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21.发明申请公开(公告)号：US20150110972A1
公开(公告)日：2015-04-23
申请号：US14144184
申请日：2013-12-30
Inventor： Kwang Il Chang , Chul Kyu Song , Dha Hae Kim , Seung Hun Hur
CPC classification number: C09K5/14 , B05D1/005 , B05D1/02 , B05D1/18 , B05D1/28 , B05D1/305 , C03C17/006 , C03C17/22 , C03C2218/11 , C03C2218/31 , C04B35/013 , C04B35/14 , C04B35/46 , C04B35/62222 , C04B35/624 , C04B35/62635 , C04B35/6264 , C04B35/64 , C04B2235/3232 , C04B2235/3418 , C04B2235/425 , C04B2235/666 , C04B2235/9607
Abstract: Disclosed are a graphene-ceramic hybrid coating layer formed from a graphene-ceramic hybrid sol solution including graphene (RGO: reduced graphene oxide) and a ceramic sol, wherein the graphene content in the graphene-ceramic hybrid coating layer is about 0.001 wt % to about 1.8 wt % based on the total weight of the graphene-ceramic hybrid coating layer, and a method for preparing the same.
Abstract translation: 公开了由包括石墨烯（RGO：还原型氧化烯石墨烯）和陶瓷溶胶的石墨烯 - 陶瓷杂化溶胶溶液形成的石墨烯 - 陶瓷混合涂层，其中石墨烯 - 陶瓷混合涂层中的石墨烯含量为约0.001重量％ 基于石墨烯 - 陶瓷混合涂层的总重量为约1.8重量％及其制备方法。
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22.发明申请公开(公告)号：US20250146169A1
公开(公告)日：2025-05-08
申请号：US18816567
申请日：2024-08-27
Inventor： Si Young BAE , Seong Min JEONG , Yun Ji SHIN , Tae Hun Gu , A Ran SHIN
Abstract: The present invention relates to a method for growing a gallium oxide single crystal and an apparatus for growing a single crystal, and according to one aspect of the present invention, the method includes providing a gallium oxide raw material in a crucible containing iridium, injecting carbon dioxide so that a preset carbon dioxide partial pressure is formed to suppress the loss of iridium, melting the gallium oxide raw material provided in the crucible, and producing a gallium oxide single crystal from the melt.
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公开(公告)号：US20240158953A1
公开(公告)日：2024-05-16
申请号：US18224396
申请日：2023-07-20
Applicant: Korea Institute of Ceramic Engineering and Technology , Electronics and Telecommunications Research Institute
Inventor： Dae-Woo JEON , Ji-Hyeon PARK , Jae-Kyoung MUN
Abstract: Disclosed are an alpha gallium oxide thin-film structure having high conductivity obtained using selective area growth in a HVPE growth manner, and a method for manufacturing the same, in which a nitride-based nitride film pattern is formed on an alpha gallium oxide thin-film so as to expose only a selected area thereof, and re-growth is performed only on the partially exposed area thereof, thereby forming a high-quality patterned alpha gallium oxide re-growth pattern.
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公开(公告)号：US20240124363A1
公开(公告)日：2024-04-18
申请号：US18226694
申请日：2023-07-26
Applicant: HYUNDAI MOTOR COMPANY , KIA CORPORATION , KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY
Inventor： Hyung Suk Kim , Hyo Soon Shin , Dong Hun Yeo , Jeoung Sik Choi
IPC: C04B35/515 , H01G4/008
CPC classification number: C04B35/5156 , H01G4/008 , C04B2235/3227 , C04B2235/3232 , C04B2235/3244 , C04B2235/3284 , C04B2235/3293 , C04B2235/3296 , C04B2235/77
Abstract: An antiferroelectric and a method for manufacturing an antiferroelectric are disclosed herein. The antiferroelectric may have high permittivity and breakdown voltage by having a PbxLa1-x([Zr1-YSnY]ZTi1-Z) composition. The manufacturing of the antiferroelectric may be performed through appropriate mixing and dysprosium addition.
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公开(公告)号：US20230303452A1
公开(公告)日：2023-09-28
申请号：US18082247
申请日：2022-12-15
Applicant: HYUNDAI MOTOR COMPANY , KIA CORPORATION , KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY
Inventor： Hyung Suk Kim , Hyo Soon Shin , Dong Hun Yeo , Jeoung Sik Choi
IPC: C04B35/515 , H01G4/008 , C04B41/00
CPC classification number: C04B35/5156 , H01G4/008 , C04B41/0072 , C04B2235/3296 , C04B2235/3244 , C04B2235/3232 , C04B2235/3227 , C04B2235/3293 , C04B2235/66 , C04B2235/96
Abstract: A high permittivity antiferroelectric composition and a manufacturing method thereof aim to provide an antiferroelectric, which has a PbxLa1-x([Zr1-YSnY]ZTi1-Z) composition, is sintered at low temperatures, and has a high density and a high permittivity.
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Patent Agency Ranking
公开(公告)号：US20230215701A1
公开(公告)日：2023-07-06
申请号：US17978778
申请日：2022-11-01
Inventor： Sung min LEE , Yoon Suk OH
CPC classification number: H01J37/32477 , H01J37/1474 , C23C14/30 , C23C14/243 , C23C14/0694 , C23C14/505 , C23C14/26 , C23C14/083 , H01J2237/182 , H01J37/06
Abstract: The present invention relates to a method of forming a plasma resistant oxyfluoride coating layer, including: mounting a substrate on a substrate holder provided in a chamber; causing an electron beam scanned from an electron gun to be incident on an oxide evaporation source accommodated in a first crucible, and heating, melting, and vaporizing the oxide evaporation source as the electron beam is incident on the oxide evaporation source; vaporizing a fluoride accommodated in a second crucible; and advancing an evaporation gas generated from the oxide evaporation source and a fluorine-containing gas generated from the fluoride toward the substrate, and reacting the evaporation gas generated from the oxide evaporation source and the fluorine-containing gas generated from the fluoride to deposit an oxyfluoride on the substrate. According to the present invention, it is possible to form a dense and stable oxyfluoride coating layer having excellent plasma resistance, suppressed generation of contaminant particles, and no cracks.
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公开(公告)号：US20230043972A1
公开(公告)日：2023-02-09
申请号：US17787888
申请日：2020-11-19
Inventor： Dae Gean KIM , Hye Won SEOK , Mun Ki LEE , Hyeong Jun KIM
Abstract: The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO2, 5-15 mol % of Al2O3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index KH is 2.0 or higher, and a plasma-resistant characteristic of an etch rate of lower than 10 nm/min for a mixed plasma of fluorine and argon (Ar) is exhibited.
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28.发明授权公开(公告)号：US11476116B2
公开(公告)日：2022-10-18
申请号：US17358284
申请日：2021-06-25
Inventor： Dae-Woo Jeon , Ji-Hyeon Park
IPC: H01L21/02 , H01L21/265
Abstract: Disclosed is a method of manufacturing a gallium oxide thin film for a power semiconductor using a dopant activation technology that maximizes dopant activation effect and rearrangement effect of lattice in a grown epitaxial at the same time by performing in-situ annealing in a growth condition of a nitrogen atmosphere at the same time as the growth of a doped layer is finished.
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29.发明申请公开(公告)号：US20220205499A1
公开(公告)日：2022-06-30
申请号：US17541153
申请日：2021-12-02
Inventor： Kwang Taek HWANG , Jin Ho Kim , Junghun Kim , Cheongsoo Choi
Abstract: The present invention relates to a collection apparatus for collecting particulate matter generated due to friction between a rotor and a brake pad in a brake system of a transport facility, the collection apparatus including a first collector configured to surround a portion of an outer side surface of the rotor, an upper collector configured to surround a portion of an outer peripheral surface of the rotor, and a second collector configured to surround a portion of an inner side surface of the rotor, wherein the first collector and the second collector are made of porous ceramic foam. According to the present invention, particulate matter generated due to friction between a rotor and a brake pad in a brake system of a transport facility can be efficiently collected, and by reducing the amount of particulate matter generated when braking a transport facility, air pollution can be prevented.
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公开(公告)号：US20210395102A1
公开(公告)日：2021-12-23
申请号：US17294818
申请日：2019-03-12
Inventor： Woo Teck KWON , Jung Hyun KIM , Yoon Joo LEE , Dong Geun SHIN , Jung Won BANG
Abstract: The present invention provides a method for manufacturing a composite carbonate in a semi-dry manner by using combustion ash and, more specifically, provides a method for manufacturing a composite carbonate in a semi-dry manner by using combustion ash, the method comprising a step of adding a small amount of water to combustion ash containing calcium ions in an atmosphere of carbon dioxide. According to the present invention, carbon mineralization is carried out in a semi-dry manner by the manufacturing method, so that the composite carbonate can be efficiently produced. In addition, the composite carbonate can be utilized as a component for a concrete composition.
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