公开(公告)号：US20070164431A1

公开(公告)日：2007-07-19

申请号：US11549933

申请日：2006-10-16

Applicant: In Young LEE ,  Hyun-Soo CHUNG ,  Dong-Ho LEE ,  Sung-Min SIM ,  Dong-Soo SEO ,  Seung-Kwan RYU ,  Myeong-Soon PARK

Inventor： In Young LEE ,  Hyun-Soo CHUNG ,  Dong-Ho LEE ,  Sung-Min SIM ,  Dong-Soo SEO ,  Seung-Kwan RYU ,  Myeong-Soon PARK

IPC: H01L23/48 ,  H01L21/44

CPC classification number: H01L23/3114 ,  H01L23/5222 ,  H01L23/525 ,  H01L24/11 ,  H01L24/12 ,  H01L2224/0231 ,  H01L2224/02313 ,  H01L2224/0236 ,  H01L2224/024 ,  H01L2224/0401 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/16 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/30105 ,  H01L2924/351 ,  H01L2924/00

Abstract: A wafer level chip scale package capable of reducing parasitic capacitances between a rerouting and the metal wiring of a wafer, and a method for manufacturing the same are provided. An embodiment of the wafer level chip scale package includes a wafer arranged with a plurality of bonding pads and an insulating member formed on the wafer so that the bonding pads are exposed. A rerouting is further formed on the insulating member in contact with the exposed bonding pads and an external connecting terminal is electrically connected to a portion of the rerouting. Here, the insulating member overlapping the rerouting is provided with a plurality of spaces in which air is trapped.

Abstract translation: 提供能够降低重新布线和晶片的金属布线之间的寄生电容的晶片级芯片级封装及其制造方法。 晶片级芯片级封装的实施例包括具有多个接合焊盘的晶片和形成在晶片上的绝缘部件，使得焊盘露出。 在与暴露的接合焊盘接触的绝缘构件上进一步形成再路由，并且外部连接端子电连接到重新布线的一部分。 这里，与重新路由重叠的绝缘构件设置有空气被捕获的多个空间。

公开(公告)号：US20070069320A1

公开(公告)日：2007-03-29

申请号：US11486041

申请日：2006-07-14

Applicant: In-Young Lee ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Hyun-Soo Chung ,  Jae-Sik Chung ,  Seung-Kwan Ryu ,  Myeong-Soon Park ,  Jong-Kook Yoon ,  Ju-Il Choi

Inventor： In-Young Lee ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Hyun-Soo Chung ,  Jae-Sik Chung ,  Seung-Kwan Ryu ,  Myeong-Soon Park ,  Jong-Kook Yoon ,  Ju-Il Choi

IPC: H01L31/00

CPC classification number: H01L24/12 ,  H01L23/3114 ,  H01L24/11 ,  H01L24/94 ,  H01L2224/0231 ,  H01L2224/0401 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/114 ,  H01L2224/1148 ,  H01L2224/116 ,  H01L2224/13099 ,  H01L2224/274 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/00014 ,  H01L2924/013

Abstract: A wiring structure may include a pad, a conductive pattern and an insulating photoresist structure. The pad may be provided on a body and electrically connected to a circuit unit of the body. The conductive pattern may be provided on the body and may be electrically connected to the pad. The insulating photoresist structure may be provided on a surface of the conductive pattern. The insulating photoresist structure may have a contact hole through which the conductive pattern may be partially exposed. The insulating photoresist structure may be fabricated by providing a photosensitive photoresist film on the conductive layer, and patterning the photosensitive photoresist film by two photo processes.

Abstract translation: 布线结构可以包括垫，导电图案和绝缘光致抗蚀剂结构。 垫可以设置在主体上并电连接到主体的电路单元。 导电图案可以设置在主体上并且可以电连接到垫。 绝缘光致抗蚀剂结构可以设置在导电图案的表面上。 绝缘光致抗蚀剂结构可以具有接触孔，导电图案可以通过该接触孔部分地暴露。 绝缘光致抗蚀剂结构可以通过在导电层上提供感光性光致抗蚀剂膜，并通过两个照相工艺对感光性光刻胶膜进行图案化来制造。

公开(公告)号：US20060118972A1

公开(公告)日：2006-06-08

申请号：US11339973

申请日：2006-01-26

Applicant: Seung-Duk Baek ,  In-Young Lee ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Hyun-Soo Chung ,  Young-Hee Song ,  Myeong-Soon Park

Inventor： Seung-Duk Baek ,  In-Young Lee ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Hyun-Soo Chung ,  Young-Hee Song ,  Myeong-Soon Park

IPC: H01L23/48

CPC classification number: H01L23/481 ,  H01L21/78 ,  H01L23/3128 ,  H01L23/525 ,  H01L24/02 ,  H01L24/10 ,  H01L24/13 ,  H01L25/0657 ,  H01L2224/0401 ,  H01L2224/13 ,  H01L2224/13099 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/0652 ,  H01L2225/06524 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2225/06551 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01024 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/30107 ,  H01L2924/00

Abstract: Packaged integrated circuit devices include a package substrate and a multi-chip stack of integrated circuit devices on the package substrate. The multi-chip stack includes at least one chip-select rerouting conductor. This rerouting conductor extends from the package substrate to a chip pad on an upper one of the chips in the multi-chip stack. The chip-select rerouting conductor extends through a first via hole in a lower one of the chips in the multi-chip stack.

公开(公告)号：US20060060970A1

公开(公告)日：2006-03-23

申请号：US11195361

申请日：2005-08-01

Applicant: Se-Young Jeong ,  Sung-Min Sim ,  Soon-Bum Kim ,  In-Young Lee ,  Young-Hee Song

Inventor： Se-Young Jeong ,  Sung-Min Sim ,  Soon-Bum Kim ,  In-Young Lee ,  Young-Hee Song

IPC: H01L23/48

CPC classification number: H01L24/05 ,  H01L23/3192 ,  H01L24/03 ,  H01L24/11 ,  H01L24/12 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05018 ,  H01L2224/05556 ,  H01L2224/05558 ,  H01L2224/05571 ,  H01L2224/05572 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/16 ,  H01L2924/0002 ,  H01L2924/01005 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/14 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2224/05552

Abstract: An interconnection structure includes an integrated circuit (IC) chip having internal circuitry and a terminal to electrically connect the internal circuitry to an external circuit, a passivation layer disposed on a top surface of the IC chip, the passivation layer configured to protect the internal circuitry and to expose the terminal, an input/output (I/O) pad, where the I/O pad includes a first portion in contact with the terminal and a second portion that extends over the passivation layer, and an electroless plating layer disposed on the I/O pad.

Abstract translation: 互连结构包括具有内部电路的集成电路（IC）芯片和用于将内部电路电连接到外部电路的端子，设置在IC芯片的顶表面上的钝化层，钝化层被配置为保护内部电路 以及使所述终端暴露于所述I / O焊盘包括与所述端子接触的第一部分和在所述钝化层上延伸的第二部分的输入/输出（I / O）焊盘，以及设置在所述钝化层上的无电镀层 I / O板。

公开(公告)号：US20060019467A1

公开(公告)日：2006-01-26

申请号：US11147677

申请日：2005-06-08

Applicant: In-Young Lee ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Hyun-Soo Chung ,  Young-Hee Song ,  Myeong-Soon Park

Inventor： In-Young Lee ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Hyun-Soo Chung ,  Young-Hee Song ,  Myeong-Soon Park

IPC: H01L21/78

CPC classification number: H01L23/481 ,  H01L21/78 ,  H01L23/3128 ,  H01L23/525 ,  H01L24/02 ,  H01L24/10 ,  H01L24/13 ,  H01L25/0657 ,  H01L2224/0401 ,  H01L2224/13 ,  H01L2224/13099 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/0652 ,  H01L2225/06524 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2225/06551 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01024 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/30107 ,  H01L2924/00

Abstract: Methods of forming integrated circuit chips include forming a plurality of criss-crossing grooves in a semiconductor wafer having a plurality of contact pads thereon and filling the criss-crossing grooves with an electrically insulating layer. The electrically insulating layer is then patterned to define at least first and second through-holes therein that extend in a first one of the criss-crossing groves. The first and second through-holes are then filled with first and second through-chip connection electrodes, respectively. The semiconductor wafer is then diced into a plurality of integrated circuit chips by cutting through the electrically insulating layer in a criss-crossing pattern that overlaps with the locations of the criss-crossing grooves.

Abstract translation: 形成集成电路芯片的方法包括在其上具有多个接触焊盘的半导体晶片中形成多个交叉交叉的沟槽，并用电绝缘层填充交叉沟槽。 然后对电绝缘层进行图案化以在其中限定至少第一和第二通孔，该第一和第二通孔在第一个十字交叉的树丛中延伸。 然后分别用第一和第二贯通芯片连接电极填充第一和第二通孔。 然后通过与交叉交叉的沟槽的位置重叠的交叉图案切割电绝缘层，将半导体晶片切割成多个集成电路芯片。

公开(公告)号：US20090020878A1

公开(公告)日：2009-01-22

申请号：US12014600

申请日：2008-01-15

Applicant: Seung-Kwan RYU ,  Hee-Kook CHOI ,  Sung-Min SIM ,  Dong-Hyeon JANG

Inventor： Seung-Kwan RYU ,  Hee-Kook CHOI ,  Sung-Min SIM ,  Dong-Hyeon JANG

IPC: H01L21/768 ,  H01L23/52

CPC classification number: H01L23/3114 ,  H01L24/05 ,  H01L2224/02166 ,  H01L2224/0231 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05548 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01021 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01059 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/30105

Abstract: A semiconductor package is provided. The semiconductor package includes a semiconductor device having a bonding pad and an interlayer insulating layer disposed on the semiconductor device. The interlayer insulating layer has an opening which exposes the bonding pad and has at least one cavity therein. A redistributed interconnection is disposed on the interlayer insulating layer and electrically connected to the exposed bonding pad. The redistributed interconnection is disposed over the cavity. A method of fabricating the semiconductor package is also provided.

Abstract translation: 提供半导体封装。 半导体封装包括具有接合焊盘和设置在半导体器件上的层间绝缘层的半导体器件。 层间绝缘层具有露出接合焊盘并且在其中具有至少一个空腔的开口。 重新分布的互连布置在层间绝缘层上并电连接到暴露的焊盘。 再分布的互连设置在空腔上。 还提供了制造半导体封装的方法。

公开(公告)号：US07151009B2

公开(公告)日：2006-12-19

申请号：US11038210

申请日：2005-01-21

Applicant: Soon-Bum Kim ,  Ung-Kwang Kim ,  Kang-Wook Lee ,  Se-Young Jeong ,  Young-Hee Song ,  Sung-min Sim

Inventor： Soon-Bum Kim ,  Ung-Kwang Kim ,  Kang-Wook Lee ,  Se-Young Jeong ,  Young-Hee Song ,  Sung-min Sim

IPC: H01L21/44 ,  H01L21/48

CPC classification number: H01L21/563 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/481 ,  H01L24/29 ,  H01L24/32 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05573 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/274 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/8121 ,  H01L2224/81815 ,  H01L2224/83191 ,  H01L2224/83194 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06582 ,  H01L2924/01006 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/3511 ,  H01L2924/00

Abstract: Provided is a method for manufacturing WLCSP devices that includes preparing at least two wafers, each wafer having a plurality of corresponding semiconductor chips, each semiconductor chip having through electrodes formed in the peripheral surface region, forming or applying a solid adhesive region to a central surface region, stacking a plurality of wafers and attaching corresponding chips provided on adjacent wafers with the solid adhesive region and connecting corresponding through electrodes of adjacent semiconductor chips, dividing the stacked wafers into individual chip stack packages, and injecting a liquid adhesive into a space remaining between adjacent semiconductor chips incorporated in the resulting chip stack package. By reducing the likelihood of void regions between adjacent semiconductor chips, it is expected that a method according to the exemplary embodiments of the present invention exhibit improved mechanical stability and reliability.

Abstract translation: 提供了一种制造WLCSP器件的方法，其包括制备至少两个晶片，每个晶片具有多个对应的半导体芯片，每个半导体芯片具有形成在外围表面区域中的通孔，形成或施加固体粘合剂区域到中心表面 区域，堆叠多个晶片，并将设置在相邻晶片上的相应芯片与固体粘合剂区域连接并且通过相邻半导体芯片的电极相对应地连接，将堆叠的晶片分成单独的芯片堆叠封装，并将液体粘合剂注入到 相邻的半导体芯片结合在所得的芯片堆叠封装中。 通过降低相邻半导体芯片之间的空隙区域的可能性，预期根据本发明的示例性实施例的方法表现出改进的机械稳定性和可靠性。

公开(公告)号：US20050280160A1

公开(公告)日：2005-12-22

申请号：US11038210

申请日：2005-01-21

Applicant: Soon-Bum Kim ,  Ung-Kwang Kim ,  Kang-Wook Lee ,  Se-Young Jeong ,  Young-Hee Song ,  Sung-Min Sim

Inventor： Soon-Bum Kim ,  Ung-Kwang Kim ,  Kang-Wook Lee ,  Se-Young Jeong ,  Young-Hee Song ,  Sung-Min Sim

IPC: H01L21/44 ,  H01L21/56 ,  H01L21/60 ,  H01L21/98 ,  H01L23/31 ,  H01L23/48 ,  H01L25/065

CPC classification number: H01L21/563 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/481 ,  H01L24/29 ,  H01L24/32 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05573 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/274 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/8121 ,  H01L2224/81815 ,  H01L2224/83191 ,  H01L2224/83194 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06582 ,  H01L2924/01006 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/3511 ,  H01L2924/00

Abstract: Provided is a method for manufacturing WLCSP devices that includes preparing at least two wafers, each wafer having a plurality of corresponding semiconductor chips, each semiconductor chip having through electrodes formed in the peripheral surface region, forming or applying a solid adhesive region to a central surface region, stacking a plurality of wafers and attaching corresponding chips provided on adjacent wafers with the solid adhesive region and connecting corresponding through electrodes of adjacent semiconductor chips, dividing the stacked wafers into individual chip stack packages, and injecting a liquid adhesive into a space remaining between adjacent semiconductor chips incorporated in the resulting chip stack package. By reducing the likelihood of void regions between adjacent semiconductor chips, it is expected that a method according to the exemplary embodiments of the present invention exhibit improved mechanical stability and reliability.

Abstract translation: 提供了一种制造WLCSP器件的方法，其包括制备至少两个晶片，每个晶片具有多个对应的半导体芯片，每个半导体芯片具有形成在外围表面区域中的通孔，形成或施加固体粘合剂区域到中心表面 区域，堆叠多个晶片，并将设置在相邻晶片上的相应芯片与固体粘合剂区域连接并且通过相邻半导体芯片的电极相对应地连接，将堆叠的晶片分成单独的芯片堆叠封装，并将液体粘合剂注入到 相邻的半导体芯片结合在所得的芯片堆叠封装中。 通过降低相邻半导体芯片之间的空隙区域的可能性，预期根据本发明的示例性实施例的方法表现出改进的机械稳定性和可靠性。

公开(公告)号：US20050277293A1

公开(公告)日：2005-12-15

申请号：US11145994

申请日：2005-06-07

Applicant: Soon-Bum Kim ,  Ung-Kwang Kim ,  Keum-Hee Ma ,  Young-Hee Song ,  Sung-Min Sim ,  Se-Yong Oh ,  Kang-Wook Lee ,  Se-Young Jeong

Inventor： Soon-Bum Kim ,  Ung-Kwang Kim ,  Keum-Hee Ma ,  Young-Hee Song ,  Sung-Min Sim ,  Se-Yong Oh ,  Kang-Wook Lee ,  Se-Young Jeong

IPC: H01L23/28 ,  C25D5/02 ,  C25D7/12 ,  H01L21/288 ,  H01L21/48 ,  H01L21/60 ,  H01L21/768 ,  H01L23/31 ,  H01L23/48

CPC classification number: C25D7/12 ,  C25D5/02 ,  H01L21/2885 ,  H01L21/76898 ,  H01L23/3114 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L2224/02166 ,  H01L2224/0401 ,  H01L2224/05554 ,  H01L2224/05599 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/13009 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/16 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01022 ,  H01L2924/01024 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/00

Abstract: A method of fabricating wafer level chip scale packages may involve forming a hole to penetrate through a chip pad of an IC chip. A base metal layer may be formed on a first face of a wafer to cover inner surfaces of the hole. An electrode metal layer may fill the hole and rise over the chip pad. A second face of the wafer may be grinded such that the electrode metal layer in the hole may be exposed through the second face. By electroplating, a plated bump may be formed on the electrode metal layer exposed through the second face. The base metal layer may be selectively removed to isolate adjacent electrode metal layers. The wafer may be sawed along scribe lanes to separate individual packages from the wafer.

Abstract translation: 制造晶片级芯片级封装的方法可包括形成穿透IC芯片的芯片焊盘的孔。 基底金属层可以形成在晶片的第一面上以覆盖孔的内表面。 电极金属层可以填充孔并在芯片垫上升起。 可以研磨晶片的第二面，使得孔中的电极金属层可以通过第二面露出。 通过电镀，可以在通过第二面暴露的电极金属层上形成电镀凸块。 可以选择性地去除贱金属层以隔离相邻的电极金属层。 可以沿着划线锯切晶片以将单独的封装与晶片分开。

公开(公告)号：US06423654B1

公开(公告)日：2002-07-23

申请号：US09499955

申请日：2000-02-08

Applicant: Sung-Min Sim ,  Young-Goan Jang

Inventor： Sung-Min Sim ,  Young-Goan Jang

IPC: H01L21469

CPC classification number: H01L21/76801 ,  C23C16/308 ,  H01L21/3145 ,  Y10S438/909

Abstract: There is provided a semiconductor device having a silicon oxynitride passivation layer and a fabrication method thereof. The passivation layer is formed of a silicon oxynitride having a dielectric constant of 5.0-6.0 and an atomic composition ratio of silicon (25-40%), oxygen (25-40%), and nitrogen (25-40%). Therefore, the passivation layer has a low dielectric constant and is highly moisture-resistant to thereby reduce the parasitic capacitance between metal wiring layers.

Abstract translation: 提供了具有氮氧化硅钝化层的半导体器件及其制造方法。 钝化层由介电常数为5.0-6.0，硅（25-40％），氧（25-40％）和氮（25-40％）的原子组成比的氮氧化硅形成。 因此，钝化层的介电常数低，耐湿度高，从而降低金属布线层之间的寄生电容。