摘要:
The invention provides a probe measuring device for effecting local measurements referring to a sample, having a first probe and a second probe, a measurement condition adjustment arrangement adapted to commonly adjust a first measurement condition of the first probe with respect to a sample or a reference surface and a second measurement condition of the second probe with respect to a sample or a reference surface, a detection arrangement having a first detection arrangement associated with the first probe adapted to independently detect first measurement data referring to local measurements effected by the first probe and a second detection arrangement associated with the second probe adapted to independently detect second measurement data referring to local measurements effected by the second probe. Also provided are methods for effecting local measurements and local manipulations using multiple probes.
摘要:
Methods and systems for operating an apertureless microscope for observing one or more features to a molecular sensitivity on objects are described. More particularly, the method includes moving a tip of a probe coupled to a cantilever in a vicinity of a feature of a sample, which emits one or more photons at a detected rate relative to a background rate of the sample based upon the presence of the tip of the probe in the vicinity of the feature. The method modifies the detected rate of the feature of the sample, whereupon the modifying of the detected rate causes the feature of the sample to enhance relative to background rate of the feature.
摘要:
An apparatus and method are provided for processing the images obtained from an atomic force microscopy when profiling high aspect ratio features. A deconvolution technique for deconvolving the sample image includes the use of multiple images but does not require exact calibration of the scanning probe. In one embodiment, erosion and dilation techniques are used to obtain an undistorted image of the sample being measured. In another embodiment, Legendre transforms are used to obtain an undistorted image of the sample being measured. Also described is a technique for measuring the tip radius of the scanning probe.
摘要:
A method for the direct reconstruction of an object from measurements, called scattering data, of scattered waves due to probing waves as emitted by a source. The scattering data is related to a scattering kernel by an integral operator. The image is directly reconstructed by executing a prescribed mathematical algorithm, as determined with reference to the integral operator, on the scattering data.
摘要:
A scan nonlinearity in scan microscopes is determined so as to take into consideration of a contribution of a nonlinearity of scans and a uniformity of a test object in a total, imaginary nonlinearity of image.
摘要:
Apparatus and methods are provided for using atomic force microscopy for profiling high aspect ratio features. Probe landing techniques include scanning prior to bringing the probe into contact with the feature. In one embodiment, the probe assembly cantilever is brought into contact with the feature and subsequent scanning is used to locate the feature with the probe. In another embodiment, the probe is moved in a scanning pattern in progressively lower horizontal planes until the probe contacts the sample feature. Also described is a deconvolution technique for deconvolving the sample image and a technique for measuring the tip radius of the feature.
摘要:
A method and apparatus for observing a specimen in atomic force microscopy with a vibrating cantilever maintained in resonance while a probe attached to the cantilever is maintained in contact with the specimen. The Q factor of the cantilever is determined based upon the detected amplitude.
摘要:
A scanning probe microscopy (SPM) inspection and/or modification system which uses SPM technology and techniques. The system includes various types of microstructured SPM probes for inspection and/or modification of the object. The components of the SPM system include microstructured calibration structures. A probe may be defective because of wear or because of fabrication errors. Various types of reference measurements of the calibration structure are made with the probe or vice versa to calibrate it. The components of the SPM system further include one or more tip machining structures. At these structures, material of the tips of the SPM probes may be machined by abrasively lapping and chemically lapping the material of the tip with the tip machining structures.
摘要:
The present invention comprises a SCM measuring apparatus and a control section. A control section adjusts shape data of a probe tip initially inputted based on SCM measurement for a standard specimen and a simulated result by the measuring apparatus, and then performs the SCM measurement by a standard specimen, and then on the basis of the measuring result, a impurity distribution is assumed. Next, the impurity distribution is adjusted so that the CV property calculated by the SCM simulation coincides with the CV property measured by the SCM measuring apparatus, and then the CV property is calculated again. The impurity distribution in case both of the CV properties coincide with each other is determined as a definitive impurity distribution. The definitive impurity distribution is outputted to a display apparatus, a printer, and so on. Therefore, it is possible to analyze the impurity distribution with accuracy smaller than a width of the probe tip.
摘要:
A scanning force microscope having a sensor head and a base wherein a moveable sample holder is housed in the base and is positioned relative to a probe housed in the sensor head, such sample being monitored by an optical deflection detection system. The detection system is configured to provide direct visual observation of the probe with respect to the sample. The mirror of the detection system is mounted in a cut away portion of a sphere and defines the axis of rotation of a kinematic mount, such providing ease of fine adjustment of the detection system. The sensor head is in communication with the base by a stage kinematic mount, such providing ease of position adjustment of the sensor head with respect to the base.