公开(公告)号：US20180288863A1

公开(公告)日：2018-10-04

申请号：US16001441

申请日：2018-06-06

Applicant: GIGAPHOTON INC.

Inventor： Takahisa FUJIMAKI ,  Takayuki YABU ,  Yuta TAKASHIMA ,  Fumio IWAMOTO ,  Yutaka SHIRAISHI

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G05D16/2006 ,  G05D23/19 ,  H05G2/00 ,  H05G2/008

Abstract: A target supply device may include a nozzle configured to output a liquid target substance contained in a tank, an excitation element, a droplet detection unit configured to detect a droplet output from the nozzle, a passage time interval measurement unit configured to measure a passage time interval of droplets, and a control unit. The control unit may be configured to set a proper range of the passage time interval, change the duty value of the electric signal to be input to the excitation element, store the passage time interval measurement values of the droplets generated with respect to a plurality of duty values and variation thereof in association with the duty values, and determine an operation duty value based on the variation from among the duty values with which the passage time interval measurement values are within the proper range, among the duty values.

公开(公告)号：US20180240562A1

公开(公告)日：2018-08-23

申请号：US15953774

申请日：2018-04-16

Applicant: Gigaphoton Inc.

Inventor： Takayuki YABU ,  Tamotsu ABE ,  Kenichi MIYAO ,  Tooru ABE

IPC: G21K1/06 ,  H05G2/00 ,  G03F7/20

CPC classification number: G21K1/062 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70525 ,  G03F7/7055 ,  G03F7/7085 ,  H05G2/008

Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.

公开(公告)号：US20170079126A1

公开(公告)日：2017-03-16

申请号：US15361120

申请日：2016-11-25

Applicant: GIGAPHOTON INC.

Inventor： Toru SUZUKI ,  Takayuki YABU

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A target sensor may include: a plurality of sensor elements, each of the plurality of sensor elements being configured to output a sensor signal that varies in accordance with an amount of light received on a light-receiving surface; and a signal generator configured to process the sensor signals from the plurality of sensor elements. The light-receiving surfaces of the plurality of sensor elements may be disposed at different positions in a second direction different from a first direction along which an image of the target illuminated by the illumination light may move. The signal generator may be configured to compare each of the sensor signals from the plurality of sensor elements with a threshold and output the signal indicating detection of a target to the controller in a case where at least one of the sensor signals from the plurality of sensor elements may exceed the threshold.

Abstract translation: 目标传感器可以包括：多个传感器元件，所述多个传感器元件中的每一个被配置为输出根据在光接收表面上接收的光量而变化的传感器信号; 以及信号发生器，被配置为处理来自多个传感器元件的传感器信号。 多个传感器元件的光接收表面可以设置在不同于由照明光照射的目标的图像可以移动的第一方向的第二方向上的不同位置处。 信号发生器可以被配置为在来自多个传感器元件的传感器信号中的至少一个传感器信号的情况下将来自多个传感器元件的每个传感器信号与阈值进行比较，并将指示检测到目标的信号输出到控制器 元素可能会超过阈值。

公开(公告)号：US20160285222A1

公开(公告)日：2016-09-29

申请号：US15172757

申请日：2016-06-03

Applicant: GIGAPHOTON INC.

Inventor： Takashi SUGANUMA ,  Takayuki YABU ,  Osamu WAKABAYASHI ,  Seiji NOGIWA

IPC: H01S3/00 ,  H01S3/23 ,  H01S3/223 ,  H05G2/00

CPC classification number: H01S3/005 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2366 ,  H05G2/005 ,  H05G2/008

Abstract: There is provided a laser unit that may include a master oscillator, a laser amplifier, and an adjuster. The master oscillator may be configured to output a laser light beam. The laser amplifier may be disposed in a light path of the laser light beam outputted from the master oscillator. The adjuster may be disposed in the light path of the laser light beam, and may be configured to adjust a beam cross-sectional shape of the laser light beam amplified by the laser amplifier to be a substantially circular shape. The beam cross-sectional shape may be at a beam waist of the laser light beam or in the vicinity of the beam waist of the laser light beam, and may be in a plane orthogonal to a light path axis.

Abstract translation: 提供了可以包括主振荡器，激光放大器和调节器的激光单元。 主振荡器可以被配置为输出激光束。 激光放大器可以设置在从主振荡器输出的激光束的光路中。 调整器可以设置在激光束的光路中，并且可以被配置为将由激光放大器放大的激光束的光束横截面形状调整为大致圆形。 光束横截面形状可以在激光束的束腰处或激光束的束腰附近，并且可以在与光路轴线正交的平面中。

公开(公告)号：US20160255707A1

公开(公告)日：2016-09-01

申请号：US15151025

申请日：2016-05-10

Applicant: Gigaphoton Inc.

Inventor： Atsushi UEDA ,  Takayuki YABU ,  Osamu WAKABAYASHI ,  Georg SOUMAGNE ,  Takashi SAITO

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.

Abstract translation: 极紫外光发生装置可以包括：腔室; 目标供给单元，被配置为朝向所述室内的预定区域输出目标; 第一气体供给单元，被配置为沿着朝向目标供给单元和预定区域之间的目标的轨迹的第一方向吹出气体; 以及配置成将脉冲激光束集中到所述预定区域的聚焦光学系统。

公开(公告)号：US20140098830A1

公开(公告)日：2014-04-10

申请号：US14047753

申请日：2013-10-07

Applicant: Gigaphoton Inc.

Inventor： Takayuki YABU ,  Takashi SAITO ,  Hideyuki HAYASHI ,  Kazuhiro SUZUKI ,  Hiroaki NAKARAI

IPC: H01S3/00

CPC classification number: H01S3/0085 ,  H01S3/005 ,  H01S3/2391 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system may include an optical device configured to cause an optical path of a pulse laser beam to approximately match one of a first optical path in which the pulse laser beam is focused at a plasma generation region and a second optical path in which the pulse laser beam passes outside the plasma generation region, and a control unit configured to output a control signal to the optical device so that the optical device sets the optical path of the pulse laser beam to the second optical path from when a predetermined time starts to when the number of pulses contained in a timing signal reaches a predetermined value and sets the optical path of the pulse laser beam to the first optical path from when the number of pulses reaches the predetermined value to when the predetermined time ends.

Abstract translation: 极紫外光发生系统可以包括光学装置，其被配置为使脉冲激光束的光路近似地匹配脉冲激光束在等离子体产生区域聚焦的第一光路中的一个和第二光路中的第二光路 脉冲激光束通过等离子体产生区域以外的控制单元，以及控制单元，其配置为向光学装置输出控制信号，使得光学装置将脉冲激光束的光路从预定时间设定为第二光路 开始于当定时信号中包含的脉冲数达到预定值并且将脉冲激光束的光路从脉冲数达到预定值到当预定时间结束时设置为第一光路。

公开(公告)号：US20130277452A1

公开(公告)日：2013-10-24

申请号：US13925727

申请日：2013-06-24

Applicant: GIGAPHOTON INC.

Inventor： Takayuki YABU ,  Kouji KAKIZAKI ,  Yukio WATANABE ,  Osamu WAKABAYASHI

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.

Abstract translation: 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。

公开(公告)号：US20130206863A1

公开(公告)日：2013-08-15

申请号：US13675790

申请日：2012-11-13

Applicant: GIGAPHOTON INC.

Inventor： Takayuki YABU ,  Yukio WATANABE ,  Toshihiro NISHISAKA ,  Hiroshi SOMEYA ,  Osamu WAKABAYASHI

IPC: B05B17/06

CPC classification number: B05B17/0607 ,  B05B12/082

Abstract: A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.

Abstract translation: 目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件 被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成 使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。

公开(公告)号：US20230413411A1

公开(公告)日：2023-12-21

申请号：US18305946

申请日：2023-04-24

Applicant: GIGAPHOTON INC.

Inventor： Shogo KITASAKA ,  Yuichi NISHIMURA ,  Takayuki YABU

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033

Abstract: An EUV light generation system includes a chamber, a target supply device supplying a target to a plasma generation region in the chamber, a laser device outputting pulse laser light, a beam sensor measuring one of a position and an angle of an optical axis of the pulse laser light as a first optical characteristic, a first reflection control mirror whose angle is controlled, and a processor controlling the laser device. The processor calculates a first corrected angle based on a first attenuation curve defined by the angle of the first reflection control mirror at an end of an immediately preceding irradiation period, the angle of the first reflection control mirror at a cold state, an elapsed time from a start of the pause period, and a first time constant, and to change the angle of the first reflection control mirror to the first corrected angle, during a pause period.

公开(公告)号：US20230266677A1

公开(公告)日：2023-08-24

申请号：US18149998

申请日：2023-01-04

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Atsushi UEDA ,  Takayuki YABU

IPC: G03F7/20 ,  G03F1/24

CPC classification number: G03F7/70741 ,  G03F7/70841 ,  G03F1/24

Abstract: A target supply system includes a load lock chamber configured to contain a solid target substance, a solid target supply pipe connected to the load lock chamber, a pressure regulator configured to regulate an externally supplied gas pressure, a gas pressure supply pipe connected to the pressure regulator, a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance, a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe, and a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank.