Apparatus for the correction of temperature drift for pressure sensor, pressure control apparatus and pressure-type flow rate control apparatus
    51.
    发明授权
    Apparatus for the correction of temperature drift for pressure sensor, pressure control apparatus and pressure-type flow rate control apparatus 有权
    用于校正压力传感器,压力控制装置和压力型流量控制装置的温度漂移的装置

    公开(公告)号:US07085628B2

    公开(公告)日:2006-08-01

    申请号:US10476973

    申请日:2002-11-22

    IPC分类号: G06D23/00

    摘要: A pressure sensor, a pressure control apparatus, and a flow rate control apparatus are provided to automatically correct temperature drift of the pressure sensor and accurately detect pressure despite changes in temperature. An embodiment includes an upstream side pressure sensor between an orifice and a control valve, to control flow rate through the orifice by a regulating control valve, while calculating the flow from the upstream side pressure. With a temperature sensor, a memory means, and a temperature drift correcting means which calculates drift of the upstream side pressure sensor from data in the memory means when the temperature of the fluid changes and offsets the output drift of the upstream side pressure sensor with the calculated amount of the output drift, temperature drift of the pressure sensor is automatically corrected, enabling accurate control of flow rate.

    摘要翻译: 提供压力传感器,压力控制装置和流量控制装置来自动校正压力传感器的温度漂移并且尽管温度变化来精确地检测压力。 一个实施例包括在孔口和控制阀之间的上游侧压力传感器,用于通过调节控制阀控制通过孔口的流量,同时计算从上游侧压力的流量。 利用温度传感器,存储装置和温度漂移校正装置,当流体的温度变化时,上游侧压力传感器的输出漂移与 输出漂移的计算量,压力传感器的温度漂移自动校正,可以精确控制流量。

    Plasma producing apparatus and doping apparatus

    公开(公告)号:US07026764B2

    公开(公告)日:2006-04-11

    申请号:US10390882

    申请日:2003-03-19

    申请人: Osamu Nakamura

    发明人: Osamu Nakamura

    IPC分类号: H01J7/24

    摘要: An object of the present invention is to provide an apparatus for producing stable plasma. Another object of the present invention is to provide an apparatus having a long-lasting cathode electrode which is superior in field emission characteristic since the plasma density has to be raised in order to increase the throughput. The structure of the plasma producing apparatus of the present invention relates to a plasma producing apparatus with a plasma chamber surrounded by walls to make material gas into plasma, characterized in the plasma chamber has a cathode electrode, an anode electrode, means for introducing the material gas, and exhaust means, and that a carbon nano tube is formed on a surface of the cathode electrode and the anode electrode is formed on the surface of the cathode electrode.

    Recording medium, recording method, and recorder
    56.
    发明授权
    Recording medium, recording method, and recorder 失效
    记录介质,记录方法和记录仪

    公开(公告)号:US06967803B2

    公开(公告)日:2005-11-22

    申请号:US10478070

    申请日:2003-03-13

    申请人: Osamu Nakamura

    发明人: Osamu Nakamura

    摘要: When the data recording is performed on a magnetic tape in various recording densities, information relating to the recording density (recording-density related information) is recorded in the data recorded on the magnetic tape. Accordingly, recording and reproduction can be properly managed by referring to the recording-density related information, even if data in various recording densities are recorded on the same magnetic tape.Further, when the recording density is altered, the drive apparatus side switches over the recording density in accordance with the quality of recording data. Thus, in the case where the data writing is not possible due to a recording error, the recording density is switched over to a lower recording density to record the data without an error, and therefore a higher flexibility is provided to a data format to be recorded on the magnetic tape.

    摘要翻译: 当以各种记录密度在磁带上进行数据记录时,将与记录密度有关的信息(记录密度相关信息)记录在记录在磁带上的数据中。 因此,即使在同一磁带上记录各种记录密度的数据,也可以通过参考记录密度相关信息适当地管理记录和再现。 此外,当记录密度改变时,驱动装置侧根据记录数据的质量切换记录密度。 因此,在由于记录错误而不能进行数据写入的情况下,将记录密度切换到较低的记录密度以便无误地记录数据,因此对数据格式提供更高的灵活性 记录在磁带上。

    Pressure-type flow rate control apparatus
    57.
    发明授权
    Pressure-type flow rate control apparatus 有权
    压力式流量控制装置

    公开(公告)号:US06964279B2

    公开(公告)日:2005-11-15

    申请号:US10469151

    申请日:2002-11-22

    摘要: A pressure-type flow rate control apparatus controls the flow rate of fluid passing through an orifice to a target flow rate. The flow rate of a compressible fluid under non-critical conditions (sub-sonic) passing through the orifice is calculated by: Qc=KP2m(P1−P2)n so that the flow rate can be controlled to the target flow rate with high precision and speed. Also provided is an improved pressure-type flow rate control apparatus in which a pressure ratio P2/P1=r, obtained from an upstream pressure P1 and a downstream pressure P2 is constantly compared with a critical value r, and under critical conditions (r≦rc), the flow rate is calculated by: Qc=KP1. Under non-critical conditions (r>rc), the flow rate is calculated by Qc=KP2m(P1−P2)n.

    摘要翻译: 压力式流量控制装置将通过孔口的流体的流量控制为目标流量。 通过孔口的非临界条件(亚音)的可压缩流体的流量通过以下公式计算:<?in-line-formula description =“In-line Formulas”end =“lead”?> Qc = KP (P 1→P 2) -formulae description =“在线公式”end =“tail”?>,可以以高精度和高速度将流量控制在目标流量上。 还提供了一种改进的压力型流量控制装置,其中从上游压力P 1获得的压力比P 2 / P 1 / / SUB>和下游压力P 2 2不断与临界值r进行比较,在临界条件(r≤Rc c)下,流量由下式计算: :<?in-line-formula description =“In-line Formulas”end =“lead”?> Qc = KP <1> <?in-line-formula description =“In-line Formulas” end =“tail”?>在非关键条件下(r> r> c ),流量通过Qc = KP 2 / (P 1→P 2)