公开(公告)号：US09767988B2

公开(公告)日：2017-09-19

申请号：US13596976

申请日：2012-08-28

申请人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

发明人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

IPC分类号： C23C14/00 ,  H01J37/32

CPC分类号： H01J37/32009 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

公开(公告)号：US09685297B2

公开(公告)日：2017-06-20

申请号：US13597093

申请日：2012-08-28

申请人： Daniel Carter ,  Victor Brouk ,  Daniel J. Hoffman

发明人： Daniel Carter ,  Victor Brouk ,  Daniel J. Hoffman

IPC分类号： C23C14/34 ,  H01J37/08 ,  G01N27/06 ,  H01J37/32

CPC分类号： H01J37/08 ,  G01N27/06 ,  H01J37/32944 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

公开(公告)号：US09362089B2

公开(公告)日：2016-06-07

申请号：US13597050

申请日：2012-08-28

申请人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

发明人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

IPC分类号： C23C14/34 ,  H01J37/32

CPC分类号： H01J37/32009 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

摘要翻译： 公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。 一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制 周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。

公开(公告)号：US09309594B2

公开(公告)日：2016-04-12

申请号：US13193345

申请日：2011-07-28

申请人： Daniel J. Hoffman ,  Victor Brouk ,  Daniel Carter

发明人： Daniel J. Hoffman ,  Victor Brouk ,  Daniel Carter

IPC分类号： C23C16/50 ,  C23C14/34 ,  H01J37/32

CPC分类号： C23C16/50 ,  C23C14/345 ,  H01J37/32009 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.

摘要翻译： 公开了用于调节等离子体室中的离子能量的系统，方法和装置。 一种示例性方法包括将基板放置在等离子体室中，通过远程产生的电离电磁场在等离子体室中形成等离子体，该离子化电磁场从远程投影源延伸到等离子体室中，可控制地将功率切换到基板，以便施加周期性 电压功能到基板，并且在周期性电压函数的多个周期中调制周期性电压函数，其响应于衬底表面处的离子能量的期望分布，以便在一段时间内实现所需的离子能量分布 依据。

公开(公告)号：US08884525B2

公开(公告)日：2014-11-11

申请号：US13425159

申请日：2012-03-20

申请人： Daniel J. Hoffman ,  Daniel Carter ,  Randy Grilley ,  Karen Peterson

发明人： Daniel J. Hoffman ,  Daniel Carter ,  Randy Grilley ,  Karen Peterson

IPC分类号： H05B31/26 ,  B23K10/00 ,  H05H1/46

CPC分类号： H05H1/46 ,  H05H2001/4652

摘要： Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement.

摘要翻译： 本文公开了用于通过远程等离子体源中的盘形等离子体解离非活化气体的系统，方法和装置。 两个感应元件，一个在盘形等离子体的两侧，产生一个磁场，其诱导维持盘形等离子体的电场。 电感元件可以是具有任何数量的环的线圈导体，并且可以布置在平面或垂直线圈中或平面和垂直线圈的组合。 此外，电感元件半径与两个感应元件之间的间隙距离的比可以被配置成实现期望的垂直等离子体约束。

公开(公告)号：US08608900B2

公开(公告)日：2013-12-17

申请号：US11409183

申请日：2006-04-21

申请人： Douglas A. Buchberger, Jr. ,  Paul Lukas Brillhart ,  Richard Fovell ,  Hamid Tavassoli ,  Douglas H. Burns ,  Kallol Bera ,  Daniel J. Hoffman

发明人： Douglas A. Buchberger, Jr. ,  Paul Lukas Brillhart ,  Richard Fovell ,  Hamid Tavassoli ,  Douglas H. Burns ,  Kallol Bera ,  Daniel J. Hoffman

IPC分类号： H01L21/3065 ,  C23C16/52 ,  C23C16/46 ,  C23C16/458 ,  C23C16/503 ,  C23C16/509

CPC分类号： H01L21/67248 ,  F25B49/02 ,  F25B2400/0401 ,  F25B2400/0403 ,  F25B2400/0411 ,  F25B2700/21174 ,  F25B2700/21175 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/32724 ,  H01J2237/2001 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831 ,  H05H2001/4682

摘要： A plasma reactor having a reactor chamber and an electrostatic chuck with a surface for holding a workpiece inside the chamber includes a backside gas pressure source coupled to the electrostatic chuck for applying a thermally conductive gas under a selected pressure into a workpiece-surface interface formed whenever a workpiece is held on the surface and an evaporator inside the electrostatic chuck and a refrigeration loop having an expansion valve for controlling flow of coolant through the evaporator. The reactor further includes a temperature sensor in the electrostatic chuck and a memory storing a schedule of changes in RF power or wafer temperature. The reactor further includes a thermal model capable of simulating heat transfer between the evaporator and the surface based upon measurements from the temperature sensor, and a control processor coupled to the thermal model and to the memory and governing the backside gas pressure source in response to a prediction from the model of a change in the selected pressure that would compensate for the next scheduled change in RF power or implement the next scheduled change in wafer temperature.

摘要翻译： 具有反应室和具有用于将工件保持在室内的表面的静电卡盘的等离子体反应器包括耦合到静电卡盘的背侧气体压力源，用于在选定压力下将导热气体施加到每次形成的工件表面界面中 工件被保持在表面上，蒸发器在静电卡盘内部，制冷回路具有用于控制通过蒸发器的冷却剂流动的膨胀阀。 反应器还包括静电卡盘中的温度传感器和存储RF功率或晶片温度变化计划的存储器。 反应器还包括热模型，其能够基于来自温度传感器的测量来模拟蒸发器和表面之间的热传递;以及控制处理器，其耦合到热模型和存储器，并且响应于所述热模型和存储器控制背侧气体压力源 从所选压力的变化的模型中预测将补偿下一次调频的功率变化或实现下一个预定的晶片温度的变化。

公开(公告)号：US08337660B2

公开(公告)日：2012-12-25

申请号：US12855678

申请日：2010-08-12

申请人： Douglas A. Buchberger, Jr. ,  Paul Lukas Brillhart ,  Richard Fovell ,  Hamid Tavassoli ,  Douglas H. Burns ,  Kallol Bera ,  Daniel J. Hoffman ,  Kenneth W. Cowans ,  William W. Cowans ,  Glenn W. Zubillaga ,  Isaac Millan

发明人： Douglas A. Buchberger, Jr. ,  Paul Lukas Brillhart ,  Richard Fovell ,  Hamid Tavassoli ,  Douglas H. Burns ,  Kallol Bera ,  Daniel J. Hoffman ,  Kenneth W. Cowans ,  William W. Cowans ,  Glenn W. Zubillaga ,  Isaac Millan

IPC分类号： H01L21/306 ,  C23C16/46 ,  C23C16/52 ,  H01L21/683

CPC分类号： H01L21/67248 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831

摘要： A plasma reactor for processing a workpiece includes a reactor chamber, an electrostatic chuck within the chamber having a top surface for supporting a workpiece and having indentations in the top surface that form enclosed gas flow channels whenever covered by a workpiece resting on the top surface. The reactor further includes thermal control apparatus thermally coupled to the electrostatic chuck, an RF plasma bias power generator coupled to apply RF power to the electrostatic chuck, a pressurized gas supply of a thermally conductive gas, a controllable gas valve coupling the pressurized gas supply to the indentations to facilitate filling the channels with the thermally conductive gas for heat transfer between a backside of a workpiece and the electrostatic chuck at a heat transfer rate that is a function of the pressure against the backside of the workpiece of the thermally conductive gas. The reactor further includes an agile workpiece temperature control loop including (a) a temperature probe in the electrostatic chuck, and (b) a backside gas pressure controller coupled to an output of the temperature probe and responsive to a specified desired temperature, the controller governing the gas valve in response to a difference between the output of the temperature probe and the desired temperature.

公开(公告)号：US20120319584A1

公开(公告)日：2012-12-20

申请号：US13597050

申请日：2012-08-28

申请人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

发明人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

IPC分类号： H05H1/24

CPC分类号： H01J37/32009 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

公开(公告)号：US08279577B2

公开(公告)日：2012-10-02

申请号：US12849012

申请日：2010-08-02

申请人： Andrew Nguyen ,  Wing Lau Cheng ,  Hiroji Hanawa ,  Semyon Kats ,  Kartik Ramaswamy ,  Yan Ye ,  Kwok Manus Wong ,  Daniel J. Hoffman ,  Tetsuya Ishikawa ,  Brian C. Lue

发明人： Andrew Nguyen ,  Wing Lau Cheng ,  Hiroji Hanawa ,  Semyon Kats ,  Kartik Ramaswamy ,  Yan Ye ,  Kwok Manus Wong ,  Daniel J. Hoffman ,  Tetsuya Ishikawa ,  Brian C. Lue

IPC分类号： H01T23/00

CPC分类号： C23C14/564 ,  C23C16/4404 ,  H01J37/16 ,  H01J37/32504 ,  H01J37/32862 ,  H01J37/32871 ,  H01J2237/022 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T428/24 ,  Y10T428/31678

摘要： A support for a substrate processing chamber comprises a chuck having a substrate receiving surface, and a base comprising an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth. A lower wall is seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel. A fluid inlet is provided to supply a heat transfer fluid to the fluid channel and a fluid outlet provided to discharge the heat transfer fluid from the fluid channel.

摘要翻译： 用于衬底处理室的支撑件包括具有衬底接收表面的卡盘，以及包括上壁的基座，该上壁包括凹槽，所述凹槽具有（i）第一深度处的附接面，以及（ii）第二深度处的流体通道 。 下壁位于凹槽中并附着到上壁的附接面，以封闭流体通道。 提供流体入口以将传热流体供应到流体通道和设置用于从流体通道排出传热流体的流体出口。

公开(公告)号：US20120187844A1

公开(公告)日：2012-07-26

申请号：US13356546

申请日：2012-01-23

申请人： Daniel J. Hoffman ,  Daniel Carter ,  Victor Brouk ,  Karen Peterson ,  Randy Grilley

发明人： Daniel J. Hoffman ,  Daniel Carter ,  Victor Brouk ,  Karen Peterson ,  Randy Grilley

IPC分类号： H05H1/46

CPC分类号： H01J37/32541 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32568 ,  H01J2237/327 ,  H05H1/46 ,  H05H2001/4675

摘要： This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

摘要翻译： 本公开描述了用于将能量电容耦合到等离子体中以点燃和维持远程等离子体源内的等离子体的系统，方法和装置。 功率由至少部分地围绕或被第二电极围绕的第一电极提供。 第二个电极可以接地或浮动。 可以布置第一和第二介电部件以将电极中的一个或两个与等离子体分开，从而将等离子体与一个或两个电极隔离。