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1.发明申请SYSTEMS AND METHODS FOR MONITORING FAULTS, ANOMALIES, AND OTHER CHARACTERISTICS OF A SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM 有权用于监控开关模式离子能量分配系统的故障，异常和其他特性的系统和方法公开(公告)号：US20140062495A1
公开(公告)日：2014-03-06
申请号：US13597093
申请日：2012-08-28
申请人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
发明人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
CPC分类号： H01J37/08 , G01N27/06 , H01J37/32944 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
摘要翻译： 公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。 一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制 周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。
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公开(公告)号：US20120318456A1
公开(公告)日：2012-12-20
申请号：US13596976
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
摘要翻译： 公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。 一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制 周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。
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3.发明授权Systems and methods for calibrating a switched mode ion energy distribution system 有权用于校准开关模式离子能量分配系统的系统和方法公开(公告)号：US09210790B2
公开(公告)日：2015-12-08
申请号：US13597032
申请日：2012-08-28
CPC分类号： H05H1/46 , C23C14/345 , H01J37/32082 , H01J37/32422 , H01J37/32706 , H01J37/32926 , H01J37/32935 , H01J37/3299 , H05H1/0081
摘要： Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate.
摘要翻译： 公开了用于调节离子能量和离子能量分布以及校准偏压源和等离子体处理室的系统，方法和装置。 一种示例性方法包括将周期性电压函数应用于负载仿真器，负载仿真器模拟等离子体负载的电特性和相关联的电子设备例如电动卡盘。 可以测量负载仿真器的各种电气参数，并与偏置源产生的预期参数进行比较。 测量值和预期值之间的差异可用于识别和纠正偏置电源，腔室或用于点燃和维持等离子体的电源的故障和异常。 一旦偏置电源被校准，可以通过测量和计算包括衬底支撑件和任选的衬底的串联和并联电容的有效电容来校准腔室。
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公开(公告)号：US08723423B2
公开(公告)日：2014-05-13
申请号：US13356546
申请日：2012-01-23
IPC分类号： H05H1/46
CPC分类号： H01J37/32541 , H01J37/32091 , H01J37/32183 , H01J37/32357 , H01J37/3244 , H01J37/32568 , H01J2237/327 , H05H1/46 , H05H2001/4675
摘要： This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.
摘要翻译： 本公开描述了用于将能量电容耦合到等离子体中以点燃和维持远程等离子体源内的等离子体的系统，方法和装置。 功率由至少部分地围绕或被第二电极围绕的第一电极提供。 第二个电极可以接地或浮动。 可以布置第一和第二介电部件以将电极中的一个或两个与等离子体分开，从而将等离子体与一个或两个电极隔离。
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5.发明申请SYSTEMS AND METHODS FOR CALIBRATING A SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM 有权用于校准切换模式离子能量分配系统的系统和方法公开(公告)号：US20140062303A1
公开(公告)日：2014-03-06
申请号：US13597032
申请日：2012-08-28
IPC分类号： H05H1/46
CPC分类号： H05H1/46 , C23C14/345 , H01J37/32082 , H01J37/32422 , H01J37/32706 , H01J37/32926 , H01J37/32935 , H01J37/3299 , H05H1/0081
摘要： Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate.
摘要翻译： 公开了用于调节离子能量和离子能量分布以及校准偏压源和等离子体处理室的系统，方法和装置。 一种示例性方法包括将周期性电压函数应用于负载仿真器，负载仿真器模拟等离子体负载的电特性和相关联的电子设备例如电动卡盘。 可以测量负载仿真器的各种电气参数，并与偏置源产生的预期参数进行比较。 测量值和预期值之间的差异可用于识别和纠正偏置电源，腔室或用于点燃和维持等离子体的电源的故障和异常。 一旦偏置电源被校准，可以通过测量和计算包括衬底支撑件和任选的衬底的串联和并联电容的有效电容来校准腔室。
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6.发明申请SYSTEM, METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION OF A PROJECTED PLASMA 有权用于控制投影等离子体的能量分配的系统，方法和装置公开(公告)号：US20120217221A1
公开(公告)日：2012-08-30
申请号：US13193345
申请日：2011-07-28
申请人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
发明人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
CPC分类号： C23C16/50 , C23C14/345 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译： 公开了用于调节等离子体室中的离子能量的系统，方法和装置。 一种示例性方法包括将基板放置在等离子体室中，通过远程产生的电离电磁场在等离子体室中形成等离子体，该离子化电磁场从远程投影源延伸到等离子体室中，可控制地将功率切换到基板，以便施加周期性 电压功能到基板，并且在周期性电压函数的多个周期中调制周期性电压函数，其响应于衬底表面处的离子能量的期望分布，以便在一段时间内实现所需的离子能量分布 依据。
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公开(公告)号：US09767988B2
公开(公告)日：2017-09-19
申请号：US13596976
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
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公开(公告)号：US09685297B2
公开(公告)日：2017-06-20
申请号：US13597093
申请日：2012-08-28
申请人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
发明人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
CPC分类号： H01J37/08 , G01N27/06 , H01J37/32944 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
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公开(公告)号：US09362089B2
公开(公告)日：2016-06-07
申请号：US13597050
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
摘要翻译： 公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。 一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制 周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。
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10.发明授权System, method and apparatus for controlling ion energy distribution of a projected plasma 有权用于控制投影等离子体的离子能量分布的系统，方法和装置公开(公告)号：US09309594B2
公开(公告)日：2016-04-12
申请号：US13193345
申请日：2011-07-28
申请人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
发明人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
CPC分类号： C23C16/50 , C23C14/345 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译： 公开了用于调节等离子体室中的离子能量的系统，方法和装置。 一种示例性方法包括将基板放置在等离子体室中，通过远程产生的电离电磁场在等离子体室中形成等离子体，该离子化电磁场从远程投影源延伸到等离子体室中，可控制地将功率切换到基板，以便施加周期性 电压功能到基板，并且在周期性电压函数的多个周期中调制周期性电压函数，其响应于衬底表面处的离子能量的期望分布，以便在一段时间内实现所需的离子能量分布 依据。
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