公开(公告)号：US07720371B2

公开(公告)日：2010-05-18

申请号：US11655501

申请日：2007-01-18

Applicant: Li Hong ,  Mark Takita ,  W. Thomas Novak

Inventor： Li Hong ,  Mark Takita ,  W. Thomas Novak

IPC: G03B3/10 ,  G03B13/34 ,  H04N5/232

CPC classification number: G03B13/18

Abstract: A camera (210) for providing an adjusted image (214) of a scene (12) includes an apparatus frame (224), an optical assembly (222), a capturing system (226), and a control system (232). The optical assembly (222) is adjustable to alternatively be focused on a first focal area (356A) and a second focal area (356B) that is different than the first focal area (356A). The capturing system (226) captures a first captured image (360A) when the optical assembly (222) is focused at the first focal area (356A) and captures a second captured image (360B) when the optical assembly (222) is focused at the second focal area (356B). The control system (232) provides the adjusted image (214) of the scene (12) based upon the first captured image (360A) and the second captured image (360B). Additionally, the control system (232) can perform object depth extraction of one or more objects (16) (18) (20) in the scene (12). Alternatively, the multiple captured images (360A) (360B) can be adjusted by a separate adjustment system (680).

Abstract translation: 用于提供场景（12）的调整图像（214）的相机（210）包括装置框架（224），光学组件（222），捕获系统（226）和控制系统（232）。 光学组件（222）可调节以可选地聚焦在与第一焦点区域（356A）不同的第一焦点区域（356A）和第二焦点区域（356B）上。 当光学组件（222）被聚焦在第一焦点区域（356A）时，捕获系统（226）捕获第一捕获图像（360A），并且当光学组件（222）被聚焦在第二捕获图像 第二重点领域（356B）。 控制系统（232）基于第一拍摄图像（360A）和第二拍摄图像（360B）提供场景（12）的调整图像（214）。 此外，控制系统（232）可以对场景（12）中的一个或多个物体（16）（18）（20）进行物体深度提取。 或者，多个拍摄图像（360A）（360B）可以通过单独的调整系统（680）进行调整。

公开(公告)号：US20090262322A1

公开(公告)日：2009-10-22

申请号：US12457742

申请日：2009-06-19

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B27/54

CPC classification number: G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

Abstract: A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. In addition, a gap is formed between a member and a surface, through which the exposure beam does not pass, of the optical element. A suction is provided to the gap.

Abstract translation: 光刻投影装置包括光学元件，通过该光学元件，用曝光光束照射基板。 在曝光期间，光学元件和基板之间的空间被填充液体。 此外，光学元件之间的部件和曝光光束不通过的表面之间形成间隙。 向间隙提供吸力。

公开(公告)号：US06963821B2

公开(公告)日：2005-11-08

申请号：US10361700

申请日：2003-02-11

Applicant: Michael Binnard ,  W. Thomas Novak ,  Toshio Ueta ,  Bausan Yuan

Inventor： Michael Binnard ,  W. Thomas Novak ,  Toshio Ueta ,  Bausan Yuan

IPC: B23Q11/00 ,  G03F7/20 ,  G01B11/24

CPC classification number: G03F7/70766 ,  B23Q11/0032 ,  G03F7/70725

Abstract: A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.

Abstract translation: 晶片台反质量组件通常包括支撑一个或多个阶段的基座和第一和第二反作用力。 第一和第二阶段以一个或多个自由度移动。 反恐怖主义至少有一个自由度，在理想条件下，可以抵抗运行阶段的运动，从而保持系统的重心，避免不必要的身体运动。 然而，在实际情况下，反恐怖主义可能在行进或超越其理想轨迹。 为了更紧密地跟踪理想轨迹，控制器启动微调电机，以将小的力施加到反作用体上，将其推向Y方向的参考位置。 第二实施例还考虑到X位置，以消除扭矩的阶段。

公开(公告)号：US06815695B2

公开(公告)日：2004-11-09

申请号：US10056017

申请日：2002-01-28

Applicant: W. Thomas Novak ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Douglas C. Watson

IPC: H01L2100

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70975 ,  H01J37/16

Abstract: A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.

Abstract translation: 与电子束系统一起使用的简化掩模版去除系统。 简化的掩模版去除系统包括具有成角度的开口的标线室和可拆卸地或可枢转地附接到其上的维护面板。 倾斜的开口提供了进入分隔板室内的掩模版阶段。 成角度的开口还允许从标线室移除光罩台，而不必拆卸和移除电子束系统的光学系统。 这样可以减少维护和修理成本，同时减少电子束系统的停机时间。

公开(公告)号：US06717159B2

公开(公告)日：2004-04-06

申请号：US09952444

申请日：2001-09-13

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: A61N500

CPC classification number: G03F7/707 ,  G03F7/70708

Abstract: A chuck assembly for use in semiconductor processing equipment includes elements that permit reticle expansion and assembly misalignment without additional reticle deformation. Reticle expansion is allowed by flexible support elements that are positioned to move in the direction of expansion, but that also combine to provide the control necessary for processing. Misalignment is allowed by connections that attach the reticle securely and uniquely to the support elements despite some amount of imperfection in the reticle, or the connections themselves. Accounting in this way for expansion and misalignment prevents additional reticle distortion and thus improves the accuracy of the product.

Abstract translation: 用于半导体加工设备的卡盘组件包括允许掩模版扩展和组装不对准的元件，而没有额外的掩模版变形。 通过定位成在膨胀方向上移动的柔性支撑元件允许标线片膨胀，但也结合起来提供加工所需的控制。 尽管在掩模版或连接本身中存在一些缺陷，但是通过将掩模版牢固且唯一地附着到支撑元件的连接允许不对准。 以这种方式计量膨胀和不对准会妨碍附加的标线失真，从而提高产品的准确性。

公开(公告)号：US06525802B1

公开(公告)日：2003-02-25

申请号：US09435155

申请日：1999-11-05

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B2742

CPC classification number: G03F9/7096 ,  G03B27/42 ,  G03F7/70858

Abstract: The invention provides a reference assembly that is mounted coaxially with an axis of a projection unit used in lithographic equipment to form semiconductor devices and LCDs. The reference assembly is made of a material having a low coefficient of thermal expansion, and the reference assembly has one or more reference features such as a mirror or off-axis alignment system that represent the axis of the projection unit. The reference assembly is attached to a housing of the projection unit by expansion joints such as flexures, which absorb the thermal expansion and contraction of the housing without significantly affecting the relationship of the reference features to the axis of the projection unit. The invention also provides a projection unit incorporating a reference assembly as well as a method of providing reference features and a method of making a semiconductor device.

Abstract translation: 本发明提供了一种参考组件，其与光刻设备中使用的投影单元的轴线同轴地安装以形成半导体器件和LCD。 参考组件由具有低热膨胀系数的材料制成，并且参考组件具有一个或多个参考特征，例如表示投影单元的轴线的反射镜或离轴对准系统。 参考组件通过膨胀接头（例如挠曲）附接到投影单元的壳体，该弯曲部吸收了壳体的热膨胀和收缩，而不会显着影响参考特征与投影单元的轴线的关系。 本发明还提供了一种结合参考组件的投影单元以及提供参考特征的方法和制造半导体器件的方法。

公开(公告)号：US06363809B1

公开(公告)日：2002-04-02

申请号：US09656641

申请日：2000-09-07

Applicant: W. Thomas Novak ,  Zahirudeen Premji ,  Uday G. Nayak ,  Akimitsu Ebihara

Inventor： W. Thomas Novak ,  Zahirudeen Premji ,  Uday G. Nayak ,  Akimitsu Ebihara

IPC: G05G1100

CPC classification number: G03F7/707 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70991 ,  G05G11/00 ,  Y10T74/20354 ,  Y10T74/20378

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam. A cable follower stage moves in the Y direction on the follower stage and supports the cables connecting to the main stage, thereby reducing cable drag. An air circulation system is provided in the magnetic tracks on the follower stage to remove heat from operation of the electromagnetic motors. Air is removed from a central region of each track by a vacuum duct enhanced by air plugs fitting at the two ends of the motor coil assembly on the main stage to contain the air therein.

Abstract translation: 用于在微光刻系统中对准晶片的精确运动的XY平台。 支撑晶片的主平台跨越在XY平面中沿第一线性方向磁驱动的可移动光束。 机械独立于主舞台的跟随台阶也在第一线性（X）方向上移动，并且其运动由具有主方向运动的控制系统在X方向上电子同步。 电磁驱动电动机包括安装在从动台上的磁道，其与安装在主台的边缘上的电动机线圈配合，以沿着与X方向正交的第二线性（Y）方向移动主工作台。 因此，主平台与XY平面中的机械扰动隔离，因为没有机械连接并且通过从梁中去除磁道的重量而被减轻。 电缆跟随器级在从动台上沿Y方向移动，并支撑连接到主级的电缆，从而减少电缆阻力。 在跟随器台上的磁道中设置有一个空气循环系统，以消除电磁马达的运行中的热量。 空气由每个轨道的中心区域被一个真空管道除去，该真空管道通过安装在主台上的电动机线圈组件的两端上的空气塞来增强，以便在其中容纳空气。

公开(公告)号：US06355993B1

公开(公告)日：2002-03-12

申请号：US09371153

申请日：1999-08-10

Applicant: Andrew J. Hazelton ,  W. Thomas Novak

Inventor： Andrew J. Hazelton ,  W. Thomas Novak

IPC: H02K4100

CPC classification number: H02K41/03 ,  G03F7/70758 ,  H02K3/04 ,  H02K3/26 ,  H02K15/0464

Abstract: The embodiments describe linear motor configurations having a polygonal shaped motor coil. The motor coil is e.g. hexagonal, diamond shaped, or double diamond shaped. Coil units are formed in a closed electrically conductive band surrounding a void. Coil units are formed e.g. from flex circuit material or by winding in a racetrack or folded tip fashion. Coil units are arranged in an overlapped shingle like manner to form a motor coil with substantially uniform thickness and high conductor density, providing high efficiency. Due to its substantially uniform thickness, the motor coil has a substantially flat cross section that allows the motor coil to be easily installed and removed from its associated linear magnetic track. The embodiments enable both moving coil and moving magnet linear motor configurations.

Abstract translation: 实施例描述了具有多边形电动机线圈的线性电动机构造。 电机线圈是例如 六角形，菱形或双菱形。 线圈单元形成在围绕空隙的封闭导电带中。 线圈单元例如形成。 从柔性电路材料或通过卷绕在跑道或折叠的尖端方式。 线圈单元以重叠的瓦板方式布置，以形成具有基本均匀的厚度和高导体密度的马达线圈，从而提供高效率。 由于其大致均匀的厚度，电动机线圈具有基本平坦的横截面，其允许电动机线圈容易地从其相关联的线性磁道安装和移除。 这些实施例使得移动线圈和移动磁体线性电动机配置都能够实

公开(公告)号：US06278203B1

公开(公告)日：2001-08-21

申请号：US09447200

申请日：1999-11-22

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Ken G. Wasson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Ken G. Wasson

IPC: H02K4103

CPC classification number: G03F7/70758 ,  G03F7/70858 ,  H02K3/24 ,  H02K9/19 ,  H02K41/03 ,  Y10S414/135

Abstract: Apparatus and associated method for cooling a linear motor coil includes a motor coil having side walls, and at least one enclosure member which encloses each linear side wall and extends generally co-extensively with a width and a length of the side walls and juxtaposed to the side walls. Coolant passages are formed between and around an exterior of the side walls and the interior walls of at least one enclosure member for enclosing a coolant fluid flowable against the side walls. An inlet plenum is in flow connection to the coolant passages for flowing the coolant fluid through the coolant passages to cool the side walls and an outlet plenum is in flow connection to the coolant passages for removal of coolant fluid heated by operation of the motor coil.

Abstract translation: 用于冷却线性电动机线圈的装置和相关联的方法包括具有侧壁的电动机线圈，以及包围每个线性侧壁并且大体上与侧壁的宽度和长度共同延伸并且并置到 侧墙。 冷却剂通道形成在侧壁的外部和周围的至少一个外壳构件的内壁之间，用于封闭可抵靠侧壁流动的冷却剂流体。 入口气室与冷却剂通道流体连通，用于使冷却剂流体流过冷却剂通道以冷却侧壁，并且出口增压室与冷却剂通道流动连接，用于移除通过电机线圈的操作加热的冷却剂流体。

公开(公告)号：US5996437A

公开(公告)日：1999-12-07

申请号：US799674

申请日：1997-02-11

Applicant: W. Thomas Novak ,  Zahirudeen Premji ,  Uday G. Nayak ,  Akimitsu Ebihara

Inventor： W. Thomas Novak ,  Zahirudeen Premji ,  Uday G. Nayak ,  Akimitsu Ebihara

IPC: G12B5/00 ,  G02B21/26 ,  G03F7/20 ,  H01L21/027 ,  G05G11/00

CPC classification number: G03F7/707 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70991 ,  Y10T74/20354 ,  Y10T74/20378

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) difection and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam. A cable follower stage moves in the Y direction on the follower stage and supports the cables connecting to the main stage, thereby reducing cable drag. An air circulation system is provided in the magnetic tracks on the follower stage to remove heat from operation of the electromagnetic motors. Air is removed from a central region of each track by a vacuum duct enhanced by air plugs fitting at the two ends of the motor coil assembly on the main stage to contain the air therein.

Abstract translation: 用于在微光刻系统中对准晶片的精确运动的XY平台。 支撑晶片的主平台跨越在XY平面中沿第一线性方向磁驱动的可移动光束。 机械独立于主舞台的跟随器阶段也在第一线性（X）等级中移动，并且其运动由具有主方向运动的控制系统在X方向上电子同步。 电磁驱动电动机包括安装在从动台上的磁道，其与安装在主台的边缘上的电动机线圈配合，以沿着与X方向正交的第二线性（Y）方向移动主工作台。 因此，主平台与XY平面中的机械扰动隔离，因为没有机械连接并且通过从梁中去除磁道的重量而被减轻。 电缆跟随器级在从动台上沿Y方向移动，并支撑连接到主级的电缆，从而减少电缆阻力。 在跟随器台上的磁道中设置有一个空气循环系统，以消除电磁马达的运行中的热量。 空气从每个轨道的中心区域被一个真空管道除去，该真空管道通过安装在主台上的电动机线圈组件的两端的空气塞增强，以便在其中容纳空气。