Device for testing components of transparent material for surface
irregularities and occlusions
    31.
    发明授权
    Device for testing components of transparent material for surface irregularities and occlusions 失效
    用于测试表面不规则和闭塞的透明材料的部件的装置

    公开(公告)号:US4815844A

    公开(公告)日:1989-03-28

    申请号:US62183

    申请日:1987-06-15

    Abstract: A device for testing components of transparent material for surface irregularities and occlusions which comprises a mechanism for rotatably mounting the component so that the component may be rotated on its axis; a mechanism for generating a light ray which moves linearly so that the light ray can dot-scan the component along a diameter of the component; at least one signal generating device disposed at a predetermined angle to the direction of impingement of the light ray for detecting surface irregularities and occlusions of the component and then generating a signal representative of the irregularity or occlusion; and a signal evaluation device for evaluating the signals produced in the signal generating device. The signal generating device comprises an image forming optical system; an interchangeable mask disposed at the focal plane of the image forming optical system for selecting the image of a plane of the component; and a receiver for receiving the light rays passing the mask and generating a signal representative of the light rays received.

    Abstract translation: 用于测试用于表面不规则和闭塞的透明材料的部件的装置,其包括用于可旋转地安装所述部件的机构,使得所述部件可以在其轴线上旋转; 用于产生线性移动的光线的机构,使得光线可以沿着部件的直径对部件进行点扫描; 至少一个信号产生装置,以与所述光线的冲击方向成预定角度设置,用于检测所述部件的表面不规则和闭塞,然后产生表示不规则性或闭塞的信号; 以及用于评估信号产生装置中产生的信号的信号评估装置。 信号发生装置包括成像光学系统; 设置在所述图像形成光学系统的焦平面处的可互换掩模,用于选择所述部件的平面的图像; 以及接收器,用于接收通过掩模的光线并产生表示所接收的光线的信号。

    Detecting irregularities in a coating on a substrate
    32.
    发明授权
    Detecting irregularities in a coating on a substrate 失效
    检测基材上涂层的不规则性

    公开(公告)号:US4469442A

    公开(公告)日:1984-09-04

    申请号:US338384

    申请日:1982-01-11

    CPC classification number: G01N21/88 G01N2021/8427 G01N21/21 G01N2201/1045

    Abstract: Irregularities in a coating on a substrate in which the coating includes optical scattering centers can be detected by irradiating the coating with polarized light and examining light from the coating through a filter which removes light having the same polarization as the initial beam. Light scattered by the optical scattering centers is transmitted through the filter, while specularly reflected light from the top surface of the coating, from the substrate exposed by gaps in the coating, or reflected by alien material on the coating is filtered out. As a result irregularities can be detected as intensity minima of the transmitted radiation.

    Abstract translation: 可以通过用偏振光照射涂层来检测其中涂层包括光散射中心的基底上的涂层中的不规则性,并通过滤光器检查来自涂层的光,该滤光器去除具有与初始光束相同的偏振光。 由光散射中心散射的光通过滤光片传播,而从涂层顶表面,从涂层中间隙暴露的基底或涂层外的异物材料反射的镜面反射光被过滤掉。 因此,可以将不规则性检测为发射辐射的强度最小值。

    MULTI-SPECTRAL MICROPARTICLE-FLUORESCENCE PHOTON CYTOMETRY
    34.
    发明申请
    MULTI-SPECTRAL MICROPARTICLE-FLUORESCENCE PHOTON CYTOMETRY 审中-公开
    多光谱微波荧光光度计

    公开(公告)号:US20170059485A1

    公开(公告)日:2017-03-02

    申请号:US15250136

    申请日:2016-08-29

    Applicant: CAPTL LLC

    Abstract: A measurement system includes a system for causing relative motion between a sample and an irradiation spot. The sample includes fluorescent markers having respective wavelengths. A gating system provides a gating signal based at least in part on resultant light substantially at an irradiation wavelength. A detection system detects fluorescent light from the irradiated markers and provides detection signals representing the fluorescent light detected concurrently with a gate-open signal. In some examples, the detection system detects fluorescent light at multiple wavelengths and provides respective detection signals. A spectral discriminator arranged optically between the sample and the detection system receives the fluorescent light from the sample and provides respective fluorescent light at the wavelengths to the detection system. A flow cytometer can spectrally disperse resultant fluorescent light and measure the wavelengths separately. Light from a sample disposed over a reflective phase grating can be dispersed, measured, and gated.

    Abstract translation: 测量系统包括用于引起样品和照射点之间的相对运动的系统。 样品包括具有各自波长的荧光标记。 门控系统至少部分地提供基本上在照射波长处的合成光的门控信号。 检测系统检测来自照射标记的荧光,并提供表示与门开启信号同时检测的荧光的检测信号。 在一些示例中,检测系统检测多个波长的荧光并提供相应的检测信号。 在样本和检测系统之间光学地布置的光谱鉴别器接收来自样品的荧光,并向检测系统提供波长的相应荧光。 流式细胞仪可以光谱分散所得的荧光并分别测量波长。 来自设置在反射相位光栅上的样品的光可以被分散,测量和门控。

    SYSTEM AND METHOD FOR SURFACE INSPECTION
    35.
    发明申请
    SYSTEM AND METHOD FOR SURFACE INSPECTION 有权
    用于表面检测的系统和方法

    公开(公告)号:US20160069820A1

    公开(公告)日:2016-03-10

    申请号:US14665748

    申请日:2015-03-23

    Abstract: A system includes a vessel floating on a body of water. The system also includes at least one conduit extending from the vessel to below the body of water. The system also includes a scanning device disposed within the at least one conduit. The scanning device includes at least one two-dimensional (2D) line scanner and a rotary encoder coupled to the at least one 2D line scanner. The scanning device is configured to generate three-dimensional (3D) image data of a surface of the at least one conduit or at least one component disposed within the at least one conduit.

    Abstract translation: 系统包括浮在水体上的船只。 该系统还包括从容器延伸到水体下方的至少一个导管。 该系统还包括设置在至少一个导管内的扫描装置。 扫描装置包括至少一个二维(2D)线扫描器和耦合到至少一个2D线扫描器的旋转编码器。 扫描装置被配置为生成至少一个管道的表面或设置在至少一个管道内的至少一个部件的表面的三维(3D)图像数据。

    DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS
    37.
    发明申请
    DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS 有权
    缺陷检查方法和缺陷检查装置

    公开(公告)号:US20130301042A1

    公开(公告)日:2013-11-14

    申请号:US13976178

    申请日:2011-10-21

    Abstract: A defect inspection method includes: illuminating an area on surface of a specimen as a test object under a specified illumination condition; scanning a specimen to translate and rotate the specimen; detecting scattering lights to separate each of scattering lights scattered in different directions from the illuminated area on the specimen into pixels to be detected according to a scan direction at the scanning a specimen and a direction approximately orthogonal to the scan direction; and processing to perform an addition process on each of scattering lights that are detected at the step and scatter approximately in the same direction from approximately the same area of the specimen, determine presence or absence of a defect based on scattering light treated by the addition process, and compute a size of the determined defect using at least one of the scattering lights corresponding to the determined defect.

    Abstract translation: 缺陷检查方法包括:在规定的照明条件下照射作为被检体的试样表面的面积; 扫描样品以平移和旋转样品; 检测散射光,根据扫描样本的扫描方向和与扫描方向大致正交的方向,将从样本上的照射区域向不同方向散射的散射光分离成要检测的像素; 对在步骤中检测到的每个散射光进行加法处理,并且从与样本的大致相同的区域大致相同的方向散射,基于通过加法处理的散射光确定缺陷的存在或不存在 并且使用与所确定的缺陷相对应的散射光中的至少一个来计算确定的缺陷的大小。

    Defect inspection apparatus
    38.
    发明授权
    Defect inspection apparatus 有权
    缺陷检查装置

    公开(公告)号:US08477302B2

    公开(公告)日:2013-07-02

    申请号:US12412776

    申请日:2009-03-27

    Abstract: A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

    Abstract translation: 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台,照射光学系统,其照射激光束以在样品的表面上形成线性照射区域,检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置,用于检测从样品表面的线性照射区域散射的光,并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号,并根据所选择的检测信号检测缺陷。

    DEFECT INSPECTION APPARATUS
    39.
    发明申请
    DEFECT INSPECTION APPARATUS 有权
    缺陷检查装置

    公开(公告)号:US20090279081A1

    公开(公告)日:2009-11-12

    申请号:US12412776

    申请日:2009-03-27

    Abstract: A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

    Abstract translation: 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台,照射光学系统,其照射激光束以在样品的表面上形成线性照射区域,检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置,用于检测从样品表面的线性照射区域散射的光,并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号,并根据所选择的检测信号检测缺陷。

    SYNCHRONIZED WAFER MAPPING
    40.
    发明申请
    SYNCHRONIZED WAFER MAPPING 审中-公开
    同步波形映射

    公开(公告)号:US20080151259A1

    公开(公告)日:2008-06-26

    申请号:US11614837

    申请日:2006-12-21

    Applicant: Woo Sik Yoo

    Inventor: Woo Sik Yoo

    Abstract: A system and method for mapping a wafer includes scanning the wafer with a laser beam using a continuous spiraling pattern on the wafer surface, where the spiraling can be inward or outward. A microprocessor analyzes characteristics of the reflected, diffracted, and/or scattered beams and synchronizes each beam with a location on the wafer to generate a map of the wafer.

    Abstract translation: 用于映射晶片的系统和方法包括使用在晶片表面上的连续螺旋图案的激光束扫描晶片,其中螺旋可以向内或向外。 微处理器分析反射,衍射和/或散射光束的特性,并使每个光束与晶片上的位置同步,以产生晶片的图。

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