少两个边缘的参考图案，并产生与扫描图案对应的时间序列图案信号 ; 提取在包括图案的预定扫描范围内图案信号的波形具有与图案的边缘相对应的形状的所有扫描位置; 根据由每对定义的两个扫描位置之间的图案信号满足预定波形条件的程度，从多个提取的扫描位置的所有可能的对中选择一对; 并且将所选择的对的两个扫描位置之间的间隔被划分成两个间​​隔预定比例的预定位置作为图案位置。

公开(公告)号：US4780616A

公开(公告)日：1988-10-25

申请号：US099913

申请日：1987-09-22

申请人： Kenji Nishi ,  Hidemi Kawai ,  Kazuaki Suzuki ,  Makoto Uehara

发明人： Kenji Nishi ,  Hidemi Kawai ,  Kazuaki Suzuki ,  Makoto Uehara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01N21/86

CPC分类号： G03F7/70058 ,  G03F7/706 ,  G03F9/70

摘要： The projection optical apparatus includes light-emitting means which are disposed on a stage movable along the image plane in the projection optical apparatus and which define a light-emitting plane having a predetermined shape; photoelectric detection means which is disposed at a position substantially in conjugate relationship with a pupil of said projection optical apparatus and which receives the light emitted from the light-emitting plane of the light-emitting means through the projection optical system and a mask in which a pattern is defined at a predetermined position; and position detection means which controls the stage in such a way that the image projected on the light-emitting plane is shifted in relation to the mask pattern and which detects the superposed position between the image and the pattern in response to the light signal derived from the photoelectric detection means while the projected image is shifted and to the position of the stage.

摘要翻译： 投影光学装置包括发光装置，其设置在能够沿着投影光学装置中的像面移动并且限定具有预定形状的发光面的台上; 光电检测装置，其设置在与所述投影光学装置的光瞳大致共轭关系的位置处，并且通过投影光学系统接收从发光装置的发光平面发射的光;以及掩模， 图案被限定在预定位置; 以及位置检测装置，其以这样的方式控制舞台，使得投影在发光平面上的图像相对于掩模图案移位，并且响应于从源图像发出的光信号检测图像和图案之间的叠加位置 光电检测装置，同时投影图像移动到舞台的位置。

公开(公告)号：US4704020A

公开(公告)日：1987-11-03

申请号：US903500

申请日：1986-09-04

申请人： Masaichi Murakami ,  Hidemi Kawai ,  Kyoichi Suwa

发明人： Masaichi Murakami ,  Hidemi Kawai ,  Kyoichi Suwa

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/66 ,  H01L21/67 ,  G01B11/26

CPC分类号： G03F9/7023

摘要： A projection optical apparatus for projecting the pattern of a mask onto a substrate through a projection optical system includes a stage for supporting thereon a substrate having a plurality of marks for detection on the surface thereof, first detecting means for detecting the amount of inclination of the surface of the substrate relative to the surface on which the pattern is projected and imaged, through the projection optical system, second detecting means for detecting the amount of inclination of the surface of the substrate relative to a predetermined reference plane independently of the projection optical system, and calibrating means for calibrating the amount of inclination detected by the second detecting means on the basis of the amount of inclination detected by the first detecting means.

摘要翻译： 一种用于通过投影光学系统将掩模的图案投影到基板上的投影光学装置包括：用于在其上表面支撑具有多个用于检测的标记的基板的台，用于检测其上的倾斜量的第一检测装置 通过投影光学系统相对于图案投射和成像的表面的基板的表面，用于独立于投影光学系统检测基板相对于预定参考平面的表面的倾斜量的第二检测装置 以及校准装置，用于基于由第一检测装置检测到的倾斜量来校准由第二检测装置检测到的倾斜量。

公开(公告)号：US08670103B2

公开(公告)日：2014-03-11

申请号：US12003038

申请日：2007-12-19

申请人： Hidemi Kawai

发明人： Hidemi Kawai

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： A liquid immersion exposure apparatus includes an optical system via which a substrate is exposed with an exposure beam, and a cleaning device which performs a cleaning operation by filling a space adjacent the optical system with a liquid including bubbles.

摘要翻译： 液浸曝光装置包括通过曝光用光线曝光基板的光学系统和通过用包含气泡的液体填充与光学系统相邻的空间进行清洁操作的清洁装置。