公开(公告)号：US20050083583A1

公开(公告)日：2005-04-21

申请号：US10688212

申请日：2003-10-15

申请人： Russell Hudyma ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

发明人： Russell Hudyma ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

IPC分类号： G02B13/14 ,  G03F7/20 ,  G02B9/00 ,  G02B3/00

CPC分类号： G03F7/70241 ,  G02B13/143

摘要： According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.

摘要翻译： 根据一个示例性实施例，提供具有物平面和像平面的投影透镜，并且包括以成像方式对象地列出的以下透镜组：（1）具有负屈光力的第一透镜组; 和（2）具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中，投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四，第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径，并且具有1/2腰围结构，其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。

公开(公告)号：US06867922B1

公开(公告)日：2005-03-15

申请号：US09593584

申请日：2000-06-12

申请人： Chiaki Terasawa ,  Hiroyuki Ishii ,  Takashi Kato

发明人： Chiaki Terasawa ,  Hiroyuki Ishii ,  Takashi Kato

IPC分类号： H01L21/027 ,  G02B13/14 ,  G02B13/24 ,  G03F7/20 ,  G02B9/00

CPC分类号： G03F7/7025 ,  G02B13/143 ,  G02B13/24 ,  G03F7/70241 ,  G03F7/70741

摘要： A projection optical system includes a plurality of positive lens groups having a positive refractive power, and at least one negative lens group having a negative refractive power, wherein, when L is a conjugate distance of the projection optical system and φ0 is the sum of powers of the or each negative lens group, a relation |L×φ0|>17 is satisfied, wherein, when h is a height of an axial marginal light ray and hb is a height of a most abaxial chief ray, at least two aspherical surfaces are formed on surfaces which satisfy a relation |hb/h|>0.35, wherein, when ΔASPH is an aspherical amount of each aspherical surface, a relation |ΔASPH/L|>1.0×10−6 is satisfied, and wherein the at least two aspherical surfaces include regions in which, from a central portion toward a peripheral portion of the surface, their local curvature powers change with mutually opposite signs.

摘要翻译： 投影光学系统包括具有正折光力的多个正透镜组和具有负屈光力的至少一个负透镜组，其中，当L是投影光学系统的共轭距离时，phi0是功率之和 或负的每个负透镜组，满足关系| Lxphi0 | 17，其中，当h是轴向边缘光线的高度，hb是最下面的主光线的高度时，形成至少两个非球面 在满足关系| hb / h |> 0.35的表面上，其中，当DeltaASPH是每个非球面的非球面量时，满足关系|ΔASPH/ L |> 1.0×10 -6，并且其中，所述至少两个 非球面包括从表面的中心部分朝向周边部分的局部曲率功率以相反的符号变化的区域。

公开(公告)号：US20050024617A1

公开(公告)日：2005-02-03

申请号：US10925965

申请日：2004-08-26

申请人： Yutaka Suenaga

发明人： Yutaka Suenaga

IPC分类号： G02B13/14 ,  G02B27/18 ,  G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B27/18 ,  G03F7/70341

摘要： A projection optical system according to the present invention whose image side numerical aperture is greater than or equal to 0.75, and which forms an image of a first object upon a second object using light of a predetermined wavelength less than or equal to 300 nm, comprises: a first lens group G1 of positive refractive power; a second lens group G2 of negative refractive power; a third lens group G3 of positive refractive power; and a fourth lens group G4 of positive refractive power, and: the first lens group G1, the second lens group G2, the third lens group G3 and the fourth lens group G4 are arranged in order from a side of the first object; and a distance D in mm along an optical axis between an optical surface of the fourth lens group G4 closest to the second object, and the second object, satisfies a condition of 0.1

公开(公告)号：US06844919B2

公开(公告)日：2005-01-18

申请号：US10628744

申请日：2003-07-30

申请人： Yutaka Suenaga

发明人： Yutaka Suenaga

IPC分类号： G02B13/14 ,  G02B27/18 ,  G03F7/20 ,  G03B27/52 ,  G02B3/00 ,  G02B9/00

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B27/18 ,  G03F7/70341

摘要： A projection optical system according to the present invention whose image side numerical aperture is greater than or equal to 0.75, and which forms an image of a first object upon a second object using light of a predetermined wavelength less than or equal to 300 nm, comprises: a first lens group G1 of positive refractive power; a second lens group G2 of negative refractive power; a third lens group G3 of positive refractive power; and a fourth lens group G4 of positive refractive power, and: the first lens group G1, the second lens group G2, the third lens group G3 and the fourth lens group G4 are arranged in order from a side of the first object; and a distance D in mm along an optical axis between an optical surface of the fourth lens group G4 closest to the second object, and the second object, satisfies a condition of 0.1

摘要翻译： 根据本发明的投影光学系统，其像侧数值孔径大于或等于0.75，并且使用小于或等于300nm的预定波长的光，在第二物体上形成第一物体的图像，包括 ：正屈光力的第一透镜组G1; 负屈光力的第二透镜组G2; 正屈光力的第三透镜组G3; 以及第一透镜组G1，第二透镜组G2，第三透镜​​组G3和第四透镜组G4从第一对象的一侧依次布置;以及第三透镜组G4， 并且沿着最靠近第二物体的第四透镜组G4的光学表面之间的光轴的距离D和第二物体满足0.1

公开(公告)号：US06842298B1

公开(公告)日：2005-01-11

申请号：US09796117

申请日：2001-02-28

申请人： David R. Shafer ,  Yung-Ho Chuang

发明人： David R. Shafer ,  Yung-Ho Chuang

IPC分类号： G02B17/08 ,  G02B21/04 ,  G03F7/20

CPC分类号： G02B21/04 ,  G02B13/143 ,  G02B17/0804 ,  G02B17/0808 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

摘要： A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.

摘要翻译： 提出了具有非常小的中心遮蔽性的高性能物镜，用于孔径和傅立叶滤波的外部光瞳，宽的制造公差，大的数值孔径，长的工作距离和大的视场。 目标最好是远心的。 该设计非常适用于紫外至紫外光谱范围波长的宽带亮场和激光暗场成像和检测。

公开(公告)号：US20040240073A1

公开(公告)日：2004-12-02

申请号：US10883849

申请日：2004-07-06

申请人： CARL ZEISS SMT AG

发明人： Michael Gerhard

IPC分类号： G03B027/42 ,  G02B005/30 ,  G02B027/28 ,  G02B027/10 ,  G02B003/00 ,  G02B009/00

CPC分类号： G03F7/70566 ,  G02B13/143 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70241 ,  G03F7/70966

摘要： A polarization rotator and crystalline quartz plate for use with an optical imaging system. The system has several imaging optical components (L1-L16) sequentially arranged along an optical axis (16), a means for creating radially polarized light arranged at a given location in that region extending up to the last of said imaging optical components, and a crystalline-quartz plate employable in such a system. A polarization rotator (14) for rotating the planes of polarization of radially polarized light and transforming same into tangentially polarized light, particularly in the form of a crystalline-quartz plate as noted above, is provided at a given location within a region commencing where those imaging optical components that follow said means for creating radially polarized light in the optical train are arranged. The optical imaging system is particularly advantageous when embodied as a microlithographic projection exposure system.

摘要翻译： 用于光学成像系统的偏振旋转器和结晶石英板。 该系统具有沿着光轴（16）顺序布置的多个成像光学部件（L1-L16），用于产生布置在该直至最后的所述成像光学部件的区域中的给定位置的径向偏振光的装置，以及 结晶石英板可用于这种系统。 用于旋转径向偏振光的偏振平面并将其变换为切向偏振光的偏振旋转器（14），特别是如上所述的结晶 - 石英板形式，提供在一个区域内的给定位置， 布置遵循用于在光学列中产生径向偏振光的所述装置的成像光学部件。 当被实现为微光刻投影曝光系统时，光学成像系统是特别有利的。

公开(公告)号：US20040179272A1

公开(公告)日：2004-09-16

申请号：US10740125

申请日：2003-12-17

申请人： Carl Zeiss SMT AG

发明人： Michael Gerhard ,  Daniel Krahmer

IPC分类号： G02B005/30 ,  G02B027/28 ,  G02B003/00 ,  G02B009/00

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70966

摘要： An objective (1), in particular for a microlithography projection apparatus, has lenses or lens parts falling into at least two groups. The first group (3) is made of a first crystalline material and the second group (5) is made of a second crystalline material. In the first group (3), an outermost aperture ray (15) is subject to a first optical path difference between two mutually orthogonal states of linear polarization; and the same outermost aperture ray is subject to a second optical path difference in the second group (5). The two different crystalline materials are selected so that the first and second optical path difference approximately compensate each other. A suitable selection consists of calcium fluoride for the first and barium fluoride for the second crystalline material.

摘要翻译： 特别是用于微光刻投影装置的目的（1）具有落入至少两组的透镜或透镜部件。 第一组（3）由第一结晶材料制成，第二组（5）由第二结晶材料制成。 在第一组（3）中，最外面的光阑（15）经历两个相互正交的线性极化状态之间的第一光程差; 并且在第二组（5）中相同的最外面的光圈受到第二光程差的影响。 选择两种不同的晶体材料，使得第一和第二光程差几乎相互补偿。 合适的选择包括用于第一晶体的氟化钙和用于第二结晶材料的氟化钡。

公开(公告)号：US06774984B2

公开(公告)日：2004-08-10

申请号：US10145138

申请日：2002-05-15

申请人： Michael Gerhard

发明人： Michael Gerhard

IPC分类号： G03B2772

CPC分类号： G03F7/70566 ,  G02B13/143 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70241 ,  G03F7/70966

摘要： An optical imaging system having several imaging optical components (L1-L16) sequentially arranged along an optical axis (16), a means for creating radially polarized light arranged at a given location in that region extending up to the last of said imaging optical components, and a crystalline-quartz plate employable in such a system. A polarization rotator (14) for rotating the planes of polarization of radially polarized light and transforming same into tangentially polarized light, particularly in the form of a crystalline-quartz plate as noted above, is provided at a given location within a region commencing where those imaging optical components that follow said means for creating radially polarized light in the optical train are arranged. The optical imaging system is particularly advantageous when embodied as a microlithographic projection exposure system.

摘要翻译： 一种光学成像系统，其具有沿着光轴（16）顺序排列的多个成像光学部件（L1-L16），用于产生布置在所述成像光学部件中最后延伸的区域中的给定位置的径向偏振光的装置， 和可用于这种系统的结晶石英板。 用于旋转径向偏振光的偏振平面并将其变换为切向偏振光的偏振旋转器（14），特别是如上所述的结晶 - 石英板形式，提供在一个区域内的给定位置， 布置遵循用于在光学列中产生径向偏振光的所述装置的成像光学部件。 当被实现为微光刻投影曝光系统时，光学成像系统是特别有利的。

公开(公告)号：US20040119962A1

公开(公告)日：2004-06-24

申请号：US10726494

申请日：2003-12-04

申请人： Nikon Corporation

发明人： Yasuhiro Omura

IPC分类号： G03B027/54

CPC分类号： G02B5/1857 ,  G02B13/143 ,  G02B27/0043 ,  G02B27/4211 ,  G02B27/4222 ,  G03F7/70241 ,  G03F7/70308

摘要： In a projection optical system which forms an image of a first plane on a second plane, using extreme ultraviolet illumination light, an object of the invention is to form an image on the first plane on the second plane under suitable conditions. This projection optical system comprises a first diffractive optical element arranged in an optical path between the first plane and the second plane; a second diffractive optical element arranged in the optical path on the side of the second plane from the first diffractive optical element; and an optical system having a negative power, arranged in the optical path between the first diffractive optical element and the second diffractive optical element.

摘要翻译： 在使用极紫外照明光在第二平面上形成第一平面的图像的投影光学系统中，本发明的目的是在合适的条件下在第二平面上的第一平面上形成图像。 该投影光学系统包括布置在第一平面和第二平面之间的光路中的第一衍射光学元件; 第二衍射光学元件，其布置在所述光路中，所述第二衍射光学元件在所述第二平面的与所述第一衍射光学元件相反的一侧上; 以及具有负功率的光学系统，布置在第一衍射光学元件和第二衍射光学元件之间的光路中。

公开(公告)号：US06714280B2

公开(公告)日：2004-03-30

申请号：US10079519

申请日：2002-02-22

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G03B2742

CPC分类号： G03F7/70025 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70575 ,  G03F7/70958

摘要： A projection optical system transferring a mask image on a mask onto a substrate and correcting chromatic aberration. A projection exposure system includes at least two refractive optical members collectively containing at least a first fluoride substance and a second fluoride substance, and satisfying the design condition 0.4

摘要翻译： 投影光学系统将掩模上的掩模图像转印到基板上并校正色差。 投影曝光系统包括至少两个折射光学构件，其共同地至少包含第一氟化物物质和第二氟化物物质，并且满足设计条件，其中MX1是折射率表面中具有最大有效孔径的表面的有效孔径 含有第一氟化物物质的光学构件MX2是包含第二氟化物物质的折射光学构件的表面中具有最大有效孔径的表面的有效孔径，MX1大于MX2。 投影曝光装置包括投影光学系统和提供具有入射在线宽变窄单元上的自然线宽的辐射的光源，以提供具有比天然线宽窄的线宽的曝光用辐射。