公开(公告)号：US20170178862A1

公开(公告)日：2017-06-22

申请号：US15375604

申请日：2016-12-12

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/04 ,  H01J37/22 ,  H01J37/10

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/141 ,  H01J37/145 ,  H01J37/153 ,  H01J37/226 ,  H01J2237/0435 ,  H01J2237/31774

Abstract: A multiple charged particle beam apparatus includes: a first aperture array substrate to form multiple beams; a first grating lens that constitutes a concave lens by using the first aperture array substrate as a grating; a second aperture array substrate that allows the multiple beams to pass through; and a first limiting aperture substrate arranged in a position of a convergent point of the multiple beams between the first aperture array substrate and the second aperture array substrate, wherein a first aperture array image having passed through the first shaping aperture array substrate is formed on the second aperture array substrate by a lens action including a magnetic field distribution generated between the first aperture array substrate and the second aperture array substrate and having opposite signs and same magnitude and an electric field distribution generated by the first grating lens.

公开(公告)号：US20170098524A1

公开(公告)日：2017-04-06

申请号：US15384021

申请日：2016-12-19

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro IIJIMA ,  Munehiro OGASAWARA ,  Hideo INOUE ,  Ryoichi YOSHIKAWA

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

公开(公告)号：US20140225008A1

公开(公告)日：2014-08-14

申请号：US14256124

申请日：2014-04-18

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Munehiro OGASAWARA

IPC: H01J37/317 ,  G21K5/04

CPC classification number: G21K5/04 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  G03F7/2065 ,  G21K5/10 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/24507 ,  Y10S430/143

Abstract: A multi charged particle beam writing apparatus according to an embodiment, includes a setting unit to set a second region such that more openings in remaining openings except for an opening through which the defective beam passes are included in the second region, a selection unit to select a mode from a first mode in which a pattern is written on a target object by using multiple beams having passed openings in the second region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in the state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam, and a writing processing control unit to control to write in the mode selected.

Abstract translation: 根据实施例的多带电粒子束写入装置包括设置单元，用于设置第二区域，使得除了缺陷光束通过的开口之外的剩余开口中的更多开口包括在第二区域中，选择单元选择 通过使用在第二区域中通过的开口的多个光束将图案写在目标物体上的第一模式的模式以及通过使用剩余多个光束中的至少一个来移动位置的同时进行多次写入的第二模式 在有缺陷的光束被控制为光束关闭的状态下，并且对于应该由缺陷光束写入的位置执行附加写入;以及写入处理控制单元，用于控制以所选择的模式写入。

公开(公告)号：US20140175303A1

公开(公告)日：2014-06-26

申请号：US14108936

申请日：2013-12-17

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Munehiro OGASAWARA

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  H01J37/141 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/1508

Abstract: A multi charged particle beam writing apparatus includes a stage to mount a target object thereon, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings, a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite, and three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of a plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object.

Abstract translation: 一种多带电粒子束写入装置，包括：在其上安装目标物体的台，发射带电粒子束的发射单元，其中形成有多个开口的孔径构件，以形成多波束， 整个多个开口被照射带电粒子束并使带电粒子束的部分分别穿过多个开口的对应开口，多个电磁透镜，其磁场相反的方向，以及三个或 更多的静电透镜，其中至少一个布置在多个电磁透镜的每个磁场中，并且其中一个或多个也用作用于将多光束共同偏转到目标物体上的偏转器。