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    Method of purging photoresist from semiconductor wafer coating apparatus
    42.
    发明授权
    Method of purging photoresist from semiconductor wafer coating apparatus 失效
    从半导体晶片涂布装置中清除光致抗蚀剂的方法

    公开(公告)号：US07144601B2

    公开(公告)日：2006-12-05

    申请号：US11103536

    申请日：2005-04-12

    Applicant: Kwang-Ho Lee ,  Jung-Hong Kim ,  Jong-Hwa Lee

    Inventor： Kwang-Ho Lee ,  Jung-Hong Kim ,  Jong-Hwa Lee

    IPC: B05D5/00

    CPC classification number: H01L21/67253 ,  H01L21/6715

    Abstract: The purging of photoresist from a supply device of semiconductor coating equipment is automatically executed in a controlled manner. The equipment employs a plurality of photoresist bottles for storing the same kind of photoresist. A plurality of supply pipes are respectively connected to the photoresist bottles, respectively. A valve system selectively opens and closes the supply pipes in response to control signals generated by a main controller. A dispense pump forces the photoresist in the open supply pipe through a nozzle. A purge start button issues a purge start command signal to the controller when the button is pressed. The controller then controls the valve system and the dispense pump so as to automatically purge the photoresist according to a sequence effected using a timer.

    Abstract translation: 从半导体涂布设备的供给装置中清除光致抗蚀剂以受控的方式自动执行。 该设备采用多个光致抗蚀剂瓶来存储相同类型的光致抗蚀剂。 分别将多个供给管连接到光致抗蚀剂瓶。 阀系统响应于由主控制器产生的控制信号选择性地打开和关闭供应管。 分配泵通过喷嘴迫使打开的供应管中的光致抗蚀剂。 当按下按钮时，清除启动按钮会向控制器发出清除启动命令信号。 然后，控制器控制阀系统和分配泵，以便根据使用计时器执行的顺序自动清除光致抗蚀剂。

    Photoresist purge control of semiconductor wafer coating equipment
    44.
    发明申请
    Photoresist purge control of semiconductor wafer coating equipment 失效
    半导体晶片涂层设备的光电阻清除控制

    公开(公告)号：US20050175787A1

    公开(公告)日：2005-08-11

    申请号：US11103536

    申请日：2005-04-12

    Applicant: Kwang-Ho Lee ,  Jung-Hong Kim ,  Jong-Hwa Lee

    Inventor： Kwang-Ho Lee ,  Jung-Hong Kim ,  Jong-Hwa Lee

    IPC: G03F7/16 ,  B05C11/10 ,  H01L21/00 ,  H01L21/027 ,  B05D7/00

    CPC classification number: H01L21/67253 ,  H01L21/6715

    Abstract: The purging of photoresist from a supply device of semiconductor coating equipment is automatically executed in a controlled manner. The equipment employs a plurality of photoresist bottles for storing the same kind of photoresist. A plurality of supply pipes are respectively connected to the photoresist bottles, respectively. A valve system selectively opens and closes the supply pipes in response to control signals generated by a main controller. A dispense pump forces the photoresist in the open supply pipe through a nozzle. A purge start button issues a purge start command signal to the controller when the button is pressed. The controller then controls the valve system and the dispense pump so as to automatically purge the photoresist according to a sequence effected using a timer.

    Abstract translation: 从半导体涂布设备的供给装置中清除光致抗蚀剂以受控的方式自动执行。 该设备采用多个光致抗蚀剂瓶来存储相同类型的光致抗蚀剂。 分别将多个供给管连接到光致抗蚀剂瓶。 阀系统响应于由主控制器产生的控制信号选择性地打开和关闭供应管。 分配泵通过喷嘴迫使打开的供应管中的光致抗蚀剂。 当按下按钮时，清除启动按钮会向控制器发出清除启动命令信号。 然后，控制器控制阀系统和分配泵，以便根据使用计时器执行的顺序自动清除光致抗蚀剂。

    Semiconductor factory automation system and method for transporting semiconductor wafers
    45.
    发明授权
    Semiconductor factory automation system and method for transporting semiconductor wafers 失效
    半导体工厂自动化系统和半导体晶圆传输方法

    公开(公告)号：US06516238B1

    公开(公告)日：2003-02-04

    申请号：US09576418

    申请日：2000-05-22

    Applicant: Jin-Sun Kim ,  Moon-Gi Kim ,  Chang-Kee Hong ,  Tae-Ho Lee ,  Won-Soo Cho ,  Yung-Hwan Chae ,  Woo-Kyu Lee ,  Jong-Mo Ahn ,  Kwang-Ho Lee

    Inventor： Jin-Sun Kim ,  Moon-Gi Kim ,  Chang-Kee Hong ,  Tae-Ho Lee ,  Won-Soo Cho ,  Yung-Hwan Chae ,  Woo-Kyu Lee ,  Jong-Mo Ahn ,  Kwang-Ho Lee

    IPC: G06F1900

    CPC classification number: G05B19/41895 ,  G05B2219/31002 ,  G05B2219/31013 ,  G05B2219/31086 ,  G05B2219/32277 ,  Y02P90/18 ,  Y02P90/285 ,  Y02P90/60

    Abstract: A method for transporting semiconductor wafers in semiconductor factory automation system, includes the steps of: a) processing a lot of semiconductor wafers to be contained in a semiconductor wafer cassette in a process equipment; b) sending a cassette transportation request from the process equipment to a cell management server when the process equipment has processed the lot of semiconductor wafers; c) generating a transportation instruction in response to the cassette transportation request; and d) if the semiconductor wafer cassette is transported from the process equipment to a stocker by an automatic guide vehicle (AGV), simultaneously activating the AGV and the stocker by simultaneously sending the transportation instruction to the AGV and the stocker. The method in accordance with the present invention can reduce a time taken to transport the semiconductor wafers.

    Abstract translation: 一种在半导体工厂自动化系统中传送半导体晶片的方法，包括以下步骤：a）处理要包含在处理设备中的半导体晶片盒中的许多半导体晶片; b）当处理设备处理了许多半导体晶片时，将处理设备的盒式磁带运送请求发送到单元管理服务器; c）响应于盒运输请求产生运输指令; 以及d）如果通过自动导向车辆（AGV）将半导体晶片盒从处理设备运送到储盘器，则同时通过向AGV和储料器发送运输指令来激活AGV和储料器。 根据本发明的方法可以减少运输半导体晶片所花费的时间。

    Process for preparing an instant rice nectar
    47.
    发明授权
    Process for preparing an instant rice nectar 失效
    制备即食米花蜜的方法

    公开(公告)号：US5804232A

    公开(公告)日：1998-09-08

    申请号：US536220

    申请日：1995-09-29

    Applicant: Jung-Man Kim ,  Bong-Jae Lee ,  Joung-Yeoul Lee ,  Sang-Hwan Han ,  Kwang-Ho Lee

    Inventor： Jung-Man Kim ,  Bong-Jae Lee ,  Joung-Yeoul Lee ,  Sang-Hwan Han ,  Kwang-Ho Lee

    IPC: A23L2/38 ,  A23L2/56 ,  A23L7/104 ,  A23L7/25 ,  A23L1/105 ,  A23L1/186

    CPC classification number: A23L2/38 ,  A23L2/56 ,  A23L7/107 ,  A23L7/25

    Abstract: The present invention relates to a process for preparing an instant rice nectar which can be preserved for long time. The instant rice nectar of the invention is prepared by the process which comprises the steps of: adding water to malt while stirring, filtrating to obtain malt extract, adding starch hydrolase to the malt extract and saccharifying, heating and chilling, filtering, and adding sugar to the filtrate so that the total sugar content reaches Brix 32 to 68; steeping nonglutinous rice in water and boiling, adding 1 to 3 times of water by weight and starch hydrolase to the resulting nectaring rice, and saccharifying; diluting the malt extract with water saccharified nectaring rice to the resulting mixture, and filling up a container with rice nectar thus produced and sealing; and, putting the container filled with the rice nectar in a retort chamber and sterilizing. The present invention provides a novel process for preparing an instant rice nectar in a massive manner, in which the process is greatly simplified by raising the efficiency of saccharifying malt extract and nectaring rice. The instant rice nectar of the invention can be preserved for a long time, while maintaining its own delicious taste and characteristic flavor.

    Abstract translation: 本发明涉及一种可以长时间保存的即食米花蜜的制备方法。 本发明的即时米花蜜通过包括以下步骤的方法制备：在搅拌下加入麦芽，过滤得到麦芽提取物，向麦芽提取物中加入淀粉水解酶，糖化，加热和冷却，过滤并加入糖 使滤液中的总糖含量达到Brix 32至68; 在水中煮沸，煮沸，加水1〜3倍，淀粉水解酶加入到所得的米饭中，糖化; 用水糖化米饭将麦芽提取物稀释至所得混合物，并用如此生产和密封的水稻花蜜填充容器; 将装有米花蜜的容器放入蒸煮室中并进行灭菌。 本发明提供了一种大规模制备即食米花蜜的新方法，其中通过提高糖化麦芽提取物和水稻的效率大大简化了该方法。 本发明的即时米花蜜可以长时间保存，同时保持其自己的美味和特征风味。

    METHOD FOR FORMING MICROSTRUCTURE PATTERN BASED ON SOLUTION PROCESS
    50.
    发明申请
    METHOD FOR FORMING MICROSTRUCTURE PATTERN BASED ON SOLUTION PROCESS 审中-公开
    基于解决方案形成微结构模式的方法

    公开(公告)号：US20130040070A1

    公开(公告)日：2013-02-14

    申请号：US13325711

    申请日：2011-12-14

    Applicant: Gun Young JUNG ,  Kwang-Ho LEE

    Inventor： Gun Young JUNG ,  Kwang-Ho LEE

    IPC: C08J7/18

    CPC classification number: G03F7/0002

    Abstract: Disclosed is a method for forming a microstructure pattern based on a solution process. The method includes the steps of forming a photoresist pattern on a hydrophilic substrate; forming a self-assembled monolayer on the hydrophilic substrate formed thereon with the photoresist pattern; forming a self-assembled monolayer pattern by removing the photoresist pattern; coating a dewetting solution on the hydrophilic substrate formed thereon with the self-assembled monolayer pattern such that the dewetting solution is coated only on a hydrophilic surface of the hydrophilic substrate exposed through the self-assembled monolayer pattern by primary dewetting; and drying the dewetting solution coated on the hydrophilic surface of the hydrophilic substrate and allowing the dewetting solution to be hardened after flowing to an edge of the dewetting solution by secondary dewetting such that only a solute of the dewetting solution remains.

    Abstract translation: 公开了一种基于溶液法形成微结构图案的方法。 该方法包括在亲水基底上形成光刻胶图案的步骤; 在其上形成有光致抗蚀剂图案的亲水性衬底上形成自组装单层; 通过去除光致抗蚀剂图案形成自组装单层图案; 在其上形成的亲水性基材上涂布去湿溶液，其上具有自组装单层图案，使得仅在通过初步除湿通过自组装单层图案曝光的亲水基底的亲水表面上涂布去湿溶液; 并干燥涂布在亲水基材的亲水表面上的去湿溶液，并且在通过二次除湿流动到去湿溶液的边缘之后使得去湿溶液硬化，使得只剩下去湿溶液的溶质。

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