Method for fabricating flexible display substrate

    公开(公告)号:US10910451B2

    公开(公告)日:2021-02-02

    申请号:US16457261

    申请日:2019-06-28

    Abstract: A method for fabricating a flexible display substrate is provided. The method includes: forming a separation structure on a rigid substrate such that the separation structure includes a first separation layer and a second separation layer; forming a flexible substrate on the separation structure; forming a display element on the flexible substrate; and separating the first separation layer and the second separation layer of the separation structure mechanically to separate the rigid substrate from the flexible substrate.

    Array substrate and method for manufacturing the same, and display device
    24.
    发明授权
    Array substrate and method for manufacturing the same, and display device 有权
    阵列基板及其制造方法以及显示装置

    公开(公告)号:US09165954B2

    公开(公告)日:2015-10-20

    申请号:US14104318

    申请日:2013-12-12

    Abstract: The present invention provides an array substrate and a method for manufacturing the same, and a display device. In the method for manufacturing the array substrate, a one-time patterning process is employed to form a channel region, a source electrode and a drain electrode of the array substrate. Specifically, a channel region, a source region and a drain region that are consisted of a metal oxide layer are formed via a one-time patterning process, and a heat treatment is carried out on the metal oxide layer of the source region and the drain region in hydrogen gas, thereby forming a conducting source electrode and a conducting drain electrode, respectively. By the technical solution of the invention, the manufacturing process of the array substrate can be simplified, and the manufacturing cost of the array substrate can be lowered.

    Abstract translation: 本发明提供一种阵列基板及其制造方法以及显示装置。 在阵列基板的制造方法中,使用一次图案化工序来形成阵列基板的沟道区域,源电极和漏电极。 具体地,通过一次构图工艺形成由金属氧化物层构成的沟道区域,源极区域和漏极区域,并且对源极区域和漏极的金属氧化物层进行热处理 区域,从而分别形成导电源电极和导电漏电极。 通过本发明的技术方案,能够简化阵列基板的制造工序,降低阵列基板的制造成本。

    Thin film transistor array substrate and method for manufacturing the same
    25.
    发明授权
    Thin film transistor array substrate and method for manufacturing the same 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号:US08952387B2

    公开(公告)日:2015-02-10

    申请号:US13822920

    申请日:2012-11-28

    Abstract: According to embodiments of the present invention, there are provided a TFT array substrate, a method for manufacturing the TFT array substrate and an electronic device. The method for manufacturing the TFT array substrate includes: a first patterning process, in which a pattern of a pixel electrode formed by a first transparent conductive layer and patterns of a drain electrode and a source electrode that are separated from each other and a data line, which are formed by a first metal layer, are formed on a transparent substrate; a second patterning process, in which a pattern of a gate insulating layer and a pattern of an active layer formed by a transparent oxide layer are formed on the transparent substrate subjected to the first patterning process; and a third patterning process, in which a pattern of a common electrode formed by a second transparent conductive layer and patterns of a gate electrode and a gate line which are formed by a second metal layer are formed on the transparent substrate subjected to the second patterning process.

    Abstract translation: 根据本发明的实施例,提供了TFT阵列基板,TFT阵列基板的制造方法和电子设备。 制造TFT阵列基板的方法包括:第一图案形成工艺,其中由第一透明导电层形成的像素电极的图案和彼此分离的漏极和源电极的图案以及数据线 由第一金属层形成,形成在透明基板上; 第二图案化工艺,其中在经过第一图案化工艺的透明衬底上形成栅极绝缘层的图案和由透明氧化物层形成的有源层的图案; 以及第三图案化工艺,其中通过第二透明导电层形成的公共电极的图案和由第二金属层形成的栅电极和栅极线的图案形成在经过第二图案化的透明基板上 处理。

    THIN FILM TRANSISTOR ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC DEVICE
    26.
    发明申请
    THIN FILM TRANSISTOR ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC DEVICE 有权
    薄膜晶体管阵列基板,其制造方法和电子器件

    公开(公告)号:US20140183519A1

    公开(公告)日:2014-07-03

    申请号:US13822920

    申请日:2012-11-28

    Abstract: According to embodiments of the present invention, there are provided a TFT array substrate, a method for manufacturing the TFT array substrate and an electronic device. The method for manufacturing the TFT array substrate comprises: a first patterning process, in which a pattern of a pixel electrode formed by a first transparent conductive layer and patterns of a drain electrode and a source electrode that are separated from each other and a data line, which are formed by a first metal layer, are formed on a transparent substrate; a second patterning process, in which a pattern of a gate insulating layer and a pattern of an active layer formed by a transparent oxide layer are formed on the transparent substrate subjected to the first patterning process; and a third patterning process, in which a pattern of a common electrode formed by a second transparent conductive layer and patterns of a gate electrode and a gate line which are formed by a second metal layer are formed on the transparent substrate subjected to the second patterning process.

    Abstract translation: 根据本发明的实施例,提供了TFT阵列基板,TFT阵列基板的制造方法和电子设备。 制造TFT阵列基板的方法包括:第一图案化工艺,其中由第一透明导电层形成的像素电极的图案以及彼此分离的漏电极和源电极的图案以及数据线 由第一金属层形成,形成在透明基板上; 第二图案化工艺,其中在经过第一图案化工艺的透明衬底上形成栅极绝缘层的图案和由透明氧化物层形成的有源层的图案; 以及第三图案化工艺,其中通过第二透明导电层形成的公共电极的图案和由第二金属层形成的栅电极和栅极线的图案形成在经过第二图案化的透明基板上 处理。

    DISPLAY DEVICE, THIN FILM TRANSISTOR, ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
    27.
    发明申请
    DISPLAY DEVICE, THIN FILM TRANSISTOR, ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF 有权
    显示装置,薄膜​​晶体管,阵列基板及其制造方法

    公开(公告)号:US20140091331A1

    公开(公告)日:2014-04-03

    申请号:US13703483

    申请日:2012-09-29

    Abstract: The embodiments of the invention provide a display device, a thin film transistor, an array substrate and a manufacturing method thereof. The manufacturing method comprises: step A, forming patterns of a source electrode, a drain electrode, a data line and a pixel electrode; step B, forming an active layer and agate insulating layer in order, and forming a via hole in the gate insulating layer for connecting the data line and an external circuit; and step C, forming patterns of a gate electrode, a gate line and a common electrode line, or forming a pattern of a gate electrode, a gate line and a common electrode.

    Abstract translation: 本发明的实施例提供一种显示装置,薄膜​​晶体管,阵列基板及其制造方法。 制造方法包括:步骤A,形成源电极,漏电极,数据线和像素电极的图案; 步骤B,依次形成有源层和玛瑙绝缘层,并在用于连接数据线和外部电路的栅极绝缘层中形成通孔; 和步骤C,形成栅电极,栅极线和公共电极线的图案,或形成栅电极,栅极线和公共电极的图案。

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