Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device, and Storage Medium

    公开(公告)号:US20190139756A1

    公开(公告)日:2019-05-09

    申请号:US16181819

    申请日:2018-11-06

    发明人: Tatsuya YAMAGUCHI

    摘要: A substrate processing apparatus for processing a substrate to manufacture a semiconductor device, includes: a mounting table on which a substrate is mounted; a first liquid supply part that supplies a first liquid to form a polymer film having a urea bond on the substrate mounted on the mounting table; a second liquid supply part that supplies a second liquid reacting with the first liquid; and a nozzle part provided at an end portion of a liquid flow path where the first liquid supplied from the first liquid supply part and the second liquid supplied from the second liquid supply part are joined with each other to obtain a mixed solution, and configured to supply the mixed solution to the substrate to form the polymer film on a surface of the substrate, wherein the polymer film is temporarily used for manufacturing the semiconductor device and is subsequently removed by depolymerization.

    Multi-passage heater assembly
    23.
    发明授权

    公开(公告)号:US10159995B2

    公开(公告)日:2018-12-25

    申请号:US12515831

    申请日:2006-12-15

    摘要: A gas dynamic spray unit is provided that includes gun housing halves secured about a heater assembly. The heater assembly includes a one-piece, multi-passage ceramic heater core. The heater assembly is retained within the gun housing using locating features provided on the heater assembly and the gun housing. The heater assembly includes a heater housing at least partially surrounding the heater core. A biasing member biases the ceramic heater core toward a tapered outlet, which is provided by a deflecting cone surrounded by an insulating cone.

    ELECTRONIC SMOKING DEVICE
    25.
    发明申请

    公开(公告)号:US20180343921A1

    公开(公告)日:2018-12-06

    申请号:US15771760

    申请日:2016-10-27

    发明人: Neha Daryani

    IPC分类号: A24F47/00 A24F7/00 B05B1/24

    CPC分类号: A24F47/008

    摘要: An electronic smoking device is provided comprising a housing with a mouthpiece portion and a heating element arranged within the housing. Furthermore, the electronic smoking device comprises a liquid reservoir adapted to receive a base liquid therein. Moreover, the electronic smoking device further comprises a pump mechanism that is adapted to provide at least a part of the base liquid within the liquid reservoir onto the heating element upon an actuation of the pump mechanism in a fully assembled state of the electronic smoking device.

    Device, system, and method for atomizer nozzle assembly

    公开(公告)号:US20180326321A1

    公开(公告)日:2018-11-15

    申请号:US16036281

    申请日:2018-07-16

    IPC分类号: A63J5/02 B05B1/24

    CPC分类号: A63J5/025 B05B1/24

    摘要: An adjustable atomizer nozzle assembly includes an assembly body; first and second side nozzle components, including compressed air tubes, liquid tubes, liquid heater, air heater, atomizer nozzles, which are mounted with an impingement angle to create a combined aerosol stream with reduced droplet size. An adjustable atomizer nozzle system includes a nozzle assembly; a mast assembly; a self-coiling line assembly, including a compressed air line, a pressurized liquid line, and a power line; a pressure tank; a compressor; a power supply; a mounting base; and wheels. A nozzle assembly can include one atomizer nozzle with a liquid heater. A method of use includes providing an adjustable atomizer nozzle system, configuring impingement for spraying, spraying a room, configuring impingement for fogging, and fogging the room.

    SUBSTRATE TREATING APPARATUS
    28.
    发明申请

    公开(公告)号:US20180207652A1

    公开(公告)日:2018-07-26

    申请号:US15936638

    申请日:2018-03-27

    发明人: Yukihiko INAGAKI

    摘要: A substrate treating apparatus includes a front heat-treating block, a front relay block and a solution treating block. The front heat-treating block has heat-treating units and main transport mechanisms. The front relay block has receivers and transport mechanisms. The solution treating block has solution treating units and transport mechanisms for solution treatment. The front heat-treating block and front relay block are connected to be able to transport substrates reciprocally. The front relay block and solution treating block are connected to be able to transport the substrates reciprocally. The front relay block is disposed between the solution treating block and front heat-treating block.

    Substrate treating apparatus
    30.
    发明授权

    公开(公告)号:US09956565B2

    公开(公告)日:2018-05-01

    申请号:US15226460

    申请日:2016-08-02

    发明人: Yukihiko Inagaki

    摘要: A substrate treating apparatus includes a front heat-treating block, a front relay block and a solution treating block. The front heat-treating block has heat-treating units and main transport mechanisms. The front relay block has receivers and transport mechanisms. The solution treating block has solution treating units and transport mechanisms for solution treatment. The front heat-treating block and front relay block are connected to be able to transport substrates reciprocally. The front relay block and solution treating block are connected to be able to transport the substrates reciprocally. The front relay block is disposed between the solution treating block and front heat-treating block.