公开(公告)号：US20150099360A1

公开(公告)日：2015-04-09

申请号：US14505167

申请日：2014-10-02

Applicant: Applied Materials, Inc.

Inventor： Ellie Y. YIEH ,  Ludovic GODET ,  Srinivas D. NEMANI

IPC: H01L21/8234 ,  H01L29/51 ,  H01L21/263 ,  H01L29/66 ,  H01L21/28

CPC classification number: H01L21/823462 ,  H01L21/0415 ,  H01L21/046 ,  H01L21/2236 ,  H01L21/2253 ,  H01L21/28185 ,  H01L21/31155 ,  H01L21/823431 ,  H01L29/66545 ,  H01L29/66803 ,  H01L29/6681 ,  H01L29/785

Abstract: Embodiments described herein generally relate to methods for forming gate structures. Various processes may be performed on a gate dielectric material to reduce the K value of the dielectric material. The gate dielectric having a reduced K value may provide for reduced parasitic capacitance and an overall reduced capacitance. The gate dielectric may be modified without thermodynamic constraint.

Abstract translation: 本文描述的实施例通常涉及用于形成栅极结构的方法。 可以在栅极电介质材料上进行各种工艺以降低电介质材料的K值。 具有减小的K值的栅极电介质可以提供减小的寄生电容和整体减小的电容。 可以在没有热力学约束的情况下修改栅极电介质。

公开(公告)号：US20140273461A1

公开(公告)日：2014-09-18

申请号：US14201700

申请日：2014-03-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Kwangduk Douglas LEE ,  Martin Jay SEAMONS ,  Matthew D. SCOTNEY-CASTLE ,  Martin A. HILKENE ,  Ludovic GODET

IPC: H01L21/314 ,  H01L21/311

CPC classification number: H01L21/02115 ,  C23C16/26 ,  C23C16/56 ,  H01J37/32412 ,  H01L21/02274 ,  H01L21/02321 ,  H01L21/0332 ,  H01L21/31155

Abstract: Methods for forming a hydrogen implanted amorphous carbon layer with desired film mechanical strength as well as optical film properties are provided. In one embodiment, a method of a hydrogen implanted amorphous carbon layer includes providing a substrate having a material layer disposed thereon, forming an amorphous carbon layer on the material layer, and ion implanting hydrogen ions from a hydrogen containing gas into the amorphous carbon layer to form a hydrogen implanted amorphous carbon layer.

Abstract translation: 提供了形成具有期望膜机械强度的氢注入非晶碳层以及光学膜性质的方法。 在一个实施例中，氢注入非晶碳层的方法包括提供其上设置有材料层的基板，在所述材料层上形成无定形碳层，以及将氢离子从含氢气体注入到所述非晶碳层中至 形成氢注入非晶碳层。

公开(公告)号：US20240385075A1

公开(公告)日：2024-11-21

申请号：US18667513

申请日：2024-05-17

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01M11/02 ,  G02B19/00 ,  G02B27/30 ,  G06T7/00 ,  H04N23/56

Abstract: Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.

公开(公告)号：US20240310639A1

公开(公告)日：2024-09-19

申请号：US18675404

申请日：2024-05-28

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G02B27/01

CPC classification number: G02B27/0172 ,  G02B27/0176

Abstract: Metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device are provided. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase ψ at a reference point directly adjacent to a second surface of the at least one optical device.

公开(公告)号：US20240142693A1

公开(公告)日：2024-05-02

申请号：US18495409

申请日：2023-10-26

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Jinxin FU

IPC: F21V8/00 ,  G02B5/18

CPC classification number: G02B6/0065 ,  G02B5/1852

Abstract: Methods for modifying the interface of optical substrates. To achieve desirable optical properties, surface defects need to be removed from the interface layer. In one example, a substrate is exposed to an ion beam then a high temperature bake or laser annealing to correct the interface layer. In another example, a high energy ion beam can be used to remove the interface layer then a new interface layer can be added during a high temperature bake or laser annealing with a protective layer added last. If not removed surface defects in the interface layer may absorb a percentage of light in a single interaction. In a waveguide, light may bounce ten to hundreds of times inside a substrate causing significant light loss. Therefore, removing the surface defects significantly increases waveguide efficiency.

公开(公告)号：US20240142690A1

公开(公告)日：2024-05-02

申请号：US18473079

申请日：2023-09-22

Applicant: Applied Materials, Inc.

Inventor： Yingdong LUO ,  Jinxin FU ,  Zhengping YAO ,  Daihua ZHANG ,  Ludovic GODET

IPC: F21V8/00

CPC classification number: G02B6/0016 ,  G02B6/002 ,  G02B6/0036 ,  G02B6/0046 ,  G02B6/0065

Abstract: An apparatus for waveguides and a method of fabricating a waveguide combiner having at least one grating with trenches gap-filled with variable refractive index materials. At least two trenches of at least one grating includes a first gap-fill material having a first volume and a first refractive index, and a second gap-fill material having a second volume and a second refractive index different than the first refractive index. Control of the deposition of first volume and the deposition of second volume in an inkjet deposition process provide for the formation of the grating with two trenches that have different refractive indices and different gap-fill depths. The first gap-fill material and the second gap-fill material merge to form the gap-filler. Therefore, by controlling the varied refractive indices and different gap-fill depths the waveguide combiner is optimized by efficiency or a color uniformity.

公开(公告)号：US20240125670A1

公开(公告)日：2024-04-18

申请号：US18397977

申请日：2023-12-27

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Kang LUO ,  Fariah HAYEE ,  Ludovic GODET

IPC: G01M11/02

CPC classification number: G01M11/0285 ,  G01M11/0207

Abstract: A method of optical device metrology is provided. The method includes introducing a first type of light into a first optical device during a first time period, the first optical device including an optical substrate and an optical film disposed on the optical substrate, the first optical device further including a first surface, a second surface, and one or more sides connecting the first surface with the second surface; and measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations.

公开(公告)号：US20240101937A1

公开(公告)日：2024-03-28

申请号：US18472688

申请日：2023-09-22

Applicant: Applied Materials, Inc.

Inventor： Wei WU ,  Jhenghan YANG ,  Yongmei CHEN ,  Jinxin FU ,  Ludovic GODET

IPC: C11D7/32 ,  C11D11/00

CPC classification number: C11D7/3281 ,  C11D11/0023 ,  C11D11/0064 ,  C11D11/007

Abstract: Embodiments of the present disclosure herein include a method of removing a contamination material from an optical device. The method may include disposing an optical device in a process chamber, the optical device having optical device structures formed in a substrate, the contamination material is disposed at least on sidewalls of the optical device structures and within trenches between the optical device structures, and exposing the optical device to a plasma generated in the process chamber, the plasma generated from oxygen gas (O2), chlorine gas (Cl2), Argon (Ar), or a combination thereof, the exposing the optical device to the plasma removes the contamination material.

公开(公告)号：US20230314126A1

公开(公告)日：2023-10-05

申请号：US18118269

申请日：2023-03-07

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G01B11/26 ,  G02B5/30 ,  G02B3/00 ,  G02B26/12

CPC classification number: G01B11/26 ,  G02B5/3025 ,  G02B3/00 ,  G02B26/123 ,  G02B2207/123

Abstract: Embodiments described herein provide for a measurement system having an aperture filtering component and methods of utilizing the measurement system. The measurement system described herein includes a measurement arm and a stage. The measurement arm projects a light beam to a top surface of an optical device structure. Multi-reflection beams resulting from reflections and diffraction off other surfaces of a non-opaque substrate leads to interference. The measurement arm includes an aperture (e.g., an aperture filtering component) that filters the multi-reflection beams from being relayed to the detector. As such, only images of the light beam are relayed to the detector.

公开(公告)号：US20230230991A1

公开(公告)日：2023-07-20

申请号：US18185863

申请日：2023-03-17

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yongan XU ,  Ludovic GODET ,  Naamah ARGAMAN ,  Robert Jan VISSER

IPC: H04N25/611 ,  H04N23/16 ,  H04N25/13 ,  H04N5/265

CPC classification number: H04N25/611 ,  H04N23/16 ,  H04N25/134 ,  H04N5/265

Abstract: An imaging system and a method of creating composite images are provided. The imaging system includes one or more lens assemblies coupled to a sensor. When reflected light from an object enters the imaging system, incident light on the metalens filter systems creates filtered light, which is turned into composite images by the corresponding sensors. Each metalens filter system focuses the light into a specific wavelength, creating the metalens images. The metalens images are sent to the processor, wherein the processor combines the metalens images into one or more composite images. The metalens images are combined into a composite image, and the composite image has reduced chromatic aberrations.