PHOTOELECTRIC CONVERSION APPARATUS AND EQUIPMENT

    公开(公告)号:US20210313369A1

    公开(公告)日:2021-10-07

    申请号:US17222743

    申请日:2021-04-05

    Abstract: A technique advantageous for improving an optical property of a photoelectric conversion apparatus is provided. The photoelectric conversion apparatus includes a photoelectric conversion layer and a light-shielding film that covers the photoelectric conversion layer, wherein the light-shielding film includes one metallic layer and another metallic layer located between the one metallic layer and the photoelectric conversion layer.

    SEMICONDUCTOR APPARATUS AND EQUIPMENT
    22.
    发明申请

    公开(公告)号:US20200251518A1

    公开(公告)日:2020-08-06

    申请号:US16749221

    申请日:2020-01-22

    Abstract: A semiconductor apparatus comprising: a first semiconductor component including a first semiconductor layer and a first insulation film; and a second semiconductor component including a second semiconductor layer and a second insulation film, wherein the first semiconductor component and the second semiconductor component are bonded to each other by each of a plurality of first electric conductor portions provided in the first insulation film and each of a plurality of second electric conductor portions provided in the second insulation film, each of the plurality of first electric conductor portions is constituted by one pad surrounded by the first insulation film and N vias bonded to the one pad so as to be positioned between the one pad and the first semiconductor layer, and a volume VTR of the one pad and a total volume VTH of the N vias satisfy VTR/VTH≥N.

    PHOTOELECTRIC CONVERSION APPARATUS AND EQUIPMENT

    公开(公告)号:US20200083263A1

    公开(公告)日:2020-03-12

    申请号:US16556964

    申请日:2019-08-30

    Abstract: A silicon compound film that is any one of a silicon oxide film, a silicon nitride film, and a silicon carbide film, and a metal compound film lying between the silicon compound film and a semiconductor layer are arranged above a main face. The silicon compound film and the metal compound film extend into a first trench, and the metal compound film extends into a second trench. When a distance from the bottom of the second trench to the silicon compound film is expressed as “Hb”, and a distance from the main face to the silicon compound film is expressed as “Hd”, the respective distances satisfy the condition “Hd

    Semiconductor apparatus, system, and method of producing semiconductor apparatus

    公开(公告)号:US10411058B2

    公开(公告)日:2019-09-10

    申请号:US15849229

    申请日:2017-12-20

    Abstract: A semiconductor apparatus includes a silicon layer including first and second semiconductor regions; an insulator film, on the silicon layer, having first and second holes positioned on the first and second semiconductor regions; a first metal portion containing a first metal element in the first hole; a first conductor portion containing a second metal element between the first metal portion and the first semiconductor region; a first silicide region containing the second metal element between the first conductor portion and the first semiconductor region; a second metal portion containing the first metal element in the second hole; a second conductor portion containing the second metal element between the second metal portion and the second semiconductor region; and a second silicide region containing a third metal element between the second conductor portion and the second semiconductor region, wherein the first conductor portion thickness is greater than the second conductor portion thickness.

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