EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20220232690A1

    公开(公告)日:2022-07-21

    申请号:US17457342

    申请日:2021-12-02

    Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    2.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    极致超紫外光发生系统

    公开(公告)号:US20140098830A1

    公开(公告)日:2014-04-10

    申请号:US14047753

    申请日:2013-10-07

    CPC classification number: H01S3/0085 H01S3/005 H01S3/2391 H05G2/005 H05G2/008

    Abstract: An extreme ultraviolet light generation system may include an optical device configured to cause an optical path of a pulse laser beam to approximately match one of a first optical path in which the pulse laser beam is focused at a plasma generation region and a second optical path in which the pulse laser beam passes outside the plasma generation region, and a control unit configured to output a control signal to the optical device so that the optical device sets the optical path of the pulse laser beam to the second optical path from when a predetermined time starts to when the number of pulses contained in a timing signal reaches a predetermined value and sets the optical path of the pulse laser beam to the first optical path from when the number of pulses reaches the predetermined value to when the predetermined time ends.

    Abstract translation: 极紫外光发生系统可以包括光学装置,其被配置为使脉冲激光束的光路近似地匹配脉冲激光束在等离子体产生区域聚焦的第一光路中的一个和第二光路中的第二光路 脉冲激光束通过等离子体产生区域以外的控制单元,以及控制单元,其配置为向光学装置输出控制信号,使得光学装置将脉冲激光束的光路从预定时间设定为第二光路 开始于当定时信号中包含的脉冲数达到预定值并且将脉冲激光束的光路从脉冲数达到预定值到当预定时间结束时设置为第一光路。

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

    公开(公告)号:US20160192469A1

    公开(公告)日:2016-06-30

    申请号:US14984458

    申请日:2015-12-30

    CPC classification number: H05G2/008 G03F7/70033 H05G2/003

    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

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