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US06714280B2 Projection optical system, projection exposure apparatus, and projection exposure method 失效
投影光学系统，投影曝光装置和投影曝光方法

  • Patent Title: Projection optical system, projection exposure apparatus, and projection exposure method
  • Patent Title (中): 投影光学系统，投影曝光装置和投影曝光方法
  • Application No.: US10079519
    Application Date: 2002-02-22
  • Publication No.: US06714280B2
    Publication Date: 2004-03-30
  • Inventor: Yasuhiro Omura
  • Applicant: Yasuhiro Omura
  • Priority: JPP2001-049306 20010223; JPP2001-254704 20010824
  • Main IPC: G03B2742
  • IPC: G03B2742
Projection optical system, projection exposure apparatus, and projection exposure method
Abstract:
A projection optical system transferring a mask image on a mask onto a substrate and correcting chromatic aberration. A projection exposure system includes at least two refractive optical members collectively containing at least a first fluoride substance and a second fluoride substance, and satisfying the design condition 0.4
Abstract(Chinese):

投影光学系统将掩模上的掩模图像转印到基板上并校正色差。 投影曝光系统包括至少两个折射光学构件，其共同地至少包含第一氟化物物质和第二氟化物物质，并且满足设计条件，其中MX1是折射率表面中具有最大有效孔径的表面的有效孔径 含有第一氟化物物质的光学构件MX2是包含第二氟化物物质的折射光学构件的表面中具有最大有效孔径的表面的有效孔径，MX1大于MX2。 投影曝光装置包括投影光学系统和提供具有入射在线宽变窄单元上的自然线宽的辐射的光源，以提供具有比天然线宽窄的线宽的曝光用辐射。

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