公开(公告)号：US09673018B2

公开(公告)日：2017-06-06

申请号：US15145398

申请日：2016-05-03

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki Nomura

IPC: H01J37/10 ,  H01J37/14 ,  H01J37/317 ,  H01J37/063 ,  H01J37/09

CPC classification number: H01J37/14 ,  H01J37/063 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0653

Abstract: A charged particle beam writing apparatus includes a limiting aperture member at the downstream side of the emission source, arranged such that its height position can be selectively adjusted, according to condition, to be one of the n-th height position (n being an integer of 1 or more) based on the n-th condition depending on at least one of the height position of the emission source and an emission current value, and the (n+m)th height position (m being an integer of 1 or more) based on the (n+m)th condition depending on at least one of the height position of the emission source and the emission current value, and a shaping aperture member at the downstream side of the electron lens and the limiting aperture member to shape the charged particle beam by letting a part of the charged particle beam pass through a second opening.

公开(公告)号：US20140273536A1

公开(公告)日：2014-09-18

申请号：US14193182

申请日：2014-02-28

Applicant: NuFlare Technology, Inc.

Inventor： Tetsuro NISHIYAMA

IPC: H01J37/317 ,  H01L21/263

CPC classification number: H01J37/3174 ,  H01J37/09 ,  H01J2237/022 ,  H01J2237/0451 ,  H01L21/2636

Abstract: A charged particle beam writing apparatus according to an embodiment includes: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; an aperture beam tube being provided on a surface of the aperture and functioning as a thermally conductive member having thermal conductivity; and a heater provided on a surface of the aperture beam tube and configured to supply heat to the aperture via the aperture beam tube.

Abstract translation: 根据实施例的带电粒子束写入装置包括：被配置为发射带电粒子束的射束发射器; 具有开口部分的孔，由射束发射器发射的带电粒子束通过该开口部分; 孔径管设置在孔的表面上并用作具有导热性的导热构件; 以及加热器，其设置在所述孔径光束管的表面上并且经配置以经由所述孔径管向所述孔提供热量。

公开(公告)号：US07598499B2

公开(公告)日：2009-10-06

申请号：US11978661

申请日：2007-10-30

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0835

Abstract: In a particle-beam projection processing apparatus a target (41) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system (103) to image a pattern presented in a pattern definition means (102) onto the target (41) held at position by means of a target stage; no elements—other than the target itself—obstruct the path of the beam after the optical elements of the projection system. In order to reduce contaminations from the target space into the projection system, a protective diaphragm (15) is provided between the projection system and the target stage, having a central aperture surrounding the path of the patterned beam, wherein at least the portions of the diaphragm defining the central aperture are located within a field-free space after the projection system (103).

Abstract translation: 在粒子束投影处理装置中，使用投影系统（103）将图案定义装置（102）中呈现的图案成像到图像定义装置（102）的图像上，借助于能量带电粒子束（pb）照射目标（41） 目标（41）通过目标阶段保持在位置; 没有元件 - 除了目标本身 - 在投影系统的光学元件之后阻挡光束的路径。 为了减少从目标空间到投影系统的污染，在投影系统和目标台之间提供保护膜片（15），其具有围绕图案化梁的路径的中心孔，其中至少部分 限定中心孔的光阑在投影系统（103）之后位于无场空间内。

公开(公告)号：US20090159797A1

公开(公告)日：2009-06-25

申请号：US12330128

申请日：2008-12-08

Applicant: Kurio Fukushima

Inventor： Kurio Fukushima

IPC: G01N23/00

CPC classification number: H01J37/18 ,  H01J37/09 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/0451 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/206 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2605 ,  H01J2237/2614

Abstract: An apparatus which permits high-angle annular dark-field (HAADF) imaging comprises an electron gun, a specimen chamber in which a specimen is set, a gas cylinder for supplying environmental gas around the surface of the specimen through both a gas flow rate controller and a gas nozzle, a vacuum pump for evacuating the inside of the specimen chamber, an objective lens including upper and lower polepieces, a detector for detecting electrons transmitted through the specimen, a display device for displaying a transmission image of the specimen, orifice plates having minute holes, holders supporting the orifice plates, a drive mechanism for driving the holders, and a motion controller. The orifice plates can be moved in a direction crossing the optical axis of the beam on the upper and lower surfaces of the upper and lower polepieces of the objective lens.

Abstract translation: 允许高角度环形暗场（HAADF）成像的装置包括电子枪，其中设置有样本的样本室，用于通过气体流量控制器通过样品的表面周围提供环境气体的气瓶 以及气体喷嘴，用于抽空试样室内部的真空泵，包括上下杆的物镜，用于检测通过试样的电子的检测器，用于显示试样的透射图像的显示装置，孔板 具有微孔，支撑孔板的支架，用于驱动保持器的驱动机构和运动控制器。 孔板可以在与物镜的上下极的上表面和下表面上的光束的光轴交叉的方向上移动。

公开(公告)号：US20080099693A1

公开(公告)日：2008-05-01

申请号：US11978661

申请日：2007-10-30

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21K5/04

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0835

Abstract: In a particle-beam projection processing apparatus a target (41) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system (103) to image a pattern presented in a pattern definition means (102) onto the target (41) held at position by means of a target stage; no elements—other than the target itself—obstruct the path of the beam after the optical elements of the projection system. In order to reduce contaminations from the target space into the projection system, a protective diaphragm (15) is provided between the projection system and the target stage, having a central aperture surrounding the path of the patterned beam, wherein at least the portions of the diaphragm defining the central aperture are located within a field-free space after the projection system (103).

Abstract translation: 在粒子束投影处理装置中，使用投影系统（103）将图案定义装置（102）中呈现的图案成像到图像定义装置（102）的图像上，借助于能量带电粒子束（pb）照射目标（41） 目标（41）通过目标阶段保持在位置; 没有元件 - 除了目标本身 - 在投影系统的光学元件之后阻挡光束的路径。 为了减少从目标空间到投影系统的污染，在投影系统和目标台之间提供保护膜片（15），其具有围绕图案化梁的路径的中心孔，其中至少部分 限定中心孔的光阑在投影系统（103）之后位于无场空间内。

公开(公告)号：US20080061246A1

公开(公告)日：2008-03-13

申请号：US11628196

申请日：2005-05-13

Applicant: Tao Zhang

Inventor： Tao Zhang

IPC: H01J3/26

CPC classification number: G21K1/087 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1472 ,  H01J37/15 ,  H01J2237/028 ,  H01J2237/0451 ,  H01J2237/3175

Abstract: A beam blanking unit (1) comprises first and second blanking plates (2, 3) mounted to a support plate (15). A stopper (4) is mechanically and electrically connected to the first blanking plate (2).

Abstract translation: 光束消隐单元（1）包括安装到支撑板（15）的第一和第二消隐板（2,3）。 制动器（4）机械地和电连接到第一冲裁板（2）。

公开(公告)号：US5180919A

公开(公告)日：1993-01-19

申请号：US761454

申请日：1991-09-18

Applicant: Yoshihisa Oae ,  Kiichi Sakamoto ,  Hiroshi Yasuda

Inventor： Yoshihisa Oae ,  Kiichi Sakamoto ,  Hiroshi Yasuda

IPC: H01J37/304 ,  H01J37/317

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/0451 ,  H01J2237/30455 ,  H01J2237/31776

Abstract: An electron beam exposure system having a capability of checking a pattern to be written on an object comprises an electron beam source for producing an electron beam along an optical axis toward the object, a block mask provided on the optical axis and having selectable aperture patterns therein for correspondingly shaping the electron beam, an addressing deflector fixture for selectively passing the electron beam through a desired aperture on the block mask, an electron optical system for focusing the electron beam shaped by the block mask on the object such that an image of the aperture of the block mask is projected on the object, a screen provided along the optical axis between the block mask and the object for interrupting the electron beam when the electron beam is offset from the alignment with the optical axis, the screen having a through-hole in alignment with the optical axis for passing the electron beam therethrough a controller for controlling the electron optical system such that an image of the aperture of the beam shaping means through which the electron beam has passed is projected on the screen when checking the pattern of the apertures on the block mask, and a detection unit for detecting the image of the aperture that is projected on the screen.

Abstract translation: 具有检查要写在物体上的图案的能力的电子束曝光系统包括用于沿着光轴向物体产生电子束的电子束源，设置在光轴上并具有可选孔径图案的块掩模 为了对应地形成电子束，用于选择性地使电子束通过块掩模上的所需孔的寻址偏转器固定装置，用于将由掩模掩模形成的电子束聚焦在物体上的电子光学系统，使得孔径的图像 块屏蔽物投影在物体上，当电子束偏离与光轴对准时，沿着光轴设置在屏蔽掩模和物体之间的屏幕，用于中断电子束，屏幕具有通孔 与用于使电子束通过的光轴对准用于控制电子光学系统的控制器 使得当检查块掩模上的孔的图案时，电子束已经通过的光束整形装置的孔径的图像被投影在屏幕上;以及检测单元，用于检测投影的光圈的图像 屏幕上。