公开(公告)号：US09496673B2

公开(公告)日：2016-11-15

申请号：US14005469

申请日：2012-02-21

Applicant: Toshiyuki Morishita ,  Yoshinori Terui ,  Shimpei Hirokawa

Inventor： Toshiyuki Morishita ,  Yoshinori Terui ,  Shimpei Hirokawa

IPC: H01J37/065 ,  H01R43/26 ,  H01J37/06 ,  H01J37/08 ,  H01J3/02 ,  H01J37/07 ,  H01J37/067

CPC classification number: H01R43/26 ,  H01J3/02 ,  H01J37/06 ,  H01J37/065 ,  H01J37/067 ,  H01J37/07 ,  H01J37/08 ,  Y10T29/49117

Abstract: The present invention is a charged-particle gun (EG) in which a negative electrode (1) and a positive electrode (9) are integrated and assembled in advance, and which can be stored and transported in a state in which the negative electrode and the positive electrode are integrated, wherein the negative electrode and the positive electrode are connected by a conductor (11) during storage and transportation of the charged-particle gun. It is thereby possible to prevent an electrode tip of the charged-particle gun from being damaged by electrical discharge caused by static electricity during storage and transportation.

Abstract translation: 本发明是一种带电粒子枪（EG），其中负极（1）和正极（9）预先集成并组装，并且可以在负极和 正极集成在一起，其中在带电粒子枪的储存和运输期间，负极和正极通过导体（11）连接。 由此，可以防止带电粒子枪的电极头在储存和运输期间由静电引起的放电损坏。

公开(公告)号：US08987677B2

公开(公告)日：2015-03-24

申请号：US12911861

申请日：2010-10-26

Applicant: Marco Jan-Jaco Wieland ,  Ferry Michael Postma

Inventor： Marco Jan-Jaco Wieland ,  Ferry Michael Postma

IPC: G21K1/08 ,  H01J37/317 ,  H01J37/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a modulation device for use in a charged particle multi-beamlet lithography system. The device includes a body comprising an interconnect structure provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode, a second electrode, and an aperture extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element formed at a first level of the interconnect structure and a second conductive element formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.

Abstract translation: 本发明涉及一种用于带电粒子多子束光刻系统的调制装置。 该装置包括主体，其包括在互连结构内的不同级别设置有多个调制器和互连的互连结构，用于使调制器能够连接到一个或多个图案数据接收元件。 调制器包括第一电极，第二电极和延伸穿过本体的孔。 电极位于孔的相对侧上，以产生穿过孔的电场。 第一电极和第二电极中的至少一个包括形成在互连结构的第一电平处的第一导电元件和形成在互连结构的第二电平处的第二导电元件。 第一和第二导电元件彼此电连接。

公开(公告)号：US20140055025A1

公开(公告)日：2014-02-27

申请号：US14000988

申请日：2011-02-25

Applicant: Hiroshi Yasuda

Inventor： Hiroshi Yasuda

IPC: H01J29/48

CPC classification number: H01J29/485 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/148 ,  H01J1/26 ,  H01J37/065 ,  H01J37/07 ,  H01J37/075 ,  H01J37/26 ,  H01J37/3174

Abstract: An electron gun cathode (104) is column shaped, and emits electrons by being heated. A holder (103), which covers the bottom and sides of the electron gun cathode, has electrical conductivity and holds the electron gun cathode, and is composed of a material that does not easily react with the electron gun cathode when in a heated state, is provided. The tip of the electron gun cathode (104) protrudes from the holder (103) so as to be exposed, and electrons are emitted from the tip toward the front by applying an electric field to the tip.

Abstract translation: 电子枪阴极（104）为柱状，通过加热发射电子。 覆盖电子枪阴极的底部和侧面的保持器（103）具有导电性并保持电子枪阴极，并且由处于加热状态时不易与电子枪阴极反应的材料构成， 被提供。 电子枪阴极（104）的尖端从保持器（103）突出以露出，并且通过向尖端施加电场，从尖端向前方发射电子。

公开(公告)号：US20140000104A1

公开(公告)日：2014-01-02

申请号：US14005469

申请日：2012-02-21

Applicant: Toshiyuki Morishita ,  Yoshinori Terui ,  Shimpei Hirokawa

Inventor： Toshiyuki Morishita ,  Yoshinori Terui ,  Shimpei Hirokawa

IPC: H01R43/26

CPC classification number: H01R43/26 ,  H01J3/02 ,  H01J37/06 ,  H01J37/065 ,  H01J37/067 ,  H01J37/07 ,  H01J37/08 ,  Y10T29/49117

Abstract: The present invention is a charged-particle gun (EG) in which a negative electrode (1) and a positive electrode (9) are integrated and assembled in advance, and which can be stored and transported in a state in which the negative electrode and the positive electrode are integrated, wherein the negative electrode and the positive electrode are connected by a conductor (11) during storage and transportation of the charged-particle gun. It is thereby possible to prevent an electrode tip of the charged-particle gun from being damaged by electrical discharge caused by static electricity during storage and transportation.

Abstract translation: 本发明是一种带电粒子枪（EG），其中负极（1）和正极（9）预先集成并组装，并且可以在负极和 正极集成在一起，其中在带电粒子枪的储存和运输期间，负极和正极通过导体（11）连接。 由此，可以防止带电粒子枪的电极头在储存和运输期间由静电引起的放电损坏。

公开(公告)号：US08492731B2

公开(公告)日：2013-07-23

申请号：US12911911

申请日：2010-10-26

Applicant: Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

IPC: G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array.

Abstract translation: 一种用于将图案转印到目标表面上的带电粒子光刻系统。 该系统包括用于产生多个带电粒子子束的束发生器，多个子束限定列，具有用于阻挡子束到达目标表面的表面的光束停止阵列和该表面中的孔阵列，用于允许子束 到达目标表面，以及调制装置，用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面，通过偏转或不偏转子束，使得 子束被阻挡或不被阻挡束阻挡。

公开(公告)号：US20110266418A1

公开(公告)日：2011-11-03

申请号：US12911861

申请日：2010-10-26

Applicant: Marco Jan-Jaco Wieland ,  Ferry Michael Postma

Inventor： Marco Jan-Jaco Wieland ,  Ferry Michael Postma

IPC: H01J3/26 ,  H01L31/18 ,  G01J3/26

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a modulation device for use in a charged particle multi-beamlet lithography system. The device includes a body comprising an interconnect structure provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode, a second electrode, and an aperture extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element formed at a first level of the interconnect structure and a second conductive element formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.

Abstract translation: 本发明涉及一种用于带电粒子多子束光刻系统的调制装置。 该装置包括主体，其包括在互连结构内的不同级别设置有多个调制器和互连的互连结构，用于使调制器能够连接到一个或多个图案数据接收元件。 调制器包括第一电极，第二电极和延伸穿过本体的孔。 电极位于孔的相对侧上，以产生穿过孔的电场。 第一电极和第二电极中的至少一个包括形成在互连结构的第一电平处的第一导电元件和形成在互连结构的第二电平处的第二导电元件。 第一和第二导电元件彼此电连接。

公开(公告)号：US20110261340A1

公开(公告)日：2011-10-27

申请号：US12911859

申请日：2010-10-26

Applicant: Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

IPC: G03B27/54 ,  G01J1/42

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the plurality of beamlets in accordance with a pattern. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators, wherein the shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.

Abstract translation: 本发明涉及一种使用多个带电粒子子束将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。 束发生器被布置用于产生多个带电粒子子束。 子束阻挡器阵列被布置成根据图案图案化多个子束。 子束遮蔽器阵列包括多个调制器和多个光敏元件，光敏元件被布置成接收携带光束的图案数据并将光束转换成电信号。 光敏元件电连接到一个或多个调制器以提供接收到的图案数据。 屏蔽结构是用于基本上屏蔽在光敏元件附近与调制器产生的电场的导电材料，其中屏蔽结构被设置成预定电位。 投影系统布置成将图案化的子束投影到目标表面上。

公开(公告)号：US20070236143A1

公开(公告)日：2007-10-11

申请号：US11806196

申请日：2007-05-30

Applicant: Soichi Katagiri ,  Takashi Ohshima

Inventor： Soichi Katagiri ,  Takashi Ohshima

IPC: H01J17/24

CPC classification number: H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

Abstract: To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

公开(公告)号：US5095241A

公开(公告)日：1992-03-10

申请号：US579790

申请日：1990-09-10

Applicant: Dieter Fritz ,  Wolfgang Schwarz

Inventor： Dieter Fritz ,  Wolfgang Schwarz

IPC: H01J37/07

CPC classification number: H01J37/07

Abstract: In the electron beam generator cooling is provided by the electrical conductors of the incandescent cathode and control electrode which are configured as heat bridges and connected to cooling plates in the interior of the high-voltage insulator which in turn are connected in a heat-conducting manner to a pot-shaped cooling body. The cooling body, configured as part of a capsule for accommodating circuitry for the control of the electron beam generator, is surrounded by a heat exchanger which is connected to a cooling circuit and is at ground potential, and is insulated from the cooling body by a wall of the high-voltage insulator.

Abstract translation: 在电子束发生器中，由白炽阴极和控制电极的电导体提供冷却，其被构造为热桥并连接到高压绝缘体的内部的冷却板，而高压绝缘子又以导热方式连接 到锅形冷却体。 配置为用于容纳用于控制电子束发生器的电路的胶囊的一部分的冷却体被连接到冷却回路并处于地电位的热交换器包围，并且与冷却体通过一个 高压绝缘子的墙壁。

公开(公告)号：US3433923A

公开(公告)日：1969-03-18

申请号：US3433923D

申请日：1968-06-10

Applicant: MECH TRONICS CORP

Inventor： MCNABB LOUIS A

IPC: B23K15/06 ,  H01J37/063 ,  H01J37/07 ,  B23K9/00

CPC classification number: B23K15/06 ,  H01J37/063 ,  H01J37/07