公开(公告)号：US09298103B2

公开(公告)日：2016-03-29

申请号：US14020850

申请日：2013-09-08

Applicant: Semiconductor Manufacturing International (Shanghai) Corporation

Inventor： Qiang Wu ,  Chang Liu ,  Jing'an Hao

IPC: G03B27/32 ,  G03B27/54 ,  G03B27/62 ,  G03F1/00 ,  G03F7/20 ,  G03F1/42 ,  G03F9/00

CPC classification number: G03F7/70616 ,  G03F1/42 ,  G03F7/703 ,  G03F7/70725 ,  G03F9/70

Abstract: An exposure apparatus is provided for performing a unidirectional scan-exposure. The exposure apparatus includes a base and a plurality of wafer stages on the base for loading/unloading wafers and successively moving from a first position to a second position of the base cyclically. The exposure apparatus also includes alignment detection units above the first position of the base for detecting alignment marks on the wafer and aligning the wafers and a cylindrical reticle system above the second position of the base. Further, the exposure apparatus includes an optical projection unit between the cylindrical reticle system and the base for projecting light onto the wafers for an exposure. Further, the exposure apparatus also includes an illuminator box and a main control unit.

Abstract translation: 提供用于进行单向扫描曝光的曝光装置。 曝光装置包括底座和底座上的多个晶片台，用于装载/卸载晶片，并且从基座的第一位置到第二位置循环移动。 曝光装置还包括在基座的第一位置之上的对准检测单元，用于检测晶片上的对准标记，并将晶片和在基座的第二位置上方的圆柱形标线系统对准。 此外，曝光装置包括在圆柱形掩模版系统和基座之间的光学投影单元，用于将光投射到晶片上用于曝光。 此外，曝光装置还包括照明箱和主控制单元。

公开(公告)号：US09298099B2

公开(公告)日：2016-03-29

申请号：US14039332

申请日：2013-09-27

Applicant: Semiconductor Manufacturing International (Shanghai) Corporation

Inventor： Qiang Wu ,  Yanlei Zu ,  Huayong Hu ,  Yiming Gu

IPC: G03B27/32 ,  G03B27/62 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F1/00 ,  G03F7/703 ,  G03F7/70733 ,  G03F7/70775

Abstract: An exposure apparatus is provided for performing an unidirectional scan-exposure. The exposure apparatus includes a base and a wafer stage group having a plurality of wafer stages on the base for holding wafers and successively moving from a first position to a second position of the base cyclically. The exposure apparatus also includes an alignment detection unit above the first position for detecting wafer stage fiducials at the first position and alignment marks on a wafer on the wafer stage to align the wafer. Further, the exposure apparatus includes a reticle stage on the second position for loading a cylindrical reticle and causing the cylindrical reticle to rotate around the center axis of the reticle stage and an optical projection unit between the reticle stage and the base for projecting light passing through the cylindrical reticle onto exposure regions on a wafer on the wafer stage.

Abstract translation: 提供了用于执行单向扫描曝光的曝光装置。 曝光装置包括基底和晶片台组，其具有用于保持晶片的基底上的多个晶片台，并且周期性地从基座的第一位置向第二位置移动。 曝光装置还包括在第一位置上方的对准检测单元，用于检测第一位置处的晶片台基准和晶片台上的晶片上的对准标记以对准晶片。 此外，曝光装置包括在第二位置处的标线台，用于装载圆柱形掩模版，并使圆柱形掩模版围绕标线片台的中心轴线旋转，并且在标线片台和基座之间设置光学投影单元，用于投射通过的光 圆柱形掩模版在晶片台上的晶片上的曝光区域上。