公开(公告)号：US20210090842A1

公开(公告)日：2021-03-25

申请号：US17027291

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yoshihiro KOYAMA ,  Tatsuya ASAHATA ,  Masahiro KIYOHARA ,  Tsunghan YANG

IPC: H01J37/08 ,  H01J37/09

Abstract: A liquid metal ion source (50) includes: a reservoir (10) configured to hold an ion material (M) forming a liquid metal; a needle electrode (20); an extraction electrode (22) configured to cause an ion of the ion material to be emitted from a distal end of the needle electrode; a beam diaphragm (24), which is arranged on a downstream side of the extraction electrode, and is configured to limit a beam diameter of the ion; and a vacuum chamber (30) configured to accommodate and hold the reservoir, the needle electrode, the extraction electrode, and the beam diaphragm in vacuum, wherein the liquid metal ion source further includes an oxidizing gas introducing portion (40), and wherein the oxidizing gas introducing portion communicates to the vacuum chamber, and is configured to introduce an oxidizing gas into a periphery of the needle electrode.

公开(公告)号：US10957512B1

公开(公告)日：2021-03-23

申请号：US16582249

申请日：2019-09-25

Applicant: APPLIED Materials, Inc.

Inventor： Morgan Evans ,  Charles T. Carlson ,  Rutger Meyer Timmerman Thijssen ,  Ross Bandy

IPC: H01J37/09 ,  H01J37/305

Abstract: A carrier proximity mask and methods of assembling and using the carrier proximity mask may include providing a first carrier body, second carrier body, and set of one or more clamps. The first carrier body may have one or more openings formed as proximity masks to form structures on a first side of a substrate. The first and second carrier bodies may have one or more contact areas to align with one or more contact areas on a first and second sides of the substrate. The set of one or more clamps may clamp the substrate between the first carrier body and the second carrier body at contact areas to suspend work areas of the substrate between the first and second carrier bodies. The openings to define edges to convolve beams to form structures on the substrate.

公开(公告)号：US10903039B2

公开(公告)日：2021-01-26

申请号：US15740077

申请日：2017-09-05

Applicant: Focus-eBeam Technology (Beijing) Co., Ltd.

Inventor： Wei He ,  Shuai Li ,  Peng Wang

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/244 ,  H01J37/28

Abstract: A vacuum condition processing apparatus is provided, the top of which is connected to an external charged particle beam generating device, and the apparatus includes: a suction cup in contact with the specimen to be observed or the stage holding the specimen, a first gas controlling device connected to an external gas supplying system, and a second gas controlling device connected to an external pumping system; a window is deployed at the top of the apparatus, through which the particle beam can go into the apparatus; the first gas controlling device is arranged to connect the gas supplying system and the suction cup; the second gas controlling device is arranged to connect the gas pumping system and the suction cup. Also disclosed is a specimen observation system and method.

公开(公告)号：US10886103B2

公开(公告)日：2021-01-05

申请号：US16432009

申请日：2019-06-05

Applicant: NuFlare Technology, Inc.

Inventor： Kei Hasegawa ,  Yoshiaki Onimaru ,  Hayato Kimura

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/20 ,  H01J37/302 ,  H01J37/04 ,  H01J37/09

Abstract: In one embodiment, a data processing method is for processing data in a writing apparatus performing multiple writing by using multiple beams. The data is for controlling an irradiation amount for each beam. The method includes generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation position, and the plurality of layers corresponding to writing paths in multiple writing, performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each layer, calculating a sum of the irradiation amounts for the respective irradiation positions defined in the corrected irradiation amount data, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process based on the comparison result.

公开(公告)号：US10832886B2

公开(公告)日：2020-11-10

申请号：US16291090

申请日：2019-03-04

Applicant: Hitachi High-Tech Corporation

Inventor： Akira Ikegami ,  Yuta Kawamoto ,  Naomasa Suzuki ,  Manabu Yano ,  Yasushi Ebizuka ,  Naoma Ban

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

公开(公告)号：US20200343073A1

公开(公告)日：2020-10-29

申请号：US16835369

申请日：2020-03-31

Applicant: NuFlare Technology, Inc.

Inventor： Mitsuhiro OKAZAWA ,  Hirofumi MORITA

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/04 ,  H01J37/12

Abstract: Provided is a multi charged particle beam writing apparatus including: an emission unit emitting a charged particle beam; a restriction aperture unit having a first opening having a variable opening area, the restriction aperture unit shielding a portion of the charged particle beam; a shaping aperture array substrate having a plurality of second openings, the shaping aperture array substrate forming multiple beams by allowing the shaping aperture array substrate to be irradiated with the charged particle beam passing through the first opening and allowing a portion of the charged particle beam to pass through the plurality of second openings; and a blanking aperture array substrate having a plurality of third openings, each beam of the multiple beams passing through the plurality of third openings, the blanking aperture array substrate being capable of independently deflecting each beam of the multiple beams.

公开(公告)号：US10796878B2

公开(公告)日：2020-10-06

申请号：US16583183

申请日：2019-09-25

Applicant: VALUE ENGINEERING, LTD.

Inventor： Kyou Tae Hwang

IPC: H01J37/147 ,  H01L21/265 ,  H01J27/02 ,  H01J5/10 ,  H01J37/08 ,  H01J37/09 ,  H01J37/317

Abstract: Provided are elements for an ion implanter and an ion generating device including the same. The elements include a repeller, a cathode, a chamber wall, and a slit member constituting an arc chamber of an ion generating device for ion implantation used in the fabrication of a semiconductor device. A coating structure including a semicarbide layer is provided to each of the elements in order to stabilize the element against thermal deformation, protect the element from wear, and prevent a deposition product from being peeled off. The coating structure enables precise ion implantation without a change in the position of ion generation or distortion of the equipment. The coating structure allows electrons to be uniformly reflected into the arc chamber to increase the uniformity of plasma, resulting in an improvement in the dissociation efficiency of an ion source gas. The coating structure significantly improves the service life of the element compared to those of existing elements. Also provided are ion generating devices including the elements.

公开(公告)号：US20200234910A1

公开(公告)日：2020-07-23

申请号：US16415255

申请日：2019-05-17

Applicant: APPLIED Materials, Inc.

Inventor： Julian G. Blake ,  Frank Sinclair

IPC: H01J37/09 ,  H01J37/317

Abstract: An ion implanter. The ion implanter may include a beamline, the beamline defining an inner wall, surrounding a cavity, the cavity arranged to conduct an ion beam. The ion implanter may also include a low emission insert, disposed on the inner wall, and further comprising a 12C layer, the 12C layer having an outer surface, facing the cavity.

公开(公告)号：US10600613B2

公开(公告)日：2020-03-24

申请号：US16196081

申请日：2018-11-20

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke

IPC: H01J37/10 ,  H01J37/09 ,  H01J37/12 ,  H01J37/28 ,  H01J37/26 ,  H01J37/24

Abstract: Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams 3 and feed adjustable excitations to the field generators.

公开(公告)号：US10600612B2

公开(公告)日：2020-03-24

申请号：US15936140

申请日：2018-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Toshiyuki Iwahori

IPC: H01J37/09 ,  H01J37/08 ,  H01J37/20 ,  H01J37/26

Abstract: A charged particle beam apparatus includes a sample chamber; a sample stage; an electron beam column irradiating a sample S using an electron beam; and a focused ion beam column irradiating the sample S using a focused ion beam. The apparatus includes an electrode member displaceable between an insertion position between a beam emitting end portion of the electron beam column and the sample stage and a withdrawal position distant from the insertion position, the electrode member being provided with an electrode penetrating hole passing the electron beam therethrough. The apparatus includes a driving unit displacing the electrode member; a power source applying a negative voltage to the electrode member; and an insulation member electrically insulating the sample chamber the driving unit from the electrode member.