公开(公告)号：US07403291B2

公开(公告)日：2008-07-22

申请号：US11228116

申请日：2005-09-16

Applicant: Kazuki Yamamoto ,  Akihiro Nakauchi

Inventor： Kazuki Yamamoto ,  Akihiro Nakauchi

IPC: G01B9/02

CPC classification number: G03F7/706

Abstract: An adjusting method measures a wavefront aberration in a first direction of a target optical system and a wavefront aberration in a second direction different from the first direction of the target optical system, and calculates a first correction value and a second correction value based on a determinant assuming that a matrix that is made by adding a first correction value to each column of the first matrix is equal to a matrix that is made by adding a second correction value to each row of the second matrix. The first correction value is different every column, and the second correction value is different every row. The first matrix represents the wavefront aberration in the first direction, and the second matrix represents the wavefront aberration in the second direction. The adjusting method obtains a two-dimensional wavefront aberration of the target optical system by calculating the matrix that is made by adding the first correction value that has been calculated to the first matrix and/or the matrix that is made by adding the second correction value that has been calculated to the second matrix, and adjusts the target optical system based on the obtained two-dimensional wavefront aberration.

Abstract translation: 调整方法测量目标光学系统的第一方向上的波前像差和与目标光学系统的第一方向不同的第二方向的波前像差，并且基于行列式计算第一校正值和第二校正值 假设通过将第一校正值添加到第一矩阵的每列而形成的矩阵等于通过将第二校正值添加到第二矩阵的每一行而做出的矩阵。 第一校正值每列不同，第二校正值每行不同。 第一矩阵表示第一方向上的波前像差，第二矩阵表示第二方向上的波前像差。 调整方法通过计算通过将已经计算出的第一校正值与第一矩阵相加的矩阵和/或通过将第二校正值相加而得到的矩阵来计算目标光学系统的二维波前像差 已经被计算为第二矩阵，并且基于获得的二维波前像差来调整目标光学系统。

公开(公告)号：US08771612B2

公开(公告)日：2014-07-08

申请号：US12920884

申请日：2009-03-11

Applicant: Masateru Fukuoka ,  Kazuki Yamamoto ,  Yoshinori Akagi ,  Hiroji Fukui

Inventor： Masateru Fukuoka ,  Kazuki Yamamoto ,  Yoshinori Akagi ,  Hiroji Fukui

IPC: B01L3/00 ,  C06B45/10 ,  C06B45/12

CPC classification number: B01L3/50273 ,  B01L2300/0887 ,  B01L2400/046 ,  F04B19/006 ,  Y10T137/2082

Abstract: The present invention provides a photoresponsive gas-generating material that is to be used in a micropump of a microfluid device having fine channels formed therein, and is capable of effectively generating gases for transporting a microfluid in response to light irradiation and transporting the microfluid at an improved transport efficiency. The present invention also provides a micropump incorporating the photoresponsive gas-generating material.A photoresponsive gas-generating material 13 is to be used in a micropump having fine channels formed in a substrate, and comprises a photo-sensitive acid-generating agent and an acid-sensitive gas-generating agent, and a micropump 10 has the photoresponsive gas-generating material 13 housed therein.

Abstract translation: 本发明提供一种光反应性气体发生材料，其用于具有形成在其中的细通道的微流体装置的微型泵中，并且能够有效地产生用于响应于光照射输送微流体的气体，并在 提高运输效率。 本发明还提供了一种结合光响应气体发生材料的微型泵。 光响应性气体发生材料13用于形成在基板上的细通道的微型泵中，并且包含光敏酸产生剂和酸敏感气体发生剂，微泵10具有光响应气体 其中容纳有生产材料13。

公开(公告)号：US08373866B2

公开(公告)日：2013-02-12

申请号：US12399612

申请日：2009-03-06

Applicant: Kazuki Yamamoto

Inventor： Kazuki Yamamoto

IPC: G01B11/02

CPC classification number: G03F7/706

Abstract: An apparatus measuring wavefront aberration of an optical system includes a first mask in an object plane and having plural openings, an illumination optical system illuminating the openings of the first mask by using light from a light source, a second mask in an image plane and having an opening allowing passage of light containing aberration of the optical system and a pinhole/slit. The apparatus takes an image of interference fringe generated by light having passed through the optical system and the pinhole/slit and the light having passed through the optical system and the opening of the second mask, calculates an evaluation value to evaluate a state of the interference fringe by using image data of the image, determines, based on the evaluation value, whether the wavefront aberration of the inspected optical system is to be calculated, and calculates the wavefront aberration of the optical system from the image data.

Abstract translation: 测量光学系统的波前像差的装置包括物体平面中的具有多个开口的第一掩模，通过使用来自光源的光照射第一掩模的开口的照明光学系统，图像平面中的第二掩模，并具有 允许包含光学系统的像差的光的通道和针孔/狭缝。 该装置拍摄通过光学系统和针孔/狭缝的光所产生的干涉条纹和通过光学系统的光和第二掩模的开口的图像，计算评估值以评估干扰的状态 通过使用图像的图像数据，基于评估值确定是否要计算被检查的光学系统的波前像差，并根据图像数据计算光学系统的波前像差。

公开(公告)号：US08353679B2

公开(公告)日：2013-01-15

申请号：US12674514

申请日：2009-03-17

Applicant: Kazuki Yamamoto ,  Masateru Fukuoka ,  Yoshinori Akagi ,  Hiroji Fukui

Inventor： Kazuki Yamamoto ,  Masateru Fukuoka ,  Yoshinori Akagi ,  Hiroji Fukui

IPC: F04B19/24

CPC classification number: F04B19/006 ,  F04B9/12 ,  F04B19/20 ,  F04B19/24 ,  F04F1/06

Abstract: To provide a micropump device having good controllability over the amount of gas generated from the gas generating material and thus the amount of liquid fed by the micropump. The micropump device includes a micropump 10 and a controller 50. The micropump 10 includes: a microchannel 22 serving as a channel for liquid; a gas generating material 34 generating a gas upon exposure to light and supplying the gas to the microchannel 22; and a light source 42 for irradiating the gas generating material 34 with light 44. The controller 50 supplies to the light source 42 a control pulse signal CS that causes the light source 42 to blink on and off in a binary manner by repeating a pulse train pattern composed of a fixed number of bits each capable of having two states, one of which is a first level allowing the light source 42 to be turned on and the other of which is a second level allowing the light source 42 to be turned off.

Abstract translation: 提供一种对从气体发生材料产生的气体量以及由微型泵供给的液体量具有良好可控性的微型泵装置。 微型泵装置包括微型泵10和控制器50.微型泵10包括：用作液体通道的微通道22; 气体发生材料34，其在暴露于光时产生气体并将气体供应到微通道22; 以及用于用光44照射气体发生材料34的光源42.控制器50向光源42提供控制脉冲信号CS，其使得光源42以二进制方式通过重复脉冲串来开启和关闭 图案由固定数量的位组成，每个位都能够具有两个状态，其中一个是允许光源42接通的第一电平，另一个是允许光源42断开的第二电平。

公开(公告)号：US08223314B2

公开(公告)日：2012-07-17

申请号：US12507159

申请日：2009-07-22

Applicant: Kazuki Yamamoto

Inventor： Kazuki Yamamoto

IPC: G03B27/42

CPC classification number: G03B27/52 ,  G01M11/0257 ,  G01M11/0271

Abstract: A method comprises determining a first processing center position to calculate a wavefront aberration of an optical system, determining a second processing center position to calculate a wavefront aberration, correcting the first processing center position in a first direction using the second processing center position in the first direction and correcting the second processing center position in a second direction using the first processing center position in the second direction.

Abstract translation: 一种方法包括确定第一处理中心位置以计算光学系统的波前像差，确定第二处理中心位置以计算波前像差，使用第一处理中心位置在第一方向上校正第一处理中心位置 方向，并且使用第二方向上的第一处理中心位置在第二方向上校正第二处理中心位置。

公开(公告)号：US07924437B2

公开(公告)日：2011-04-12

申请号：US12499531

申请日：2009-07-08

Applicant: Kazuki Yamamoto

Inventor： Kazuki Yamamoto

IPC: G01B11/02

CPC classification number: G03F7/706 ,  G01J9/02 ,  G01M11/0264 ,  G01M11/0271

Abstract: A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system parameter a shift from a design value of a value that defines a structure of the measurement apparatus and the target optical system, and measuring the wavefront aberration of the target optical system using the system parameter.

Abstract translation: 使用通过检测干涉图案测量目标光学系统的波面像差的测量装置测量目标光学系统的波前像差的测量方法包括以下步骤：从系统参数测量从值的设计值 其定义了测量装置和目标光学系统的结构，并且使用系统参数测量目标光学系统的波前像差。

公开(公告)号：US07746479B2

公开(公告)日：2010-06-29

申请号：US12409295

申请日：2009-03-23

Applicant: Kazuki Yamamoto

Inventor： Kazuki Yamamoto

IPC: G01B11/02

CPC classification number: G03F7/706

Abstract: A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.

Abstract translation: 用于测量光学系统的波前像差的测量装置包括用于限定进入光学系统的光的第一掩模和具有第一至第四开口的第二掩模。 第一开口透射通过光学系统的光的分量，而不去除关于光学系统的波前像差的信息，并且第二至第四开口传输通过具有关于波前像差的信息的光学系统的光的分量 光学系统被去除。

公开(公告)号：US20090185194A1

公开(公告)日：2009-07-23

申请号：US12409295

申请日：2009-03-23

Applicant: Kazuki Yamamoto

Inventor： Kazuki Yamamoto

IPC: G01B11/02

CPC classification number: G03F7/706

Abstract: A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.

Abstract translation: 用于测量光学系统的波前像差的测量装置包括用于限定进入光学系统的光的第一掩模和具有第一至第四开口的第二掩模。 第一开口透射通过光学系统的光的分量，而不去除关于光学系统的波前像差的信息，并且第二至第四开口传输通过具有关于波前像差的信息的光学系统的光的分量 光学系统被去除。

公开(公告)号：US20090126516A1

公开(公告)日：2009-05-21

申请号：US12282168

申请日：2007-03-08

Applicant: Kazuki Yamamoto ,  Hiroji Fukui ,  Minoru Seki

Inventor： Kazuki Yamamoto ,  Hiroji Fukui ,  Minoru Seki

IPC: G01N35/10

CPC classification number: B01F13/0071 ,  B01F15/0404 ,  B01F2013/1052 ,  B01F2015/0221 ,  B01J2219/00889 ,  B01L3/502792 ,  B01L2200/0605 ,  B01L2300/0816 ,  B01L2300/0867 ,  B01L2400/0487 ,  G01N2035/00465 ,  Y10T137/87249 ,  Y10T137/87652

Abstract: A microfluidic device provided with a micro-channel structure capable of easily and positively providing therein micro-droplet having various dilution ratios. A micro-channel structure provided in a substrate (2) has a first mixing unit (11) and a second mixing unit (21) connected to the downstream side of the first mixing unit (11), with each mixing unit (11, 21) having first through third micro-channels. One end of a first weighing unit (11d) consisting of a micro-channel having a capacity equivalent to the volume of a specified-amount first micro-droplet is opened to a first micro-channel (11a), and the other end is opened to a merging unit (12a) provided on a second micro-channel (12). One end of a second weighing unit (13d) consisting of a micro-channel having a capacity equivalent to the volume of a specified-amount second micro-droplet is connected to a third micro-channel (13), and the other end is opened to the merging unit (12a). Any one of the first through third outlet ports of the first mixing unit is connected with the first or the third inlet port of the second mixing unit (21).

Abstract translation: 具有微通道结构的微流体装置，其能够容易且积极地在其中提供具有各种稀释比的微滴。 设置在基板（2）中的微通道结构具有与第一混合单元（11）的下游侧连接的第一混合单元（11）和第二混合单元（21），每个混合单元（11,21 ）具有第一至第三微通道。 第一称重单元（11d）的一端由具有与规定量的第一微小液滴的体积相当的容量的微通道构成，向第一微通道（11a）开放，另一端开放 到设置在第二微通道（12）上的合并单元（12a）。 第二称重单元（13d）的一端连接到具有相当于规定量的第二微小液滴的体积的微通道的微通道，与第三微通道（13）连接，另一端打开 到合并单元（12a）。 第一混合单元的第一至第三出口中的任何一个与第二混合单元（21）的第一或第三入口连接。

公开(公告)号：US20090066812A1

公开(公告)日：2009-03-12

申请号：US11813704

申请日：2006-01-06

Applicant: Daisuke Nakaya ,  Naozumi Jogo ,  Takayuki Uemura ,  Kazuki Yamamoto

Inventor： Daisuke Nakaya ,  Naozumi Jogo ,  Takayuki Uemura ,  Kazuki Yamamoto

IPC: H04N5/76

CPC classification number: H04N1/1008 ,  H04N1/047 ,  H04N1/195 ,  H04N2201/04767

Abstract: A method for creating frame data used when forming an image by moving a spatial light modulation device including a plurality of plotting element arrays in a scanning direction which forms an inclination angle θ with an arrangement direction of the plotting element arrays, and sequentially inputting the frame data to the spatial light modulation device according to the movement of the device in the scanning direction. The method is based on image data in which pixel data are disposed two-dimensionally in a sub-scanning direction corresponding to the scanning direction, and a main scanning direction orthogonal to the sub-scanning direction, and the frame data are created after performing a deformation process on the image data such that the pixel data corresponding to each of the plotting element arrays (e.g., circled numbers 1 to 6) are disposed in the main scanning direction.

Abstract translation: 一种用于创建通过在扫描方向上移动包括多个绘图元素阵列的空间光调制装置以形成图形的方法，该扫描方向与绘图元件阵列的布置方向形成倾斜角度θ，并且顺序地输入框架 根据装置在扫描方向上的移动，向空间光调制装置提供数据。 该方法基于像素数据在与扫描方向对应的副扫描方向和与副扫描方向正交的主扫描方向二维地设置的图像数据，并且在执行 对图像数据进行变形处理，使得对应于每个绘图元素阵列（例如，圈数1至6）的像素数据被布置在主扫描方向上。