SSD supporting deallocate summary bit table and associated SSD operations

    公开(公告)号:US11669254B2

    公开(公告)日:2023-06-06

    申请号:US17491123

    申请日:2021-09-30

    IPC分类号: G06F3/06

    摘要: The present invention is directed to an SSD that stores data in a plurality of regions of the SSD, each of the regions associated with a plurality of logical cluster addresses. The SSD also sets a deallocation status of each of the plurality of regions in a deallocate flag bitmap and sets a deallocation status of one or more sections of the deallocate flag bitmap in a deallocate summary table, wherein each of the one or more sections corresponds to more than one of the plurality of regions. In response to a shutdown or loss of power event. The SSD writes to non-volatile memory only sections of the deallocation flag bitmap with a predetermined deallocation status in the deallocate summary table. The SSD stores the deallocate flag bitmap is stored in a first volatile memory and stores the deallocate summary table is stored in a second volatile memory, different from the first volatile memory.

    Failure detection circuit and semiconductor device

    公开(公告)号:US11639961B2

    公开(公告)日:2023-05-02

    申请号:US17016751

    申请日:2020-09-10

    发明人: Kenji Suina

    IPC分类号: G01R31/317

    摘要: A first circuit outputs a third signal having a first level during a period over which first and second signals have the same level, and having a second level during a period over which the first and second signals have different levels. A second circuit outputs a fifth signal having the first level during a period over which a fourth signal having the same level as the third signal has the same level as the first signal, and having the second level during a period over which the first and fourth signals have different levels. A third circuit outputs a sixth signal having a third level during a period over which the second and fifth signals have the same level, and having a fourth level during a period over which the second and fifth signals have different levels.

    Trench vertical power MOSFET with channel including regions with different concentrations

    公开(公告)号:US11626514B2

    公开(公告)日:2023-04-11

    申请号:US17007241

    申请日:2020-08-31

    摘要: A semiconductor device includes: a first semiconductor layer of first conductivity type; a second semiconductor layer of first conductivity type provided on the first semiconductor layer; a first semiconductor region of second conductivity type provided on the second semiconductor layer; a second semiconductor region of first conductivity type provided on the first semiconductor region; a first electrode provided in a first trench, the first trench reaching the second semiconductor layer from above the first semiconductor region, the first electrode facing the first semiconductor region via a first insulating film; a second electrode provided in a second trench, the second trench reaching the second semiconductor layer from above the first semiconductor region, the second electrode facing the first semiconductor region via a second insulating film; a third electrode including a first electrode portion, a second electrode portion provided on the first electrode portion and a third electrode portion provided on the second electrode portion, the first electrode portion being provided between the first trench and the second trench, the first electrode portion reaching the first semiconductor region from above the second semiconductor region, the first electrode portion being electrically connected to the first semiconductor region and the second semiconductor region; a third semiconductor region provided between the third electrode and the second semiconductor region provided between the first insulating film and the third electrode, the third semiconductor region having a higher concentration of impurities of second conductivity type than the first semiconductor region; a fourth semiconductor region provided between the third electrode and the second semiconductor region provided between the second insulating film and the third electrode, the fourth semiconductor region having a higher concentration of impurities of second conductivity type than the first semiconductor region; and a fifth semiconductor region provided between the first semiconductor region and the third electrode, the fifth semiconductor region being provided apart from the third semiconductor region and the fourth semiconductor region, the fifth semiconductor region having a higher concentration of impurities of second conductivity type than the first semiconductor region.

    Disk device with base and first and second covers

    公开(公告)号:US11594251B2

    公开(公告)日:2023-02-28

    申请号:US17565784

    申请日:2021-12-30

    发明人: Yasuhiko Kato

    摘要: According to one embodiment, a disk device includes a disk-shaped recording medium, a base accommodating the recording medium, the base including a bottom wall, a sidewall on a peripheral portion of the bottom wall, and a rib on a part of an upper surface of the sidewall and extending along an entire circumference of the sidewall, a first cover on a part of the upper surface of the sidewall, and a second cover on a first surface of the rib and above the first cover. The rib includes a first region with a first width, a second region with a second width less than the first width, and the first surface with a fixed width around an entire circumference of the rib. The first region and the second region are located corresponding to a side portion of the recording medium.