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公开(公告)号：US3440085A
公开(公告)日：1969-04-22
申请号：US3440085D
申请日：1963-12-16
发明人： BAKER DONALD E , ECK JOHN E
CPC分类号： C23C14/223 , B01J2/003 , C23C14/22 , G21C3/626 , Y02E30/38 , Y10T428/2993
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公开(公告)号：US4811691A
公开(公告)日：1989-03-14
申请号：US17452
申请日：1987-02-24
申请人： Timothy L. McJilton
发明人： Timothy L. McJilton
CPC分类号： C23C14/246
摘要： In metalizing apparatus employing wire as a source of metalizing material, wire with rectangular cross-section is employed and is fed toward the heated boat of the metalizing apparatus in a specific orientation. This cross-section tends to avoid kinking of the wire, clogging the guide tube which feeds the wire toward the boat, and reduces the criticalility of the hardness of the wire used in the metalizing process.
摘要翻译： 在使用金属线作为金属化材料源的金属化装置中，采用具有矩形横截面的金属线，并且以特定取向向金属化装置的加热舟皿供给。 该横截面倾向于避免线的扭结，堵塞将导线朝向舟料供给的导管，并且降低金属化过程中使用的电线的硬度的临界性。
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公开(公告)号：US4528939A
公开(公告)日：1985-07-16
申请号：US623875
申请日：1984-06-25
CPC分类号： C23C14/243 , C22B21/0084 , C22B9/228 , C23C14/30 , F27B14/06 , F27B14/10 , F27B3/085 , F27M2001/01
摘要： The present invention is directed to a containment vessel which is particularly useful in melting aluminum. The vessel of the present invention is a multilayered vessel characterized by being electrically conductive, essentially nonwettable by and nonreactive with molten aluminum. The vessel is formed by coating a tantalum substrate of a suitable configuration with a mixture of yttria and particulate metal borides. The yttria in the coating inhibits the wetting of the coating while the boride particulate material provides the electrical conductivity through the vessel. The vessel of the present invention is particularly suitable for use in melting aluminum by ion bombardment.
摘要翻译： 本发明涉及一种特别适用于熔化铝的容器。 本发明的容器是一种多层容器，其特征在于它具有导电性，基本上不可润湿并且不与熔融铝反应。 容器通过用合适的构型的钽基材与氧化钇和颗粒金属硼化物的混合物来形成。 涂层中的氧化钇抑制涂层的润湿，而硼化物颗粒材料通过容器提供导电性。 本发明的容器特别适用于通过离子轰击熔化铝。
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公开(公告)号：US4516525A
公开(公告)日：1985-05-14
申请号：US544027
申请日：1983-10-21
IPC分类号： C23C14/24 , C23C14/30 , H01L21/203 , H01L21/285 , C23C13/12
CPC分类号： C23C14/30
摘要： This invention relates more particularly to an electron-gun metal evaporation system for solder (lead/tin, lead/indium) deposition upon integrated circuit chips. This system utilizes a crucible comprised of a tantalum bent-cone V-shaped liner or cup seated in spaced relationship in a recess of a copper hearth.
摘要翻译： 本发明更具体地涉及用于集成电路芯片上的焊料（铅/锡，铅/铟）沉积的电子枪金属蒸发系统。 该系统利用由钽弯曲锥形V形衬垫或杯构成的坩埚，所述坩埚以间隔关系坐在铜炉底的凹槽中。
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公开(公告)号：US4508053A
公开(公告)日：1985-04-02
申请号：US455828
申请日：1983-01-05
申请人： Richard C. Eriksson
发明人： Richard C. Eriksson
CPC分类号： H01J37/32422 , C23C14/541 , G03G5/08207
摘要： A vapor deposition apparatus including a vacuum chamber, a vacuum pump for evacuating the chamber, and a mounting assembly disposed within the chamber and adapted to support and electrically isolate a plurality of substrate electrode units to be coated. Electrical couplings connect the electrode units to a power supply that establishes therebetween potential gradients that produce a glow discharge and resultant heating thereof. Also disposed within the vacuum chamber is a source of evaporative coating for deposition on the glow discharge heated electrode units.
摘要翻译： 一种气相沉积设备，包括真空室，用于抽真空室的真空泵和设置在室内的适于支撑和电隔离待涂覆的多个基板电极单元的安装组件。 电耦合将电极单元连接到电源，其在其间建立产生辉光放电的电位梯度并且其产生的加热。 还设置在真空室内的是用于在辉光放电加热的电极单元上沉积的蒸发涂层的源。
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公开(公告)号：US4470370A
公开(公告)日：1984-09-11
申请号：US435601
申请日：1982-10-20
申请人： Lothar Rachor , Erwin Eichinger , Peter Scheyrer , Rudolf Seif
发明人： Lothar Rachor , Erwin Eichinger , Peter Scheyrer , Rudolf Seif
CPC分类号： C23C14/246
摘要： For the loading of evaporators in vapor coating plants with shaped pieces made of vapor coating materials there is used an apparatus which is characterized by rolls having indentations for receiving the shaped pieces, centered on a rotatable shaft and surrounded by a closely fitting housing by a moving part having gradual feed fastened on the shaft and by a swivelable shaft moveable into a resting position and into a loading position, on which there is mounted the shaft having rolls via fastening elements. Thereby the housing of the rolls is provided with a recess corresponding to the shaped pieces, which is located in the loading position directly above the evaporator. Because there is only a short time loading process there is no need to cool and there is avoided influencing of the vaporization by the action of moving.
摘要翻译： 对于在具有由蒸气涂覆材料制成的成形件的蒸气涂覆设备中装载蒸发器，使用一种装置，其特征在于具有用于接收成形件的压痕的辊，其中心是可旋转的轴，并通过移动的紧密配合的壳体包围 部分具有紧固在轴上的逐渐进给和可移动的轴，其可移动到静止位置并进入加载位置，在该位置上，通过紧固元件将轴安装在辊上。 因此，辊的壳体设置有与成形件对应的凹部，其位于蒸发器正上方的加载位置。 因为只有短时间的加载过程，不需要冷却，并且避免了通过移动的动作影响蒸发。
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公开(公告)号：US4412508A
公开(公告)日：1983-11-01
申请号：US407019
申请日：1982-08-11
申请人： Robert J. Ney , Erich Hafner
发明人： Robert J. Ney , Erich Hafner
CPC分类号： C23C14/243
摘要： A nozzle beam source for use in the vapor deposition of electrode materials such as gold, during the fabrication of precision quartz-crystal resonators, or the like. The nozzle beam source includes a graphite crucible and source tube, a tungsten wick within the source tube, and graphite-to-graphite mechanical seals.
摘要翻译： 用于在精密石英晶体谐振器的制造期间用于气体沉积诸如金的电极材料的喷嘴束源。 喷嘴梁源包括石墨坩埚和源管，源管内的钨芯，以及石墨 - 石墨机械密封。
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58.发明授权Method and apparatus for depositing film on a substrate, and products produced thereby 失效用于在基板上沉积膜的方法和装置，以及由此产生的产品
公开(公告)号：US4210701A
公开(公告)日：1980-07-01
申请号：US929733
申请日：1978-07-31
IPC分类号： B05D7/02 , B05D7/24 , B29D11/00 , C23C14/32 , C23C14/48 , G21K5/04 , H01J27/26 , C23C13/12 , B05D3/06 , B32B31/28
CPC分类号： B29D11/0073 , B05D1/60 , B05D7/02 , B05D7/24 , B29D11/00865 , C23C14/32 , C23C14/48 , G21K5/04 , H01J27/26 , Y10S428/911 , Y10T428/31 , Y10T428/31504
摘要： Method and apparatus for using emitting, ionizing, accelerating and collecting elements in a high vacuum to implant a hard film on a plastic substrate or the like. In preparation, a slug of a selected material to be deposited as a film is placed in the emitter. The specimens or articles to be implanted are placed on supports in the vicinity of the collector. A cover enclosure is then placed in position and the region enclosed by the cover is exhausted to a high vacuum. Selected potentials are applied to various elements of the apparatus and an accelerating/directing field which may be developed electrostatically, magnetically or by a combination of both, is developed in the acceleration structure. The electrostatic field causes electron emission from the ionizing elements to develop an increased charge on the emitted ionized particles. When implantation is to begin, a shutter control is moved out of beam blocking position and ionized particles from the emitter pick up additional charge from the ionizing elements and are accelerated to high velocity for bombarding the specimens. The collector is provided near the end of the enclosure beyond the specimen support region. The specimens are discharged regularly to eliminate the build-up of surface charge from the stream of bombarding ions.
摘要翻译： 用于在高真空中使用发射，电离，加速和收集元件以在塑料基板等上植入硬膜的方法和装置。 在制备中，将要沉积为膜的所选材料的块塞放置在发射器中。 待植入的标本或物品放置在收集器附近的支撑件上。 然后将盖罩放置在适当位置，并且由盖封闭的区域被排出到高真空。 选择的电位被应用于装置的各种元件，并且在加速结构中开发出可以静电，磁性地或通过两者的组合开发的加速/定向场。 静电场引起电离元件的电子发射，对发射的电离粒子产生增加的电荷。 当开始植入时，快门控制被移出光束阻挡位置，并且来自发射器的离子化颗粒从电离元件拾取附加电荷并且被加速到高速度以轰击样品。 收集器设置在靠近样品支撑区域的外壳端部附近。 样品经常排出，以消除从轰击离子流中积聚的表面电荷。
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公开(公告)号：US4181541A
公开(公告)日：1980-01-01
申请号：US875762
申请日：1978-02-07
申请人： Philippe LeFrancois
发明人： Philippe LeFrancois
CPC分类号： C23C8/36
摘要： Thermochemical Treatment System and Process for the treatment of steel or steel alloys by ionic bombardment. Two successive stages of operation are involved in which during the first stage, a DC voltage is applied across the electrodes of a furnace so that the furnace operates at a point far enough away from the arc formation zone to prevent formation of an arc and lies in the zone of abnormal discharge. During the second stage, a succession of pulses of voltage pulses of high voltage but of limited energy is applied to the furnace electrodes, and the operating point of the furnace moves along the voltage-intensity curve to a limit point far enough away from the arc formation zone, so that no arc formation takes place.
摘要翻译： 热处理系统及通过离子轰击处理钢铁合金的工艺。 涉及两个连续的操作阶段，其中在第一阶段期间，跨电炉的电极施加直流电压，使得炉子在远离电弧形成区足够远的位置运行，以防止形成电弧并且位于 异常放电区。 在第二阶段期间，将高压但有限能量的电压脉冲的一连串脉冲施加到炉电极，并且炉的工作点沿着电压 - 强度曲线移动到远离电弧的极限点 形成区域，使得不形成电弧。
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公开(公告)号：US4080926A
公开(公告)日：1978-03-28
申请号：US744000
申请日：1976-11-22
CPC分类号： C23C14/243 , C23C14/0623 , C30B23/02 , C30B29/48
摘要： A method of and apparatus for growing films composed of low-melting-point materials from a feed material whose constituents have large differences in vapor pressure. In the system disclosed, the feed material is contained within an ampoule whose only outlet is a downwardly directed capillary tube and delivered in the form of a melt to a heated environment whose temperature is higher than the temperature of vaporization of the constituent of the feed material having the highest vaporization temperature, thereby to effect flash vaporization of the liquid and thus avoid changes in composition or phase separation.
摘要翻译： 一种用于生产由低熔点材料构成的膜的方法和装置，所述低熔点材料的成分具有较大的蒸气压差。 在所公开的系统中，饲料包含在安瓿内，其安全瓶的唯一出口是向下的毛细管，并以熔体形式递送到温度高于饲料成分蒸发温度的加热环境 具有最高的蒸发温度，从而影响液体的闪蒸，从而避免组成或相分离的变化。
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