公开(公告)号：US20210185803A1

公开(公告)日：2021-06-17

申请号：US16810016

申请日：2020-03-05

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Bin Qin ,  Jintao Peng ,  Yanan Niu ,  Jinyu Ren ,  Fangzhen Zhang ,  Kuanjun Peng

IPC: H05K1/02

Abstract: Embodiments of the present disclosure provide a display substrate, a display device, and a method for manufacturing a display substrate. The display substrate includes: a plurality of bearing parts for supporting display assemblies; and a connecting beam located between two bearing parts and connected to the two bearing parts. The connecting beam includes at least one stretchable portion with a hollow portion provided inside the stretchable portion, so that the stretchable portion is deformable in a first direction and a second direction, and the second direction is perpendicular to the first direction.

公开(公告)号：US10483129B2

公开(公告)日：2019-11-19

申请号：US15717527

申请日：2017-09-27

Applicant: BOE Technology Group Co., Ltd.

Inventor： Jing Feng ,  Seung Jin Choi ,  Fangzhen Zhang ,  Wusheng Li ,  Zhijun Lv ,  Ce Ning ,  Jiushi Wang

IPC: H01L21/4763 ,  H01L21/027 ,  H01L29/66 ,  H01L29/786 ,  G03F7/00 ,  H01L27/12 ,  G03F7/38 ,  G03F7/20 ,  G03F7/40 ,  H01L21/321

Abstract: The disclosure discloses a method for roughening a surface of a metal layer, a thin film transistor, and a method for fabricating the same. The method for roughening the surface of a metal layer includes: forming a first photo-resist layer on the surface of the metal layer, and processing the first photo-resist layer at high temperature; and stripping the first photo-resist layer to roughen the surface of the metal layer.

公开(公告)号：US10217851B2

公开(公告)日：2019-02-26

申请号：US15707827

申请日：2017-09-18

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Jing Niu ,  Shuang Sun ,  Fangzhen Zhang ,  Dongcan Mi

IPC: H01L29/66 ,  H01L21/443 ,  H01L21/4763 ,  H01L29/786 ,  H01L27/12

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

公开(公告)号：US20180299958A1

公开(公告)日：2018-10-18

申请号：US15519582

申请日：2016-10-26

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Long Wang ,  Li Zhou ,  Feng Jiang ,  Fangzhen Zhang ,  Chungchun Lee

IPC: G06F3/01 ,  G06F3/044 ,  H01L41/08

CPC classification number: G06F3/016 ,  G06F3/01 ,  G06F3/044 ,  G06F2203/04105 ,  G06F2203/04107 ,  G06F2203/04111 ,  H01L41/0825 ,  H01L41/1132

Abstract: A touch display device includes a display panel, a processor and a pressure sensing device and a touch feedback device disposed over the display panel. The pressure sensing device is configured to sense a pressure sensing upon an occurrence of touch, such that the pressure signal may be provided to the processor to generate a feedback signal. The touch feedback device is configured to perform a corresponding feedback operation according to the feedback signal.

公开(公告)号：US20180226269A1

公开(公告)日：2018-08-09

申请号：US15717527

申请日：2017-09-27

Applicant: BOE Technology Group Co., Ltd.

Inventor： Jing Feng ,  Seung Jin Choi ,  Fangzhen Zhang ,  Wusheng Li ,  Zhijun Lv ,  Ce Ning ,  Jiushi Wang

IPC: H01L21/4763 ,  H01L21/027 ,  H01L29/66 ,  H01L29/786 ,  H01L27/12 ,  G03F7/38 ,  G03F7/20 ,  G03F7/40 ,  G03F7/00

CPC classification number: H01L21/47635 ,  G03F7/0035 ,  G03F7/20 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274 ,  H01L21/321 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/66969 ,  H01L29/78618 ,  H01L29/7869

Abstract: The disclosure discloses a method for roughening a surface of a metal layer, a thin film transistor, and a method for fabricating the same. The method for roughening the surface of a metal layer includes: forming a first photo-resist layer on the surface of the metal layer, and processing the first photo-resist layer at high temperature; and stripping the first photo-resist layer to roughen the surface of the metal layer.

公开(公告)号：US20180122924A1

公开(公告)日：2018-05-03

申请号：US15707827

申请日：2017-09-18

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Jing Niu ,  Shuang Sun ,  Fangzhen Zhang ,  Dongcan Mi

IPC: H01L29/66 ,  H01L27/12 ,  H01L29/786 ,  H01L21/443 ,  H01L21/4763

CPC classification number: H01L29/66969 ,  H01L21/443 ,  H01L21/47635 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/78618 ,  H01L29/7869

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

公开(公告)号：US20170148820A1

公开(公告)日：2017-05-25

申请号：US15110416

申请日：2015-10-13

Applicant: BOE Technology Group Co., Ltd.

Inventor： Ce Ning ,  Fangzhen Zhang

IPC: H01L27/12 ,  H01L29/786 ,  H01L29/66 ,  H01L21/30 ,  H01L21/768

CPC classification number: H01L27/127 ,  H01L21/28 ,  H01L21/30 ,  H01L21/76895 ,  H01L21/84 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/41733 ,  H01L29/45 ,  H01L29/458 ,  H01L29/4908 ,  H01L29/6675 ,  H01L29/66969 ,  H01L29/78663 ,  H01L29/78672 ,  H01L29/78684

Abstract: The present disclosure provides an array substrate and a method of manufacturing the same and a display apparatus in which the array substrate is applied. In one embodiment, the method of manufacturing an array substrate at least includes the steps of: forming a first electrode layer, a metal gate layer and a first layer of non-oxide insulation material, the first layer of non-oxide insulation material being formed on an upper surface of the metal gate layer; forming, by using one patterning process, a pattern including a first electrode and a gate such that, after completion of the patterning process, a first non-oxide insulation layer is further formed on the gate and a first sub-electrode belonging to the first electrode layer is further formed below the gate. This method of manufacturing the array substrate is simple, which facilitates mass production of the array substrate as well as the display apparatus.

公开(公告)号：US09633899B2

公开(公告)日：2017-04-25

申请号：US14513324

申请日：2014-10-14

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shi Shu ,  Zhijun Lv ,  Jingxia Gu ,  Yue Shi ,  Fangzhen Zhang ,  Bing Sun ,  Chuanxiang Xu

IPC: H01L21/768 ,  H01L21/3205 ,  H01L23/498 ,  H05K3/06 ,  H01L21/308

CPC classification number: H01L21/76892 ,  H01L21/3081 ,  H01L21/32055 ,  H01L23/49877 ,  H01L2924/0002 ,  H05K3/064 ,  H05K2201/0108 ,  H05K2201/0323 ,  H05K2201/10128 ,  H01L2924/00

Abstract: The invention provides a method for patterning a graphene layer and a method for manufacturing a display substrate. The method for patterning a graphene layer comprises: forming an isolation layer on a graphene layer; forming a photoresist layer on the isolation layer; patterning the photoresist layer; etching the isolation layer according to the patterned photoresist layer to form a patterned isolation layer; etching the graphene layer according to the patterned photoresist layer to form a patterned graphene layer; and removing the patterned isolation layer. In the method of the invention, the unfavorable condition of the prior art may be avoided that a graphene film sloughs off or a photoresist remains on a graphene film when a photoresist material is peeled off, and the product yield can be improved in the case that the production cost is controlled.

公开(公告)号：US09627421B2

公开(公告)日：2017-04-18

申请号：US14443474

申请日：2014-10-01

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun ,  Seungjin Choi ,  Jing Niu ,  Fangzhen Zhang

IPC: H01L27/12 ,  H01L27/32 ,  G02F1/1343 ,  H01L21/77 ,  G02F1/1333 ,  G02F1/1368 ,  H01L29/786 ,  G02F1/1362

CPC classification number: H01L27/1288 ,  G02F1/133345 ,  G02F1/134309 ,  G02F1/13439 ,  G02F1/136227 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136236 ,  G02F2001/13625 ,  G02F2001/136295 ,  H01L21/77 ,  H01L27/12 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/127 ,  H01L27/32 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/4908 ,  H01L29/78642 ,  H01L29/7869 ,  H01L29/78696

Abstract: An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode (8), including a first portion (b) in a non-display region and a second portion (a) in a display region; a first electrode (6) formed on the first portion (b) of the pixel electrode (8); a passivation layer (9) formed on the pixel electrode (8) and the first electrode (6), the passivation layer (9) includes a via hole (11) located over the first electrode (6); an active layer (4) and a second electrode (7) that are formed on the passivation layer (9), the active layer (4) being connected to the first electrode (6) through the via hole (11) of the passivation layer (9). With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, materials of the electrodes are less subjected to corrosion, and quality of the array substrate is enhanced.

公开(公告)号：US09543443B2

公开(公告)日：2017-01-10

申请号：US14777666

申请日：2015-02-27

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun ,  Fangzhen Zhang ,  Jing Niu ,  Zhijun Lv

IPC: H01L29/786 ,  H01L27/12 ,  H01L29/417

CPC classification number: H01L29/78675 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/41733 ,  H01L29/66757 ,  H01L29/78633 ,  H01L29/78696

Abstract: The present disclosure discloses a thin film transistor assembly, an array substrate and a method of manufacturing the same, and a display device including the array substrate. The array substrate includes a substrate; a plurality of thin film transistors formed on the substrate; and a plurality of light shielding layers, each of the light shielding layers being arranged between a source electrode and a drain electrode of the thin film transistor and configured to block light from the exterior from illuminating an active layer of the thin film transistor. The light shielding layer and the source electrode and the drain electrode of the thin film transistor are formed in the same layer on the substrate. As the light shielding layer, the source electrode and the drain electrode of the thin film transistor and a data line may be formed on the substrate by using the same material layer through a single patterning process, times of performing patterning processes and the number of masks used may be reduced and thus manufacturing process and cost of the array substrate may be decreased.

Abstract translation: 本公开公开了一种薄膜晶体管组件，阵列基板及其制造方法，以及包括阵列基板的显示装置。 阵列基板包括基板; 形成在所述基板上的多个薄膜晶体管; 和多个遮光层，每个遮光层设置在薄膜晶体管的源电极和漏电极之间，并被构造成阻挡来自外部的光照射薄膜晶体管的有源层。 薄膜晶体管的遮光层和源电极以及漏极形成在基板上的同一层中。 作为遮光层，可以通过使用相同的材​​料层，通过单一的图案化工艺，进行图案化处理的次数和掩模的数量，在基板上形成薄膜晶体管的源电极和漏电极以及数据线 可以减少使用，因此阵列基板的制造工艺和成本可能降低。