公开(公告)号：US06980279B2

公开(公告)日：2005-12-27

申请号：US10764377

申请日：2004-01-22

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70775

Abstract: An interferometer system for measuring the height of a wafer stage utilizes four beams emitted horizontally parallel to one another and in a same direction from an interferometer and obtained by splitting a single laser beam. Two of these four beams are reference beams and the other two are measurement beams. The reference beams are mutually on opposite sides of the center point of the stage, equally separated therefrom horizontally, and are reflected back from the front surface of the stage. The wafer stage is provided with two mirrors inclined at 45° extending horizontally so as to reflect the measurement beams vertically upward. These two inclined mirrors are disposed in lower front and upper back parts of the stage and the two measurement beams are aimed and reflected at target points on them, diametrically opposite with reference to the center point of the stage. The height of the wafer stage is calculated from measured path lengths of these four beams, independent of small displacements to first degree in other linear and rotational degrees of freedom of motion of the wafer stage.

公开(公告)号：USH2114H1

公开(公告)日：2005-02-01

申请号：US10298286

申请日：2002-11-14

Applicant: W. Thomas Novak ,  John H. McCoy ,  Martin E. Lee

Inventor： W. Thomas Novak ,  John H. McCoy ,  Martin E. Lee

Abstract: An inspection system and method are disclosed. The inspection system is configured to inspect a projection unit having multiple optical subsystems. The optical subsystems are configured to project an image during a lithography step. The inspection system provides self calibration by measuring both a test mask and the aerial image of the test mask with the same detector assembly. The inspection system is also capable of measuring multiple fields simultaneously using multiple detectors and 6 axis interferometry to accurately determine the position of each detector. Additionally, the inspection system is capable of measuring the distance between the test mask and the detector assembly with an indirect path around the projection unit which normally blocks the direct path.

公开(公告)号：US06781138B2

公开(公告)日：2004-08-24

申请号：US09866838

申请日：2001-05-30

Applicant: W. Thomas Novak ,  Michael Kovalerchik

Inventor： W. Thomas Novak ,  Michael Kovalerchik

IPC: G21K510

CPC classification number: G03F7/70716 ,  H01J37/20 ,  H01J2237/3175 ,  Y10T74/20354

Abstract: A positioning stage system for precise and accurate movement of an article in an electron beam lithography system. The positioning stage system includes a support platform for supporting the article, an X-direction linear motor coupled to an X-member, a Y-direction linear motor coupled a Y-member, and a slide attached to the support platform and slidably engaged to the X-member and the Y-member. The X-member and Y-member, upon actuation of the X-direction and Y-direction linear motors, cause the support platform to move in an X-direction and a Y-direction, respectively.

Abstract translation: 一种用于电子束光刻系统中物品精确和精确移动的定位台系统。 定位台系统包括用于支撑物品的支撑平台，耦合到X构件的X方向线性电动机，连接Y形构件的Y方向线性电动机和附接到支撑平台的滑动件，可滑动地接合到 X会员和Y会员。 在X方向和Y方向线性电动机的驱动下，X形件和Y形件分别使支撑平台在X方向和Y方向上移动。

公开(公告)号：US06735867B2

公开(公告)日：2004-05-18

申请号：US10205200

申请日：2002-07-26

Applicant: Takuma Tsuda ,  Shinji Shinohara ,  Shinobu Tokushima ,  Yukiharu Okubo ,  Toshimasa Shimoda ,  Douglas C. Watson ,  W. Thomas Novak

Inventor： Takuma Tsuda ,  Shinji Shinohara ,  Shinobu Tokushima ,  Yukiharu Okubo ,  Toshimasa Shimoda ,  Douglas C. Watson ,  W. Thomas Novak

IPC: B21D5310

CPC classification number: F16C32/06 ,  B23Q1/0027 ,  B23Q1/38 ,  B23Q1/621 ,  F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  F16C2322/39 ,  G03F7/70816 ,  Y10T29/49639 ,  Y10T29/49641

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract translation: 为了提供一种具有两个轴的静压空气轴承，该真空环在真空环境中可以使支撑排气管的连接不会对轴承机构的运动产生不利影响，排气管仅与固定部分 ）。 从上轴排出的排气通过形成在上下轴的固定部内的内部排气管（通路）进行排气，不需要将排气管与可动部连接。

公开(公告)号：US06562528B2

公开(公告)日：2003-05-13

申请号：US09884140

申请日：2001-06-20

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03F900

CPC classification number: G03F9/7019 ,  G03F7/70641 ,  G03F9/7011 ,  G03F9/7034

Abstract: A method for determining and calibrating substrate plane tilt and image plane tilt in a photolithography system, which includes subjecting a test substrate to multiple exposure series to form image from which image plane tilt and substrate plane tilt about the first axis can be separately determined. For a first exposure series, two test areas aligned along a second axis are subject to the same exposures at the same position along a third axis orthogonal to the horizontal reference plane. The image from this exposure series would indicate the presence of substrate plane tilt if the relative locations of the best focus images in the test areas were substantially different. For a second exposure series, the substrate plane is stepped along the third axis direction and at least one of the test areas is subjected to the same exposure at different positions in the third axis direction. The image from this second exposure series provides information on the change in position of best focus across the substrate plane, corresponding to changes in substrate position along the third axis direction. Such information is used for determining the image plane tilt and substrate plane tilt with respect to the substrate plane. The image plane tilt and substrate plane tilt information may be used to calibrate the photolithography system for processing production substrates.

Abstract translation: 一种用于在光刻系统中确定和校准衬底平面倾斜和图像平面倾斜的方法，其包括使测试衬底经受多次曝光序列以形成图像，从而可以分别确定图像平面倾斜和衬底平面围绕第一轴线倾斜的图像。 对于第一曝光系列，沿着第二轴对准的两个测试区域沿着与水平参考平面正交的第三轴线在相同位置处受到相同的曝光。 如果测试区域中最佳对焦图像的相对位置基本不同，则来自该曝光系列的图像将指示存在基板平面倾斜。 对于第二曝光系列，基板平面沿着第三轴线方向阶梯，并且至少一个测试区域在第三轴线方向上的不同位置处受到相同的曝光。 来自该第二曝光系列的图像提供关于沿着第三轴线方向的基板位置的变化的关于跨越基板平面的最佳焦点的位置变化的信息。 这样的信息用于确定相对于基板平面的图像平面倾斜和基板平面倾斜。 图像平面倾斜和基板平面倾斜信息可以用于校准用于处理生产基板的光刻系统。

公开(公告)号：US06515381B1

公开(公告)日：2003-02-04

申请号：US09661321

申请日：2000-09-13

Applicant: W. Thomas Novak ,  Michael Kovalerchik

Inventor： W. Thomas Novak ,  Michael Kovalerchik

IPC: G03B2742

CPC classification number: B23Q1/26 ,  B23Q11/0021 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70766 ,  H01J37/20 ,  H01J37/3174 ,  H02K16/00 ,  H02K41/02 ,  H02K2201/18

Abstract: A cantilever stage for precision movement and positioning an article such as a reticle in an electron beam photolithography system is disclosed. The cantilever stage comprises a cantilevered support platform for supporting the article extending from a movable member. The cantilever stage is supported by at least one elongate guide extending through a channel defined by the movable member. The cantilever stage may be driven by one or more actuators mechanically coupled to the movable member to move and position the cantilever stage in a first direction along the elongate guide. The actuator may be any suitable actuator such as an electromagnetic drive motors. The movable portion defines an open region which includes the center of gravity of the cantilever stage and is configured to receive a counterbalance or reaction force balancing device. The cantilever stage may also be driven in a second direction, generally perpendicular to the first direction, by an actuator mechanically coupled to the elongate guide.

Abstract translation: 公开了一种用于在电子束光刻系统中精确移动和定位诸如掩模版的物品的悬臂台。 悬臂台包括用于支撑从可移动构件延伸的制品的悬臂支撑平台。 悬臂台由延伸穿过由可移动构件限定的通道的至少一个细长引导件支撑。 悬臂台可以由一个或多个致动器驱动，该致动器机械联接到可移动构件，以沿着细长引导件沿第一方向移动和定位悬臂台。 致动器可以是任何合适的致动器，例如电磁驱动马达。 可移动部分限定了包括悬臂台的重心的开放区域，并且构造成容纳平衡或反作用平衡装置。 悬臂台还可以通过机械联接到细长引导件的致动器在大致垂直于第一方向的第二方向上被驱动。

公开(公告)号：US06437463B1

公开(公告)日：2002-08-20

申请号：US09556353

申请日：2000-04-24

Applicant: Andrew J. Hazelton ,  W. Thomas Novak ,  Akimitsu Ebihara

Inventor： Andrew J. Hazelton ,  W. Thomas Novak ,  Akimitsu Ebihara

IPC: H02K4100

CPC classification number: H02K41/03 ,  G03F7/70716 ,  G03F7/70758 ,  H02K2201/18

Abstract: A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is driveable in six degrees of freedom and includes variable reluctance actuators for positioning in three degrees of freedom.

Abstract translation: 一种具有粗糙台阶的定位台组件，其包括可以至少两个自由度驱动的平面电机，以及位于粗糙台上的精细台，所述精细平台可相对于粗略平台至少三个自由度驱动。 更优选地，精细级可以在六个自由度中驱动，并且包括用于以三个自由度定位的可变磁阻致动器。

公开(公告)号：US6147421A

公开(公告)日：2000-11-14

申请号：US192637

申请日：1998-11-16

Applicant: Mark K. Takita ,  W. Thomas Novak ,  Andrew J. Hazelton

Inventor： Mark K. Takita ,  W. Thomas Novak ,  Andrew J. Hazelton

IPC: G03F7/20 ,  H02K41/03 ,  H02K41/00

CPC classification number: G03F7/70758 ,  H02K41/03 ,  H02K2201/18

Abstract: The invention comprises a platform positionable in at least three degrees of freedom at least partly by interaction with coils. The platform includes a support member having a surface. Magnets are attached to the surface and part of a magnet bearing is attached to the support member. Inner and outer platforms are coupled to each other by magnet bearings and interact with coils to position the inner platform in six degrees of freedom. The invention may be particularly useful in precise positioning of semiconductor wafers and materials during photolithography and other processing.

Abstract translation: 本发明包括至少部分地通过与线圈相互作用而至少三个自由度定位的平台。 平台包括具有表面的支撑构件。 磁体连接到表面，并且磁体轴承的一部分附接到支撑构件。 内平台和外平台通过磁铁轴承彼此联接，并与线圈相互作用，以使内平台处于六自由度。 在光刻和其它处理期间，本发明可以特别适用于半导体晶片和材料的精确定位。

公开(公告)号：US5760564A

公开(公告)日：1998-06-02

申请号：US495044

申请日：1995-06-27

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: B23Q1/00 ,  B23Q1/38 ,  B23Q1/62 ,  B23Q3/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G05B11/00

CPC classification number: G03F7/70716 ,  B23Q3/00

Abstract: A dual guide beam stage mechanism for accurate X-Y positioning for use e.g. in semiconductor processing equipment provides accurate planar motion and yaw control. Over-constraint between components in their relative motion is minimized by utilizing flexibly mounted air bearings at the connection between at least one of the moveable guide beams and its corresponding stationary guide, and between at least one of the guide beams and the adjacent stage itself. Thus stage yaw motion is provided by allowing yaw motion of one of the guide beams. Preloading provides enough constraint through the air bearings without over-constraining the moving components, thereby improving accuracy and also reducing the need for close manufacturing tolerances.

Abstract translation: 用于准确的X-Y定位的双引导波束级机构 在半导体加工设备中提供精确的平面运动和偏航控制。 通过在至少一个可移动导向梁及其对应的固定导轨之间的连接处以及至少一个导向梁和相邻的台本身之间的连接处利用柔性安装的空气轴承来最小化其相对运动中的部件之间的过度约束。 因此，通过允许一个引导梁的偏航运动来提供舞台偏转运动。 预加载通过空气轴承提供足够的约束，而不会过度约束运动部件，从而提高精度并减少对紧密制造公差的需求。

公开(公告)号：US5623853A

公开(公告)日：1997-04-29

申请号：US325740

申请日：1994-10-19

Applicant: W. Thomas Novak ,  Zahirudeen Premji ,  Uday G. Nayak ,  Akimitsu Ebihara

Inventor： W. Thomas Novak ,  Zahirudeen Premji ,  Uday G. Nayak ,  Akimitsu Ebihara

IPC: G12B5/00 ,  G02B21/26 ,  G03F7/20 ,  H01L21/027 ,  G05G11/00

CPC classification number: G03F7/707 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70991 ,  Y10T74/20354 ,  Y10T74/20378

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam. A cable follower stage moves in the Y direction on the follower stage and supports the cables connecting to the main stage, thereby reducing cable drag. An air circulation system is provided in the magnetic tracks on the follower stage to remove heat from operation of the electromagnetic motors. Air is removed from a central region of each track by a vacuum duct enhanced by air plugs fitting at the two ends of the motor coil assembly on the main stage to contain the air therein.

Abstract translation: 用于在微光刻系统中对准晶片的精确运动的XY平台。 支撑晶片的主平台跨越在XY平面中沿第一线性方向磁驱动的可移动光束。 机械独立于主舞台的跟随台阶也在第一线性（X）方向上移动，并且其运动由具有主方向运动的控制系统在X方向上电子同步。 电磁驱动电动机包括安装在从动台上的磁道，其与安装在主台的边缘上的电动机线圈配合，以沿着与X方向正交的第二线性（Y）方向移动主工作台。 因此，主平台与XY平面中的机械扰动隔离，因为没有机械连接并且通过从梁中去除磁道的重量而被减轻。 电缆跟随器级在从动台上沿Y方向移动，并支撑连接到主级的电缆，从而减少电缆阻力。 在跟随器台上的磁道中设置有一个空气循环系统，以消除电磁马达的运行中的热量。 空气由每个轨道的中心区域被一个真空管道除去，该真空管道通过安装在主台上的电动机线圈组件的两端上的空气塞来增强，以便在其中容纳空气。