摘要:
Provided is a polymerizable composition of (a) a monomer composition including ethylenically unsaturated monomer having a β-epithiopropyl functional group; (b) optionally, a compound having two or more β-epithiopropyl functional groups but no polymerizable ethylenically unsaturated groups; (c) an isourea functional polymerization initiator; and (d) a catalyst for reaction between the β-epithiopropyl functional groups. Also provided is a method of reducing the yellowness index of a sulfur-containing polymerizate prepared by addition polymerization, the method including reacting in the presence of an isourea functional polymerization initiator and a catalyst for reaction between β-epithiopropyl functional groups, a polymerizable composition of: (a) a monomer composition including ethylenically unsaturated monomer having a β-epithiopropyl functional group; and, optionally, (b) a compound having two or more β-epithiopropyl functional groups but no polymerizable ethylenically unsaturated groups.
摘要:
A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.
摘要:
There are provided a radical polymerizable composition having a low viscosity suitable for coating and a cured product and a plastic lens each obtained by curing the composition, the cured product having a high refractive index, good adhesiveness to a plastic film substrate, and good adhesiveness kept even under high-temperature and high-humidity conditions. The radical polymerizable composition includes phenylbenzyl (meth)acrylate (A), an epoxy (meth)acrylate (X) having an aromatic ring in its molecular structure, and a radical polymerization initiator (Y) as essential components.
摘要:
A resin composition which is excellent in quick curing and can be used for curing in conventionally used ovens, and a semiconductor device which is excellent in reliability such as solder crack resistance or the like when the resin composition is used as a die attach material for semiconductor. Further preferably, a resin composition which has a sufficient low stress property, good adhesion and excellent bleeding property.A resin composition comprising a filler (A), the compound (B) comprising a structure represented by the formula (1) and a functional group represented by the formula (2) and a thermal radical initiator (C), and substantially not containing a photo polymerization initiator.
摘要:
The present invention provides a polymer comprising a unit of formula The present invention also provides an electronic device comprising the polymer as semiconducting material.
摘要:
An electrically conductive polymer linked to conductive nanoparticle is provided. The conductive polymer can include conductive monomers and one or more monomers in the conductive polymer can be linked to a conductive nanoparticle and can include a polymerizable moiety so that it can be incorporated into a polymer chain. The electrically conductive monomer can include a 3,4-ethylenedioxythiophene as a conductive monomer. The electrically conductive polymer having the conductive nanoparticle can be prepared into an electrically conductive layer or film for use in electronic devices.
摘要:
There are provided a conductive material obtained by bringing a π conjugated polymer into contact with an ionic liquid and a conductive film obtained by bringing a π conjugated polymer film into contact with the ionic liquid. Method of producing them is provided.
摘要:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
摘要:
The present invention provides block copolymers containing at least one block of a poly(heteroaromatic) polymer and at least two blocks of a non-conjugated polymer. The chemically different blocks of the copolymer are covalently bonded to each other in an alternating fashion through an appropriate linkage group. The poly(heteroaromatic) block may exist in its neutral or oxidized form, and when in the oxidized form, it associates with organic or inorganic counter-anions to balance the charge. The poly(heteroaromatic) polymer is an intrinsically conducting polymer (ICP), and when in the oxidized form it is electrically conducting. When the ICP block or blocks of the block copolymer are in the doped form, the block copolymer is electrically conducting. Preferably the conducting block copolymers have conductivities in the range 10−6-103 S/cm. Block copolymers of this invention are soluble or dispersible in water, one or more organic solvents, or in a mixture thereof at a level of at least about 0.1 g/liter.