摘要:
A perpendicular magnetic recording medium has a multilayer recording layer (RL) structure that includes a ferromagnetic intergranular exchange enhancement layer for mediating intergranular exchange coupling in the other ferromagnetic layers in the RL structure. The RL structure may be a multilayer of a first ferromagnetic layer (MAG1) of granular polycrystalline Co alloy with Ta-oxide, a second ferromagnetic layer (MAG2) of granular polycrystalline Co alloy with Si-oxide, and an oxide-free CoCr capping layer on top of and in contact with MAG2 for mediating intergranular exchange coupling in MAG1 and MAG2. The RL structure may also be a multilayer of an intergranular exchange enhancement interlayer (IL) in between two ferromagnetic layers, MAG1 and MAG2, each with reduced or no intergranular exchange coupling. Because the IL is in direct contact with both MAG1 and MAG2, it directly mediates intergranular exchange coupling in each of MAG1 and MAG2.
摘要:
An improved structure for the construction of perpendicular recording media is disclosed. The structure includes a perpendicular recording layer with at least two oxide sublayers or a lower sublayer of a non-oxide. One structure includes an upper sublayer comprised of a Silicon-oxide, while a lower sublayer is comprised of a Tantalum-oxide. The structures provide for increased coercivity and corrosion resistance.
摘要:
A SiON overcoat for use on magnetic media for magnetic recording. The SiON overcoat is deposited by pulsed DC sputtering while applying a negative DC bias. The SiON overcoat is especially useful on perpendicular magnetic recording media because of its ability to deposit thinly and evenly on a rough, granular high coercivity recording media while maintaining excellent corrosion protection properties. A SiON overcoat can be applied less than 3 nm thick while still maintaining excellent mechanical and corrosion protection. The overcoat also has a very high density and water contact angle.
摘要:
A method is provided for planarization of structures which minimizes step heights, reduces process steps, improves cleanliness, and provides increased ease of debond. Structures are placed with working surfaces facing down onto an adhesive layer such that structures remain fixed during heating. A bi-layer encapsulating film is used to achieve planarization. A carrier is bi-laminated with a thermoplastic film layer followed by a chemically inert protective polymer film layer that can withstand etch and cleaning processes. The thermoplastic layer is laminated on top of the carrier; the polymer layer is laminated on top of the joined thermoplastic layer and carrier. The carrier with bi-layer film is then placed onto the backside of the structures to resist chemical attack from the front side during photostrip and enable planarization. When heat is applied, the bi-layer encapsulating film melts and pushes the polymer layer into the gaps between structures thereby achieving complete planarization.
摘要:
A vacuum planarization method substantially improves the surface roughness of a thermally-assisted recording (TAR) disk that has a recording layer (RL) formed of a substantially chemically-ordered FePt alloy or FePt-X alloy (or CoPt alloy or CoPt-X alloy) and a segregant, like SiO2. A first amorphous carbon overcoat (OC1) is deposited on the RL and etched with a non-chemically reactive plasma to remove at least one-half the thickness of OC1. Then a second amorphous carbon overcoat (OC2) is deposited on the etched OC1. The OC2 is then reactive-ion-etched, for example in a H2/Ar plasma, to remove at least one-half the thickness of OC2. A thin third overcoat (OC3) may be deposited on the etched OC2.
摘要:
A vacuum planarization method substantially improves the surface roughness of a thermally-assisted recording (TAR) disk that has a recording layer (RL) formed of a substantially chemically-ordered FePt alloy or FePt-X alloy (or CoPt alloy or CoPt-X alloy) and a segregant, like SiO2. A first amorphous carbon overcoat (OC1) is deposited on the RL and etched with a non-chemically reactive plasma to remove at least one-half the thickness of OC1. Then a second amorphous carbon overcoat (OC2) is deposited on the etched OC1. The OC2 is then reactive-ion-etched, for example in a H2/Ar plasma, to remove at least one-half the thickness of OC2. A thin third overcoat (OC3) may be deposited on the etched OC2.
摘要:
A method of fabricating media comprises forming recording media on a substrate. An overcoat is deposited on the recording media opposite the substrate. The overcoat has a first surface finish. The overcoat is etched to remove material and provide the overcoat with a second surface finish that is smoother than the first surface finish. The depositing and etching may occur sequentially in an in-situ, dry vacuum process. The second surface finish may not be mechanically processed after etching to further planarize the overcoat.
摘要:
A method for planarizing a magnetic recording disk that has surface features of elevated lands and recessed grooves includes forming two coatings of cured perfluorinated polyether (PFPE) polymers over the surface features. The disk may have a protective carbon overcoat with a surface that replicates the topography of lands and grooves. A liquid functionalized-PFPE is applied over the disk surface and then cured to form a first coating with the functionalized end groups bonding to the carbon overcoat. A liquid non-functionalized-PFPE polymer is then applied over the functionalized-PFPE coating and cured to form a second coating. The combined coatings substantially planarize the disk surface so that there is minimal recession between the top of the coating over the lands and the top of the coating over the grooves.
摘要:
In a method of estimating a PSF in the electron-beam lithography process, a linear resist test pattern may be formed on a substrate. A line response function (LRF) may be determined using a cross-sectional profile of the linear resist test pattern. A development rate distribution in a first direction, the first direction may be substantially perpendicular to an extending direction of the linear resist test pattern, may be calculated using the LRF. A line spread function (LSF), which may represent an exposure distribution in the first direction, may be calculated using the development rate distribution. The PSF may be estimated using the LSF.
摘要:
A magnetic storage medium according to one embodiment includes a substrate; a first oxide magnetic layer formed above the substrate; a second oxide magnetic layer formed above the first oxide magnetic layer; an exchange coupling layer formed above the second oxide magnetic layer, the exchange coupling layer comprising an oxide; and a magnetic cap layer formed above the exchange coupling layer. A method according to one embodiment includes forming a high Ku first oxide magnetic layer above a substrate by sputtering; forming a low Ku second oxide magnetic layer above the first oxide magnetic layer by sputtering; forming an exchange coupling layer of CoCrPt-oxide above the second oxide magnetic layer; and forming a magnetic cap layer above the exchange coupling layer. Additional systems and methods are also presented.